IT1121741B - Procedimento per rivestire mediante deposito ionico reattivo un substrato isolante di uno strato di ossido ossido di almeno un metallo in particolare per rendere la superficie di un vetro conduttrice - Google Patents
Procedimento per rivestire mediante deposito ionico reattivo un substrato isolante di uno strato di ossido ossido di almeno un metallo in particolare per rendere la superficie di un vetro conduttriceInfo
- Publication number
- IT1121741B IT1121741B IT29455/76A IT2945576A IT1121741B IT 1121741 B IT1121741 B IT 1121741B IT 29455/76 A IT29455/76 A IT 29455/76A IT 2945576 A IT2945576 A IT 2945576A IT 1121741 B IT1121741 B IT 1121741B
- Authority
- IT
- Italy
- Prior art keywords
- oxide
- procedure
- coating
- metal
- layer
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/23—Mixtures
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/23—Mixtures
- C03C2217/231—In2O3/SnO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/23—Mixtures
- C03C2217/232—CdO/SnO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/151—Deposition methods from the vapour phase by vacuum evaporation
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH1501975A CH610013A5 (it) | 1975-11-19 | 1975-11-19 |
Publications (1)
Publication Number | Publication Date |
---|---|
IT1121741B true IT1121741B (it) | 1986-04-23 |
Family
ID=4405620
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT29455/76A IT1121741B (it) | 1975-11-19 | 1976-11-17 | Procedimento per rivestire mediante deposito ionico reattivo un substrato isolante di uno strato di ossido ossido di almeno un metallo in particolare per rendere la superficie di un vetro conduttrice |
Country Status (11)
Country | Link |
---|---|
US (1) | US4112137A (it) |
JP (1) | JPS5262678A (it) |
BE (1) | BE848500A (it) |
CA (1) | CA1093910A (it) |
CH (1) | CH610013A5 (it) |
DE (1) | DE2653242C2 (it) |
FR (1) | FR2332338A1 (it) |
GB (1) | GB1542496A (it) |
IT (1) | IT1121741B (it) |
NL (1) | NL184792C (it) |
SE (1) | SE420914B (it) |
Families Citing this family (41)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH631743A5 (de) * | 1977-06-01 | 1982-08-31 | Balzers Hochvakuum | Verfahren zum aufdampfen von material in einer vakuumaufdampfanlage. |
US4349425A (en) * | 1977-09-09 | 1982-09-14 | Hitachi, Ltd. | Transparent conductive films and methods of producing same |
JPS581186B2 (ja) * | 1977-12-13 | 1983-01-10 | 双葉電子工業株式会社 | イオンプレ−テイング装置 |
GB2085482B (en) * | 1980-10-06 | 1985-03-06 | Optical Coating Laboratory Inc | Forming thin film oxide layers using reactive evaporation techniques |
JPS5775414A (en) * | 1980-10-28 | 1982-05-12 | Fuji Photo Film Co Ltd | Manufacture of magneti substance thin film target for sputtering |
JPS5778519A (en) * | 1980-11-05 | 1982-05-17 | Citizen Watch Co Ltd | Production of electrochromic display element |
JPS58197262A (ja) * | 1982-05-13 | 1983-11-16 | Canon Inc | 量産型真空成膜装置及び真空成膜法 |
US4474827A (en) * | 1982-07-08 | 1984-10-02 | Ferralli Michael W | Ion induced thin surface coating |
GB8324779D0 (en) * | 1982-09-29 | 1983-10-19 | Nat Res Dev | Depositing film onto substrate |
US4664980A (en) * | 1984-09-14 | 1987-05-12 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Oxidation protection coatings for polymers |
US4560577A (en) * | 1984-09-14 | 1985-12-24 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Oxidation protection coatings for polymers |
