SG11201606030UA - Protecting an interior of a hollow body with an ald coating - Google Patents

Protecting an interior of a hollow body with an ald coating

Info

Publication number
SG11201606030UA
SG11201606030UA SG11201606030UA SG11201606030UA SG11201606030UA SG 11201606030U A SG11201606030U A SG 11201606030UA SG 11201606030U A SG11201606030U A SG 11201606030UA SG 11201606030U A SG11201606030U A SG 11201606030UA SG 11201606030U A SG11201606030U A SG 11201606030UA
Authority
SG
Singapore
Prior art keywords
protecting
interior
hollow body
ald coating
ald
Prior art date
Application number
SG11201606030UA
Other languages
English (en)
Inventor
Juhana Kostamo
Timo Malinen
Original Assignee
Picosun Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Picosun Oy filed Critical Picosun Oy
Publication of SG11201606030UA publication Critical patent/SG11201606030UA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4408—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber by purging residual gases from the reaction chamber or gas lines
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45555—Atomic layer deposition [ALD] applied in non-semiconductor technology

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
SG11201606030UA 2014-03-03 2014-03-03 Protecting an interior of a hollow body with an ald coating SG11201606030UA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/FI2014/050153 WO2015132444A1 (en) 2014-03-03 2014-03-03 Protecting an interior of a hollow body with an ald coating

Publications (1)

Publication Number Publication Date
SG11201606030UA true SG11201606030UA (en) 2016-08-30

Family

ID=54054616

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201606030UA SG11201606030UA (en) 2014-03-03 2014-03-03 Protecting an interior of a hollow body with an ald coating

Country Status (9)

Country Link
US (1) US10329662B2 (ja)
EP (1) EP3114249B1 (ja)
JP (1) JP6374973B2 (ja)
KR (1) KR102286345B1 (ja)
CN (1) CN106062246B (ja)
RU (1) RU2016136052A (ja)
SG (1) SG11201606030UA (ja)
TW (1) TWI699450B (ja)
WO (1) WO2015132444A1 (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015132443A1 (en) * 2014-03-03 2015-09-11 Picosun Oy Protecting an interior of a gas container with an ald coating
KR102086574B1 (ko) * 2018-04-03 2020-03-09 전남대학교산학협력단 분말 입자를 코팅할 수 있는 증착장치 및 분말 입자의 코팅 방법
DE102019130303A1 (de) * 2019-11-11 2021-05-12 Khs Corpoplast Gmbh Vorrichtung und Verfahren zur Plasmabehandlung von Behältern
TWI772913B (zh) * 2020-10-06 2022-08-01 天虹科技股份有限公司 微粒的原子層沉積裝置
TWI750836B (zh) * 2020-10-06 2021-12-21 天虹科技股份有限公司 可拆式粉末原子層沉積裝置
CN115821209A (zh) * 2022-10-21 2023-03-21 航天材料及工艺研究所 发动机推力室身部内外表面高效制备难熔金属涂层的装置

