RU2194089C2 - Способ получения покрытия из оксида олова на стекле - Google Patents
Способ получения покрытия из оксида олова на стекле Download PDFInfo
- Publication number
- RU2194089C2 RU2194089C2 RU98102125/02A RU98102125A RU2194089C2 RU 2194089 C2 RU2194089 C2 RU 2194089C2 RU 98102125/02 A RU98102125/02 A RU 98102125/02A RU 98102125 A RU98102125 A RU 98102125A RU 2194089 C2 RU2194089 C2 RU 2194089C2
- Authority
- RU
- Russia
- Prior art keywords
- glass substrate
- tin oxide
- fluorine
- mixture
- hot glass
- Prior art date
Links
- 239000011521 glass Substances 0.000 title claims abstract description 96
- 238000000034 method Methods 0.000 title claims abstract description 59
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 title claims abstract description 54
- 229910001887 tin oxide Inorganic materials 0.000 title claims abstract description 54
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 29
- 239000000203 mixture Substances 0.000 claims abstract description 24
- 229910001868 water Inorganic materials 0.000 claims abstract description 23
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 19
- 239000001301 oxygen Substances 0.000 claims abstract description 19
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 19
- 239000000376 reactant Substances 0.000 claims abstract description 17
- 239000008240 homogeneous mixture Substances 0.000 claims abstract description 10
- 238000006243 chemical reaction Methods 0.000 claims abstract description 9
- 238000000576 coating method Methods 0.000 claims description 53
- 239000003153 chemical reaction reagent Substances 0.000 claims description 52
- 239000000758 substrate Substances 0.000 claims description 46
- 239000011248 coating agent Substances 0.000 claims description 45
- 150000001875 compounds Chemical class 0.000 claims description 36
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 34
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 32
- 229910000040 hydrogen fluoride Inorganic materials 0.000 claims description 31
- 238000005229 chemical vapour deposition Methods 0.000 claims description 17
- 239000000377 silicon dioxide Substances 0.000 claims description 15
- 235000012239 silicon dioxide Nutrition 0.000 claims description 13
- 230000008569 process Effects 0.000 claims description 12
- 239000001307 helium Substances 0.000 claims description 11
- 229910052734 helium Inorganic materials 0.000 claims description 11
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 10
- 238000000151 deposition Methods 0.000 claims description 8
- PKKGKUDPKRTKLJ-UHFFFAOYSA-L dichloro(dimethyl)stannane Chemical compound C[Sn](C)(Cl)Cl PKKGKUDPKRTKLJ-UHFFFAOYSA-L 0.000 claims description 7
- 238000009792 diffusion process Methods 0.000 claims description 7
- 229910052708 sodium Inorganic materials 0.000 claims description 7
- 239000011734 sodium Substances 0.000 claims description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 6
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 6
- 230000008021 deposition Effects 0.000 claims description 6
- 230000004888 barrier function Effects 0.000 claims description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 4
- 229910052786 argon Inorganic materials 0.000 claims description 3
- DEPUMLCRMAUJIS-UHFFFAOYSA-N dicalcium;disodium;dioxido(oxo)silane Chemical compound [Na+].[Na+].[Ca+2].[Ca+2].[O-][Si]([O-])=O.[O-][Si]([O-])=O.[O-][Si]([O-])=O DEPUMLCRMAUJIS-UHFFFAOYSA-N 0.000 claims description 3
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 claims description 2
- 239000005354 aluminosilicate glass Substances 0.000 claims description 2
- 239000005388 borosilicate glass Substances 0.000 claims description 2
- 239000000378 calcium silicate Substances 0.000 claims description 2
- 229910052918 calcium silicate Inorganic materials 0.000 claims description 2
