SG103303A1 - Exposure apparatus, surface position adjustment unit, mask, and device manufacturing method - Google Patents

Exposure apparatus, surface position adjustment unit, mask, and device manufacturing method

Info

Publication number
SG103303A1
SG103303A1 SG200104048A SG200104048A SG103303A1 SG 103303 A1 SG103303 A1 SG 103303A1 SG 200104048 A SG200104048 A SG 200104048A SG 200104048 A SG200104048 A SG 200104048A SG 103303 A1 SG103303 A1 SG 103303A1
Authority
SG
Singapore
Prior art keywords
mask
exposure apparatus
adjustment unit
position adjustment
device manufacturing
Prior art date
Application number
SG200104048A
Other languages
English (en)
Inventor
Kida Yoshiki
Miyai Tsuneo
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2000207055A external-priority patent/JP2002025893A/ja
Priority claimed from JP2000235319A external-priority patent/JP2002050563A/ja
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of SG103303A1 publication Critical patent/SG103303A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70458—Mix-and-match, i.e. multiple exposures of the same area using a similar type of exposure apparatus, e.g. multiple exposures using a UV apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7046—Strategy, e.g. mark, sensor or wavelength selection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200104048A 2000-07-07 2001-07-05 Exposure apparatus, surface position adjustment unit, mask, and device manufacturing method SG103303A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000207055A JP2002025893A (ja) 2000-07-07 2000-07-07 露光装置、面位置調整装置、マスク、及びデバイス製造方法
JP2000235319A JP2002050563A (ja) 2000-08-03 2000-08-03 露光装置及びデバイス製造方法

Publications (1)

Publication Number Publication Date
SG103303A1 true SG103303A1 (en) 2004-04-29

Family

ID=26595621

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200104048A SG103303A1 (en) 2000-07-07 2001-07-05 Exposure apparatus, surface position adjustment unit, mask, and device manufacturing method

Country Status (6)

