RU2013117118A - Способ, процесс и технология изготовления высокоэффективных недорогих кристаллических кремниевых солнечных элементов - Google Patents
Способ, процесс и технология изготовления высокоэффективных недорогих кристаллических кремниевых солнечных элементов Download PDFInfo
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- RU2013117118A RU2013117118A RU2013117118/28A RU2013117118A RU2013117118A RU 2013117118 A RU2013117118 A RU 2013117118A RU 2013117118/28 A RU2013117118/28 A RU 2013117118/28A RU 2013117118 A RU2013117118 A RU 2013117118A RU 2013117118 A RU2013117118 A RU 2013117118A
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- composition
- substrate
- etching
- oxide layer
- redox system
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- 229910052710 silicon Inorganic materials 0.000 title claims abstract 7
- 239000010703 silicon Substances 0.000 title claims abstract 7
- 238000004519 manufacturing process Methods 0.000 title claims 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims 3
- 238000000034 method Methods 0.000 title 2
- 239000013078 crystal Substances 0.000 title 1
- 239000000758 substrate Substances 0.000 claims abstract 30
- 238000005530 etching Methods 0.000 claims abstract 15
- 239000000654 additive Substances 0.000 claims abstract 10
- 230000000996 additive effect Effects 0.000 claims abstract 10
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims abstract 8
- 229910052740 iodine Inorganic materials 0.000 claims abstract 6
- 239000007788 liquid Substances 0.000 claims abstract 5
- 238000007254 oxidation reaction Methods 0.000 claims abstract 4
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims abstract 3
- 239000011630 iodine Substances 0.000 claims abstract 3
- 229910052745 lead Inorganic materials 0.000 claims abstract 3
- 229910052709 silver Inorganic materials 0.000 claims abstract 3
- 239000000126 substance Substances 0.000 claims abstract 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract 3
- 238000009792 diffusion process Methods 0.000 claims 8
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 claims 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims 2
- 229910017855 NH 4 F Inorganic materials 0.000 claims 2
- 239000002253 acid Substances 0.000 claims 2
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- 229910052732 germanium Inorganic materials 0.000 claims 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims 2
- 229910052739 hydrogen Inorganic materials 0.000 claims 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 238000003486 chemical etching Methods 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- 230000001105 regulatory effect Effects 0.000 claims 1
- 230000001737 promoting effect Effects 0.000 abstract 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
- C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/30—Coatings
- H10F77/306—Coatings for devices having potential barriers
- H10F77/311—Coatings for devices having potential barriers for photovoltaic cells
- H10F77/315—Coatings for devices having potential barriers for photovoltaic cells the coatings being antireflective or having enhancing optical properties
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/25—Oxides by deposition from the liquid phase
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/14—Photovoltaic cells having only PN homojunction potential barriers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/121—The active layers comprising only Group IV materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/129—Passivating
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/20—Electrodes
- H10F77/206—Electrodes for devices having potential barriers
- H10F77/211—Electrodes for devices having potential barriers for photovoltaic cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/40—Optical elements or arrangements
