SG11201405483WA - Methods and materials for removing metals in block copolymers - Google Patents
Methods and materials for removing metals in block copolymersInfo
- Publication number
- SG11201405483WA SG11201405483WA SG11201405483WA SG11201405483WA SG11201405483WA SG 11201405483W A SG11201405483W A SG 11201405483WA SG 11201405483W A SG11201405483W A SG 11201405483WA SG 11201405483W A SG11201405483W A SG 11201405483WA SG 11201405483W A SG11201405483W A SG 11201405483WA
- Authority
- SG
- Singapore
- Prior art keywords
- materials
- methods
- block copolymers
- removing metals
- metals
- Prior art date
Links
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D15/00—Separating processes involving the treatment of liquids with solid sorbents; Apparatus therefor
- B01D15/08—Selective adsorption, e.g. chromatography
- B01D15/26—Selective adsorption, e.g. chromatography characterised by the separation mechanism
- B01D15/36—Selective adsorption, e.g. chromatography characterised by the separation mechanism involving ionic interaction
- B01D15/361—Ion-exchange
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J39/00—Cation exchange; Use of material as cation exchangers; Treatment of material for improving the cation exchange properties
- B01J39/04—Processes using organic exchangers
- B01J39/05—Processes using organic exchangers in the strongly acidic form
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J41/00—Anion exchange; Use of material as anion exchangers; Treatment of material for improving the anion exchange properties
- B01J41/04—Processes using organic exchangers
- B01J41/07—Processes using organic exchangers in the weakly basic form
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J45/00—Ion-exchange in which a complex or a chelate is formed; Use of material as complex or chelate forming ion-exchangers; Treatment of material for improving the complex or chelate forming ion-exchange properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/002—Processes for applying liquids or other fluent materials the substrate being rotated
- B05D1/005—Spin coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F6/00—Post-polymerisation treatments
- C08F6/02—Neutralisation of the polymerisation mass, e.g. killing the catalyst also removal of catalyst residues
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J3/00—Processes of treating or compounding macromolecular substances
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/416,669 US8686109B2 (en) | 2012-03-09 | 2012-03-09 | Methods and materials for removing metals in block copolymers |
PCT/EP2013/053548 WO2013131762A1 (en) | 2012-03-09 | 2013-02-22 | Methods and materials for removing metals in block copolymers |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201405483WA true SG11201405483WA (en) | 2014-10-30 |
Family
ID=47747636
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201405483WA SG11201405483WA (en) | 2012-03-09 | 2013-02-22 | Methods and materials for removing metals in block copolymers |
Country Status (8)
Country | Link |
---|---|
US (2) | US8686109B2 (en) |
EP (1) | EP2822988B1 (en) |
JP (1) | JP6182164B2 (en) |
KR (1) | KR101895655B1 (en) |
CN (1) | CN104159948B (en) |
SG (1) | SG11201405483WA (en) |
TW (2) | TWI574982B (en) |
WO (1) | WO2013131762A1 (en) |
Families Citing this family (16)
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US8691925B2 (en) | 2011-09-23 | 2014-04-08 | Az Electronic Materials (Luxembourg) S.A.R.L. | Compositions of neutral layer for directed self assembly block copolymers and processes thereof |
US8686109B2 (en) | 2012-03-09 | 2014-04-01 | Az Electronic Materials (Luxembourg) S.A.R.L. | Methods and materials for removing metals in block copolymers |
US8835581B2 (en) | 2012-06-08 | 2014-09-16 | Az Electronic Materials (Luxembourg) S.A.R.L. | Neutral layer polymer composition for directed self assembly and processes thereof |
US10457088B2 (en) | 2013-05-13 | 2019-10-29 | Ridgefield Acquisition | Template for self assembly and method of making a self assembled pattern |
