SG11201710317RA - Substrate with electrically conductive film, substrate with multilayer reflective film, reflective mask blank, reflective mask, and method of manufacturing semiconductor device - Google Patents
Substrate with electrically conductive film, substrate with multilayer reflective film, reflective mask blank, reflective mask, and method of manufacturing semiconductor deviceInfo
- Publication number
- SG11201710317RA SG11201710317RA SG11201710317RA SG11201710317RA SG11201710317RA SG 11201710317R A SG11201710317R A SG 11201710317RA SG 11201710317R A SG11201710317R A SG 11201710317RA SG 11201710317R A SG11201710317R A SG 11201710317RA SG 11201710317R A SG11201710317R A SG 11201710317RA
- Authority
- SG
- Singapore
- Prior art keywords
- substrate
- reflective mask
- reflective
- film
- semiconductor device
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/40—Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
- G03F1/24—Reflection masks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015121712 | 2015-06-17 | ||
| PCT/JP2016/067134 WO2016204051A1 (ja) | 2015-06-17 | 2016-06-08 | 導電膜付き基板、多層反射膜付き基板、反射型マスクブランク、反射型マスク及び半導体装置の製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11201710317RA true SG11201710317RA (en) | 2018-01-30 |
Family
ID=57545764
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201710317RA SG11201710317RA (en) | 2015-06-17 | 2016-06-08 | Substrate with electrically conductive film, substrate with multilayer reflective film, reflective mask blank, reflective mask, and method of manufacturing semiconductor device |
| SG10201911400WA SG10201911400WA (en) | 2015-06-17 | 2016-06-08 | Substrate with electrically conductive film, substrate with multilayer reflective film, reflective mask blank, reflective mask, and method of manufacturing semiconductor device |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG10201911400WA SG10201911400WA (en) | 2015-06-17 | 2016-06-08 | Substrate with electrically conductive film, substrate with multilayer reflective film, reflective mask blank, reflective mask, and method of manufacturing semiconductor device |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US10606166B2 (https=) |
| JP (3) | JP6815995B2 (https=) |
| KR (2) | KR102653351B1 (https=) |
| SG (2) | SG11201710317RA (https=) |
| TW (2) | TWI708993B (https=) |
| WO (1) | WO2016204051A1 (https=) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SG11201710317RA (en) | 2015-06-17 | 2018-01-30 | Hoya Corp | Substrate with electrically conductive film, substrate with multilayer reflective film, reflective mask blank, reflective mask, and method of manufacturing semiconductor device |
| KR102646681B1 (ko) * | 2016-03-31 | 2024-03-12 | 호야 가부시키가이샤 | 반사형 마스크 블랭크의 제조 방법, 반사형 마스크의 제조 방법 및 반도체 장치의 제조 방법 |
| KR102002441B1 (ko) * | 2017-01-17 | 2019-07-23 | 호야 가부시키가이샤 | 반사형 마스크 블랭크, 반사형 마스크 및 그 제조 방법, 및 반도체 장치의 제조 방법 |
| JP6863169B2 (ja) * | 2017-08-15 | 2021-04-21 | Ａｇｃ株式会社 | 反射型マスクブランク、および反射型マスク |
| US10553428B2 (en) * | 2017-08-22 | 2020-02-04 | Taiwan Semiconductor Manufacturing Company, Ltd. | Reflection mode photomask and fabrication method therefore |
| KR102906466B1 (ko) * | 2018-05-25 | 2026-01-02 | 호야 가부시키가이샤 | 반사형 마스크 블랭크, 반사형 마스크, 그리고 반사형 마스크 및 반도체 장치의 제조 방법 |