US4604181A (en) * | 1984-09-14 | 1986-08-05 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Apparatus for producing oxidation protection coatings for polymers |
US4620872A (en) * | 1984-10-18 | 1986-11-04 | Mitsubishi Kinzoku Kabushiki Kaisha | Composite target material and process for producing the same |
CH664163A5 (de) * | 1985-03-01 | 1988-02-15 | Balzers Hochvakuum | Verfahren zum reaktiven aufdampfen von schichten aus oxiden, nitriden, oxynitriden und karbiden. |
EP0239664B1 (de) * | 1986-04-04 | 1991-12-18 | Ibm Deutschland Gmbh | Verfahren zum Herstellen von Silicium und Sauerstoff enthaltenden Schichten |
US4719355A (en) * | 1986-04-10 | 1988-01-12 | Texas Instruments Incorporated | Ion source for an ion implanter |
US4888202A (en) * | 1986-07-31 | 1989-12-19 | Nippon Telegraph And Telephone Corporation | Method of manufacturing thin compound oxide film and apparatus for manufacturing thin oxide film |
US4876984A (en) * | 1987-06-12 | 1989-10-31 | Ricoh Company, Ltd. | Apparatus for forming a thin film |
US4970376A (en) * | 1987-12-22 | 1990-11-13 | Gte Products Corporation | Glass transparent heater |
US5008215A (en) * | 1989-07-07 | 1991-04-16 | Industrial Technology Research Institute | Process for preparing high sensitivity semiconductive magnetoresistance element |
US5306408A (en) * | 1992-06-29 | 1994-04-26 | Ism Technologies, Inc. | Method and apparatus for direct ARC plasma deposition of ceramic coatings |
US5792521A (en) * | 1996-04-18 | 1998-08-11 | General Electric Company | Method for forming a multilayer thermal barrier coating |
US6428848B1 (en) * | 1998-08-06 | 2002-08-06 | Toray Industries, Inc. | Method for producing a metal evaporated article |
US6620525B1 (en) | 2000-11-09 | 2003-09-16 | General Electric Company | Thermal barrier coating with improved erosion and impact resistance and process therefor |
US6492038B1 (en) | 2000-11-27 | 2002-12-10 | General Electric Company | Thermally-stabilized thermal barrier coating and process therefor |
US6617049B2 (en) | 2001-01-18 | 2003-09-09 | General Electric Company | Thermal barrier coating with improved erosion and impact resistance |
US6544665B2 (en) | 2001-01-18 | 2003-04-08 | General Electric Company | Thermally-stabilized thermal barrier coating |
US20030034458A1 (en) * | 2001-03-30 | 2003-02-20 | Fuji Photo Film Co., Ltd. | Radiation image storage panel |
US6586115B2 (en) | 2001-04-12 | 2003-07-01 | General Electric Company | Yttria-stabilized zirconia with reduced thermal conductivity |
US7879411B2 (en) * | 2001-04-30 | 2011-02-01 | University Of Virginia Patent Foundation | Method and apparatus for efficient application of substrate coating |
EP1678736A4 (en) * | 2003-10-31 | 2009-01-21 | Ventracor Ltd | PLASMAIMMERSION ION IMPLANTATION BY USING A CONDUCTIVE MASK GRILLE |
US20050229856A1 (en) * | 2004-04-20 | 2005-10-20 | Malik Roger J | Means and method for a liquid metal evaporation source with integral level sensor and external reservoir |
LV13383B (en) * | 2004-05-27 | 2006-02-20 | Sidrabe As | Method and device for vacuum vaporization metals or alloys |
US20100129564A1 (en) * | 2007-04-28 | 2010-05-27 | Enerize Corporation | Method for deposition of electrochemically active thin films and layered coatings |
US20090117289A1 (en) * | 2007-10-09 | 2009-05-07 | Enerize Corporation | Method and apparatus for deposition of thin film materials for energy storage devices |
