SG11201604779XA - Method for producing a block copolymer film on a substrate - Google Patents
Method for producing a block copolymer film on a substrateInfo
- Publication number
- SG11201604779XA SG11201604779XA SG11201604779XA SG11201604779XA SG11201604779XA SG 11201604779X A SG11201604779X A SG 11201604779XA SG 11201604779X A SG11201604779X A SG 11201604779XA SG 11201604779X A SG11201604779X A SG 11201604779XA SG 11201604779X A SG11201604779X A SG 11201604779XA
- Authority
- SG
- Singapore
- Prior art keywords
- producing
- substrate
- block copolymer
- copolymer film
- film
- Prior art date
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D187/00—Coating compositions based on unspecified macromolecular compounds, obtained otherwise than by polymerisation reactions only involving unsaturated carbon-to-carbon bonds
- C09D187/005—Block or graft polymers not provided for in groups C09D101/00 - C09D185/04
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
- C08J9/26—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof by elimination of a solid phase from a macromolecular composition or article, e.g. leaching out
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J31/00—Catalysts comprising hydrides, coordination complexes or organic compounds
- B01J31/02—Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides
- B01J31/06—Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides containing polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
- B81C1/00031—Regular or irregular arrays of nanoscale structures, e.g. etch mask layer
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F293/00—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
- C08F293/005—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
- B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
- B81C2201/0147—Film patterning
- B81C2201/0149—Forming nanoscale microstructures using auto-arranging or self-assembling material
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2438/00—Living radical polymerisation
- C08F2438/02—Stable Free Radical Polymerisation [SFRP]; Nitroxide Mediated Polymerisation [NMP] for, e.g. using 2,2,6,6-tetramethylpiperidine-1-oxyl [TEMPO]
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1362585A FR3014876B1 (en) | 2013-12-13 | 2013-12-13 | METHOD FOR PRODUCING A BLOCK COPOLYMER FILM ON A SUBSTRATE |
PCT/FR2014/053254 WO2015086991A1 (en) | 2013-12-13 | 2014-12-10 | Method for producing a block copolymer film on a substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201604779XA true SG11201604779XA (en) | 2016-07-28 |
Family
ID=50179786
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201604779XA SG11201604779XA (en) | 2013-12-13 | 2014-12-10 | Method for producing a block copolymer film on a substrate |
Country Status (9)
Country | Link |
---|---|
US (1) | US20160319158A1 (en) |
EP (1) | EP3080198A1 (en) |
JP (1) | JP6373998B2 (en) |
KR (1) | KR20160098378A (en) |
CN (1) | CN106029759B (en) |
FR (1) | FR3014876B1 (en) |
SG (1) | SG11201604779XA (en) |
TW (1) | TWI557166B (en) |
WO (1) | WO2015086991A1 (en) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012151482A2 (en) | 2011-05-04 | 2012-11-08 | Cornell University | Multiblock copolymer films, methods of making same, and uses thereof |
CN109310955B (en) | 2016-04-28 | 2022-08-30 | 特拉波尔技术公司 | Charged homoporous materials for electrostatic separations |
EP3541500B1 (en) | 2016-11-17 | 2021-12-08 | Shethji, Jayraj K. | Isoporous self-assembled block copolymer films containing high molecular weight hydrophilic additives and methods of making the same |
SG11201907674WA (en) | 2017-02-22 | 2019-09-27 | Terapore Tech Inc | Ligand bound mbp membranes, uses and method of manufacturing |
MX2019013534A (en) | 2017-05-12 | 2020-02-10 | Terapore Tech Inc | Chemically resistant fluorinated multiblock polymer structures, methods of manufacturing and use. |
CN111032200A (en) * | 2017-07-25 | 2020-04-17 | 特拉波雷技术有限公司 | Porous materials from complex block copolymer architectures |
KR102146538B1 (en) * | 2017-11-07 | 2020-08-20 | 주식회사 엘지화학 | Polymer composition |
FR3075800B1 (en) * | 2017-12-21 | 2020-10-09 | Arkema France | ANTI-STICK COATS FOR TRANSFER PRINTING PROCESSES |
KR20200130387A (en) | 2018-03-12 | 2020-11-18 | 테라포어 테크놀로지스, 인코포레이티드 | Isophorus mesoporous asymmetric block copolymer materials with macrovoids and method for preparing the same |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7407554B2 (en) * | 2005-04-12 | 2008-08-05 | International Business Machines Corporation | Development or removal of block copolymer or PMMA-b-S-based resist using polar supercritical solvent |
US9028859B2 (en) * | 2006-07-07 | 2015-05-12 | Advanced Cardiovascular Systems, Inc. | Phase-separated block copolymer coatings for implantable medical devices |
US7763319B2 (en) * | 2008-01-11 | 2010-07-27 | International Business Machines Corporation | Method of controlling orientation of domains in block copolymer films |
EP2442839B1 (en) | 2009-04-09 | 2017-10-04 | The University of Queensland | Block copolymer blends |
FR2974094A1 (en) * | 2011-04-15 | 2012-10-19 | Arkema France | PROCESS FOR PREPARING SURFACES |
US8513356B1 (en) * | 2012-02-10 | 2013-08-20 | Dow Global Technologies Llc | Diblock copolymer blend composition |
JP6228932B2 (en) * | 2012-02-10 | 2017-11-08 | ボード・オブ・リージエンツ,ザ・ユニバーシテイ・オブ・テキサス・システム | Polylactic acid / silicon-containing block copolymer for nanolithography |
JP5934565B2 (en) * | 2012-04-20 | 2016-06-15 | 東京応化工業株式会社 | Pattern reduction method and composition |
-
2013
- 2013-12-13 FR FR1362585A patent/FR3014876B1/en not_active Expired - Fee Related
-
2014
- 2014-12-10 US US15/103,748 patent/US20160319158A1/en not_active Abandoned
- 2014-12-10 SG SG11201604779XA patent/SG11201604779XA/en unknown
- 2014-12-10 CN CN201480075435.0A patent/CN106029759B/en not_active Expired - Fee Related
- 2014-12-10 EP EP14827490.5A patent/EP3080198A1/en not_active Withdrawn
- 2014-12-10 WO PCT/FR2014/053254 patent/WO2015086991A1/en active Application Filing
- 2014-12-10 KR KR1020167018793A patent/KR20160098378A/en not_active Application Discontinuation
- 2014-12-10 JP JP2016538579A patent/JP6373998B2/en not_active Expired - Fee Related
- 2014-12-11 TW TW103143325A patent/TWI557166B/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JP2017502123A (en) | 2017-01-19 |
CN106029759A (en) | 2016-10-12 |
FR3014876B1 (en) | 2017-03-31 |
CN106029759B (en) | 2019-08-16 |
KR20160098378A (en) | 2016-08-18 |
FR3014876A1 (en) | 2015-06-19 |
EP3080198A1 (en) | 2016-10-19 |
US20160319158A1 (en) | 2016-11-03 |
JP6373998B2 (en) | 2018-08-15 |
TW201538578A (en) | 2015-10-16 |
TWI557166B (en) | 2016-11-11 |
WO2015086991A1 (en) | 2015-06-18 |
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