SG11201601687YA - Process for producing thick nanostructured films obtained from a block copolymer composition - Google Patents

Process for producing thick nanostructured films obtained from a block copolymer composition

Info

Publication number
SG11201601687YA
SG11201601687YA SG11201601687YA SG11201601687YA SG11201601687YA SG 11201601687Y A SG11201601687Y A SG 11201601687YA SG 11201601687Y A SG11201601687Y A SG 11201601687YA SG 11201601687Y A SG11201601687Y A SG 11201601687YA SG 11201601687Y A SG11201601687Y A SG 11201601687YA
Authority
SG
Singapore
Prior art keywords
block copolymer
copolymer composition
films obtained
producing thick
nanostructured films
Prior art date
Application number
SG11201601687YA
Other languages
English (en)
Inventor
Christophe Navarro
Xavier Chevalier
Celia Nicolet
Ilias Iliopoulos
Raluca Tiron
Guillaume Fleury
Georges Hadziioannou
Original Assignee
Arkema France
Centre Nat Rech Scient
Univ Bordeaux
Inst Polytechnique Bordeaux
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from FR1358628A external-priority patent/FR3010412B1/fr
Application filed by Arkema France, Centre Nat Rech Scient, Univ Bordeaux, Inst Polytechnique Bordeaux filed Critical Arkema France
Publication of SG11201601687YA publication Critical patent/SG11201601687YA/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
    • B05D3/0433—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being a reactive gas
    • B05D3/0453—After-treatment
    • B05D3/046—Curing or evaporating the solvent
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/002—Processes for applying liquids or other fluent materials the substrate being rotated
    • B05D1/005—Spin coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0254—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F293/00—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
    • C08F293/005—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/02—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/08—Heat treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2438/00—Living radical polymerisation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2438/00—Living radical polymerisation
    • C08F2438/02—Stable Free Radical Polymerisation [SFRP]; Nitroxide Mediated Polymerisation [NMP] for, e.g. using 2,2,6,6-tetramethylpiperidine-1-oxyl [TEMPO]
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2353/00—Characterised by the use of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2353/00—Characterised by the use of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Derivatives of such polymers
    • C08J2353/02—Characterised by the use of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Derivatives of such polymers of vinyl aromatic monomers and conjugated dienes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00—Polymer mixtures characterised by other features
    • C08L2205/02—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group
    • C08L2205/025—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group containing two or more polymers of the same hierarchy C08L, and differing only in parameters such as density, comonomer content, molecular weight, structure
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00—Polymer mixtures characterised by other features
    • C08L2205/03—Polymer mixtures characterised by other features containing three or more polymers in a blend

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Graft Or Block Polymers (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
SG11201601687YA 2013-09-09 2014-09-05 Process for producing thick nanostructured films obtained from a block copolymer composition SG11201601687YA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR1358628A FR3010412B1 (fr) 2013-09-09 2013-09-09 Procede d'obtention de films epais nano-structures obtenus a partir de copolymeres a blocs
FR1451492A FR3010414B1 (fr) 2013-09-09 2014-02-25 Procede d'obtention de films epais nano-structures obtenus a partir d'une composition de copolymeres a blocs
PCT/EP2014/068957 WO2015032904A1 (fr) 2013-09-09 2014-09-05 Procédé de fabrication de films nanostructurés épais obtenus à partir d'une composition de copolymères à blocs

Publications (1)

Publication Number Publication Date
SG11201601687YA true SG11201601687YA (en) 2016-04-28

Family

ID=51483348

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201601687YA SG11201601687YA (en) 2013-09-09 2014-09-05 Process for producing thick nanostructured films obtained from a block copolymer composition

Country Status (9)

Country Link
US (2) US20150073094A1 (fr)
EP (1) EP2845888A1 (fr)
JP (1) JP6199263B2 (fr)
KR (1) KR20150029599A (fr)
CN (1) CN105518089B (fr)
FR (1) FR3010414B1 (fr)
SG (1) SG11201601687YA (fr)
TW (2) TW201823321A (fr)
WO (1) WO2015032904A1 (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102557689B1 (ko) 2014-06-12 2023-07-20 국립연구개발법인 고쿠리츠간켄큐센터 전립선암 검출 키트 또는 디바이스 및 검출 방법
FR3032714A1 (fr) * 2015-02-18 2016-08-19 Arkema France Procede de reduction du temps d'assemblage des films ordonnes de copolymeres a blocs
FR3032713A1 (fr) * 2015-02-18 2016-08-19 Arkema France Procede de reduction des defauts dans un film ordonne de copolymeres a blocs
FR3032712A1 (fr) * 2015-02-18 2016-08-19 Arkema France Procede d'obtention de films ordonnes epais et de periodes elevees comprenant un copolymere a blocs
FR3042794B1 (fr) * 2015-10-23 2020-03-27 Arkema France Procede permettant la creation de structures nanometriques par l'auto-assemblage de copolymeres di-blocs
JP2018154760A (ja) * 2017-03-17 2018-10-04 東芝メモリ株式会社 パターン形成材料及びパターン形成方法
FR3075800B1 (fr) * 2017-12-21 2020-10-09 Arkema France Couches anti adhesives pour les procedes d'impression par transfert