US9093263B2 (en) | 2013-09-27 | 2015-07-28 | Az Electronic Materials (Luxembourg) S.A.R.L. | Underlayer composition for promoting self assembly and method of making and using |
US9181449B2 (en) | 2013-12-16 | 2015-11-10 | Az Electronic Materials (Luxembourg) S.A.R.L. | Underlayer composition for promoting self assembly and method of making and using |
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JP6772132B2 (en) * | 2015-06-22 | 2020-10-21 | 丸善石油化学株式会社 | A method for producing a polymer for electronic materials and a polymer for electronic materials obtained by the production method. |
SG10202110494QA (en) | 2016-08-18 | 2021-11-29 | Ridgefield Acquisition | Polymer compositions for self-assembly applications |
WO2018114930A1 (en) | 2016-12-21 | 2018-06-28 | AZ Electronic Materials (Luxembourg) S.à.r.l. | Novel compositions and processes for self-assembly of block copolymers |
WO2021045068A1 (en) * | 2019-09-05 | 2021-03-11 | 日産化学株式会社 | Method for producing silicon-containing polymer composition |
US20230102166A1 (en) * | 2021-08-30 | 2023-03-30 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method of manufacturing a semiconductor device |
WO2023074156A1 (en) * | 2021-10-29 | 2023-05-04 | ソニーグループ株式会社 | Wave control medium, metamaterial, electromagnetic wave control member, sensor, electromagnetic wave waveguide, computation element, transmitting/receivng device, light-receiving/emitting device, energy absorption material, blackbody material, extinction material, energy conversion material, electric wave lens, optical lens, color filter, frequency selection filter, electromagnetic wave reflection material, beam phase control device, electrospinning device, device for manufacturing wave control medium, and method for manufacturing wave control medium |
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US8686109B2 (en) | 2012-03-09 | 2014-04-01 | Az Electronic Materials (Luxembourg) S.A.R.L. | Methods and materials for removing metals in block copolymers |
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WO2013160027A1 (en) | 2012-04-27 | 2013-10-31 | Asml Netherlands B.V. | Methods and compositions for providing spaced lithography features on a substrate by self-assembly of block copolymers |
US8835581B2 (en) | 2012-06-08 | 2014-09-16 | Az Electronic Materials (Luxembourg) S.A.R.L. | Neutral layer polymer composition for directed self assembly and processes thereof |
US10457088B2 (en) | 2013-05-13 | 2019-10-29 | Ridgefield Acquisition | Template for self assembly and method of making a self assembled pattern |
-
2012
- 2012-03-09 US US13/416,669 patent/US8686109B2/en active Active
-
2013
- 2013-02-22 KR KR1020147024721A patent/KR101895655B1/en active IP Right Grant
- 2013-02-22 WO PCT/EP2013/053548 patent/WO2013131762A1/en active Application Filing
- 2013-02-22 SG SG11201405483WA patent/SG11201405483WA/en unknown
- 2013-02-22 JP JP2014560302A patent/JP6182164B2/en active Active
- 2013-02-22 CN CN201380013072.3A patent/CN104159948B/en active Active
- 2013-02-22 EP EP13705489.6A patent/EP2822988B1/en active Active
- 2013-03-08 TW TW102108348A patent/TWI574982B/en active
- 2013-03-08 TW TW105142530A patent/TWI599589B/en active
-
2014
- 2014-02-07 US US14/175,203 patent/US9040659B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP6182164B2 (en) | 2017-08-16 |
TW201343696A (en) | 2013-11-01 |
TW201713703A (en) | 2017-04-16 |
JP2015512980A (en) | 2015-04-30 |
CN104159948B (en) | 2018-02-09 |
US8686109B2 (en) | 2014-04-01 |
EP2822988B1 (en) | 2018-11-14 |
TWI599589B (en) | 2017-09-21 |
KR20140132719A (en) | 2014-11-18 |
US9040659B2 (en) | 2015-05-26 |
TWI574982B (en) | 2017-03-21 |
US20140151330A1 (en) | 2014-06-05 |
WO2013131762A1 (en) | 2013-09-12 |
US20130233827A1 (en) | 2013-09-12 |
EP2822988A1 (en) | 2015-01-14 |
CN104159948A (en) | 2014-11-19 |
KR101895655B1 (en) | 2018-09-05 |
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