RU2618483C2 - ДИОД С p-n-ПЕРЕХОДОМ, ИМЕЮЩИЙ РЕГУЛИРУЕМУЮ ГЕТЕРОСТРУКТУРУ, САМОПОЗИЦИОНИРУЮЩУЮСЯ НА HgCdTe, ДЛЯ ФОРМИРОВАТЕЛЯ СИГНАЛОВ ИЗОБРАЖЕНИЯ В ИНФРАКРАСНОЙ ОБЛАСТИ СПЕКТРА - Google Patents
ДИОД С p-n-ПЕРЕХОДОМ, ИМЕЮЩИЙ РЕГУЛИРУЕМУЮ ГЕТЕРОСТРУКТУРУ, САМОПОЗИЦИОНИРУЮЩУЮСЯ НА HgCdTe, ДЛЯ ФОРМИРОВАТЕЛЯ СИГНАЛОВ ИЗОБРАЖЕНИЯ В ИНФРАКРАСНОЙ ОБЛАСТИ СПЕКТРА Download PDFInfo
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- RU2618483C2 RU2618483C2 RU2014126434A RU2014126434A RU2618483C2 RU 2618483 C2 RU2618483 C2 RU 2618483C2 RU 2014126434 A RU2014126434 A RU 2014126434A RU 2014126434 A RU2014126434 A RU 2014126434A RU 2618483 C2 RU2618483 C2 RU 2618483C2
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- Prior art keywords
- cadmium
- junction
- concentration
- diode
- substrate
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- 229910000661 Mercury cadmium telluride Inorganic materials 0.000 title claims abstract description 7
- 238000002329 infrared spectrum Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 claims abstract description 184
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 claims abstract description 129
- 229910052793 cadmium Inorganic materials 0.000 claims abstract description 128
- 238000009792 diffusion process Methods 0.000 claims description 79
- 239000002019 doping agent Substances 0.000 claims description 62
- 238000000034 method Methods 0.000 claims description 32
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 24
- 230000004913 activation Effects 0.000 claims description 23
- 229910052785 arsenic Inorganic materials 0.000 claims description 22
- 238000000137 annealing Methods 0.000 claims description 21
- 238000002161 passivation Methods 0.000 claims description 14
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 claims description 13
- 229910052753 mercury Inorganic materials 0.000 claims description 12
- 238000005468 ion implantation Methods 0.000 claims description 8
- 238000011049 filling Methods 0.000 claims description 7
- 230000008021 deposition Effects 0.000 claims description 6
- 238000001228 spectrum Methods 0.000 claims description 6
- 239000012535 impurity Substances 0.000 claims description 5
- 230000008569 process Effects 0.000 claims description 3
- 239000011159 matrix material Substances 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 2
- 239000000126 substance Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 35
- 239000000463 material Substances 0.000 description 22
- 239000002344 surface layer Substances 0.000 description 21
- 230000015572 biosynthetic process Effects 0.000 description 13
- 230000007547 defect Effects 0.000 description 11
- 238000005259 measurement Methods 0.000 description 11
- 238000002513 implantation Methods 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000013078 crystal Substances 0.000 description 5
- 238000001514 detection method Methods 0.000 description 5
- 230000005855 radiation Effects 0.000 description 5
- 238000001004 secondary ion mass spectrometry Methods 0.000 description 5
- 238000000151 deposition Methods 0.000 description 4
- 230000033228 biological regulation Effects 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 230000003993 interaction Effects 0.000 description 3
- 238000004943 liquid phase epitaxy Methods 0.000 description 3
- 238000001451 molecular beam epitaxy Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000002269 spontaneous effect Effects 0.000 description 3
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical group [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 3
- 230000007704 transition Effects 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 239000000969 carrier Substances 0.000 description 2
- 230000000739 chaotic effect Effects 0.000 description 2
