SG10201709477TA - Imprint apparatus, imprinting method, and method for manufacturing article - Google Patents

Imprint apparatus, imprinting method, and method for manufacturing article

Info

Publication number
SG10201709477TA
SG10201709477TA SG10201709477TA SG10201709477TA SG10201709477TA SG 10201709477T A SG10201709477T A SG 10201709477TA SG 10201709477T A SG10201709477T A SG 10201709477TA SG 10201709477T A SG10201709477T A SG 10201709477TA SG 10201709477T A SG10201709477T A SG 10201709477TA
Authority
SG
Singapore
Prior art keywords
substrate
imprint apparatus
shot area
manufacturing article
imprinting
Prior art date
Application number
SG10201709477TA
Other languages
English (en)
Inventor
Sato Kazuhiro
Miyaharu Takafumi
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Publication of SG10201709477TA publication Critical patent/SG10201709477TA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C37/00—Component parts, details, accessories or auxiliary operations, not covered by group B29C33/00 or B29C35/00
    • B29C37/0025—Applying surface layers, e.g. coatings, decorative layers, printed layers, to articles during shaping, e.g. in-mould printing
    • B29C37/0028—In-mould coating, e.g. by introducing the coating material into the mould after forming the article
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C37/00—Component parts, details, accessories or auxiliary operations, not covered by group B29C33/00 or B29C35/00
    • B29C37/0025—Applying surface layers, e.g. coatings, decorative layers, printed layers, to articles during shaping, e.g. in-mould printing
    • B29C37/0028—In-mould coating, e.g. by introducing the coating material into the mould after forming the article
    • B29C2037/0046—In-mould printing, in-mould transfer printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
SG10201709477TA 2016-11-30 2017-11-17 Imprint apparatus, imprinting method, and method for manufacturing article SG10201709477TA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016233247A JP6827785B2 (ja) 2016-11-30 2016-11-30 インプリント装置、インプリント方法、および物品の製造方法

Publications (1)

Publication Number Publication Date
SG10201709477TA true SG10201709477TA (en) 2018-06-28

Family

ID=62190802

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201709477TA SG10201709477TA (en) 2016-11-30 2017-11-17 Imprint apparatus, imprinting method, and method for manufacturing article

Country Status (6)

Country Link
US (1) US11204548B2 (enrdf_load_stackoverflow)
JP (1) JP6827785B2 (enrdf_load_stackoverflow)
KR (1) KR102282089B1 (enrdf_load_stackoverflow)
CN (1) CN108121155B (enrdf_load_stackoverflow)
SG (1) SG10201709477TA (enrdf_load_stackoverflow)
TW (1) TWI668734B (enrdf_load_stackoverflow)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3620856A1 (en) * 2018-09-10 2020-03-11 Canon Kabushiki Kaisha Imprint method and article manufacturing method
JP7289633B2 (ja) * 2018-11-08 2023-06-12 キヤノン株式会社 インプリント装置および物品製造方法
TWI771623B (zh) * 2018-11-08 2022-07-21 日商佳能股份有限公司 壓印裝置和產品製造方法
JP7267801B2 (ja) 2019-03-26 2023-05-02 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
JP7379091B2 (ja) * 2019-10-30 2023-11-14 キヤノン株式会社 インプリント装置、インプリント方法、及び物品の製造方法
US11366384B2 (en) * 2019-12-18 2022-06-21 Canon Kabushiki Kaisha Nanoimprint lithography system and method for adjusting a radiation pattern that compensates for slippage of a template
US11199774B2 (en) * 2020-03-30 2021-12-14 Canon Kabushiki Kaisha Method and apparatus to improve frame cure imaging resolution for extrusion control
US11747731B2 (en) * 2020-11-20 2023-09-05 Canon Kabishiki Kaisha Curing a shaped film using multiple images of a spatial light modulator