| US10768534B2 (en) * | 2018-08-14 | 2020-09-08 | Taiwan Semiconductor Manufacturing Co., Ltd. | Photolithography apparatus and method and method for handling wafer |
| US20220121109A1 (en) * | 2019-03-28 | 2022-04-21 | Hoya Corporation | Substrate for mask blank, substrate with conductive film, substrate with multilayer reflective film, reflective mask blank, reflective mask, and method for manufacturing semiconductor device |
| WO2020261986A1 (ja) * | 2019-06-27 | 2020-12-30 | Hoya株式会社 | 薄膜付基板、多層反射膜付基板、反射型マスクブランク、反射型マスク及び半導体装置の製造方法 |
| JP7350571B2 (ja) | 2019-08-30 | 2023-09-26 | Hoya株式会社 | 導電膜付基板、反射型マスクブランク及び反射型マスク、並びに半導体デバイスの製造方法 |
| JP7354005B2 (ja) * | 2020-02-12 | 2023-10-02 | Hoya株式会社 | 反射型マスクブランク、反射型マスク、及び半導体装置の製造方法 |
| US11111176B1 (en) * | 2020-02-27 | 2021-09-07 | Applied Materials, Inc. | Methods and apparatus of processing transparent substrates |
| KR102567180B1 (ko) * | 2020-04-21 | 2023-08-16 | 에이지씨 가부시키가이샤 | Euv 리소그래피용 반사형 마스크 블랭크 |
| US20210333717A1 (en) * | 2020-04-23 | 2021-10-28 | Taiwan Semiconductor Manufacturing Co., Ltd. | Extreme ultraviolet mask and method of manufacturing the same |
| KR102464780B1 (ko) * | 2020-09-02 | 2022-11-09 | 주식회사 에스앤에스텍 | 도전막을 구비하는 블랭크마스크 및 이를 이용하여 제작된 포토마스크 |
| JP7633832B2 (ja) * | 2021-02-25 | 2025-02-20 | Hoya株式会社 | マスクブランク、反射型マスク、および半導体デバイスの製造方法 |
| US20220283491A1 (en) * | 2021-03-03 | 2022-09-08 | Shin-Etsu Chemical Co., Ltd. | Reflective mask blank, and method for manufacturing thereof |
| JP7567742B2 (ja) * | 2021-10-01 | 2024-10-16 | 信越化学工業株式会社 | 反射型マスクブランク用膜付き基板、反射型マスクブランク、及び反射型マスクの製造方法 |
| JP7669321B2 (ja) * | 2022-09-01 | 2025-04-28 | 信越化学工業株式会社 | 反射型マスクブランクおよび反射型マスクの製造方法 |
| JPWO2024071026A1 (https=) * | 2022-09-28 | 2024-04-04 | ||
| WO2025069822A1 (ja) * | 2023-09-29 | 2025-04-03 | Ａｇｃ株式会社 | 反射型マスクブランク、反射型マスクブランクの製造方法、反射型マスク、反射型マスクの製造方法 |
| WO2025115566A1 (ja) * | 2023-11-29 | 2025-06-05 | Ａｇｃ株式会社 | 反射型マスクブランク、反射型マスク、反射型マスクブランクの製造方法、及び反射型マスクの製造方法 |
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| JPS526730Y2 (https=) | 1972-10-30 | 1977-02-12 | ||
| JPS5228892Y2 (https=) | 1972-12-04 | 1977-07-01 | ||
| JPS5082857U (https=) | 1973-11-30 | 1975-07-16 | ||
| JPS5596951A (en) * | 1979-01-17 | 1980-07-23 | Mitsubishi Electric Corp | Negative for photomask |
| JP2001358055A (ja) * | 2000-06-15 | 2001-12-26 | Nikon Corp | 露光装置及びデバイス製造方法 |
| JP2005210093A (ja) * | 2003-12-25 | 2005-08-04 | Hoya Corp | 多層反射膜付き基板、露光用反射型マスクブランクス及び露光用反射型マスク、並びにそれらの製造方法 |
| US20050238922A1 (en) * | 2003-12-25 | 2005-10-27 | Hoya Corporation | Substrate with a multilayer reflection film, reflection type mask blank for exposure, reflection type mask for exposure and methods of manufacturing them |
| JP5082857B2 (ja) | 2005-12-12 | 2012-11-28 | 旭硝子株式会社 | Ｅｕｖリソグラフィ用反射型マスクブランク、および該マスクブランク用の導電膜付基板 |
| US7678511B2 (en) * | 2006-01-12 | 2010-03-16 | Asahi Glass Company, Limited | Reflective-type mask blank for EUV lithography |
| WO2008072706A1 (ja) | 2006-12-15 | 2008-06-19 | Asahi Glass Company, Limited | Ｅｕｖリソグラフィ用反射型マスクブランク、および該マスクブランク用の機能膜付基板 |
| JP4372178B2 (ja) * | 2007-04-27 | 2009-11-25 | 株式会社東芝 | 光反射型マスクと光反射型マスクの作製方法及び半導体装置の製造方法 |
| EP2256789B1 (en) | 2008-03-18 | 2012-07-04 | Asahi Glass Company, Limited | Reflective mask blank for euv lithography |
| JP4994405B2 (ja) | 2009-03-05 | 2012-08-08 | Ｈｏｙａ株式会社 | プレス成形型の離型膜の良否判定方法および光学素子の製造方法 |