US8323408B2 (en) * | 2007-12-10 | 2012-12-04 | Solopower, Inc. | Methods and apparatus to provide group VIA materials to reactors for group IBIIIAVIA film formation |
EP2113584A1 (en) * | 2008-04-28 | 2009-11-04 | LightLab Sweden AB | Evaporation system |
DE102010040049A1 (de) * | 2010-08-31 | 2012-03-01 | Von Ardenne Anlagentechnik Gmbh | Elektronenstrahlverdampfungseinrichtung und Verfahren zur Abscheidung von ferromagnetischen Beschichtungsmaterialien auf einem Substrat |
US8735718B2 (en) * | 2010-09-13 | 2014-05-27 | University Of Central Florida | Electrode structure, method and applications |
TWI595110B (zh) * | 2016-06-30 | 2017-08-11 | Jung Tsai Weng | Preparation of Multivariate Alloy Reactive Coating by Vacuum Ion Evaporation |
EP3725911A1 (en) * | 2019-04-16 | 2020-10-21 | Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. | Source arrangement, deposition apparatus and method for depositing source material |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US848600A (en) * | 1906-10-04 | 1907-03-26 | Siemens Ag | Production of homogeneous bodies from tantalum or other metals. |
US2784115A (en) * | 1953-05-04 | 1957-03-05 | Eastman Kodak Co | Method of producing titanium dioxide coatings |
US3492152A (en) * | 1967-01-30 | 1970-01-27 | Gen Dynamics Corp | Method of vacuum vapor depositing a material on a substrate including reconstitution of decomposed portions of the material |
US3634647A (en) * | 1967-07-14 | 1972-01-11 | Ernest Brock Dale Jr | Evaporation of multicomponent alloys |
US3562141A (en) * | 1968-02-23 | 1971-02-09 | John R Morley | Vacuum vapor deposition utilizing low voltage electron beam |
US3756193A (en) * | 1972-05-01 | 1973-09-04 | Battelle Memorial Institute | Coating apparatus |
US3912462A (en) * | 1974-01-25 | 1975-10-14 | Westinghouse Electric Corp | Selective dimensional control of fine wire mesh |
-
1975
- 1975-11-19 CH CH1501975A patent/CH610013A5/xx not_active IP Right Cessation
-
1976
- 1976-11-15 US US05/741,783 patent/US4112137A/en not_active Expired - Lifetime
- 1976-11-16 GB GB7647642A patent/GB1542496A/en not_active Expired
- 1976-11-16 FR FR7634464A patent/FR2332338A1/fr active Granted
- 1976-11-16 CA CA265,743A patent/CA1093910A/fr not_active Expired
- 1976-11-17 IT IT29455/76A patent/IT1121741B/it active
- 1976-11-17 SE SE7612832A patent/SE420914B/xx not_active IP Right Cessation
- 1976-11-17 NL NLAANVRAGE7612749,A patent/NL184792C/xx not_active IP Right Cessation
- 1976-11-18 BE BE172490A patent/BE848500A/xx not_active IP Right Cessation
- 1976-11-19 JP JP51138528A patent/JPS5262678A/ja active Granted
- 1976-11-19 DE DE2653242A patent/DE2653242C2/de not_active Expired
Also Published As
Publication number | Publication date |
---|---|
SE420914B (sv) | 1981-11-09 |
JPS5262678A (en) | 1977-05-24 |
NL184792C (nl) | 1989-11-01 |
CH610013A5 (it) | 1979-03-30 |
FR2332338A1 (fr) | 1977-06-17 |
NL7612749A (nl) | 1977-05-23 |
GB1542496A (en) | 1979-03-21 |
NL184792B (nl) | 1989-06-01 |
CA1093910A (fr) | 1981-01-20 |
DE2653242C2 (de) | 1985-12-19 |
FR2332338B1 (it) | 1979-07-13 |
SE7612832L (sv) | 1977-05-20 |
DE2653242A1 (de) | 1977-06-02 |
US4112137A (en) | 1978-09-05 |
JPS6149764B2 (it) | 1986-10-31 |
BE848500A (fr) | 1977-05-18 |
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