SG11201609093UA - Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium - Google Patents

Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium

Info

Publication number
SG11201609093UA
SG11201609093UA SG11201609093UA SG11201609093UA SG11201609093UA SG 11201609093U A SG11201609093U A SG 11201609093UA SG 11201609093U A SG11201609093U A SG 11201609093UA SG 11201609093U A SG11201609093U A SG 11201609093UA SG 11201609093U A SG11201609093U A SG 11201609093UA
Authority
SG
Singapore
Prior art keywords
magnetic recording
target material
sputtering target
magnetic
recording medium
Prior art date
Application number
SG11201609093UA
Other languages
English (en)
Inventor
Hiroyuki Hasegawa
Noriaki Matsubara
Yumeki SHINMURA
Ryoji Hayashi
Original Assignee
Sanyo Special Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Special Steel Co Ltd filed Critical Sanyo Special Steel Co Ltd
Publication of SG11201609093UA publication Critical patent/SG11201609093UA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Magnetic Record Carriers (AREA)
SG11201609093UA 2014-05-01 2015-04-02 Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium SG11201609093UA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014094550 2014-05-01
JP2015027251A JP6405261B2 (ja) 2014-05-01 2015-02-16 磁気記録用軟磁性合金及びスパッタリングターゲット材並びに磁気記録媒体
PCT/JP2015/060512 WO2015166762A1 (ja) 2014-05-01 2015-04-02 磁気記録用軟磁性合金及びスパッタリングターゲット材並びに磁気記録媒体

Publications (1)

Publication Number Publication Date
SG11201609093UA true SG11201609093UA (en) 2016-12-29

Family

ID=54358499

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201609093UA SG11201609093UA (en) 2014-05-01 2015-04-02 Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium

Country Status (6)

Country Link
JP (1) JP6405261B2 (ja)
CN (1) CN106415720B (ja)
MY (1) MY181595A (ja)
SG (1) SG11201609093UA (ja)
TW (1) TWI641705B (ja)
WO (1) WO2015166762A1 (ja)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6116928B2 (ja) * 2013-02-18 2017-04-19 山陽特殊製鋼株式会社 垂直磁気記録媒体における軟磁性膜層用ＣｏＦｅ系合金およびスパッタリングターゲット材
WO2017047754A1 (ja) * 2015-09-18 2017-03-23 山陽特殊製鋼株式会社 スパッタリングターゲット材
JP6660130B2 (ja) 2015-09-18 2020-03-04 山陽特殊製鋼株式会社 ＣｏＦｅＢ系合金ターゲット材
JP2017057490A (ja) 2015-09-18 2017-03-23 山陽特殊製鋼株式会社 Ｃｏ−Ｆｅ−Ｂ系合金ターゲット材
JP6442460B2 (ja) * 2016-10-27 2018-12-19 山陽特殊製鋼株式会社 垂直磁気記録媒体における軟磁性膜層用ＣｏＦｅ系合金およびスパッタリングターゲット材
JP6226093B1 (ja) * 2017-01-30 2017-11-08 Tdk株式会社 軟磁性合金および磁性部品
JP6784733B2 (ja) * 2018-08-20 2020-11-11 山陽特殊製鋼株式会社 磁気記録媒体の軟磁性層用Ｃｏ系合金
JP6998431B2 (ja) 2020-08-03 2022-02-04 山陽特殊製鋼株式会社 磁気記録媒体の軟磁性層用Ｃｏ系合金