- 239000005365 phosphate glass Substances 0.000 claims description 2
- VXKWYPOMXBVZSJ-UHFFFAOYSA-N tetramethyltin Chemical compound C[Sn](C)(C)C VXKWYPOMXBVZSJ-UHFFFAOYSA-N 0.000 claims description 2
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 claims 2
- 239000003795 chemical substances by application Substances 0.000 claims 1
- KWTSZCJMWHGPOS-UHFFFAOYSA-M chloro(trimethyl)stannane Chemical compound C[Sn](C)(C)Cl KWTSZCJMWHGPOS-UHFFFAOYSA-M 0.000 claims 1
- -1 dietilolovodihlorid Chemical compound 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 9
- 230000015572 biosynthetic process Effects 0.000 abstract description 4
- 239000000126 substance Substances 0.000 abstract description 3
- 230000000694 effects Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 30
- 239000010408 film Substances 0.000 description 17
- 239000007789 gas Substances 0.000 description 14
- 239000008246 gaseous mixture Substances 0.000 description 12
- 229910052731 fluorine Inorganic materials 0.000 description 10
- 239000011737 fluorine Substances 0.000 description 10
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 8
- 238000001704 evaporation Methods 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- 150000003606 tin compounds Chemical class 0.000 description 7
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 6
- 239000007800 oxidant agent Substances 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 230000008020 evaporation Effects 0.000 description 4
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 3
- 239000003570 air Substances 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 239000002019 doping agent Substances 0.000 description 3
- 239000002243 precursor Substances 0.000 description 3
- 238000006124 Pilkington process Methods 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- JUGDWSNYRIPJGE-UHFFFAOYSA-N 1-[acetyl(dibutyl)stannyl]ethanone Chemical compound CCCC[Sn](C(C)=O)(C(C)=O)CCCC JUGDWSNYRIPJGE-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- NPNMHHNXCILFEF-UHFFFAOYSA-N [F].[Sn]=O Chemical compound [F].[Sn]=O NPNMHHNXCILFEF-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- YFAXVVMIXZAKSR-UHFFFAOYSA-L dichloro(diethyl)stannane Chemical compound CC[Sn](Cl)(Cl)CC YFAXVVMIXZAKSR-UHFFFAOYSA-L 0.000 description 1
- UHIZLKDOFUWMKQ-UHFFFAOYSA-K ethyl 3-trichlorostannylpropanoate Chemical compound CCOC(=O)CC[Sn](Cl)(Cl)Cl UHIZLKDOFUWMKQ-UHFFFAOYSA-K 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 239000005329 float glass Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 150000003385 sodium Chemical class 0.000 description 1
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- WROMPOXWARCANT-UHFFFAOYSA-N tfa trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F.OC(=O)C(F)(F)F WROMPOXWARCANT-UHFFFAOYSA-N 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- YFRLQYJXUZRYDN-UHFFFAOYSA-K trichloro(methyl)stannane Chemical compound C[Sn](Cl)(Cl)Cl YFRLQYJXUZRYDN-UHFFFAOYSA-K 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
- C03C17/2453—Coating containing SnO2
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C23C16/402—Silicon dioxide
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/211—SnO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/24—Doped oxides
- C03C2217/241—Doped oxides with halides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
Landscapes
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Surface Treatment Of Glass (AREA)
- Chemical Vapour Deposition (AREA)
- Glass Compositions (AREA)
- Chemically Coating (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/642,921 US5698262A (en) | 1996-05-06 | 1996-05-06 | Method for forming tin oxide coating on glass |
| US08/642921 | 1996-05-06 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| RU98102125A RU98102125A (ru) | 2000-02-20 |