- H10F77/42—Optical elements or arrangements directly associated or integrated with photovoltaic cells, e.g. light-reflecting means or light-concentrating means
- H10F77/48—Back surface reflectors [BSR]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/70—Surface textures, e.g. pyramid structures
- H10F77/703—Surface textures, e.g. pyramid structures of the semiconductor bodies, e.g. textured active layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/70—Surface textures, e.g. pyramid structures
- H10F77/707—Surface textures, e.g. pyramid structures of the substrates or of layers on substrates, e.g. textured ITO layer on a glass substrate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/52—PV systems with concentrators
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Photovoltaic Devices (AREA)
- Sustainable Development (AREA)
- Sustainable Energy (AREA)
- Crystallography & Structural Chemistry (AREA)
- Formation Of Insulating Films (AREA)
- Silicon Compounds (AREA)
- Weting (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US38343510P | 2010-09-16 | 2010-09-16 | |
| US61/383,435 | 2010-09-16 | ||
| PCT/US2011/028190 WO2012036760A1 (en) | 2010-09-16 | 2011-03-11 | Method, process and fabrication technology for high-efficency low-cost crytalline silicon solar cells |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| RU2013117118A true RU2013117118A (ru) | 2014-10-27 |
Family
ID=45831899
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| RU2013117118/28A RU2013117118A (ru) | 2010-09-16 | 2011-03-11 | Способ, процесс и технология изготовления высокоэффективных недорогих кристаллических кремниевых солнечных элементов |
Country Status (10)
| Country | Link |
|---|---|
| US (2) | US9068112B2 (enExample) |
| EP (1) | EP2616401A4 (enExample) |
| JP (1) | JP2013540090A (enExample) |
| KR (1) | KR101836548B1 (enExample) |
| AU (1) | AU2011302575A1 (enExample) |
| BR (1) | BR112013006364A2 (enExample) |
| MX (1) | MX2013003007A (enExample) |
| RU (1) | RU2013117118A (enExample) |
| TW (1) | TW201228010A (enExample) |
| WO (1) | WO2012036760A1 (enExample) |
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| JP6295953B2 (ja) * | 2012-07-19 | 2018-03-20 | 日立化成株式会社 | 太陽電池素子及びその製造方法、並びに太陽電池モジュール |
| KR101890282B1 (ko) * | 2012-08-06 | 2018-08-22 | 엘지전자 주식회사 | 선택적 에미터를 갖는 태양전지 및 이의 제조 방법 |
| TWI643351B (zh) * | 2013-01-31 | 2018-12-01 | 澳洲商新南創新有限公司 | 太陽能電池金屬化及互連方法 |
| US9859455B2 (en) | 2013-02-08 | 2018-01-02 | International Business Machines Corporation | Interdigitated back contact heterojunction photovoltaic device with a floating junction front surface field |
| US9640699B2 (en) | 2013-02-08 | 2017-05-02 | International Business Machines Corporation | Interdigitated back contact heterojunction photovoltaic device |
| WO2014196253A1 (ja) * | 2013-06-06 | 2014-12-11 | 信越化学工業株式会社 | p型選択エミッタ形成方法及び太陽電池 |
| CN105453238B (zh) * | 2013-06-11 | 2020-11-10 | 斯派克迈特股份有限公司 | 用于半导体制造过程和/或方法的化学组合物、使用其制得的装置 |
| WO2014205238A1 (en) * | 2013-06-19 | 2014-12-24 | The Board Of Trustees Of The Leland Stanford Junior University | Novel dielectric nano-structure for light trapping in solar cells |
| TWI497733B (zh) * | 2013-06-20 | 2015-08-21 | Motech Ind Inc | 背接觸太陽能電池及其模組 |
| US10217893B2 (en) | 2013-09-16 | 2019-02-26 | Special Materials Research And Technology, Inc. (Specmat) | Methods, apparatus, and systems for passivation of solar cells and other semiconductor devices |
| RU2540753C1 (ru) * | 2013-10-31 | 2015-02-10 | Федеральное государственное бюджетное учреждение науки Ордена Трудового Красного Знамени Институт химии силикатов им. И.В. Гребенщикова Российской академии наук (ИХС РАН) | Способ поиска новых кристаллических соединений в стеклообразующих эвтектических оксидных системах, кристаллизующихся в порошке |