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3528364B2 (ja) 1995-10-18 2004-05-17 ソニー株式会社 レーザビーム合成装置及び合成方法並びにレーザ製版装置及びレーザ製版方法
JP2002122945A (ja) 2000-10-18 2002-04-26 Noritsu Koki Co Ltd デジタル露光装置及びこれを備える写真処理装置
TW529172B (en) * 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
US7153616B2 (en) 2004-03-31 2006-12-26 Asml Holding N.V. System and method for verifying and controlling the performance of a maskless lithography tool
JP4958614B2 (ja) * 2006-04-18 2012-06-20 キヤノン株式会社 パターン転写装置、インプリント装置、パターン転写方法および位置合わせ装置
EP2037488A4 (en) * 2006-06-09 2011-11-23 Nikon Corp METHOD AND DEVICE FOR FORMING PATTERNS, METHOD AND DEVICE FOR EXPOSING, AND METHOD FOR MANUFACTURING DEVICES
KR101360160B1 (ko) 2006-11-22 2014-02-12 엘아이지에이디피 주식회사 미세패턴 형성장치 및 이를 이용한 미세패턴 형성방법
JP5329520B2 (ja) 2007-03-27 2013-10-30 カール・ツァイス・エスエムティー・ゲーエムベーハー 低角度で入射する補正光を用いる補正光学素子
JPWO2009153925A1 (ja) * 2008-06-17 2011-11-24 株式会社ニコン ナノインプリント方法及び装置
US8345242B2 (en) * 2008-10-28 2013-01-01 Molecular Imprints, Inc. Optical system for use in stage control
JP2011248327A (ja) * 2010-04-27 2011-12-08 Panasonic Corp 照明装置及びそれを備えた投写型表示装置
EP3460928A3 (en) 2010-07-30 2019-08-21 Sony Corporation Light source unit, illuminator, and display
JP5713961B2 (ja) 2011-06-21 2015-05-07 キヤノン株式会社 位置検出装置、インプリント装置及び位置検出方法
JP5686779B2 (ja) 2011-10-14 2015-03-18 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法
JP5932286B2 (ja) * 2011-10-14 2016-06-08 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法
JP2013175604A (ja) 2012-02-24 2013-09-05 Toshiba Corp パターン形成装置、パターン形成方法及び半導体装置の製造方法
JP6076618B2 (ja) 2012-05-14 2017-02-08 アストロデザイン株式会社 光学的分解能向上装置
CN103962079B (zh) * 2013-01-28 2017-11-17 西门子公司 加热装置和用于发生化学反应的设备
JP6236095B2 (ja) * 2013-03-13 2017-11-22 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ装置
JP6418773B2 (ja) 2013-05-14 2018-11-07 キヤノン株式会社 インプリント装置、インプリント方法および物品の製造方法
JP2015005676A (ja) * 2013-06-22 2015-01-08 株式会社ニコン 照明光学系、照明光学装置、露光装置、およびデバイス製造方法
JP6329353B2 (ja) 2013-10-01 2018-05-23 キヤノン株式会社 インプリント装置、および物品の製造方法
JP6336275B2 (ja) * 2013-12-26 2018-06-06 キヤノン株式会社 インプリント装置、および物品の製造方法
JP6294680B2 (ja) * 2014-01-24 2018-03-14 キヤノン株式会社 インプリント装置、および物品の製造方法
US9946166B2 (en) 2014-05-02 2018-04-17 Asml Netherlands B.V. Reduction of hotspots of dense features
JP2016042498A (ja) * 2014-08-13 2016-03-31 キヤノン株式会社 インプリント装置および物品製造方法
US20170210036A1 (en) * 2016-01-22 2017-07-27 Canon Kabushiki Kaisha Mold replicating method, imprint apparatus, and article manufacturing method
US11175598B2 (en) * 2017-06-30 2021-11-16 Canon Kabushiki Kaisha Imprint apparatus and method of manufacturing article

Also Published As

Publication number Publication date
CN108121155B (zh) 2022-06-03
JP2018092997A (ja) 2018-06-14
CN108121155A (zh) 2018-06-05
TW201822250A (zh) 2018-06-16
KR102282089B1 (ko) 2021-07-27
TWI668734B (zh) 2019-08-11
KR20180062391A (ko) 2018-06-08
JP6827785B2 (ja) 2021-02-10
US20180149969A1 (en) 2018-05-31
US11204548B2 (en) 2021-12-21

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