FR2332338A1 - Procede pour revetir par depot ionique reactif un substrat isolant d'une couche d'oxyde d'au moins un metal - Google Patents

Procede pour revetir par depot ionique reactif un substrat isolant d'une couche d'oxyde d'au moins un metal

Info

Publication number
FR2332338A1
FR2332338A1 FR7634464A FR7634464A FR2332338A1 FR 2332338 A1 FR2332338 A1 FR 2332338A1 FR 7634464 A FR7634464 A FR 7634464A FR 7634464 A FR7634464 A FR 7634464A FR 2332338 A1 FR2332338 A1 FR 2332338A1
Authority
FR
France
Prior art keywords
coating
metal
oxide layer
insulating substrate
reagent ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7634464A
Other languages
English (en)
Other versions
FR2332338B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Battelle Memorial Institute Inc
Original Assignee
Battelle Memorial Institute Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Battelle Memorial Institute Inc filed Critical Battelle Memorial Institute Inc
Publication of FR2332338A1 publication Critical patent/FR2332338A1/fr
Application granted granted Critical
Publication of FR2332338B1 publication Critical patent/FR2332338B1/fr
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/23—Mixtures
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/23—Mixtures
    • C03C2217/231—In2O3/SnO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/23—Mixtures
    • C03C2217/232—CdO/SnO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/151—Deposition methods from the vapour phase by vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Glass (AREA)
FR7634464A 1975-11-19 1976-11-16 Procede pour revetir par depot ionique reactif un substrat isolant d'une couche d'oxyde d'au moins un metal Granted FR2332338A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1501975A CH610013A5 (fr) 1975-11-19 1975-11-19

Publications (2)

Publication Number Publication Date
FR2332338A1 true FR2332338A1 (fr) 1977-06-17
FR2332338B1 FR2332338B1 (fr) 1979-07-13

Family

ID=4405620

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7634464A Granted FR2332338A1 (fr) 1975-11-19 1976-11-16 Procede pour revetir par depot ionique reactif un substrat isolant d'une couche d'oxyde d'au moins un metal

Country Status (11)

Country Link
US (1) US4112137A (fr)
JP (1) JPS5262678A (fr)
BE (1) BE848500A (fr)
CA (1) CA1093910A (fr)
CH (1) CH610013A5 (fr)
DE (1) DE2653242C2 (fr)
FR (1) FR2332338A1 (fr)
GB (1) GB1542496A (fr)
IT (1) IT1121741B (fr)
NL (1) NL184792C (fr)
SE (1) SE420914B (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2578270A1 (fr) * 1985-03-01 1986-09-05 Balzers Hochvakuum Procede de vaporisation reactive de couches d'oxyde, de nitrure, d'oxynitrure et de carbure.
EP0239664A1 (fr) * 1986-04-04 1987-10-07 Ibm Deutschland Gmbh Procédé de fabrication de couches d'oxydes de silicium
EP0577246A1 (fr) * 1992-06-29 1994-01-05 Ism Technologies, Inc. Procédé et appareillage pour le dépôt direct de revêtemets céramiques

