PH26861A - Method for preparing lithographically sensitive branched novolaks using a mannich base intermediate - Google Patents
Method for preparing lithographically sensitive branched novolaks using a mannich base intermediate Download PDFInfo
- Publication number
- PH26861A PH26861A PH40380A PH40380A PH26861A PH 26861 A PH26861 A PH 26861A PH 40380 A PH40380 A PH 40380A PH 40380 A PH40380 A PH 40380A PH 26861 A PH26861 A PH 26861A
- Authority
- PH
- Philippines
- Prior art keywords
- phenol
- polymer
- preparing
- branched
- acid
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 24
- 229920003986 novolac Polymers 0.000 title description 21
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 79
- 229920000642 polymer Polymers 0.000 claims description 34
- 239000000203 mixture Substances 0.000 claims description 9
- -1 trimethyl-phenol resorcinol Chemical compound 0.000 claims description 4
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 claims description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 30
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical class OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- 230000015572 biosynthetic process Effects 0.000 description 11
- 238000006243 chemical reaction Methods 0.000 description 11
- 150000002989 phenols Chemical class 0.000 description 11
- 229920002120 photoresistant polymer Polymers 0.000 description 11
- 238000003786 synthesis reaction Methods 0.000 description 11
- 229960004279 formaldehyde Drugs 0.000 description 10
- 235000019256 formaldehyde Nutrition 0.000 description 10
- 239000002253 acid Substances 0.000 description 9
- 239000003377 acid catalyst Substances 0.000 description 9
- 239000007983 Tris buffer Substances 0.000 description 8
- 238000004090 dissolution Methods 0.000 description 8
- ALSTYHKOOCGGFT-KTKRTIGZSA-N (9Z)-octadecen-1-ol Chemical compound CCCCCCCC\C=C/CCCCCCCCO ALSTYHKOOCGGFT-KTKRTIGZSA-N 0.000 description 6
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 6
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 6
- 238000009826 distribution Methods 0.000 description 6
- 230000005855 radiation Effects 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 5
- 239000000376 reactant Substances 0.000 description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 238000000354 decomposition reaction Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 230000002378 acidificating effect Effects 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- LSYXXLMBRSSBGS-UHFFFAOYSA-N 2,4,6-tris(hydroxymethyl)phenol Chemical compound OCC1=CC(CO)=C(O)C(CO)=C1 LSYXXLMBRSSBGS-UHFFFAOYSA-N 0.000 description 2
- AHDSRXYHVZECER-UHFFFAOYSA-N 2,4,6-tris[(dimethylamino)methyl]phenol Chemical compound CN(C)CC1=CC(CN(C)C)=C(O)C(CN(C)C)=C1 AHDSRXYHVZECER-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N Bisphenol A Natural products C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 241000282320 Panthera leo Species 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 239000003063 flame retardant Substances 0.000 description 2
- 238000009740 moulding (composite fabrication) Methods 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 235000006408 oxalic acid Nutrition 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- 150000005207 1,3-dihydroxybenzenes Chemical class 0.000 description 1
- QWBBPBRQALCEIZ-UHFFFAOYSA-N 2,3-dimethylphenol Chemical compound CC1=CC=CC(O)=C1C QWBBPBRQALCEIZ-UHFFFAOYSA-N 0.000 description 1
- IUNJCFABHJZSKB-UHFFFAOYSA-N 2,4-dihydroxybenzaldehyde Chemical compound OC1=CC=C(C=O)C(O)=C1 IUNJCFABHJZSKB-UHFFFAOYSA-N 0.000 description 1
- ZTMADXFOCUXMJE-UHFFFAOYSA-N 2-methylbenzene-1,3-diol Chemical compound CC1=C(O)C=CC=C1O ZTMADXFOCUXMJE-UHFFFAOYSA-N 0.000 description 1
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- 241001209177 Akis Species 0.000 description 1
- 241001116389 Aloe Species 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- 241000631130 Chrysophyllum argenteum Species 0.000 description 1
- 102100030796 E3 ubiquitin-protein ligase rififylin Human genes 0.000 description 1
- 101710128004 E3 ubiquitin-protein ligase rififylin Proteins 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 241001658031 Eris Species 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 241000283986 Lepus Species 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 241000011102 Thera Species 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 235000011399 aloe vera Nutrition 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 125000004985 dialkyl amino alkyl group Chemical group 0.000 description 1
