SG11201804308YA - Tape for wafer processing - Google Patents

Tape for wafer processing

Info

Publication number
SG11201804308YA
SG11201804308YA SG11201804308YA SG11201804308YA SG11201804308YA SG 11201804308Y A SG11201804308Y A SG 11201804308YA SG 11201804308Y A SG11201804308Y A SG 11201804308YA SG 11201804308Y A SG11201804308Y A SG 11201804308YA SG 11201804308Y A SG11201804308Y A SG 11201804308YA
Authority
SG
Singapore
Prior art keywords
tape
wafer processing
wafer
processing
Prior art date
Application number
SG11201804308YA
Other languages
English (en)
Inventor
Satoshi Ota
Akira Akutsu
Original Assignee
Furukawa Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Electric Co Ltd filed Critical Furukawa Electric Co Ltd
Publication of SG11201804308YA publication Critical patent/SG11201804308YA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J201/00—Adhesives based on unspecified macromolecular compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/20—Adhesives in the form of films or foils characterised by their carriers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape

Landscapes

  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Dicing (AREA)
  • Adhesive Tapes (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
SG11201804308YA 2016-03-02 2017-02-23 Tape for wafer processing SG11201804308YA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016040085 2016-03-02
PCT/JP2017/006810 WO2017150330A1 (fr) 2016-03-02 2017-02-23 Bande de traitement de plaquette

Publications (1)

Publication Number Publication Date
SG11201804308YA true SG11201804308YA (en) 2018-06-28

Family

ID=59742878

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201804308YA SG11201804308YA (en) 2016-03-02 2017-02-23 Tape for wafer processing

Country Status (6)

Country Link
JP (1) JP6831831B2 (fr)
KR (1) KR102233439B1 (fr)
CN (1) CN108541338A (fr)
SG (1) SG11201804308YA (fr)
TW (1) TW201739870A (fr)
WO (1) WO2017150330A1 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7400263B2 (ja) * 2018-08-23 2023-12-19 東レ株式会社 フィルム、及びフィルムの製造方法
KR102332928B1 (ko) * 2019-08-07 2021-12-01 주식회사 아이센스 연속 혈당 측정 장치용 신체 부착 유닛의 보조 접착 패치
JP2021061325A (ja) * 2019-10-07 2021-04-15 倉敷紡績株式会社 ダイシングシートおよびダイシングシート用基材フィルム
WO2021130823A1 (fr) 2019-12-23 2021-07-01 昭和電工マテリアルズ株式会社 Film intégré de découpage en dés/collage de puces, procédé de gestion de qualité associé et procédé de fabrication de dispositif à semi-conducteur

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002256239A (ja) * 2001-03-05 2002-09-11 Hitachi Chem Co Ltd 接着フィルム、それを用いた半導体装置の製造方法及び半導体装置
JP4876451B2 (ja) * 2005-06-27 2012-02-15 日立化成工業株式会社 接着シート
JP4762671B2 (ja) * 2005-10-26 2011-08-31 古河電気工業株式会社 ダイシングテープ、および半導体ウェハダイシング方法
US9324592B2 (en) * 2007-09-14 2016-04-26 Furukawa Electric Co., Ltd. Wafer processing tape
JP4360653B2 (ja) * 2007-09-14 2009-11-11 古河電気工業株式会社 ウエハ加工用テープ
JP5090241B2 (ja) * 2008-04-17 2012-12-05 リンテック株式会社 ダイソート用シート
JP5391158B2 (ja) * 2010-06-30 2014-01-15 古河電気工業株式会社 ウエハ貼着用粘着シートおよびそれを用いたウエハの加工方法
JP5733049B2 (ja) * 2011-06-23 2015-06-10 日立化成株式会社 接着シート、接着シートの製造方法、接着シートロール、半導体装置の製造方法、及び半導体装置
JP5889026B2 (ja) * 2012-02-10 2016-03-22 古河電気工業株式会社 ウエハ加工用テープ
WO2014046121A1 (fr) * 2012-09-20 2014-03-27 リンテック株式会社 Stratifié de feuille pelable/feuille de découpe laser, feuille de découpe laser et procédé de fabrication de puce
JP5583724B2 (ja) * 2012-09-20 2014-09-03 リンテック株式会社 レーザーダイシングシート−剥離シート積層体、レーザーダイシングシートおよびチップ体の製造方法
JP2014214157A (ja) * 2013-04-22 2014-11-17 日東電工株式会社 エネルギー線硬化型自発巻回性粘着テープ
JP6319433B2 (ja) * 2014-05-23 2018-05-09 リンテック株式会社 保護膜形成用複合シート

Also Published As

Publication number Publication date
WO2017150330A1 (fr) 2017-09-08
TW201739870A (zh) 2017-11-16
KR20180121487A (ko) 2018-11-07
JP6831831B2 (ja) 2021-02-17
CN108541338A (zh) 2018-09-14
JPWO2017150330A1 (ja) 2018-12-27
KR102233439B1 (ko) 2021-03-30

Similar Documents

Publication Publication Date Title
SG10201606385RA (en) Wafer processing method
SG10201606388SA (en) Wafer processing method
SG11201707829WA (en) Semiconductor processing tape
SG10201600648YA (en) Wafer processing system
SG10201603205TA (en) Wafer processing method
SG10201700915XA (en) Wafer processing method
SG10202011613YA (en) Substrate processing apparatus
SG10201509657RA (en) Wafer processing method
SG10201505185XA (en) Wafer processing method
SG10201504351YA (en) Wafer processing method
SG10201701086SA (en) Wafer processing method
SG11201802780QA (en) Sheet for semiconductor processing
SG10201610632XA (en) Wafer processing method
SG10201602704UA (en) Wafer processing method
SG10201508278VA (en) Wafer processing method
EP3132467A4 (fr) Technologies de métrologie de tranche
SG11201708564WA (en) Film for manufacturing semiconductor parts
SG10201700218WA (en) Packaged wafer processing method
SG10201506936WA (en) Wafer processing method
SG10201505459WA (en) Wafer processing method
SG10201503911VA (en) Wafer processing method
SG10201604691WA (en) Wafer processing method
SG10201504089SA (en) Wafer processing method
SG10201502813TA (en) Substrate Processing Apparatus
SG10201610623YA (en) Wafer processing method