SG11201501475PA - Integrated type gas supplying apparatus - Google Patents

Integrated type gas supplying apparatus

Info

Publication number
SG11201501475PA
SG11201501475PA SG11201501475PA SG11201501475PA SG11201501475PA SG 11201501475P A SG11201501475P A SG 11201501475PA SG 11201501475P A SG11201501475P A SG 11201501475PA SG 11201501475P A SG11201501475P A SG 11201501475PA SG 11201501475P A SG11201501475P A SG 11201501475PA
Authority
SG
Singapore
Prior art keywords
type gas
integrated type
supplying apparatus
gas supplying
integrated
Prior art date
Application number
SG11201501475PA
Other languages
English (en)
Inventor
Mutsunori Koyomogi
Takashi Hirose
Michio Yamaji
Takahiro Matsuda
Original Assignee
Fujikin Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujikin Kk filed Critical Fujikin Kk
Publication of SG11201501475PA publication Critical patent/SG11201501475PA/en

Links

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • G05D7/0641—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means
    • G05D7/0652—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means the plurality of throttling means being arranged in parallel
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K27/00—Construction of housing; Use of materials therefor
    • F16K27/003—Housing formed from a plurality of the same valve elements
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F15—FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
    • F15B—SYSTEMS ACTING BY MEANS OF FLUIDS IN GENERAL; FLUID-PRESSURE ACTUATORS, e.g. SERVOMOTORS; DETAILS OF FLUID-PRESSURE SYSTEMS, NOT OTHERWISE PROVIDED FOR
    • F15B13/00—Details of servomotor systems ; Valves for servomotor systems
    • F15B13/02—Fluid distribution or supply devices characterised by their adaptation to the control of servomotors
    • F15B13/04—Fluid distribution or supply devices characterised by their adaptation to the control of servomotors for use with a single servomotor
    • F15B13/044—Fluid distribution or supply devices characterised by their adaptation to the control of servomotors for use with a single servomotor operated by electrically-controlled means, e.g. solenoids, torque-motors
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0676—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on flow sources
    • G05D7/0682—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on flow sources using a plurality of flow sources
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/87249—Multiple inlet with multiple outlet
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/877—With flow control means for branched passages
    • Y10T137/87885—Sectional block structure

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Mechanical Engineering (AREA)
  • Valve Housings (AREA)
  • Flow Control (AREA)
SG11201501475PA 2012-11-02 2013-10-18 Integrated type gas supplying apparatus SG11201501475PA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012243041A JP5616416B2 (ja) 2012-11-02 2012-11-02 集積型ガス供給装置
PCT/JP2013/006184 WO2014068886A1 (ja) 2012-11-02 2013-10-18 集積型ガス供給装置

Publications (1)

Publication Number Publication Date
SG11201501475PA true SG11201501475PA (en) 2015-05-28

Family

ID=50626838

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201501475PA SG11201501475PA (en) 2012-11-02 2013-10-18 Integrated type gas supplying apparatus

Country Status (8)

Country Link
US (1) US9471065B2 (ko)
JP (1) JP5616416B2 (ko)
KR (1) KR101800684B1 (ko)
CN (1) CN104737086B (ko)
IL (1) IL237344A (ko)
SG (1) SG11201501475PA (ko)
TW (1) TWI564502B (ko)
WO (1) WO2014068886A1 (ko)

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US10658222B2 (en) 2015-01-16 2020-05-19 Lam Research Corporation Moveable edge coupling ring for edge process control during semiconductor wafer processing
US10957561B2 (en) * 2015-07-30 2021-03-23 Lam Research Corporation Gas delivery system
US10192751B2 (en) 2015-10-15 2019-01-29 Lam Research Corporation Systems and methods for ultrahigh selective nitride etch
US10087959B2 (en) * 2015-11-10 2018-10-02 Stella Maris, Llc Hydraulic manifold control assembly
US10825659B2 (en) 2016-01-07 2020-11-03 Lam Research Corporation Substrate processing chamber including multiple gas injection points and dual injector
US10147588B2 (en) 2016-02-12 2018-12-04 Lam Research Corporation System and method for increasing electron density levels in a plasma of a substrate processing system
US10651015B2 (en) 2016-02-12 2020-05-12 Lam Research Corporation Variable depth edge ring for etch uniformity control
US10699878B2 (en) 2016-02-12 2020-06-30 Lam Research Corporation Chamber member of a plasma source and pedestal with radially outward positioned lift pins for translation of a substrate c-ring
US10438833B2 (en) 2016-02-16 2019-10-08 Lam Research Corporation Wafer lift ring system for wafer transfer
WO2017188129A1 (ja) * 2016-04-28 2017-11-02 株式会社フジキン 流体制御装置、流体制御装置の制御方法、および、流体制御システム
US10410832B2 (en) 2016-08-19 2019-09-10 Lam Research Corporation Control of on-wafer CD uniformity with movable edge ring and gas injection adjustment
US10927459B2 (en) 2017-10-16 2021-02-23 Asm Ip Holding B.V. Systems and methods for atomic layer deposition
JP7262745B2 (ja) * 2018-12-27 2023-04-24 株式会社フジキン マスフローコントローラ
GB2615414A (en) * 2022-12-22 2023-08-09 Anaero Tech Limited Fluid flow control device

