SG11201610665YA - Anti-scratch coating - Google Patents

Anti-scratch coating

Info

Publication number
SG11201610665YA
SG11201610665YA SG11201610665YA SG11201610665YA SG11201610665YA SG 11201610665Y A SG11201610665Y A SG 11201610665YA SG 11201610665Y A SG11201610665Y A SG 11201610665YA SG 11201610665Y A SG11201610665Y A SG 11201610665YA SG 11201610665Y A SG11201610665Y A SG 11201610665YA
Authority
SG
Singapore
Prior art keywords
scratch coating
scratch
coating
Prior art date
Application number
SG11201610665YA
Inventor
Liang Hong
Siok Wei Tay
William Sai Yau Wong
Original Assignee
Agency Science Tech & Res
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency Science Tech & Res filed Critical Agency Science Tech & Res
Priority to SG11201610665YA priority Critical patent/SG11201610665YA/en
Publication of SG11201610665YA publication Critical patent/SG11201610665YA/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/54Silicon-containing compounds
    • C08K5/544Silicon-containing compounds containing nitrogen
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/04Oxygen-containing compounds
    • C08K5/09Carboxylic acids; Metal salts thereof; Anhydrides thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/54Silicon-containing compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/54Silicon-containing compounds
    • C08K5/549Silicon-containing compounds containing silicon in a ring
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D143/00Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing boron, silicon, phosphorus, selenium, tellurium, or a metal; Coating compositions based on derivatives of such polymers
    • C09D143/04Homopolymers or copolymers of monomers containing silicon
SG11201610665YA 2014-06-20 2015-06-22 Anti-scratch coating SG11201610665YA (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
SG11201610665YA SG11201610665YA (en) 2014-06-20 2015-06-22 Anti-scratch coating

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
SG10201403496W 2014-06-20
SG11201610665YA SG11201610665YA (en) 2014-06-20 2015-06-22 Anti-scratch coating
PCT/SG2015/050175 WO2015195054A1 (en) 2014-06-20 2015-06-22 Anti-scratch coating

Publications (1)

Publication Number Publication Date
SG11201610665YA true SG11201610665YA (en) 2017-01-27

Family

ID=54935888

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201610665YA SG11201610665YA (en) 2014-06-20 2015-06-22 Anti-scratch coating

Country Status (3)

Country Link
US (2) US10316210B2 (en)
SG (1) SG11201610665YA (en)
WO (1) WO2015195054A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108192455B (en) * 2018-01-15 2020-04-24 湖北航泰科技有限公司 Interpenetrating network structure polymer of silicon rubber-fluorocarbon coating and preparation method thereof
US20210263415A1 (en) * 2020-02-24 2021-08-26 TCL China Star Optoelectronics Technology CO.,LTD Display panel and negative photoresist material

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4130535A (en) * 1975-07-21 1978-12-19 Monsanto Company Thermoplastic vulcanizates of olefin rubber and polyolefin resin
US5384376A (en) * 1992-12-23 1995-01-24 Eastman Kodak Company Organic/inorganic hybrid materials
US5623030A (en) * 1994-12-01 1997-04-22 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Curable composition and process for producing molded articles using the same
US7820761B2 (en) * 1999-08-04 2010-10-26 Hybrid Plastics, Inc. Metallized nanostructured chemicals as cure promoters
US6652975B2 (en) * 2001-03-02 2003-11-25 Lucent Technologies Inc. Adherent silicones
GB0326286D0 (en) * 2003-11-11 2003-12-17 Vantico Gmbh Initiator systems for polymerisable compositions
US7160963B2 (en) * 2004-04-30 2007-01-09 Eastman Kodak Company Toner fuser member with release layer formed from silsesquioxane-epoxy resin composition
US8133478B2 (en) * 2007-05-09 2012-03-13 Avon Products Inc. Cosmetic nanocomposites based on in-situ cross-linked POSS materials
US8470516B2 (en) * 2007-05-18 2013-06-25 International Business Machines Corporation Method of forming a relief pattern by e-beam lithography using chemical amplification, and derived articles
US8097683B2 (en) * 2007-07-10 2012-01-17 The United States Of America As Represented By The Secretary Of The Navy Polyhedral oligomeric silsesquioxane and carborane containing network polymers
US8309213B2 (en) * 2007-10-22 2012-11-13 Flexible Ceramics, Inc. Fire resistant flexible ceramic resin blend and composite products formed therefrom
KR101937140B1 (en) 2011-08-03 2019-04-09 주식회사 동진쎄미켐 Photocurable organic-inorganic hybrid resin composition
WO2013105539A1 (en) * 2012-01-12 2013-07-18 積水化学工業株式会社 Resin composite material and method for producing resin composite material
TWI565732B (en) * 2012-06-13 2017-01-11 財團法人工業技術研究院 Organic-inorganic hybrid resin, method for forming the same, and transparent resin composition formed therefrom
US8729179B1 (en) * 2012-08-20 2014-05-20 Henkel US IP LLC Moisture curable polyacrylates
US9006355B1 (en) * 2013-10-04 2015-04-14 Burning Bush Group, Llc High performance silicon-based compositions
JP6547674B2 (en) * 2015-05-15 2019-07-24 信越化学工業株式会社 Photocurable composition and cured product containing the same

Also Published As

Publication number Publication date
US20190256732A1 (en) 2019-08-22
WO2015195054A1 (en) 2015-12-23
US10851260B2 (en) 2020-12-01
US10316210B2 (en) 2019-06-11
US20170204286A1 (en) 2017-07-20

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