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH631743A5 (de) * 1977-06-01 1982-08-31 Balzers Hochvakuum Verfahren zum aufdampfen von material in einer vakuumaufdampfanlage.
US4349425A (en) * 1977-09-09 1982-09-14 Hitachi, Ltd. Transparent conductive films and methods of producing same
JPS581186B2 (ja) * 1977-12-13 1983-01-10 双葉電子工業株式会社 イオンプレ−テイング装置
GB2085482B (en) * 1980-10-06 1985-03-06 Optical Coating Laboratory Inc Forming thin film oxide layers using reactive evaporation techniques
JPS5775414A (en) * 1980-10-28 1982-05-12 Fuji Photo Film Co Ltd Manufacture of magneti substance thin film target for sputtering
JPS5778519A (en) * 1980-11-05 1982-05-17 Citizen Watch Co Ltd Production of electrochromic display element
JPS58197262A (ja) * 1982-05-13 1983-11-16 Canon Inc 量産型真空成膜装置及び真空成膜法
US4474827A (en) * 1982-07-08 1984-10-02 Ferralli Michael W Ion induced thin surface coating
GB8324779D0 (en) * 1982-09-29 1983-10-19 Nat Res Dev Depositing film onto substrate
US4664980A (en) * 1984-09-14 1987-05-12 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Oxidation protection coatings for polymers
US4560577A (en) * 1984-09-14 1985-12-24 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Oxidation protection coatings for polymers
US4604181A (en) * 1984-09-14 1986-08-05 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Apparatus for producing oxidation protection coatings for polymers
US4620872A (en) * 1984-10-18 1986-11-04 Mitsubishi Kinzoku Kabushiki Kaisha Composite target material and process for producing the same
US4719355A (en) * 1986-04-10 1988-01-12 Texas Instruments Incorporated Ion source for an ion implanter
US4888202A (en) * 1986-07-31 1989-12-19 Nippon Telegraph And Telephone Corporation Method of manufacturing thin compound oxide film and apparatus for manufacturing thin oxide film
US4876984A (en) * 1987-06-12 1989-10-31 Ricoh Company, Ltd. Apparatus for forming a thin film
US4970376A (en) * 1987-12-22 1990-11-13 Gte Products Corporation Glass transparent heater
US5008215A (en) * 1989-07-07 1991-04-16 Industrial Technology Research Institute Process for preparing high sensitivity semiconductive magnetoresistance element
US5792521A (en) * 1996-04-18 1998-08-11 General Electric Company Method for forming a multilayer thermal barrier coating
US6428848B1 (en) * 1998-08-06 2002-08-06 Toray Industries, Inc. Method for producing a metal evaporated article
US6620525B1 (en) 2000-11-09 2003-09-16 General Electric Company Thermal barrier coating with improved erosion and impact resistance and process therefor
US6492038B1 (en) 2000-11-27 2002-12-10 General Electric Company Thermally-stabilized thermal barrier coating and process therefor
US6617049B2 (en) 2001-01-18 2003-09-09 General Electric Company Thermal barrier coating with improved erosion and impact resistance
US6544665B2 (en) 2001-01-18 2003-04-08 General Electric Company Thermally-stabilized thermal barrier coating
US20030034458A1 (en) * 2001-03-30 2003-02-20 Fuji Photo Film Co., Ltd. Radiation image storage panel
US6586115B2 (en) 2001-04-12 2003-07-01 General Electric Company Yttria-stabilized zirconia with reduced thermal conductivity
WO2002087787A1 (fr) * 2001-04-30 2002-11-07 University Of Virginia Patent Foundation Procede et appareil permettant l'application efficace d'un revetement de substrat
JP2007510258A (ja) * 2003-10-31 2007-04-19 ベントラコー リミテッド 導電性メッシュを使用するプラズマ浸漬イオン埋め込み
US20050229856A1 (en) * 2004-04-20 2005-10-20 Malik Roger J Means and method for a liquid metal evaporation source with integral level sensor and external reservoir
LV13383B (en) * 2004-05-27 2006-02-20 Sidrabe As Method and device for vacuum vaporization metals or alloys
US20100129564A1 (en) * 2007-04-28 2010-05-27 Enerize Corporation Method for deposition of electrochemically active thin films and layered coatings
US20090117289A1 (en) * 2007-10-09 2009-05-07 Enerize Corporation Method and apparatus for deposition of thin film materials for energy storage devices
US8323408B2 (en) * 2007-12-10 2012-12-04 Solopower, Inc. Methods and apparatus to provide group VIA materials to reactors for group IBIIIAVIA film formation
EP2113584A1 (fr) * 2008-04-28 2009-11-04 LightLab Sweden AB Système d'évaporation
DE102010040049A1 (de) * 2010-08-31 2012-03-01 Von Ardenne Anlagentechnik Gmbh Elektronenstrahlverdampfungseinrichtung und Verfahren zur Abscheidung von ferromagnetischen Beschichtungsmaterialien auf einem Substrat
US8735718B2 (en) * 2010-09-13 2014-05-27 University Of Central Florida Electrode structure, method and applications
TWI595110B (zh) * 2016-06-30 2017-08-11 Jung Tsai Weng Preparation of Multivariate Alloy Reactive Coating by Vacuum Ion Evaporation
EP3725911A1 (fr) * 2019-04-16 2020-10-21 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Agencement de source, appareil de dépôt et procédé de dépôt de matériau source

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Publication number Priority date Publication date Assignee Title
US848600A (en) * 1906-10-04 1907-03-26 Siemens Ag Production of homogeneous bodies from tantalum or other metals.
US2784115A (en) * 1953-05-04 1957-03-05 Eastman Kodak Co Method of producing titanium dioxide coatings
US3492152A (en) * 1967-01-30 1970-01-27 Gen Dynamics Corp Method of vacuum vapor depositing a material on a substrate including reconstitution of decomposed portions of the material
US3634647A (en) * 1967-07-14 1972-01-11 Ernest Brock Dale Jr Evaporation of multicomponent alloys
US3562141A (en) * 1968-02-23 1971-02-09 John R Morley Vacuum vapor deposition utilizing low voltage electron beam
US3756193A (en) * 1972-05-01 1973-09-04 Battelle Memorial Institute Coating apparatus
US3912462A (en) * 1974-01-25 1975-10-14 Westinghouse Electric Corp Selective dimensional control of fine wire mesh

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2578270A1 (fr) * 1985-03-01 1986-09-05 Balzers Hochvakuum Procede de vaporisation reactive de couches d'oxyde, de nitrure, d'oxynitrure et de carbure.
EP0239664A1 (fr) * 1986-04-04 1987-10-07 Ibm Deutschland Gmbh Procédé de fabrication de couches d'oxydes de silicium
EP0577246A1 (fr) * 1992-06-29 1994-01-05 Ism Technologies, Inc. Procédé et appareillage pour le dépôt direct de revêtemets céramiques

Also Published As

Publication number Publication date
NL184792C (nl) 1989-11-01
DE2653242C2 (de) 1985-12-19
DE2653242A1 (de) 1977-06-02
GB1542496A (en) 1979-03-21
NL184792B (nl) 1989-06-01
IT1121741B (it) 1986-04-23
JPS6149764B2 (fr) 1986-10-31
SE420914B (sv) 1981-11-09
FR2332338B1 (fr) 1979-07-13
CA1093910A (fr) 1981-01-20
CH610013A5 (fr) 1979-03-30
SE7612832L (sv) 1977-05-20
NL7612749A (nl) 1977-05-23
JPS5262678A (en) 1977-05-24
US4112137A (en) 1978-09-05
BE848500A (fr) 1977-05-18

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Legal Events

Date Code Title Description
ST Notification of lapse