| RU2194089C2 true RU2194089C2 (ru) | 2002-12-10 |
Family
ID=24578594
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| RU98102125/02A RU2194089C2 (ru) | 1996-05-06 | 1997-05-06 | Способ получения покрытия из оксида олова на стекле |
Country Status (13)
| Country | Link |
|---|---|
| US (1) | US5698262A (OSRAM) |
| EP (1) | EP0839218B1 (OSRAM) |
| JP (1) | JP4322314B2 (OSRAM) |
| KR (1) | KR100577945B1 (OSRAM) |
| CN (1) | CN1122115C (OSRAM) |
| AT (1) | ATE211779T1 (OSRAM) |
| AU (1) | AU2828197A (OSRAM) |
| BR (1) | BR9702244A (OSRAM) |
| CA (1) | CA2225961A1 (OSRAM) |
| DE (1) | DE69709525T2 (OSRAM) |
| PL (1) | PL185373B1 (OSRAM) |
| RU (1) | RU2194089C2 (OSRAM) |
| WO (1) | WO1997042357A1 (OSRAM) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2610044C2 (ru) * | 2012-01-10 | 2017-02-07 | Ппг Индастриз Огайо, Инк. | Стекла с покрытием, имеющие низкое поверхностное сопротивление, гладкую поверхность и/или низкий коэффициент теплового излучения |
Families Citing this family (60)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2738813B1 (fr) * | 1995-09-15 | 1997-10-17 | Saint Gobain Vitrage | Substrat a revetement photo-catalytique |
| US6027766A (en) * | 1997-03-14 | 2000-02-22 | Ppg Industries Ohio, Inc. | Photocatalytically-activated self-cleaning article and method of making same |
| US7096692B2 (en) | 1997-03-14 | 2006-08-29 | Ppg Industries Ohio, Inc. | Visible-light-responsive photoactive coating, coated article, and method of making same |
| US6124026A (en) * | 1997-07-07 | 2000-09-26 | Libbey-Owens-Ford Co. | Anti-reflective, reduced visible light transmitting coated glass article |
| US5935716A (en) * | 1997-07-07 | 1999-08-10 | Libbey-Owens-Ford Co. | Anti-reflective films |
| FR2780054B1 (fr) * | 1998-06-19 | 2000-07-21 | Saint Gobain Vitrage | Procede de depot d'une couche a base d'oxyde metallique sur un substrat verrier, substrat verrier ainsi revetu |
| US6964731B1 (en) | 1998-12-21 | 2005-11-15 | Cardinal Cg Company | Soil-resistant coating for glass surfaces |
| US6660365B1 (en) | 1998-12-21 | 2003-12-09 | Cardinal Cg Company | Soil-resistant coating for glass surfaces |
| US6974629B1 (en) | 1999-08-06 | 2005-12-13 | Cardinal Cg Company | Low-emissivity, soil-resistant coating for glass surfaces |
| US6312831B1 (en) * | 1999-04-30 | 2001-11-06 | Visteon Global Technologies, Inc. | Highly reflective, durable titanium/tin oxide films |
| EP1054454A3 (en) * | 1999-05-18 | 2004-04-21 | Nippon Sheet Glass Co., Ltd. | Glass sheet with conductive film, method of manufacturing the same, and photoelectric conversion device using the same |
| JP2001093996A (ja) * | 1999-09-27 | 2001-04-06 | Toshiba Corp | 半導体装置の製造方法 |
| US6111224A (en) * | 1999-12-02 | 2000-08-29 | Hatco Corporation | Food warming oven with transparent heating shelves |
| US6413579B1 (en) * | 2000-01-27 | 2002-07-02 | Libbey-Owens-Ford Co. | Temperature control of CVD method for reduced haze |
| US6643442B2 (en) | 2000-03-23 | 2003-11-04 | University Of Southampton | Optical waveguides and devices including same |
| WO2001070640A1 (en) | 2000-03-23 | 2001-09-27 | University Of Southampton | Optical waveguides and devices including same |
| US6605341B2 (en) * | 2000-05-19 | 2003-08-12 | Tdk Corporation | Functional film having specific surface dispersion ratio |
| MXPA03002139A (es) | 2000-09-11 | 2004-05-04 | Cardinal Cg Co | Cubiertas protectoras temporales. |
| US6921579B2 (en) * | 2000-09-11 | 2005-07-26 | Cardinal Cg Company | Temporary protective covers |
| WO2002062716A1 (en) * | 2001-02-08 | 2002-08-15 | Cardinal Cg Company | Edge treatments for coated substrates |
| US6902813B2 (en) * | 2001-09-11 | 2005-06-07 | Cardinal Cg Company | Hydrophilic surfaces carrying temporary protective covers |
