SG11201405483WA - Methods and materials for removing metals in block copolymers - Google Patents

Methods and materials for removing metals in block copolymers

Info

Publication number
SG11201405483WA
SG11201405483WA SG11201405483WA SG11201405483WA SG11201405483WA SG 11201405483W A SG11201405483W A SG 11201405483WA SG 11201405483W A SG11201405483W A SG 11201405483WA SG 11201405483W A SG11201405483W A SG 11201405483WA SG 11201405483W A SG11201405483W A SG 11201405483WA
Authority
SG
Singapore
Prior art keywords
materials
methods
block copolymers
removing metals
metals
Prior art date
Application number
SG11201405483WA
Other languages
English (en)
Inventor
Jian Yin
Hengpeng Wu
Sungeun Hong
Mark Neisser
Yi Cao
Original Assignee
Az Electronic Materials Luxembourg S À R L
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Az Electronic Materials Luxembourg S À R L filed Critical Az Electronic Materials Luxembourg S À R L
Publication of SG11201405483WA publication Critical patent/SG11201405483WA/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D15/00Separating processes involving the treatment of liquids with solid sorbents; Apparatus therefor
    • B01D15/08Selective adsorption, e.g. chromatography
    • B01D15/26Selective adsorption, e.g. chromatography characterised by the separation mechanism
    • B01D15/36Selective adsorption, e.g. chromatography characterised by the separation mechanism involving ionic interaction
    • B01D15/361Ion-exchange
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J39/00Cation exchange; Use of material as cation exchangers; Treatment of material for improving the cation exchange properties
    • B01J39/04Processes using organic exchangers
    • B01J39/05Processes using organic exchangers in the strongly acidic form
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J41/00Anion exchange; Use of material as anion exchangers; Treatment of material for improving the anion exchange properties
    • B01J41/04Processes using organic exchangers
    • B01J41/07Processes using organic exchangers in the weakly basic form
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J45/00Ion-exchange in which a complex or a chelate is formed; Use of material as complex or chelate forming ion-exchangers; Treatment of material for improving the complex or chelate forming ion-exchange properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/002Processes for applying liquids or other fluent materials the substrate being rotated
    • B05D1/005Spin coating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F6/00Post-polymerisation treatments
    • C08F6/02Neutralisation of the polymerisation mass, e.g. killing the catalyst also removal of catalyst residues
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00Processes of treating or compounding macromolecular substances

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Analytical Chemistry (AREA)
  • Graft Or Block Polymers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
SG11201405483WA 2012-03-09 2013-02-22 Methods and materials for removing metals in block copolymers SG11201405483WA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/416,669 US8686109B2 (en) 2012-03-09 2012-03-09 Methods and materials for removing metals in block copolymers
PCT/EP2013/053548 WO2013131762A1 (en) 2012-03-09 2013-02-22 Methods and materials for removing metals in block copolymers

Publications (1)

Publication Number Publication Date
SG11201405483WA true SG11201405483WA (en) 2014-10-30

Family

ID=47747636

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201405483WA SG11201405483WA (en) 2012-03-09 2013-02-22 Methods and materials for removing metals in block copolymers

Country Status (8)