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JP2731080B2 (ja) 1991-05-31 1998-03-25 株式会社本山製作所 ガス制御装置
JP2832166B2 (ja) * 1995-05-19 1998-12-02 シーケーディ株式会社 ガス供給集積ユニット
US6293310B1 (en) * 1996-10-30 2001-09-25 Unit Instruments, Inc. Gas panel
DE19645695A1 (de) * 1996-11-06 1998-05-07 Deutsch Zentr Luft & Raumfahrt Gasmeßgerät-Kalibrierungsvorrichtung für Wasserstoff-Sauerstoff-Gemische
JPH10184966A (ja) * 1996-12-27 1998-07-14 Ckd Corp 流体圧制御機器ブロック
US6231260B1 (en) * 1997-07-11 2001-05-15 Insync Systems, Inc. Mounting plane for integrated gas panel
US6068016A (en) * 1997-09-25 2000-05-30 Applied Materials, Inc Modular fluid flow system with integrated pump-purge
US6158454A (en) * 1998-04-14 2000-12-12 Insync Systems, Inc. Sieve like structure for fluid flow through structural arrangement
JPH11353030A (ja) * 1998-06-08 1999-12-24 Hitachi Metals Ltd マスフローコントローラ
US6260581B1 (en) * 1998-06-12 2001-07-17 J. Gregory Hollingshead Apparatus for assembling modular chemical distribution substrate blocks
JP2002089798A (ja) * 2000-09-11 2002-03-27 Ulvac Japan Ltd 流体制御装置およびこれを用いたガス処理装置
US6349744B1 (en) * 2000-10-13 2002-02-26 Mks Instruments, Inc. Manifold for modular gas box system
JP2002349797A (ja) 2001-05-23 2002-12-04 Fujikin Inc 流体制御装置
JP2004100889A (ja) 2002-09-12 2004-04-02 Fujikin Inc 多段アクチュエータ
US7072743B2 (en) * 2004-03-09 2006-07-04 Mks Instruments, Inc. Semiconductor manufacturing gas flow divider system and method
JP2006234110A (ja) * 2005-02-25 2006-09-07 Ckd Corp ガス供給ユニット及びガス供給システム
JP4572139B2 (ja) 2005-05-23 2010-10-27 株式会社フジキン 改良型圧力式流量制御装置
JP4814706B2 (ja) * 2006-06-27 2011-11-16 株式会社フジキン 流量比可変型流体供給装置
KR101466998B1 (ko) 2006-08-23 2014-12-01 가부시키가이샤 호리바 에스텍 집적형 가스 패널 장치
JP4933936B2 (ja) 2007-03-30 2012-05-16 株式会社フジキン 圧電素子駆動式制御弁
JP5127304B2 (ja) 2007-05-31 2013-01-23 株式会社フジキン 流体制御装置
JP5457021B2 (ja) * 2008-12-22 2014-04-02 東京エレクトロン株式会社 混合ガスの供給方法及び混合ガスの供給装置
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US8291935B1 (en) * 2009-04-07 2012-10-23 Novellus Systems, Inc. Flexible gas mixing manifold
WO2013046660A1 (ja) * 2011-09-30 2013-04-04 株式会社フジキン ガス供給装置

Also Published As

Publication number Publication date
TWI564502B (zh) 2017-01-01
TW201433733A (zh) 2014-09-01
CN104737086B (zh) 2017-06-30
US9471065B2 (en) 2016-10-18
CN104737086A (zh) 2015-06-24
JP2014092929A (ja) 2014-05-19
JP5616416B2 (ja) 2014-10-29
KR20150036740A (ko) 2015-04-07
IL237344A (en) 2017-12-31
IL237344A0 (en) 2015-04-30
KR101800684B1 (ko) 2017-11-23
WO2014068886A1 (ja) 2014-05-08
US20150234390A1 (en) 2015-08-20

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