SE7612832L - Forfarande for beleggning av ett substrat med ett skikt av en oxid av minst en metall - Google Patents

Forfarande for beleggning av ett substrat med ett skikt av en oxid av minst en metall

Info

Publication number
SE7612832L
SE7612832L SE7612832A SE7612832A SE7612832L SE 7612832 L SE7612832 L SE 7612832L SE 7612832 A SE7612832 A SE 7612832A SE 7612832 A SE7612832 A SE 7612832A SE 7612832 L SE7612832 L SE 7612832L
Authority
SE
Sweden
Prior art keywords
substrate
metal
oxide
coating
procedure
Prior art date
Application number
SE7612832A
Other languages
Unknown language ( )
English (en)
Other versions
SE420914B (sv
Inventor
B Zega
Original Assignee
Battelle Memorial Institute
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Battelle Memorial Institute filed Critical Battelle Memorial Institute
Publication of SE7612832L publication Critical patent/SE7612832L/sv
Publication of SE420914B publication Critical patent/SE420914B/sv

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/23—Mixtures
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/23—Mixtures
    • C03C2217/231—In2O3/SnO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/23—Mixtures
    • C03C2217/232—CdO/SnO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/151—Deposition methods from the vapour phase by vacuum evaporation
SE7612832A 1975-11-19 1976-11-17 Forfarande for att genom reaktiv jonavsettning belegga ett isolerande substrat med ett oxidskikt av minst en metall SE420914B (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1501975A CH610013A5 (sv) 1975-11-19 1975-11-19

Publications (2)

Publication Number Publication Date
SE7612832L true SE7612832L (sv) 1977-05-20
SE420914B SE420914B (sv) 1981-11-09

Family

ID=4405620

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7612832A SE420914B (sv) 1975-11-19 1976-11-17 Forfarande for att genom reaktiv jonavsettning belegga ett isolerande substrat med ett oxidskikt av minst en metall

Country Status (11)

Country Link
US (1) US4112137A (sv)
JP (1) JPS5262678A (sv)
BE (1) BE848500A (sv)
CA (1) CA1093910A (sv)
CH (1) CH610013A5 (sv)
DE (1) DE2653242C2 (sv)
FR (1) FR2332338A1 (sv)
GB (1) GB1542496A (sv)
IT (1) IT1121741B (sv)
NL (1) NL184792C (sv)
SE (1) SE420914B (sv)

