SG11201404047QA - Polishing composition, manufacturing process therefor, process for production of silicon substrate, and silicon substrate - Google Patents
Polishing composition, manufacturing process therefor, process for production of silicon substrate, and silicon substrateInfo
- Publication number
- SG11201404047QA SG11201404047QA SG11201404047QA SG11201404047QA SG11201404047QA SG 11201404047Q A SG11201404047Q A SG 11201404047QA SG 11201404047Q A SG11201404047Q A SG 11201404047QA SG 11201404047Q A SG11201404047Q A SG 11201404047QA SG 11201404047Q A SG11201404047Q A SG 11201404047QA
- Authority
- SG
- Singapore
- Prior art keywords
- silicon substrate
- production
- polishing composition
- manufacturing process
- therefor
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
- B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/04—Aqueous dispersions
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1409—Abrasive particles per se
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1463—Aqueous liquid suspensions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02002—Preparing wafers
- H01L21/02005—Preparing bulk and homogeneous wafers
- H01L21/02008—Multistep processes
- H01L21/0201—Specific process step
- H01L21/02024—Mirror polishing
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Dispersion Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mechanical Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012006371 | 2012-01-16 | ||
PCT/JP2013/050654 WO2013108777A1 (ja) | 2012-01-16 | 2013-01-16 | 研磨用組成物、その製造方法、シリコン基板の製造方法、及びシリコン基板 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201404047QA true SG11201404047QA (en) | 2014-09-26 |
Family
ID=48799202
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201404047QA SG11201404047QA (en) | 2012-01-16 | 2013-01-16 | Polishing composition, manufacturing process therefor, process for production of silicon substrate, and silicon substrate |
Country Status (7)
Country | Link |
---|---|
US (1) | US9206336B2 (ja) |
JP (1) | JP5873882B2 (ja) |
KR (1) | KR102047281B1 (ja) |
DE (1) | DE112013001199T5 (ja) |
SG (1) | SG11201404047QA (ja) |
TW (1) | TWI650408B (ja) |
WO (1) | WO2013108777A1 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6228032B2 (ja) * | 2014-02-25 | 2017-11-08 | 株式会社フジミインコーポレーテッド | 半導体基板を連続的に製造する方法 |
JP6160579B2 (ja) | 2014-08-05 | 2017-07-12 | 信越半導体株式会社 | シリコンウェーハの仕上げ研磨方法 |
JP6396740B2 (ja) * | 2014-09-29 | 2018-09-26 | 株式会社フジミインコーポレーテッド | 研磨用組成物及び研磨方法 |
JP6775453B2 (ja) * | 2017-03-23 | 2020-10-28 | 山口精研工業株式会社 | 磁気ディスク基板用研磨剤組成物 |
JP6879798B2 (ja) * | 2017-03-30 | 2021-06-02 | 株式会社フジミインコーポレーテッド | 研磨用組成物および研磨方法 |
JP7340335B2 (ja) * | 2018-01-22 | 2023-09-07 | ニッタ・デュポン株式会社 | 研磨用組成物 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10309660A (ja) * | 1997-05-07 | 1998-11-24 | Tokuyama Corp | 仕上げ研磨剤 |
JP2000218107A (ja) | 1998-11-25 | 2000-08-08 | Ebara Corp | フィルタ装置及び砥液供給装置 |
US6280300B1 (en) * | 1998-11-25 | 2001-08-28 | Ebara Corporation | Filter apparatus |
JP2001015461A (ja) | 1999-06-29 | 2001-01-19 | Toshiba Corp | 研磨液および研磨方法 |
JP2001294417A (ja) * | 2000-04-12 | 2001-10-23 | Nippon Chem Ind Co Ltd | コロイダルシリカの製造方法 |
JP2003136406A (ja) * | 2001-10-25 | 2003-05-14 | Speedfam Co Ltd | 研磨剤リサイクル方法及び同システム |
US6685757B2 (en) | 2002-02-21 | 2004-02-03 | Rodel Holdings, Inc. | Polishing composition |
US6929532B1 (en) * | 2003-05-08 | 2005-08-16 | Lsi Logic Corporation | Method and apparatus for filtering a chemical polishing slurry of a wafer fabrication process |
TWI364450B (en) | 2004-08-09 | 2012-05-21 | Kao Corp | Polishing composition |
KR100640583B1 (ko) * | 2004-08-16 | 2006-10-31 | 삼성전자주식회사 | 산화세륨 연마 입자 및 그 제조 방법과 cmp용 슬러리조성물 및 그 제조 방법과 이들을 이용한 기판 연마 방법 |
JP2006056774A (ja) | 2004-08-16 | 2006-03-02 | Samsung Electronics Co Ltd | 酸化セリウム研磨粒子の製造方法及びそれを含む組成物 |
JP2006136996A (ja) | 2004-10-12 | 2006-06-01 | Kao Corp | 研磨液組成物の製造方法 |
JP4824976B2 (ja) | 2005-09-06 | 2011-11-30 | Sumco Techxiv株式会社 | 半導体ウェハの研磨方法 |
JP4796807B2 (ja) | 2005-09-06 | 2011-10-19 | Sumco Techxiv株式会社 | 半導体ウェハの研磨方法 |
TW200717635A (en) | 2005-09-06 | 2007-05-01 | Komatsu Denshi Kinzoku Kk | Polishing method for semiconductor wafer |
US7775854B1 (en) * | 2007-07-23 | 2010-08-17 | Gemini, Inc. | Water jet machining with abrasive recovery and filtration |
JP5474400B2 (ja) * | 2008-07-03 | 2014-04-16 | 株式会社フジミインコーポレーテッド | 半導体用濡れ剤、それを用いた研磨用組成物および研磨方法 |
JP4772156B1 (ja) | 2010-07-05 | 2011-09-14 | 花王株式会社 | シリコンウエハ用研磨液組成物 |
-
2013
- 2013-01-15 TW TW102101491A patent/TWI650408B/zh active
- 2013-01-16 KR KR1020147021978A patent/KR102047281B1/ko active IP Right Grant
- 2013-01-16 DE DE201311001199 patent/DE112013001199T5/de active Pending
- 2013-01-16 WO PCT/JP2013/050654 patent/WO2013108777A1/ja active Application Filing
- 2013-01-16 US US14/372,141 patent/US9206336B2/en active Active
- 2013-01-16 SG SG11201404047QA patent/SG11201404047QA/en unknown
- 2013-01-16 JP JP2013554304A patent/JP5873882B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
DE112013001199T5 (de) | 2014-11-20 |
JPWO2013108777A1 (ja) | 2015-05-11 |
US20150056122A1 (en) | 2015-02-26 |
TW201348417A (zh) | 2013-12-01 |
KR20140117496A (ko) | 2014-10-07 |
US9206336B2 (en) | 2015-12-08 |
WO2013108777A1 (ja) | 2013-07-25 |
TWI650408B (zh) | 2019-02-11 |
KR102047281B1 (ko) | 2019-11-21 |
JP5873882B2 (ja) | 2016-03-01 |
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