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4859489A (en) 1988-07-18 1989-08-22 Vapor Technologies Inc. Method of coating a metal gas-pressure bottle or tank
WO1995022413A1 (en) 1994-02-16 1995-08-24 The Coca-Cola Company Hollow containers with inert or impermeable inner surface through plasma-assisted surface reaction or on-surface polymerization
US5741544A (en) 1995-08-31 1998-04-21 Olin Corporation Articles using specialized vapor deposition processes
US6112695A (en) * 1996-10-08 2000-09-05 Nano Scale Surface Systems, Inc. Apparatus for plasma deposition of a thin film onto the interior surface of a container
FI104383B (fi) * 1997-12-09 2000-01-14 Fortum Oil & Gas Oy Menetelmä laitteistojen sisäpintojen päällystämiseksi
JP4776054B2 (ja) 2000-02-04 2011-09-21 株式会社デンソー 原子層成長による薄膜形成方法
JP3993971B2 (ja) * 2000-08-09 2007-10-17 北海製罐株式会社 ガスバリア被覆層を有するプラスチック製容器及びその製法
BR0311232B1 (pt) * 2002-05-24 2013-04-02 aparelho de revestimento e processo para o revestimento de plasma de peÇas de trabalho.
JP3943516B2 (ja) 2003-03-27 2007-07-11 松下電器産業株式会社 画像再生装置
JP4664658B2 (ja) * 2004-12-02 2011-04-06 麒麟麦酒株式会社 プラズマｃｖｄ成膜装置及びガスバリア性を有するプラスチック容器の製造方法
KR20060076714A (ko) * 2004-12-28 2006-07-04 에이에스엠지니텍코리아 주식회사 원자층 증착기
JP4593357B2 (ja) * 2005-05-18 2010-12-08 麒麟麦酒株式会社 口部着色が低減されたガスバリア性プラスチック容器の製造方法及びその容器
JP5028755B2 (ja) 2005-06-23 2012-09-19 東京エレクトロン株式会社 半導体処理装置の表面処理方法
KR100915722B1 (ko) 2005-06-23 2009-09-04 도쿄엘렉트론가부시키가이샤 반도체 처리 장치용의 구성 부재 및 그 제조 방법, 및반도체 처리 장치
JP5040119B2 (ja) 2006-02-22 2012-10-03 東京エレクトロン株式会社 耐環境部材、半導体製造装置及び耐環境部材の製造方法
WO2007024987A2 (en) * 2005-08-22 2007-03-01 Advanced Technology Materials, Inc. Material containment system
CN101506062A (zh) 2005-11-28 2009-08-12 马西森三气公司 使用化学气相沉积形成的气体储存容器衬里
CN101370992A (zh) 2005-11-28 2009-02-18 Beneq有限公司 防止金属从铜及其合金中浸出的方法
JP2008266416A (ja) * 2007-04-18 2008-11-06 Ube Ind Ltd ポリイミドフィルムの製造方法およびポリイミドフィルム
CA2718253C (en) 2008-03-12 2016-04-19 Ricardo Enrique Biana Plasma system
US8741062B2 (en) * 2008-04-22 2014-06-03 Picosun Oy Apparatus and methods for deposition reactors
US10041169B2 (en) 2008-05-27 2018-08-07 Picosun Oy System and method for loading a substrate holder carrying a batch of vertically placed substrates into an atomic layer deposition reactor
JP4739376B2 (ja) * 2008-07-14 2011-08-03 三菱重工食品包装機械株式会社 バリア膜形成用内部電極及び成膜装置
JP2010242205A (ja) * 2009-04-10 2010-10-28 Toppan Printing Co Ltd 成膜装置
WO2010132591A2 (en) 2009-05-13 2010-11-18 Cv Holdings, Llc Pecvd coating using an organosilicon precursor
US7985188B2 (en) * 2009-05-13 2011-07-26 Cv Holdings Llc Vessel, coating, inspection and processing apparatus
JP2012526922A (ja) 2009-05-13 2012-11-01 エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド 有機ケイ素前駆体を使用するｐｅｃｖｄ被覆材
WO2011028535A2 (en) 2009-08-24 2011-03-10 Life Technologies Corporation System for rapid high-resolution gel electrophoresis
JP5346904B2 (ja) 2009-11-27 2013-11-20 東京エレクトロン株式会社 縦型成膜装置およびその使用方法
CN102452797B (zh) 2010-10-19 2014-08-20 英作纳米科技（北京）有限公司 药用玻璃瓶内壁涂层的制备方法
JP5555930B2 (ja) 2011-02-22 2014-07-23 オールテック株式会社 プラスチックボトル内面の処理方法及びプラスチックボトル内面の処理装置
US20130337171A1 (en) * 2012-06-13 2013-12-19 Qualcomm Mems Technologies, Inc. N2 purged o-ring for chamber in chamber ald system
CN202753490U (zh) * 2012-08-27 2013-02-27 英作纳米科技（北京）有限公司 新型包装耗材容器

Also Published As

Publication number Publication date
JP6374973B2 (ja) 2018-08-15
TW201546322A (zh) 2015-12-16
KR102286345B1 (ko) 2021-08-06
JP2017507246A (ja) 2017-03-16
TWI699450B (zh) 2020-07-21
CN106062246B (zh) 2020-05-08
EP3114249B1 (en) 2020-07-08
WO2015132444A1 (en) 2015-09-11
EP3114249A1 (en) 2017-01-11
US10329662B2 (en) 2019-06-25
CN106062246A (zh) 2016-10-26
KR20160125982A (ko) 2016-11-01
US20170073807A1 (en) 2017-03-16
RU2016136052A (ru) 2018-04-03
EP3114249A4 (en) 2017-03-29

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