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CH631743A5 (de) * 1977-06-01 1982-08-31 Balzers Hochvakuum Verfahren zum aufdampfen von material in einer vakuumaufdampfanlage.
US4349425A (en) * 1977-09-09 1982-09-14 Hitachi, Ltd. Transparent conductive films and methods of producing same
JPS581186B2 (ja) * 1977-12-13 1983-01-10 双葉電子工業株式会社 イオンプレ−テイング装置
GB2085482B (en) * 1980-10-06 1985-03-06 Optical Coating Laboratory Inc Forming thin film oxide layers using reactive evaporation techniques
JPS5775414A (en) * 1980-10-28 1982-05-12 Fuji Photo Film Co Ltd Manufacture of magneti substance thin film target for sputtering
JPS5778519A (en) * 1980-11-05 1982-05-17 Citizen Watch Co Ltd Production of electrochromic display element
JPS58197262A (ja) * 1982-05-13 1983-11-16 Canon Inc 量産型真空成膜装置及び真空成膜法
US4474827A (en) * 1982-07-08 1984-10-02 Ferralli Michael W Ion induced thin surface coating
GB8324779D0 (en) * 1982-09-29 1983-10-19 Nat Res Dev Depositing film onto substrate
US4664980A (en) * 1984-09-14 1987-05-12 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Oxidation protection coatings for polymers
US4560577A (en) * 1984-09-14 1985-12-24 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Oxidation protection coatings for polymers
US4604181A (en) * 1984-09-14 1986-08-05 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Apparatus for producing oxidation protection coatings for polymers
US4620872A (en) * 1984-10-18 1986-11-04 Mitsubishi Kinzoku Kabushiki Kaisha Composite target material and process for producing the same
CH664163A5 (de) * 1985-03-01 1988-02-15 Balzers Hochvakuum Verfahren zum reaktiven aufdampfen von schichten aus oxiden, nitriden, oxynitriden und karbiden.
EP0239664B1 (de) * 1986-04-04 1991-12-18 Ibm Deutschland Gmbh Verfahren zum Herstellen von Silicium und Sauerstoff enthaltenden Schichten
US4719355A (en) * 1986-04-10 1988-01-12 Texas Instruments Incorporated Ion source for an ion implanter
US4888202A (en) * 1986-07-31 1989-12-19 Nippon Telegraph And Telephone Corporation Method of manufacturing thin compound oxide film and apparatus for manufacturing thin oxide film
US4876984A (en) * 1987-06-12 1989-10-31 Ricoh Company, Ltd. Apparatus for forming a thin film
US4970376A (en) * 1987-12-22 1990-11-13 Gte Products Corporation Glass transparent heater
US5008215A (en) * 1989-07-07 1991-04-16 Industrial Technology Research Institute Process for preparing high sensitivity semiconductive magnetoresistance element
US5306408A (en) * 1992-06-29 1994-04-26 Ism Technologies, Inc. Method and apparatus for direct ARC plasma deposition of ceramic coatings
US5792521A (en) * 1996-04-18 1998-08-11 General Electric Company Method for forming a multilayer thermal barrier coating
US6428848B1 (en) * 1998-08-06 2002-08-06 Toray Industries, Inc. Method for producing a metal evaporated article
US6620525B1 (en) 2000-11-09 2003-09-16 General Electric Company Thermal barrier coating with improved erosion and impact resistance and process therefor
US6492038B1 (en) 2000-11-27 2002-12-10 General Electric Company Thermally-stabilized thermal barrier coating and process therefor
US6617049B2 (en) 2001-01-18 2003-09-09 General Electric Company Thermal barrier coating with improved erosion and impact resistance
US6544665B2 (en) 2001-01-18 2003-04-08 General Electric Company Thermally-stabilized thermal barrier coating
US20030034458A1 (en) * 2001-03-30 2003-02-20 Fuji Photo Film Co., Ltd. Radiation image storage panel
US6586115B2 (en) 2001-04-12 2003-07-01 General Electric Company Yttria-stabilized zirconia with reduced thermal conductivity
US7879411B2 (en) * 2001-04-30 2011-02-01 University Of Virginia Patent Foundation Method and apparatus for efficient application of substrate coating
EP1678736A4 (en) * 2003-10-31 2009-01-21 Ventracor Ltd PLASMAIMMERSION ION IMPLANTATION BY USING A CONDUCTIVE MASK GRILLE
US20050229856A1 (en) * 2004-04-20 2005-10-20 Malik Roger J Means and method for a liquid metal evaporation source with integral level sensor and external reservoir
LV13383B (en) * 2004-05-27 2006-02-20 Sidrabe As Method and device for vacuum vaporization metals or alloys
US20100129564A1 (en) * 2007-04-28 2010-05-27 Enerize Corporation Method for deposition of electrochemically active thin films and layered coatings
US20090117289A1 (en) * 2007-10-09 2009-05-07 Enerize Corporation Method and apparatus for deposition of thin film materials for energy storage devices
US8323408B2 (en) * 2007-12-10 2012-12-04 Solopower, Inc. Methods and apparatus to provide group VIA materials to reactors for group IBIIIAVIA film formation
EP2113584A1 (en) * 2008-04-28 2009-11-04 LightLab Sweden AB Evaporation system
DE102010040049A1 (de) * 2010-08-31 2012-03-01 Von Ardenne Anlagentechnik Gmbh Elektronenstrahlverdampfungseinrichtung und Verfahren zur Abscheidung von ferromagnetischen Beschichtungsmaterialien auf einem Substrat
US8735718B2 (en) * 2010-09-13 2014-05-27 University Of Central Florida Electrode structure, method and applications
TWI595110B (zh) * 2016-06-30 2017-08-11 Jung Tsai Weng Preparation of Multivariate Alloy Reactive Coating by Vacuum Ion Evaporation
EP3725911A1 (en) * 2019-04-16 2020-10-21 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Source arrangement, deposition apparatus and method for depositing source material

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US848600A (en) * 1906-10-04 1907-03-26 Siemens Ag Production of homogeneous bodies from tantalum or other metals.
US2784115A (en) * 1953-05-04 1957-03-05 Eastman Kodak Co Method of producing titanium dioxide coatings
US3492152A (en) * 1967-01-30 1970-01-27 Gen Dynamics Corp Method of vacuum vapor depositing a material on a substrate including reconstitution of decomposed portions of the material
US3634647A (en) * 1967-07-14 1972-01-11 Ernest Brock Dale Jr Evaporation of multicomponent alloys
US3562141A (en) * 1968-02-23 1971-02-09 John R Morley Vacuum vapor deposition utilizing low voltage electron beam
US3756193A (en) * 1972-05-01 1973-09-04 Battelle Memorial Institute Coating apparatus
US3912462A (en) * 1974-01-25 1975-10-14 Westinghouse Electric Corp Selective dimensional control of fine wire mesh

Also Published As

Publication number Publication date
SE420914B (sv) 1981-11-09
JPS5262678A (en) 1977-05-24
NL184792C (nl) 1989-11-01
CH610013A5 (sv) 1979-03-30
FR2332338A1 (fr) 1977-06-17
NL7612749A (nl) 1977-05-23
GB1542496A (en) 1979-03-21
NL184792B (nl) 1989-06-01
CA1093910A (fr) 1981-01-20
DE2653242C2 (de) 1985-12-19
FR2332338B1 (sv) 1979-07-13
IT1121741B (it) 1986-04-23
DE2653242A1 (de) 1977-06-02
US4112137A (en) 1978-09-05
JPS6149764B2 (sv) 1986-10-31
BE848500A (fr) 1977-05-18

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