- 230000001276 controlling effect Effects 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 150000002500 ions Chemical group 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 229910004613 CdTe Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 239000002800 charge carrier Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- -1 on the one hand Chemical compound 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000006862 quantum yield reaction Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F30/00—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
- H10F30/20—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
- H10F30/21—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation
- H10F30/22—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes
- H10F30/221—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes the potential barrier being a PN homojunction
- H10F30/2212—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes the potential barrier being a PN homojunction the devices comprising active layers made of only Group II-VI materials, e.g. HgCdTe infrared photodiodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F30/00—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
- H10F30/20—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
- H10F30/21—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation
- H10F30/22—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes
- H10F30/222—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes the potential barrier being a PN heterojunction
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/125—The active layers comprising only Group II-VI materials, e.g. CdS, ZnS or CdTe
- H10F71/1253—The active layers comprising only Group II-VI materials, e.g. CdS, ZnS or CdTe comprising at least three elements, e.g. HgCdTe
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/12—Active materials
- H10F77/123—Active materials comprising only Group II-VI materials, e.g. CdS, ZnS or HgCdTe
- H10F77/1237—Active materials comprising only Group II-VI materials, e.g. CdS, ZnS or HgCdTe having at least three elements, e.g. HgCdTe
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- Light Receiving Elements (AREA)
- Solid State Image Pick-Up Elements (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR1103617A FR2983351B1 (fr) | 2011-11-28 | 2011-11-28 | Diode p/n a heterostructure controlee autopositionnee sur hgcdte pour imageurs infrarouges |
| FR1103617 | 2011-11-28 | ||
| PCT/EP2012/073629 WO2013079446A1 (fr) | 2011-11-28 | 2012-11-26 | DIODE P/N A HETEROSTRUCTURE CONTRÔLEE AUTOPOSITIONNEE SUR HgCdTe POUR IMAGEURS INFRAROUGES |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| RU2014126434A RU2014126434A (ru) | 2016-01-27 |
| RU2618483C2 true RU2618483C2 (ru) | 2017-05-03 |
Family
ID=47221434
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| RU2014126434A RU2618483C2 (ru) | 2011-11-28 | 2012-11-26 | ДИОД С p-n-ПЕРЕХОДОМ, ИМЕЮЩИЙ РЕГУЛИРУЕМУЮ ГЕТЕРОСТРУКТУРУ, САМОПОЗИЦИОНИРУЮЩУЮСЯ НА HgCdTe, ДЛЯ ФОРМИРОВАТЕЛЯ СИГНАЛОВ ИЗОБРАЖЕНИЯ В ИНФРАКРАСНОЙ ОБЛАСТИ СПЕКТРА |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US9178101B2 (enExample) |
| EP (1) | EP2786425B1 (enExample) |
| JP (1) | JP6151266B2 (enExample) |
| KR (1) | KR102064542B1 (enExample) |
| CN (1) | CN103959482B (enExample) |
| FR (1) | FR2983351B1 (enExample) |
| IL (1) | IL232856A (enExample) |
| IN (1) | IN2014MN00998A (enExample) |
| RU (1) | RU2618483C2 (enExample) |
| WO (1) | WO2013079446A1 (enExample) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2983351B1 (fr) | 2011-11-28 | 2014-01-24 | Commissariat Energie Atomique | Diode p/n a heterostructure controlee autopositionnee sur hgcdte pour imageurs infrarouges |
| CN103855007A (zh) * | 2012-11-30 | 2014-06-11 | 中国科学院微电子研究所 | P型mosfet的制造方法 |
| CN103855013A (zh) * | 2012-11-30 | 2014-06-11 | 中国科学院微电子研究所 | N型mosfet的制造方法 |