Country Link
US (2) US8686109B2 (ko)
EP (1) EP2822988B1 (ko)
JP (1) JP6182164B2 (ko)
KR (1) KR101895655B1 (ko)
CN (1) CN104159948B (ko)
SG (1) SG11201405483WA (ko)
TW (2) TWI574982B (ko)
WO (1) WO2013131762A1 (ko)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8691925B2 (en) 2011-09-23 2014-04-08 Az Electronic Materials (Luxembourg) S.A.R.L. Compositions of neutral layer for directed self assembly block copolymers and processes thereof
US8686109B2 (en) 2012-03-09 2014-04-01 Az Electronic Materials (Luxembourg) S.A.R.L. Methods and materials for removing metals in block copolymers
US8835581B2 (en) 2012-06-08 2014-09-16 Az Electronic Materials (Luxembourg) S.A.R.L. Neutral layer polymer composition for directed self assembly and processes thereof
US10457088B2 (en) 2013-05-13 2019-10-29 Ridgefield Acquisition Template for self assembly and method of making a self assembled pattern
US9093263B2 (en) 2013-09-27 2015-07-28 Az Electronic Materials (Luxembourg) S.A.R.L. Underlayer composition for promoting self assembly and method of making and using
US9181449B2 (en) 2013-12-16 2015-11-10 Az Electronic Materials (Luxembourg) S.A.R.L. Underlayer composition for promoting self assembly and method of making and using
CN103768013A (zh) * 2014-01-17 2014-05-07 丽珠医药集团股份有限公司 以精制两亲性嵌段共聚物为载体的紫杉醇聚合物胶束
JP2015170723A (ja) * 2014-03-06 2015-09-28 Jsr株式会社 パターン形成方法及び自己組織化組成物
FR3021551A1 (fr) * 2014-06-03 2015-12-04 Arkema France Procede d'elimination d'ions metalliques dans une solution organique visqueuse
CN105315444B (zh) * 2014-07-16 2018-04-17 西南药业股份有限公司 注射用聚乙二醇单甲醚‑聚乳酸两亲性嵌段共聚物的纯化方法
WO2016208257A1 (ja) * 2015-06-22 2016-12-29 丸善石油化学株式会社 電子材料用重合体の製造方法およびその製造方法により得られた電子材料用重合体
US11518730B2 (en) 2016-08-18 2022-12-06 Merck Patent Gmbh Polymer compositions for self-assembly applications
SG10202108825RA (en) 2016-12-21 2021-09-29 Ridgefield Acquisition Novel compositions and processes for self-assembly of block copolymers
KR20220059468A (ko) * 2019-09-05 2022-05-10 닛산 가가쿠 가부시키가이샤 실리콘함유 폴리머 조성물의 제조방법
US20230102166A1 (en) * 2021-08-30 2023-03-30 Taiwan Semiconductor Manufacturing Company, Ltd. Method of manufacturing a semiconductor device
WO2023074156A1 (ja) * 2021-10-29 2023-05-04 ソニーグループ株式会社 波動制御媒質、メタマテリアル、電磁波制御部材、センサ、電磁波導波路、演算素子、送受信装置、受発光装置、エネルギー吸収材、黒体材、消光材、エネルギー変換材、電波レンズ、光学レンズ、カラーフィルタ、周波数選択フィルタ、電磁波反射材、ビーム位相制御装置、エレクトロスピニング装置、波動制御媒質の製造装置及び波動制御媒質の製造方法

