SG10201802884SA - Imprint apparatus and method of manufacturing article - Google Patents

Imprint apparatus and method of manufacturing article

Info

Publication number
SG10201802884SA
SG10201802884SA SG10201802884SA SG10201802884SA SG10201802884SA SG 10201802884S A SG10201802884S A SG 10201802884SA SG 10201802884S A SG10201802884S A SG 10201802884SA SG 10201802884S A SG10201802884S A SG 10201802884SA SG 10201802884S A SG10201802884S A SG 10201802884SA
Authority
SG
Singapore
Prior art keywords
mirror elements
imprint apparatus
imprint
manufacturing article
substrate
Prior art date
Application number
SG10201802884SA
Inventor
Yoshida Kenji
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Publication of SG10201802884SA publication Critical patent/SG10201802884SA/en

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  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

OF THE DISCLOSURE IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE The present invention provides an imprint apparatus that performs an imprint process of forming a pattern of an imprint material on a processing target region on a substrate by using a mold, including a digital mirror device including two-dimensionally arrayed mirror elements and configured to irradiate the substrate with light reflected by the mirror elements, a measurement unit configured to measure, for each of a plurality of segments obtained by dividing a region in which the mirror elements are arrayed so as to include a plurality of the mirror elements, a light amount of light emitted from each segment, and a control unit configured to control the mirror elements included in each segment based on a measurement result of the measurement unit. (Figure 1)
SG10201802884SA 2017-04-17 2018-04-05 Imprint apparatus and method of manufacturing article SG10201802884SA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017081437 2017-04-17
JP2018017577A JP6606567B2 (en) 2017-04-17 2018-02-02 Imprint apparatus and article manufacturing method

Publications (1)

Publication Number Publication Date
SG10201802884SA true SG10201802884SA (en) 2018-11-29

Family

ID=64277007

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201802884SA SG10201802884SA (en) 2017-04-17 2018-04-05 Imprint apparatus and method of manufacturing article

Country Status (3)

Country Link
JP (1) JP6606567B2 (en)
SG (1) SG10201802884SA (en)
TW (1) TWI720301B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7204464B2 (en) * 2018-12-12 2023-01-16 キヤノン株式会社 IMPRINT METHOD, IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD
JP7194010B2 (en) * 2018-12-20 2022-12-21 キヤノン株式会社 Imprint apparatus and article manufacturing method
JP7179655B2 (en) * 2019-03-14 2022-11-29 キヤノン株式会社 IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD
JP7337670B2 (en) * 2019-11-15 2023-09-04 キヤノン株式会社 IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD
JP7407579B2 (en) 2019-12-04 2024-01-04 キヤノン株式会社 Imprint device, imprint method, and article manufacturing method
JP7431659B2 (en) 2020-05-01 2024-02-15 キヤノン株式会社 Imprint method, imprint device and article manufacturing method

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4827513B2 (en) * 2005-12-09 2011-11-30 キヤノン株式会社 Processing method
US7978308B2 (en) * 2006-05-15 2011-07-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8345242B2 (en) * 2008-10-28 2013-01-01 Molecular Imprints, Inc. Optical system for use in stage control
JP6045363B2 (en) * 2012-01-27 2016-12-14 キヤノン株式会社 Imprint apparatus and article manufacturing method using the same
JP6418773B2 (en) * 2013-05-14 2018-11-07 キヤノン株式会社 Imprint apparatus, imprint method, and article manufacturing method
JP6362399B2 (en) * 2013-05-30 2018-07-25 キヤノン株式会社 Imprint apparatus, imprint method, and article manufacturing method
JP6306830B2 (en) * 2013-06-26 2018-04-04 キヤノン株式会社 Imprint apparatus and article manufacturing method
JP6294680B2 (en) * 2014-01-24 2018-03-14 キヤノン株式会社 Imprint apparatus and article manufacturing method
KR102166879B1 (en) * 2014-03-10 2020-10-16 어플라이드 머티어리얼스, 인코포레이티드 Pixel blending for multiple charged-particle beam lithography
JP6282298B2 (en) * 2015-06-10 2018-02-21 キヤノン株式会社 Imprint apparatus, imprint method, and article manufacturing method

Also Published As

Publication number Publication date
JP2018182300A (en) 2018-11-15
TW201838790A (en) 2018-11-01
JP6606567B2 (en) 2019-11-13
TWI720301B (en) 2021-03-01

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