| FR3000609B1 (fr) | 2012-12-31 | 2015-01-30 | Commissariat Energie Atomique | Structure semiconductrice du type photodiode a avalanche a haut rapport signal sur bruit et procede de fabrication d'une telle photodiode |
| FR3020176B1 (fr) * | 2014-04-22 | 2017-09-29 | Commissariat Energie Atomique | Matrice de photodiodes en cdhgte |
| FR3021807B1 (fr) | 2014-05-27 | 2017-09-29 | Commissariat A L Energie Atomique Et Aux Energies Alternatives | Matrice de photodiodes mesa a ftm amelioree |
| FR3023976B1 (fr) | 2014-07-16 | 2017-11-17 | Commissariat Energie Atomique | Matrice de photodiodes cdhgte a faible bruit |
| FR3027452B1 (fr) * | 2014-10-21 | 2016-12-09 | Commissariat Energie Atomique | Procede de fabrication d'une photodiode a faible bruit |
| FR3042310B1 (fr) * | 2015-10-12 | 2018-10-12 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Fabrication d'une matrice de photodiodes multispectrale en cdhgte par diffusion de cadmium |
| FR3050572B1 (fr) | 2016-04-26 | 2018-04-13 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Dispositif de photo-detection a reseau inter-diodes sur-dope et procede de fabrication |
| FR3053837B1 (fr) | 2016-07-08 | 2018-08-24 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Structure du type photodiode a avalanche et procede de fabrication d'une telle structure |
| FR3089063A1 (fr) | 2018-11-27 | 2020-05-29 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Photodiode sam à multiplication d’un seul type de porteurs dans une région à multicouche périodique |
| IL297009B2 (en) * | 2020-04-09 | 2025-11-01 | Commissariat Energie Atomique | Process for manufacturing a low-noise photodetector device in a cdhgte substrate |
| FR3113781B1 (fr) | 2020-08-25 | 2022-12-16 | Commissariat Energie Atomique | PROCÉDÉ DE FABRICATION D’UN DISPOSITIF DE PHOTODÉTECTION À FAIBLE BRUIT DANS UN SUBSTRAT EN CdHgTe. |
| FR3109244B1 (fr) | 2020-04-09 | 2022-04-01 | Commissariat Energie Atomique | Dispositif de photo-détection à gradient latéral de concentration en cadmium dans la zone de charge d’espace |
| KR102672685B1 (ko) * | 2021-12-17 | 2024-06-05 | 한국과학기술연구원 | nBn구조를 이용한 중적외선 광검출소자 및 이의 제조방법 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0229574A1 (fr) * | 1986-01-08 | 1987-07-22 | Commissariat A L'energie Atomique | Detecteur photovoltaique en HgCdTe a heterojonction et son procédé de fabrication |
| US5608208A (en) * | 1994-02-08 | 1997-03-04 | Technion Research & Development Foundation Ltd. | Single layer planar HgCdTe photovoltaic infrared detector with heterostructure passivation and p-on-n homojunction |
| US5936268A (en) * | 1988-03-29 | 1999-08-10 | Raytheon Company | Epitaxial passivation of group II-VI infrared photodetectors |
| RU2244365C1 (ru) * | 2003-12-09 | 2005-01-10 | Федеральное государственное унитарное предприятие "Альфа" | Фотоприемное устройство |
| US20070034898A1 (en) * | 2005-01-06 | 2007-02-15 | Rockwell Scientific Licensing, Llc | Heterojunction photodiode |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4137544A (en) * | 1977-07-05 | 1979-01-30 | Honeywell Inc. | Mercury cadmium telluride photodiode |
| JPS61256676A (ja) * | 1985-05-09 | 1986-11-14 | Mitsubishi Electric Corp | 半導体装置 |
| JPS63237484A (ja) * | 1987-03-25 | 1988-10-03 | Mitsubishi Electric Corp | 半導体装置 |
| US5880510A (en) * | 1988-05-11 | 1999-03-09 | Raytheon Company | Graded layer passivation of group II-VI infrared photodetectors |
| JPH03148185A (ja) * | 1989-11-02 | 1991-06-24 | Mitsubishi Electric Corp | 赤外線検知器 |
| JPH06163469A (ja) * | 1992-11-20 | 1994-06-10 | Fujitsu Ltd | 半導体のエッチング方法および該エッチング方法を用いた光検知素子の製造方法 |
| JPH06260675A (ja) * | 1993-03-09 | 1994-09-16 | Fujitsu Ltd | 光検知素子およびその製造方法 |
| US5466953A (en) * | 1993-05-28 | 1995-11-14 | Santa Barbara Research Center | Denuded zone field effect photoconductive detector |