Family Cites Families (74)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB715913A (en) 1951-03-09 1954-09-22 Rohm & Haas Improvements in or relating to esters of vinyloxyalkoxy compounds and unsaturated carboxylic acids
FR1233582A (fr) 1959-04-20 1960-10-12 Rhone Poulenc Sa Azonitriles sulfonés
US3285949A (en) 1964-04-17 1966-11-15 Goodrich Co B F Carboxyl-terminated butadiene polymers prepared in tertiary butanol with bis-azocyano acid initiation
US3474054A (en) 1966-09-13 1969-10-21 Permalac Corp The Surface coating compositions containing pyridine salts or aromatic sulfonic acids
US3919077A (en) * 1972-12-29 1975-11-11 Darrell Duayne Whitehurst Sorbent for removal of heavy metals
JPS5126934A (ko) * 1974-08-30 1976-03-05 Hitachi Ltd
US4025456A (en) * 1974-09-20 1977-05-24 Union Carbide Corporation Polysiloxane-polyoxyalkylene block copolymers
US4200729A (en) 1978-05-22 1980-04-29 King Industries, Inc Curing amino resins with aromatic sulfonic acid oxa-azacyclopentane adducts
US4251665A (en) 1978-05-22 1981-02-17 King Industries, Inc. Aromatic sulfonic acid oxa-azacyclopentane adducts
JPS58225103A (ja) 1982-06-22 1983-12-27 Sumitomo Bakelite Co Ltd 熱可塑性樹脂の架橋方法
US4636540A (en) * 1985-07-08 1987-01-13 Atlantic Richfield Company Purification of polymer solutions
EP0227124B2 (en) 1985-12-23 1996-01-31 Shell Internationale Researchmaatschappij B.V. Olefinic benzocyclobutene polymers and processes for the preparation thereof
US4698394A (en) 1985-12-23 1987-10-06 Shell Oil Company Reactive styrene polymers
CA1293090C (en) 1986-09-29 1991-12-10 Pui Kwan Wong Olefinic benzocyclobutene polymers and processes for the preparation thereof
US5136029A (en) 1988-10-20 1992-08-04 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Hydrolyzable silyl group-containing azo compound
US4985540A (en) * 1989-11-20 1991-01-15 Polysar Limited Process for removing rhodium-containing catalyst residue from hydrogenated nitrile rubber
US5446125A (en) 1991-04-01 1995-08-29 Ocg Microelectronic Materials, Inc. Method for removing metal impurities from resist components
JP2771076B2 (ja) * 1991-09-03 1998-07-02 オリン・マイクロエレクトロニツク・ケミカルズ・インコーポレイテツド レジスト成分からの金属不純物の除去方法
US5187019A (en) 1991-09-06 1993-02-16 King Industries, Inc. Latent catalysts
FR2687671B1 (fr) * 1992-02-21 1994-05-20 Centre Nal Recherc Scientifique Monomeres derives de sultones perhalogenees et polymeres obtenus a partir de ces monomeres.
US5571657A (en) 1993-09-30 1996-11-05 Shipley Company, Inc. Modified cation exhange process
US5686561A (en) * 1994-08-23 1997-11-11 Hoechst Celanese Corporation Metal ion reduction in novolak resin solution using an anion exchange resin
JP3363051B2 (ja) 1997-02-21 2003-01-07 丸善石油化学株式会社 ビニルフェノール系重合体の金属除去法
NL1014545C2 (nl) 1999-03-31 2002-02-26 Ciba Sc Holding Ag Oxim-derivaten en de toepassing daarvan als latente zuren.
EP1095711B1 (en) 1999-10-27 2004-01-28 Novartis AG Process for coating a material surface
EP1126537B1 (en) * 2000-02-15 2010-12-15 Asahi Glass Company Ltd. Block polymer, process for producing a polymer, and polymer electrolyte fuel cell
JP2003048929A (ja) 2001-05-29 2003-02-21 Nippon Shokubai Co Ltd 硬化性樹脂組成物
EP1408066B1 (en) * 2001-06-20 2010-03-31 Nippon Kayaku Kabushiki Kaisha Block copolymer reduced in impurity content; polymeric carrier; pharmaceutical preparations in polymeric form and process for the preparation of the same
JP2003238682A (ja) 2002-02-19 2003-08-27 Sumitomo Bakelite Co Ltd ポリアミド系化合物中の金属除去方法
JP2006513291A (ja) 2003-01-09 2006-04-20 アルコン,インコーポレイテッド 眼科用レンズ材料のための二重機能性uv吸収材
JP4012480B2 (ja) * 2003-03-28 2007-11-21 Azエレクトロニックマテリアルズ株式会社 微細パターン形成補助剤及びその製造法
US7471614B2 (en) 2003-08-29 2008-12-30 International Business Machines Corporation High density data storage medium
KR101129948B1 (ko) * 2003-12-16 2012-03-26 듀퐁 일렉트로닉 폴리머스 엘피 중합체 정제방법
US8133534B2 (en) 2004-11-22 2012-03-13 Wisconsin Alumni Research Foundation Methods and compositions for forming patterns with isolated or discrete features using block copolymer materials
KR100696254B1 (ko) * 2005-02-23 2007-03-21 박철민 나노크기 블록공중합체 마이셀 박막의 패턴닝 방법
US8168284B2 (en) 2005-10-06 2012-05-01 Wisconsin Alumni Research Foundation Fabrication of complex three-dimensional structures based on directed assembly of self-assembling materials on activated two-dimensional templates
JP2007211048A (ja) * 2006-02-07 2007-08-23 Toyo Ink Mfg Co Ltd ビニル系重合体の製造方法
US7411053B2 (en) 2006-05-25 2008-08-12 Harruna Issifu I Ligand-functionalized/azo compounds and methods of use thereof