| US10622495B2 (en) | 2014-03-18 | 2020-04-14 | Specmat, Inc. | Method, process and fabrication technology for oxide layers |
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| KR101541422B1 (ko) | 2014-05-15 | 2015-08-03 | 한국에너지기술연구원 | 도금을 이용한 태양전지 제조 방법 |
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| CN104123999A (zh) * | 2014-07-07 | 2014-10-29 | 苏州世优佳电子科技有限公司 | 一种石墨烯导电薄膜的制备方法 |
| KR101622091B1 (ko) * | 2014-08-20 | 2016-05-18 | 엘지전자 주식회사 | 태양 전지 및 이의 제조 방법 |
| US9520507B2 (en) * | 2014-12-22 | 2016-12-13 | Sunpower Corporation | Solar cells with improved lifetime, passivation and/or efficiency |
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| TWI511316B (zh) * | 2015-02-13 | 2015-12-01 | Neo Solar Power Corp | 異質接面太陽能電池及其製造方法 |
| EP3271946A4 (en) * | 2015-03-19 | 2019-12-04 | Specmat Inc. | SILICULAR SEMICONDUCTOR STRUCTURES, METHOD FOR THE MANUFACTURE THEREOF AND DEVICES THEREWITH |
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| TWI568012B (zh) * | 2015-06-11 | 2017-01-21 | 太極能源科技股份有限公司 | 雙面太陽能電池製造方法 |
| DE102016101801B4 (de) * | 2016-02-02 | 2021-01-14 | Infineon Technologies Ag | Lastanschluss eines leistungshalbleiterbauelements, leistungshalbleitermodul damit und herstellungsverfahren dafür |
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| RU2653843C2 (ru) * | 2016-08-01 | 2018-05-15 | Акционерное общество "Научно-производственное предприятие "Алмаз" (АО "НПП "Алмаз") | Способ повышения плотности и стабильности тока матрицы многоострийного автоэмиссионного катода |
| CN106328765A (zh) * | 2016-08-31 | 2017-01-11 | 晋能清洁能源科技有限公司 | 一种高效perc晶体硅太阳能电池的制备方法及工艺 |
| DE102016225120A1 (de) * | 2016-12-15 | 2018-06-21 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Reduzierung der optischen Reflexion an Solarzellen |
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| GB201821095D0 (en) * | 2018-12-21 | 2019-02-06 | Univ Loughborough | Cover sheet for photovoltaic panel |
| TWI737311B (zh) * | 2020-05-25 | 2021-08-21 | 大葉大學 | 利用液相沉積製作太陽能電池的製備方法及其太陽能電池 |
| CN115621337A (zh) * | 2021-07-16 | 2023-01-17 | 福建钜能电力有限公司 | 一种hjt电池生产中的单晶制绒工艺 |
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-
2011
- 2011-03-11 WO PCT/US2011/028190 patent/WO2012036760A1/en not_active Ceased
- 2011-03-11 RU RU2013117118/28A patent/RU2013117118A/ru not_active Application Discontinuation
- 2011-03-11 US US13/823,214 patent/US9068112B2/en active Active
- 2011-03-11 MX MX2013003007A patent/MX2013003007A/es not_active Application Discontinuation
- 2011-03-11 KR KR1020137009497A patent/KR101836548B1/ko not_active Expired - Fee Related
- 2011-03-11 BR BR112013006364A patent/BR112013006364A2/pt not_active IP Right Cessation
- 2011-03-11 AU AU2011302575A patent/AU2011302575A1/en not_active Abandoned
- 2011-03-11 JP JP2013529138A patent/JP2013540090A/ja active Pending
- 2011-03-11 EP EP11825579.3A patent/EP2616401A4/en not_active Ceased
- 2011-09-16 TW TW100133428A patent/TW201228010A/zh unknown
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2014
- 2014-11-20 US US14/549,261 patent/US10526538B2/en active Active - Reinstated
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| Publication number | Publication date |
|---|---|
| US9068112B2 (en) | 2015-06-30 |
| JP2013540090A (ja) | 2013-10-31 |
| KR101836548B1 (ko) | 2018-03-08 |
| US10526538B2 (en) | 2020-01-07 |
| TW201228010A (en) | 2012-07-01 |
| US20150162460A1 (en) | 2015-06-11 |
| EP2616401A4 (en) | 2017-06-28 |
| EP2616401A1 (en) | 2013-07-24 |
| KR20130121095A (ko) | 2013-11-05 |
| MX2013003007A (es) | 2013-09-26 |
| BR112013006364A2 (pt) | 2016-06-28 |
| WO2012036760A1 (en) | 2012-03-22 |
| AU2011302575A1 (en) | 2013-05-02 |
| US20140061531A1 (en) | 2014-03-06 |
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