Country Link
US (2) US20020003216A1 (ko)
EP (1) EP1170636A3 (ko)
KR (1) KR100781105B1 (ko)
CN (1) CN1290155C (ko)
SG (1) SG103303A1 (ko)
TW (1) TW503468B (ko)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002134396A (ja) * 2000-10-25 2002-05-10 Sony Corp 半導体装置の製造方法および半導体パターン自動調節装置
US6906305B2 (en) * 2002-01-08 2005-06-14 Brion Technologies, Inc. System and method for aerial image sensing
JP2003309271A (ja) * 2002-04-18 2003-10-31 Matsushita Electric Ind Co Ltd 集積回路素子の実装構造および実装方法
US6828542B2 (en) 2002-06-07 2004-12-07 Brion Technologies, Inc. System and method for lithography process monitoring and control
US6807503B2 (en) 2002-11-04 2004-10-19 Brion Technologies, Inc. Method and apparatus for monitoring integrated circuit fabrication
SG125101A1 (en) * 2003-01-14 2006-09-29 Asml Netherlands Bv Level sensor for lithographic apparatus
US7053355B2 (en) 2003-03-18 2006-05-30 Brion Technologies, Inc. System and method for lithography process monitoring and control
EP1482373A1 (en) * 2003-05-30 2004-12-01 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1500987A1 (en) 2003-07-21 2005-01-26 ASML Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
JP4481109B2 (ja) 2003-08-26 2010-06-16 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィック装置、デバイス製造方法及びコンピュータ・プログラム
US20050094856A1 (en) * 2003-11-03 2005-05-05 Warren Scott R. Systems and methods for detecting target focus and tilt errors during genetic analysis
JP2005284867A (ja) * 2004-03-30 2005-10-13 Canon Inc 駆動制御装置及び方法及び露光装置
US7283759B2 (en) * 2004-03-31 2007-10-16 Canon Kabushiki Kaisha Image forming apparatus with heating member control in accordance with type of recording material
US7871810B2 (en) * 2004-11-03 2011-01-18 Life Technologies Corporation Multiaxis focusing mechanism for microarray analysis
JP4752473B2 (ja) * 2004-12-09 2011-08-17 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
JP2006245157A (ja) * 2005-03-02 2006-09-14 Canon Inc 露光方法及び露光装置
KR100771902B1 (ko) * 2006-07-13 2007-11-01 삼성전자주식회사 기판 노광 방법 및 장치
JP2009295932A (ja) * 2008-06-09 2009-12-17 Canon Inc 露光装置及びデバイス製造方法
JP5318544B2 (ja) * 2008-12-01 2013-10-16 株式会社ディスコ レーザ加工装置
CN102081307B (zh) * 2009-11-26 2013-06-19 上海微电子装备有限公司 光刻机曝光剂量控制方法
TW201133703A (en) * 2010-03-19 2011-10-01 Els System Technology Co Ltd Carrying apparatus and exposure machine having the same
US8728831B2 (en) * 2010-12-30 2014-05-20 Stmicroelectronics Pte. Ltd. Reconstituted wafer warpage adjustment
JP5906567B2 (ja) * 2011-02-09 2016-04-20 コニカミノルタ株式会社 画像形成装置及び画質調整方法
US9568831B2 (en) 2012-01-17 2017-02-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI551205B (zh) * 2013-06-20 2016-09-21 欣興電子股份有限公司 曝光圖像補償方法
TWI463251B (zh) * 2013-10-17 2014-12-01 hui ying Lin 具環境資訊感測之光罩結構
US9612534B2 (en) 2015-03-31 2017-04-04 Tokyo Electron Limited Exposure dose homogenization through rotation, translation, and variable processing conditions
US10345714B2 (en) * 2016-07-12 2019-07-09 Cymer, Llc Lithography optics adjustment and monitoring
CN106842830B (zh) * 2017-04-19 2018-05-18 广东工业大学 一种焦点探测侧面式光刻焦面位置的检测装置及方法
JP7005183B2 (ja) * 2017-06-19 2022-01-21 キヤノン株式会社 露光方法、露光装置および、物品製造方法
CN108803672B (zh) * 2018-04-25 2021-12-14 武汉高德红外股份有限公司 光电跟踪系统
CN109031897B (zh) * 2018-08-31 2019-10-25 北京理工大学 一种混合曝光快速精确制作微电极的方法
CN113703377B (zh) * 2021-10-28 2022-02-18 北京惠朗时代科技有限公司 一种校正系统

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0753796A1 (en) * 1995-07-07 1997-01-15 Canon Kabushiki Kaisha Scanning exposure apparatus and device for manufacturing method using the same
US6027839A (en) * 1997-11-18 2000-02-22 Nec Corporation Method for transferring pattern images through mix-and-match exposure at improved overlay accuracy
EP1039511A1 (en) * 1997-12-12 2000-09-27 Nikon Corporation Projection exposure method and projection aligner