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FR2679237B1 (fr) 1991-07-19 1994-07-22 Atochem Systeme d'amorcage pour la polymerisation anionique de monomeres (meth) acryliques.
FR2735480B1 (fr) 1995-06-15 1997-07-18 Atochem Elf Sa Procede de polymerisation anionique en continu d'au moins un monomere (meth)acrylique pour l'obtention de polymeres a haut taux de solide
CN101375162A (zh) * 2006-01-27 2009-02-25 阿科玛法国公司 高光学纯度共聚物膜
KR101046551B1 (ko) * 2006-05-16 2011-07-05 닛뽕소다 가부시키가이샤 블록 코폴리머
EP2027208B1 (fr) * 2006-05-25 2016-02-10 Arkema Inc. Copolymères bloc amphiphiles
KR100834729B1 (ko) * 2006-11-30 2008-06-09 포항공과대학교 산학협력단 반사 방지용 나노 다공성 필름 및 블록 공중합체를 이용한그 제조방법
US7964107B2 (en) * 2007-02-08 2011-06-21 Micron Technology, Inc. Methods using block copolymer self-assembly for sub-lithographic patterning
JP2008231233A (ja) * 2007-03-20 2008-10-02 Kyoto Univ 高分子薄膜、パターン基板、磁気記録用パターン媒体及びこれらの製造方法
US7732533B2 (en) * 2007-08-31 2010-06-08 Micron Technology, Inc. Zwitterionic block copolymers and methods
JP5281386B2 (ja) * 2008-12-22 2013-09-04 株式会社日立製作所 高分子薄膜及びパターン媒体並びにこれらの製造方法
FR2974072B1 (fr) 2011-04-15 2014-06-13 Oreal Dispositif de stockage et de distribution de produits a plusieurs compartiments
FR2974094A1 (fr) * 2011-04-15 2012-10-19 Arkema France Procede de preparation de surfaces
JP2014531615A (ja) * 2011-09-06 2014-11-27 コーネル ユニバーシティー ブロックコポリマー及び該ブロックコポリマーを用いたリソグラフィーパターニング
US8513356B1 (en) * 2012-02-10 2013-08-20 Dow Global Technologies Llc Diblock copolymer blend composition
US8961918B2 (en) * 2012-02-10 2015-02-24 Rohm And Haas Electronic Materials Llc Thermal annealing process
US8697810B2 (en) * 2012-02-10 2014-04-15 Rohm And Haas Electronic Materials Llc Block copolymer and methods relating thereto
US20130209755A1 (en) * 2012-02-15 2013-08-15 Phillip Dene Hustad Self-assembled structures, method of manufacture thereof and articles comprising the same
US9127113B2 (en) * 2012-05-16 2015-09-08 Rohm And Haas Electronic Materials Llc Polystyrene-polyacrylate block copolymers, methods of manufacture thereof and articles comprising the same
JP5752655B2 (ja) * 2012-09-10 2015-07-22 株式会社東芝 パターン形成方法
JP5640099B2 (ja) * 2013-01-07 2014-12-10 株式会社日立製作所 微細構造を有する高分子薄膜およびパターン基板の製造方法
US8859433B2 (en) * 2013-03-11 2014-10-14 International Business Machines Corporation DSA grapho-epitaxy process with etch stop material

Also Published As

Publication number Publication date
EP2845888A1 (fr) 2015-03-11
WO2015032904A1 (fr) 2015-03-12
TWI633135B (zh) 2018-08-21
JP6199263B2 (ja) 2017-09-20
US20150328661A1 (en) 2015-11-19
FR3010414A1 (fr) 2015-03-13
US20150073094A1 (en) 2015-03-12
CN105518089B (zh) 2020-11-10
CN105518089A (zh) 2016-04-20
JP2015071756A (ja) 2015-04-16
TW201520247A (zh) 2015-06-01
TW201823321A (zh) 2018-07-01
FR3010414B1 (fr) 2015-09-25
KR20150029599A (ko) 2015-03-18

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