JP2008088368A (ja) 2006-10-04 2008-04-17 Canon Inc 高分子化合物を含有する組成物の製造方法、組成物、及び液体付与方法
US7964107B2 (en) * 2007-02-08 2011-06-21 Micron Technology, Inc. Methods using block copolymer self-assembly for sub-lithographic patterning
JP2008308565A (ja) * 2007-06-14 2008-12-25 Toray Ind Inc 熱可塑性共重合の製造方法
US8080615B2 (en) 2007-06-19 2011-12-20 Micron Technology, Inc. Crosslinkable graft polymer non-preferentially wetted by polystyrene and polyethylene oxide
US7790350B2 (en) 2007-07-30 2010-09-07 International Business Machines Corporation Method and materials for patterning a neutral surface
KR100930966B1 (ko) 2007-09-14 2009-12-10 한국과학기술원 블록공중합체의 나노구조와 일치하지 않는 형태의 표면패턴상에 형성되는 블록공중합체의 나노구조체 및 그 제조방법
CN201127857Y (zh) * 2007-11-21 2008-10-08 黄永刚 新型空化器
WO2009079241A2 (en) 2007-12-07 2009-06-25 Wisconsin Alumni Research Foundation Density multiplication and improved lithography by directed block copolymer assembly
KR101355167B1 (ko) * 2007-12-14 2014-01-28 삼성전자주식회사 적어도 세 개의 고분자 블록을 구비하는 블록 공중합체를이용한 미세 패턴 형성 방법
US7763319B2 (en) 2008-01-11 2010-07-27 International Business Machines Corporation Method of controlling orientation of domains in block copolymer films
US7521094B1 (en) 2008-01-14 2009-04-21 International Business Machines Corporation Method of forming polymer features by directed self-assembly of block copolymers
US8017194B2 (en) 2008-01-17 2011-09-13 International Business Machines Corporation Method and material for a thermally crosslinkable random copolymer
US8999492B2 (en) 2008-02-05 2015-04-07 Micron Technology, Inc. Method to produce nanometer-sized features with directed assembly of block copolymers
JP2009221447A (ja) * 2008-03-19 2009-10-01 Kaneka Corp アクリル系重合体の製造方法
US8114301B2 (en) * 2008-05-02 2012-02-14 Micron Technology, Inc. Graphoepitaxial self-assembly of arrays of downward facing half-cylinders
US7560141B1 (en) 2008-11-11 2009-07-14 International Business Machines Corporation Method of positioning patterns from block copolymer self-assembly
US8362179B2 (en) 2008-11-19 2013-01-29 Wisconsin Alumni Research Foundation Photopatternable imaging layers for controlling block copolymer microdomain orientation
JP5431012B2 (ja) 2009-04-30 2014-03-05 株式会社ダイセル 共重合体、該共重合体を含む樹脂組成物及びその硬化物
JP5222805B2 (ja) 2009-07-09 2013-06-26 パナソニック株式会社 自己組織化パターン形成方法
KR20120066016A (ko) * 2009-08-14 2012-06-21 마루젠 세끼유가가꾸 가부시키가이샤 비닐에터계 별형 폴리머 및 그 제조방법
US8623458B2 (en) 2009-12-18 2014-01-07 International Business Machines Corporation Methods of directed self-assembly, and layered structures formed therefrom
US8309278B2 (en) 2010-07-07 2012-11-13 Massachusetts Institute Of Technology Guided self-assembly of block copolymer line structures for integrated circuit interconnects
DE102010034577B4 (de) 2010-08-17 2013-01-17 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Herstellung durchschlagfester ultradünner Dielektrika in elektronischen Bauteilen unter Verwendung vernetzbarer polymerer dielektrischer Materialien
KR101781517B1 (ko) * 2010-09-30 2017-09-26 삼성디스플레이 주식회사 블록 공중합체 및 이를 이용한 패턴 형성 방법
KR101892623B1 (ko) 2011-04-29 2018-08-30 삼성디스플레이 주식회사 중성표면을 형성하기 위한 랜덤 공중합체 및 그 제조 및 사용 방법들
JP6064360B2 (ja) 2011-05-11 2017-01-25 Jsr株式会社 パターン形成方法及びレジスト下層膜形成用組成物
WO2012161106A1 (ja) 2011-05-26 2012-11-29 住友化学株式会社 有機薄膜トランジスタ絶縁層材料
JP5240380B1 (ja) 2011-07-05 2013-07-17 Jsr株式会社 樹脂組成物、重合体、硬化膜および電子部品
US8691925B2 (en) 2011-09-23 2014-04-08 Az Electronic Materials (Luxembourg) S.A.R.L. Compositions of neutral layer for directed self assembly block copolymers and processes thereof
US10240250B2 (en) 2011-10-03 2019-03-26 Asml Netherlands B.V. Method to provide a patterned orientation template for a self-assemblable polymer
KR102018932B1 (ko) 2012-02-10 2019-09-05 보드 오브 리전츠, 더 유니버시티 오브 텍사스 시스템 박막 블록 공중합체의 배향 조절을 위한 무수물 공중합체 톱 코트
US8686109B2 (en) 2012-03-09 2014-04-01 Az Electronic Materials (Luxembourg) S.A.R.L. Methods and materials for removing metals in block copolymers
WO2013156240A1 (en) 2012-04-20 2013-10-24 Asml Netherlands B.V. Methods for providing spaced lithography features on a substrate by self-assembly of block copolymers
US9250528B2 (en) 2012-04-27 2016-02-02 Asml Netherlands B.V. Methods and compositions for providing spaced lithography features on a substrate by self-assembly of block copolymers
US8835581B2 (en) 2012-06-08 2014-09-16 Az Electronic Materials (Luxembourg) S.A.R.L. Neutral layer polymer composition for directed self assembly and processes thereof
US10457088B2 (en) 2013-05-13 2019-10-29 Ridgefield Acquisition Template for self assembly and method of making a self assembled pattern