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL9100410A (nl) * 1991-03-07 1992-10-01 Asm Lithography Bv Afbeeldingsapparaat voorzien van een focusfout- en/of scheefstandsdetectie-inrichting.
US5506684A (en) * 1991-04-04 1996-04-09 Nikon Corporation Projection scanning exposure apparatus with synchronous mask/wafer alignment system
JP3275368B2 (ja) * 1992-07-09 2002-04-15 株式会社ニコン 露光方法及び装置
US5854671A (en) * 1993-05-28 1998-12-29 Nikon Corporation Scanning exposure method and apparatus therefor and a projection exposure apparatus and method which selectively chooses between static exposure and scanning exposure
JP3500620B2 (ja) * 1994-10-24 2004-02-23 株式会社ニコン 投影露光方法及び装置
JP3453818B2 (ja) * 1993-11-08 2003-10-06 株式会社ニコン 基板の高さ位置検出装置及び方法
KR100422887B1 (ko) * 1995-03-16 2005-02-02 가부시키가이샤 니콘 노광장치및방법
US6229595B1 (en) * 1995-05-12 2001-05-08 The B. F. Goodrich Company Lithography system and method with mask image enlargement
US6238851B1 (en) * 1995-05-29 2001-05-29 Nikon Corporation Exposure method
KR100500199B1 (ko) * 1995-05-29 2005-11-01 가부시키가이샤 니콘 마스크패턴을겹쳐서노광하는노광방법
JP3624919B2 (ja) * 1995-08-04 2005-03-02 株式会社ニコン 露光方法
US5834160A (en) * 1996-01-16 1998-11-10 Lucent Technologies Inc. Method and apparatus for forming fine patterns on printed circuit board
EP1369895B1 (en) * 1996-03-04 2012-05-09 Canon Kabushiki Kaisha Electron beam exposure apparatus and method, and device manufacturing method
JP4043519B2 (ja) * 1996-04-10 2008-02-06 エーエスエムエル ネザーランズ ビー． ブイ． フォトリソグラフィク装置
US5948572A (en) * 1997-11-26 1999-09-07 United Microelectronics Corp. Mixed mode photomask for nikon stepper
AU2549899A (en) * 1998-03-02 1999-09-20 Nikon Corporation Method and apparatus for exposure, method of manufacture of exposure tool, device, and method of manufacture of device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0753796A1 (en) * 1995-07-07 1997-01-15 Canon Kabushiki Kaisha Scanning exposure apparatus and device for manufacturing method using the same
US6027839A (en) * 1997-11-18 2000-02-22 Nec Corporation Method for transferring pattern images through mix-and-match exposure at improved overlay accuracy
EP1039511A1 (en) * 1997-12-12 2000-09-27 Nikon Corporation Projection exposure method and projection aligner

Also Published As

Publication number Publication date
US20020003216A1 (en) 2002-01-10
KR20020005472A (ko) 2002-01-17
EP1170636A3 (en) 2004-09-29
CN1332470A (zh) 2002-01-23
EP1170636A2 (en) 2002-01-09
CN1290155C (zh) 2006-12-13
US20040036849A1 (en) 2004-02-26
KR100781105B1 (ko) 2007-11-30
US6900880B2 (en) 2005-05-31
TW503468B (en) 2002-09-21

Similar Documents

Publication Publication Date Title
SG103303A1 (en) Exposure apparatus, surface position adjustment unit, mask, and device manufacturing method
HK1063345A1 (en) Image forming characteristics adjusting method, exposure method and apparatus and device manufacturing method
SG107559A1 (en) Exposure method, exposure apparatus and device producing method
SG120906A1 (en) Lithographic apparatus and device manufacturing method
SG101453A1 (en) Exposure apparatus, substrate processing unit and lithographic system, and device manufacturing method
SG101954A1 (en) Exposure method, exposure apparatus, method for producing exposure apparatus, and method for producing device
SG103902A1 (en) Lithographic apparatus and device manufacturing method
SG113388A1 (en) Exposure method and exposure apparatus
SG121762A1 (en) Lithographic apparatus, and device manufacturing method
SG96605A1 (en) Substrate holding apparatus and exposure apparatus including substrate holding apparatus
SG2011031200A (en) Exposure apparatus and device manufacturing method
SG2010050110A (en) Lithographic apparatus and device manufacturing method
SG121819A1 (en) Lithographic apparatus and device manufacturing method
SG121820A1 (en) Lithographic apparatus and device manufacturing method
SG130007A1 (en) Lithographic apparatus and device manufacturing method
SG121829A1 (en) Lithographic apparatus and device manufacturing method
SG108317A1 (en) Lithographic apparatus and device manufacturing method
SG106138A1 (en) Lithographic apparatus and device manufacturing method
SG103893A1 (en) Lithographic apparatus and device manufacturing method
SG121780A1 (en) Lithographic apparatus and device manufacturing method
SG112970A1 (en) Lithographic projection apparatus and device manufacturing method
AU2003265176A8 (en) Exposure method, exposure mask, and exposure apparatus
SG123556A1 (en) Lithographic apparatus and device manufacturing method
SG115590A1 (en) Lithographic projection apparatus and device manufacturing method
SG111171A1 (en) Lithographic projection apparatus and device manufacturing method