| US8093490B2 (en) | 2001-12-03 | 2012-01-10 | Nippon Sheet Glass Company, Limited | Method for forming thin film, substrate having transparent electroconductive film and photoelectric conversion device using the substrate |
| US7259085B2 (en) | 2001-12-03 | 2007-08-21 | Nippon Sheet Glass Company, Limited | Method for forming thin film, substrate having thin film formed by the method, and photoelectric conversion device using the substrate |
| US6733889B2 (en) | 2002-05-14 | 2004-05-11 | Pilkington North America, Inc. | Reflective, solar control coated glass article |
| US7993741B2 (en) * | 2002-12-06 | 2011-08-09 | Cardinal Cg Company | Preventing damage with separators |
| CA2550331A1 (en) | 2003-12-22 | 2005-07-14 | Cardinal Cg Compagny | Graded photocatalytic coatings |
| CA2570369C (en) | 2004-07-12 | 2008-02-19 | Cardinal Cg Company | Low-maintenance coatings |
| CA2586842C (en) * | 2004-11-15 | 2013-01-08 | Cardinal Cg Company | Methods and equipment for depositing coatings having sequenced structures |
| CN1317740C (zh) * | 2004-12-01 | 2007-05-23 | 四川大学 | 用高温氧化方法制备SnO2过渡层 |
| US7923114B2 (en) | 2004-12-03 | 2011-04-12 | Cardinal Cg Company | Hydrophilic coatings, methods for depositing hydrophilic coatings, and improved deposition technology for thin films |
| US8092660B2 (en) | 2004-12-03 | 2012-01-10 | Cardinal Cg Company | Methods and equipment for depositing hydrophilic coatings, and deposition technologies for thin films |
| US8197231B2 (en) | 2005-07-13 | 2012-06-12 | Purity Solutions Llc | Diaphragm pump and related methods |
| EP1929542A1 (en) * | 2005-08-30 | 2008-06-11 | Pilkington Group Limited | Light transmittance optimizing coated glass article for solar cell and method for making |
| US20070134501A1 (en) * | 2005-12-13 | 2007-06-14 | Mcmaster Alan J | Self-cleaning coatings applied to solar thermal devices |
| US7989094B2 (en) | 2006-04-19 | 2011-08-02 | Cardinal Cg Company | Opposed functional coatings having comparable single surface reflectances |
| EP2035340B1 (en) * | 2006-06-30 | 2016-03-09 | Cardinal CG Company | Carbon nanotube glazing technology |
| US20080011599A1 (en) | 2006-07-12 | 2008-01-17 | Brabender Dennis M | Sputtering apparatus including novel target mounting and/or control |
| KR101383946B1 (ko) * | 2006-08-29 | 2014-04-10 | 알케마 인코포레이티드 | 산화아연 코팅된 물품의 형성 방법 |
| US7820296B2 (en) | 2007-09-14 | 2010-10-26 | Cardinal Cg Company | Low-maintenance coating technology |
| GB0803574D0 (en) * | 2008-02-27 | 2008-04-02 | Pilkington Group Ltd | Coated glazing |
| FR2973023B1 (fr) | 2011-03-25 | 2019-08-02 | Saint-Gobain Glass France | Vitrage multiple isolant comprenant deux empilements bas emissifs |
| US8609197B1 (en) | 2011-03-29 | 2013-12-17 | Owens-Brockway Glass Container Inc. | Preparing glass containers for electrostatic coating |
| US9610392B2 (en) | 2012-06-08 | 2017-04-04 | Fresenius Medical Care Holdings, Inc. | Medical fluid cassettes and related systems and methods |
| US20130334089A1 (en) * | 2012-06-15 | 2013-12-19 | Michael P. Remington, Jr. | Glass Container Insulative Coating |
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Also Published As
| Publication number | Publication date |
|---|---|
| MX9800254A (es) | 1998-07-31 |
| EP0839218A4 (OSRAM) | 1998-06-03 |
| US5698262A (en) | 1997-12-16 |
| DE69709525T2 (de) | 2002-08-29 |
| KR19990028727A (ko) | 1999-04-15 |
| KR100577945B1 (ko) | 2006-08-30 |
| JP4322314B2 (ja) | 2009-08-26 |
| WO1997042357A1 (en) | 1997-11-13 |
| JPH11509895A (ja) | 1999-08-31 |
| DE69709525D1 (de) | 2002-02-14 |
| CA2225961A1 (en) | 1997-11-13 |
| EP0839218B1 (en) | 2002-01-09 |
| PL324429A1 (en) | 1998-05-25 |
| ATE211779T1 (de) | 2002-01-15 |
| BR9702244A (pt) | 1999-02-17 |
| CN1196760A (zh) | 1998-10-21 |
| EP0839218A1 (en) | 1998-05-06 |
| AU2828197A (en) | 1997-11-26 |
| CN1122115C (zh) | 2003-09-24 |
| PL185373B1 (pl) | 2003-04-30 |
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