Also Published As

Publication number Publication date
US20130233827A1 (en) 2013-09-12
US8686109B2 (en) 2014-04-01
CN104159948A (zh) 2014-11-19
WO2013131762A1 (en) 2013-09-12
JP6182164B2 (ja) 2017-08-16
EP2822988A1 (en) 2015-01-14
CN104159948B (zh) 2018-02-09
KR20140132719A (ko) 2014-11-18
EP2822988B1 (en) 2018-11-14
TW201343696A (zh) 2013-11-01
TW201713703A (zh) 2017-04-16
TWI599589B (zh) 2017-09-21
US20140151330A1 (en) 2014-06-05
US9040659B2 (en) 2015-05-26
JP2015512980A (ja) 2015-04-30
TWI574982B (zh) 2017-03-21
KR101895655B1 (ko) 2018-09-05

Similar Documents

Publication Publication Date Title
SG11201405483WA (en) Methods and materials for removing metals in block copolymers
GB201223055D0 (en) Method and apparatus for use in well abandonment
PL2855065T3 (pl) Sposób i układ do spawania manualnego
GB201220795D0 (en) Hair removal device and method
GB201505403D0 (en) Method and apparatus for configurable microplanning
HK1205320A1 (en) Tools and methods for determining relationship values
HK1201695A1 (en) Noodle-steaming method and noodle-steaming device
EP2918096A4 (en) PCRF APPARATUS AND TRAFFIC DELIVERY METHOD FOR USE IN PCRF
EP2796540A4 (en) OBJECT SELECTION DEVICE AND OBJECT SELECTION METHOD
EP2748633A4 (en) METHOD AND APPARATUS FOR LOCATION
PL2866854T3 (pl) Polimery do zastosowania w sposobach
EP2930898A4 (en) METHOD FOR COMMON FILE USE AND PORTABLE DEVICE
EP2721235A4 (en) VERSATILE SECURITY DEVICE AND ASSOCIATED METHODS
HUE047309T2 (hu) Eljárások és berendezés készülékek közötti üzenetátvitel javítására
EP2796538A4 (en) OBJECT SELECTION DEVICE AND OBJECT SELECTION METHOD
EP2891535A4 (en) TURNING METHOD AND TURNING DEVICE
HK1207461A1 (en) Graph-drawing device and graph-drawing method
EP2913954A4 (en) METHOD AND DEVICE FOR SYNCHRONIZING THE TIME ON A SHORT DISTANCE
EP2938937A4 (en) DEVICE AND METHOD FOR REMOVING REFRIGERANT
IL235082B (en) Buprenorphine for use in the prevention or treatment of an adverse pharmacodynamic reaction caused by oxycodone
EP2893987A4 (en) PART PROCESSING DEVICE AND METHOD FOR MOVING A MOLD IN A PART PROCESSING DEVICE
EP2933234A4 (en) PROCESS FOR REMOVING HEAVY METAL AND DEVICE FOR REMOVING HEAVY METAL
EP2786238A4 (en) METHOD AND DEVICE FOR PROCESSING MITER PAGE
EP2804539A4 (en) DEVICE AND METHOD FOR ACQUIRING TISSUE
PL2873482T3 (pl) Sposób zgrzewania tarciowego i urządzenie do zgrzewania tarciowego