SG11201405483WA - Methods and materials for removing metals in block copolymers - Google Patents

Methods and materials for removing metals in block copolymers

Info

Publication number
SG11201405483WA
SG11201405483WA SG11201405483WA SG11201405483WA SG11201405483WA SG 11201405483W A SG11201405483W A SG 11201405483WA SG 11201405483W A SG11201405483W A SG 11201405483WA SG 11201405483W A SG11201405483W A SG 11201405483WA SG 11201405483W A SG11201405483W A SG 11201405483WA
Authority
SG
Singapore
Prior art keywords
materials
methods
block copolymers
removing metals
metals
Prior art date
Application number
SG11201405483WA
Inventor
Jian Yin
Hengpeng Wu
Sungeun Hong
Mark Neisser
Yi Cao
Original Assignee
Az Electronic Materials Luxembourg S À R L
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Az Electronic Materials Luxembourg S À R L filed Critical Az Electronic Materials Luxembourg S À R L
Publication of SG11201405483WA publication Critical patent/SG11201405483WA/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D15/00Separating processes involving the treatment of liquids with solid sorbents; Apparatus therefor
    • B01D15/08Selective adsorption, e.g. chromatography
    • B01D15/26Selective adsorption, e.g. chromatography characterised by the separation mechanism
    • B01D15/36Selective adsorption, e.g. chromatography characterised by the separation mechanism involving ionic interaction
    • B01D15/361Ion-exchange
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J39/00Cation exchange; Use of material as cation exchangers; Treatment of material for improving the cation exchange properties
    • B01J39/04Processes using organic exchangers
    • B01J39/05Processes using organic exchangers in the strongly acidic form
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J41/00Anion exchange; Use of material as anion exchangers; Treatment of material for improving the anion exchange properties
    • B01J41/04Processes using organic exchangers
    • B01J41/07Processes using organic exchangers in the weakly basic form
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J45/00Ion-exchange in which a complex or a chelate is formed; Use of material as complex or chelate forming ion-exchangers; Treatment of material for improving the complex or chelate forming ion-exchange properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/002Processes for applying liquids or other fluent materials the substrate being rotated
    • B05D1/005Spin coating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F6/00Post-polymerisation treatments
    • C08F6/02Neutralisation of the polymerisation mass, e.g. killing the catalyst also removal of catalyst residues
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00Processes of treating or compounding macromolecular substances
SG11201405483WA 2012-03-09 2013-02-22 Methods and materials for removing metals in block copolymers SG11201405483WA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/416,669 US8686109B2 (en) 2012-03-09 2012-03-09 Methods and materials for removing metals in block copolymers
PCT/EP2013/053548 WO2013131762A1 (en) 2012-03-09 2013-02-22 Methods and materials for removing metals in block copolymers

Publications (1)

Publication Number Publication Date
SG11201405483WA true SG11201405483WA (en) 2014-10-30

Family

ID=47747636

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201405483WA SG11201405483WA (en) 2012-03-09 2013-02-22 Methods and materials for removing metals in block copolymers

Country Status (8)

Country Link
US (2) US8686109B2 (en)
EP (1) EP2822988B1 (en)
JP (1) JP6182164B2 (en)
KR (1) KR101895655B1 (en)
CN (1) CN104159948B (en)
SG (1) SG11201405483WA (en)
TW (2) TWI574982B (en)
WO (1) WO2013131762A1 (en)

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US10457088B2 (en) 2013-05-13 2019-10-29 Ridgefield Acquisition Template for self assembly and method of making a self assembled pattern
US9093263B2 (en) 2013-09-27 2015-07-28 Az Electronic Materials (Luxembourg) S.A.R.L. Underlayer composition for promoting self assembly and method of making and using
US9181449B2 (en) 2013-12-16 2015-11-10 Az Electronic Materials (Luxembourg) S.A.R.L. Underlayer composition for promoting self assembly and method of making and using
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WO2023074156A1 (en) * 2021-10-29 2023-05-04 ソニーグループ株式会社 Wave control medium, metamaterial, electromagnetic wave control member, sensor, electromagnetic wave waveguide, computation element, transmitting/receivng device, light-receiving/emitting device, energy absorption material, blackbody material, extinction material, energy conversion material, electric wave lens, optical lens, color filter, frequency selection filter, electromagnetic wave reflection material, beam phase control device, electrospinning device, device for manufacturing wave control medium, and method for manufacturing wave control medium

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Also Published As

Publication number Publication date
JP6182164B2 (en) 2017-08-16
TW201343696A (en) 2013-11-01
TW201713703A (en) 2017-04-16
JP2015512980A (en) 2015-04-30
CN104159948B (en) 2018-02-09
US8686109B2 (en) 2014-04-01
EP2822988B1 (en) 2018-11-14
TWI599589B (en) 2017-09-21
KR20140132719A (en) 2014-11-18
US9040659B2 (en) 2015-05-26
TWI574982B (en) 2017-03-21
US20140151330A1 (en) 2014-06-05
WO2013131762A1 (en) 2013-09-12
US20130233827A1 (en) 2013-09-12
EP2822988A1 (en) 2015-01-14
CN104159948A (en) 2014-11-19
KR101895655B1 (en) 2018-09-05

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