| JP5515773B2 (ja) * | 2010-01-21 | 2014-06-11 | 大日本印刷株式会社 | 遮光枠を有する反射型マスクおよびその製造方法 |
| TWI399456B (zh) * | 2010-01-25 | 2013-06-21 | Sun Well Solar Corp | 導電膜製作設備及用於在其中處理基板之方法 |
| KR101444044B1 (ko) * | 2010-12-16 | 2014-09-23 | 히타치가세이가부시끼가이샤 | 감광성 엘리먼트, 레지스트 패턴의 형성 방법 및 프린트 배선판의 제조 방법 |
| KR20130013515A (ko) * | 2011-07-28 | 2013-02-06 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 |
| EP2581789B1 (en) | 2011-10-14 | 2020-04-29 | Fundació Institut de Ciències Fotòniques | Optically transparent and electrically conductive coatings and method for their deposition on a substrate |
| JP6157874B2 (ja) * | 2012-03-19 | 2017-07-05 | Hoya株式会社 | Ｅｕｖリソグラフィー用多層反射膜付き基板及びｅｕｖリソグラフィー用反射型マスクブランク、並びにｅｕｖリソグラフィー用反射型マスク及び半導体装置の製造方法 |
| JP5575169B2 (ja) * | 2012-03-22 | 2014-08-20 | 株式会社ニューフレアテクノロジー | 荷電粒子ビーム描画装置および荷電粒子ビーム描画方法 |
| JP5993779B2 (ja) * | 2013-03-29 | 2016-09-14 | 富士フイルム株式会社 | 導電膜形成用組成物、導電膜、配線基板 |
| KR102109129B1 (ko) * | 2013-07-02 | 2020-05-08 | 삼성전자주식회사 | 반사형 포토마스크 블랭크 및 반사형 포토마스크 |
| JP6186996B2 (ja) * | 2013-07-30 | 2017-08-30 | 旭硝子株式会社 | Ｅｕｖリソグラフィ用反射型マスクブランク、および、ｅｕｖリソグラフィ用反射型マスク |
| KR101877896B1 (ko) | 2013-09-27 | 2018-07-12 | 호야 가부시키가이샤 | 도전막 부착 기판, 다층 반사막 부착 기판, 반사형 마스크 블랭크 및 반사형 마스크, 그리고 반도체 장치의 제조방법 |
| JP2015126127A (ja) * | 2013-12-26 | 2015-07-06 | キヤノン株式会社 | 保持装置、露光装置、および物品の製造方法 |
| JP6257428B2 (ja) * | 2014-04-15 | 2018-01-10 | 株式会社ジャパンディスプレイ | 電極基板、表示装置、入力装置および電極基板の製造方法 |
| SG11201710317RA (en) | 2015-06-17 | 2018-01-30 | Hoya Corp | Substrate with electrically conductive film, substrate with multilayer reflective film, reflective mask blank, reflective mask, and method of manufacturing semiconductor device |
-
2016
- 2016-06-08 SG SG11201710317RA patent/SG11201710317RA/en unknown
- 2016-06-08 WO PCT/JP2016/067134 patent/WO2016204051A1/ja not_active Ceased
- 2016-06-08 US US15/580,331 patent/US10606166B2/en active Active
- 2016-06-08 SG SG10201911400WA patent/SG10201911400WA/en unknown
- 2016-06-08 KR KR1020177035098A patent/KR102653351B1/ko active Active
- 2016-06-08 JP JP2017525171A patent/JP6815995B2/ja active Active
- 2016-06-08 KR KR1020247010348A patent/KR102870729B1/ko active Active
- 2016-06-16 TW TW105118976A patent/TWI708993B/zh active
- 2016-06-16 TW TW109134273A patent/TWI755085B/zh active
-
2020
- 2020-02-20 US US16/796,395 patent/US10996554B2/en active Active
- 2020-10-30 JP JP2020182324A patent/JP7296358B2/ja active Active
-
2022
- 2022-03-18 JP JP2022043344A patent/JP7296499B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| KR20240046293A (ko) | 2024-04-08 |
| US10606166B2 (en) | 2020-03-31 |
| TW201706709A (zh) | 2017-02-16 |
| JP2022069683A (ja) | 2022-05-11 |
| JP6815995B2 (ja) | 2021-01-20 |
| JPWO2016204051A1 (ja) | 2018-04-05 |
| US10996554B2 (en) | 2021-05-04 |
| KR102653351B1 (ko) | 2024-04-02 |
| KR20180018526A (ko) | 2018-02-21 |
| TWI708993B (zh) | 2020-11-01 |
| JP2021015295A (ja) | 2021-02-12 |
| KR102870729B1 (ko) | 2025-10-15 |
| WO2016204051A1 (ja) | 2016-12-22 |
| US20180149962A1 (en) | 2018-05-31 |
| JP7296499B2 (ja) | 2023-06-22 |
| JP7296358B2 (ja) | 2023-06-22 |
| TWI755085B (zh) | 2022-02-11 |
| SG10201911400WA (en) | 2020-02-27 |
| US20200192213A1 (en) | 2020-06-18 |
| TW202109173A (zh) | 2021-03-01 |
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