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10317082A (ja) * 1997-05-20 1998-12-02 Sumitomo Metal Mining Co Ltd ターゲット材用Ａｌ系合金とその製造方法
JP5605787B2 (ja) * 2008-07-14 2014-10-15 山陽特殊製鋼株式会社 垂直磁気記録媒体における軟磁性膜層用合金を成膜するためのスパッタリングターゲット材とその製造方法
JP2010150591A (ja) * 2008-12-25 2010-07-08 Hitachi Metals Ltd 軟磁性膜用Ｃｏ−Ｆｅ系合金
JP5631659B2 (ja) * 2010-08-24 2014-11-26 山陽特殊製鋼株式会社 垂直磁気記録媒体用軟磁性合金およびスパッタリングターゲット材並びに磁気記録媒体
JP5714397B2 (ja) * 2010-10-26 2015-05-07 山陽特殊製鋼株式会社 磁気記録用軟磁性合金およびスパッタリングターゲット材並びに磁気記録媒体
JP5698023B2 (ja) * 2011-02-16 2015-04-08 山陽特殊製鋼株式会社 磁気記録用軟磁性合金及びスパッタリングターゲット材ならびに磁気記録媒体
JP5917045B2 (ja) * 2011-08-17 2016-05-11 山陽特殊製鋼株式会社 垂直磁気記録媒体における軟磁性薄膜層用合金およびスパッタリングターゲット材
JP5474902B2 (ja) * 2011-09-26 2014-04-16 山陽特殊製鋼株式会社 垂直磁気記録媒体における軟磁性薄膜層に用いる合金およびスパッタリングターゲット材並びに軟磁性薄膜層を有する垂直磁気記録媒体。
JP6302153B2 (ja) * 2011-09-28 2018-03-28 山陽特殊製鋼株式会社 垂直磁気記録媒体内の軟磁性薄膜層及び垂直磁気記録媒体
JP5778052B2 (ja) * 2012-02-03 2015-09-16 山陽特殊製鋼株式会社 磁気記録媒体に用いる低飽和磁束密度を有する軟磁性膜層用合金およびスパッタリングターゲット材
JP6210503B2 (ja) * 2012-08-13 2017-10-11 山陽特殊製鋼株式会社 磁気記録用軟磁性用合金およびスパッタリングターゲット材

Also Published As

Publication number Publication date
WO2015166762A1 (ja) 2015-11-05
CN106415720A (zh) 2017-02-15
TWI641705B (zh) 2018-11-21
JP6405261B2 (ja) 2018-10-17
TW201604289A (zh) 2016-02-01
CN106415720B (zh) 2019-04-12
JP2015222609A (ja) 2015-12-10
MY181595A (en) 2020-12-29

Similar Documents

Publication Publication Date Title
EP3675123A4 (en) MAGNETIC RECORDING MEDIUM
EP3300080A4 (en) Magnetic recording medium
EP3561811A4 (en) MAGNETIC RECORDING MEDIUM
SG11201609093UA (en) Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium
SG11201602850SA (en) Magnetic recording medium
SG11201701836YA (en) Sputtering target for forming magnetic recording film and method for producing same
GB201707019D0 (en) Low cobalt hard facing alloy
GB2546808B (en) Low cobalt hard facing alloy
SG11201704465WA (en) Magnetic material sputtering target and method for producing same
SG10201508695WA (en) Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium
SG11201600474SA (en) Fe-Co-BASED ALLOY SPUTTERING TARGET MATERIAL, SOFT MAGNETIC THIN FILM LAYER, AND VERTICAL MAGNETIC RECORDING MEDIUM PRODUCED USING SAID SOFT MAGNETIC THIN FILM LAYER
EP3570281A4 (en) MAGNETIC RECORDING MEDIUM
SG10202101868SA (en) Magnetic recording medium
SG11201701838XA (en) Sputtering target for magnetic recording film formation and production method therefor
EP3166108A4 (en) Magnetic field generation device, method for controlling magnetic field generation device, and magnetic recording medium processing device
SG11201707058WA (en) Perpendicular magnetic recording medium
SG11201408798PA (en) Soft magnetic alloy for magnetic recording purposes, sputtering target material, and magnetic recording medium
SG11201506155PA (en) Sintered body, and sputtering target for forming magnetic recording film produced from said sintered body
SG11201702542VA (en) Magnetic recording medium
SG11201706280XA (en) Cr-Ti ALLOY SPUTTERING TARGET MATERIAL AND METHOD FOR PRODUCING SAME
SG11201607790WA (en) SPUTTERING TARGET COMPRISING Al-Te-Cu-Zr ALLOY, AND METHOD FOR PRODUCING SAME
SG11201602691UA (en) Perpendicular magnetic recording medium
EP3106540A4 (en) SPUTTERING TARGET COMPRISING Ni-P ALLOY OR Ni-Pt-P ALLOY AND PRODUCTION METHOD THEREFOR
SG10201500333SA (en) Sputtering Target for Magnetic Recording Medium
SG11201707351RA (en) Ni-BASED SPUTTERING TARGET MATERIAL AND MAGNETIC RECORDING MEDIUM