| JPH0779008A (ja) * | 1993-06-30 | 1995-03-20 | Fujitsu Ltd | 赤外線検出装置 |
| JP2699838B2 (ja) * | 1993-11-25 | 1998-01-19 | 日本電気株式会社 | 赤外線検出器とその製造方法 |
| JP2001274421A (ja) * | 2000-03-23 | 2001-10-05 | Toshiba Corp | 化合物半導体素子およびその製造方法 |
| US7041983B2 (en) * | 2001-10-12 | 2006-05-09 | Lockheed Martin Corporation | Planar geometry buried junction infrared detector and focal plane array |
| FR2868602B1 (fr) | 2004-04-05 | 2006-05-26 | Commissariat Energie Atomique | Circuit de detection photonique a structure mesa |
| GB0407804D0 (en) * | 2004-04-06 | 2004-05-12 | Qinetiq Ltd | Manufacture of cadmium mercury telluride |
| FR2934716B1 (fr) | 2008-07-31 | 2010-09-10 | Commissariat Energie Atomique | Diode electroluminescente en materiau semiconducteur et son procede de fabrication |
| US8541256B2 (en) * | 2011-04-17 | 2013-09-24 | Chang-Feng Wan | Method of cadmium molecular beam based anneals for manufacture of HgCdTe photodiode arrays |
| FR2983351B1 (fr) | 2011-11-28 | 2014-01-24 | Commissariat Energie Atomique | Diode p/n a heterostructure controlee autopositionnee sur hgcdte pour imageurs infrarouges |
| FR3000608B1 (fr) | 2012-12-31 | 2015-03-06 | Commissariat Energie Atomique | Structure semiconductrice du type photodiode a avalanche et procede de fabrication d'une telle structure |
| FR3000610B1 (fr) | 2012-12-31 | 2015-03-06 | Commissariat Energie Atomique | Structure semiconductrice du type photodiode a avalanche a faible temps de reponse et procede de fabrication d'une telle photodiode |
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2011
- 2011-11-28 FR FR1103617A patent/FR2983351B1/fr not_active Expired - Fee Related
-
2012
- 2012-11-26 IN IN998MUN2014 patent/IN2014MN00998A/en unknown
- 2012-11-26 US US14/359,216 patent/US9178101B2/en active Active
- 2012-11-26 KR KR1020147017990A patent/KR102064542B1/ko active Active
- 2012-11-26 WO PCT/EP2012/073629 patent/WO2013079446A1/fr not_active Ceased
- 2012-11-26 RU RU2014126434A patent/RU2618483C2/ru active
- 2012-11-26 JP JP2014542878A patent/JP6151266B2/ja active Active
- 2012-11-26 EP EP12790573.5A patent/EP2786425B1/fr active Active
- 2012-11-26 CN CN201280058391.1A patent/CN103959482B/zh active Active
-
2014
- 2014-05-28 IL IL232856A patent/IL232856A/en active IP Right Grant
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0229574A1 (fr) * | 1986-01-08 | 1987-07-22 | Commissariat A L'energie Atomique | Detecteur photovoltaique en HgCdTe a heterojonction et son procédé de fabrication |
| US5936268A (en) * | 1988-03-29 | 1999-08-10 | Raytheon Company | Epitaxial passivation of group II-VI infrared photodetectors |
| US5608208A (en) * | 1994-02-08 | 1997-03-04 | Technion Research & Development Foundation Ltd. | Single layer planar HgCdTe photovoltaic infrared detector with heterostructure passivation and p-on-n homojunction |
| RU2244365C1 (ru) * | 2003-12-09 | 2005-01-10 | Федеральное государственное унитарное предприятие "Альфа" | Фотоприемное устройство |
| US20070034898A1 (en) * | 2005-01-06 | 2007-02-15 | Rockwell Scientific Licensing, Llc | Heterojunction photodiode |
Also Published As
| Publication number | Publication date |
|---|---|
| IL232856A (en) | 2017-03-30 |
| CN103959482B (zh) | 2016-10-12 |
| KR102064542B1 (ko) | 2020-01-09 |
| JP6151266B2 (ja) | 2017-06-21 |
| FR2983351A1 (fr) | 2013-05-31 |
| CN103959482A (zh) | 2014-07-30 |
| IL232856A0 (en) | 2014-07-31 |
| JP2015504607A (ja) | 2015-02-12 |
| KR20140098838A (ko) | 2014-08-08 |
| WO2013079446A1 (fr) | 2013-06-06 |
| RU2014126434A (ru) | 2016-01-27 |
| US9178101B2 (en) | 2015-11-03 |
| IN2014MN00998A (enExample) | 2015-04-24 |
| FR2983351B1 (fr) | 2014-01-24 |
| EP2786425B1 (fr) | 2016-03-02 |
| US20140319580A1 (en) | 2014-10-30 |
| EP2786425A1 (fr) | 2014-10-08 |
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