- 125000005265 dialkylamine group Chemical group 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- NKDDWNXOKDWJAK-UHFFFAOYSA-N dimethoxymethane Chemical compound COCOC NKDDWNXOKDWJAK-UHFFFAOYSA-N 0.000 description 1
- 150000002118 epoxides Chemical class 0.000 description 1
- ZZUFCTLCJUWOSV-UHFFFAOYSA-N furosemide Chemical compound C1=C(Cl)C(S(=O)(=O)N)=CC(C(O)=O)=C1NCC1=CC=CO1 ZZUFCTLCJUWOSV-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- TWXDDNPPQUTEOV-FVGYRXGTSA-N methamphetamine hydrochloride Chemical compound Cl.CN[C@@H](C)CC1=CC=CC=C1 TWXDDNPPQUTEOV-FVGYRXGTSA-N 0.000 description 1
- VUZPPFZMUPKLLV-UHFFFAOYSA-N methane;hydrate Chemical compound C.O VUZPPFZMUPKLLV-UHFFFAOYSA-N 0.000 description 1
- KPRZOPQOBJRYSW-UHFFFAOYSA-N o-hydroxybenzylamine Natural products NCC1=CC=CC=C1O KPRZOPQOBJRYSW-UHFFFAOYSA-N 0.000 description 1
- HFHZKZSRXITVMK-UHFFFAOYSA-N oxyphenbutazone Chemical compound O=C1C(CCCC)C(=O)N(C=2C=CC=CC=2)N1C1=CC=C(O)C=C1 HFHZKZSRXITVMK-UHFFFAOYSA-N 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- 238000012643 polycondensation polymerization Methods 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000009790 rate-determining step (RDS) Methods 0.000 description 1
- 230000036647 reaction Effects 0.000 description 1
- 229920003987 resole Polymers 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000001577 simple distillation Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
- C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
- C08G8/10—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with phenol
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
- C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US07/351,154 US4939229A (en) | 1989-05-12 | 1989-05-12 | Method for preparing lithographically sensitive branched novolaks using a mannich base intermediate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| PH26861A true PH26861A (en) | 1992-11-16 |
Family
ID=23379799
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PH40380A PH26861A (en) | 1989-05-12 | 1990-04-17 | Method for preparing lithographically sensitive branched novolaks using a mannich base intermediate |
Country Status (14)
| Country | Link |
|---|---|
| US (1) | US4939229A (fr) |
| EP (1) | EP0399691A3 (fr) |
| JP (1) | JPH0347820A (fr) |
| KR (1) | KR900018187A (fr) |
| CN (1) | CN1022690C (fr) |
| AU (1) | AU635929B2 (fr) |
| BR (1) | BR9001952A (fr) |
| CA (1) | CA2014644A1 (fr) |
| FI (1) | FI902376A0 (fr) |
| IL (1) | IL94352A0 (fr) |
| MY (1) | MY105698A (fr) |
| NO (1) | NO902062L (fr) |
| PH (1) | PH26861A (fr) |
| ZA (1) | ZA903559B (fr) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5091282A (en) * | 1989-04-03 | 1992-02-25 | Kabushiki Kaisha Toshiba | Alkali soluble phenol polymer photosensitive composition |
| CA2015721A1 (fr) * | 1989-05-12 | 1990-11-12 | Karen Ann Graziano | Methode d'utilisation de novolaques grandement ramifiees dans les resines photosensibles |
| EP1035438A3 (fr) * | 1999-03-12 | 2000-09-20 | Shipley Company LLC | Résines phénoliques et compositions pour photoréserves comprenant ces résines |
| TWI263861B (en) * | 1999-03-26 | 2006-10-11 | Shinetsu Chemical Co | Resist material and pattern forming method |
| JP2005519345A (ja) * | 2002-03-04 | 2005-06-30 | ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． | 短波長イメージング用ネガ型フォトレジスト |
| US6828383B2 (en) * | 2002-12-13 | 2004-12-07 | Occidental Petroleum | Phenolic modified resorcinolic resins for rubber compounding |
| US7425402B2 (en) * | 2003-08-13 | 2008-09-16 | Agfa Graphics, N.V. | Heat-sensitive lithographic printing plate precursor |
| US7205084B2 (en) * | 2003-12-18 | 2007-04-17 | Agfa-Gevaert | Heat-sensitive lithographic printing plate precursor |
| US11650505B2 (en) * | 2014-08-08 | 2023-05-16 | Nissan Chemical Industries, Ltd. | Resist underlayer film-forming composition containing novolac resin reacted with aromatic methylol compound |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2147789A (en) * | 1936-05-29 | 1939-02-21 | Du Pont | Resins from aminophenols and formaldehyde |
| US2431011A (en) * | 1941-01-29 | 1947-11-18 | Standard Oil Dev Co | Corrosive inhibited additive for mineral lubricating oil composition |
| US2636019A (en) * | 1951-06-26 | 1953-04-21 | Research Corp | Ion exchange resins from a trifunctional phenol, formaldehyde and a mannich base made from a trifunctional phenol, formaldehyde and a dialkylamine, morpholine or piperidine |
| JPS57102960A (en) * | 1972-09-14 | 1982-06-26 | Yoshizaki Kozo | Production of thermosetting resin paint |
| DE3274354D1 (en) * | 1981-06-22 | 1987-01-08 | Hunt Chem Corp Philip A | Novolak resin and a positive photoresist composition containing the same |
| JPS58101108A (ja) * | 1981-12-11 | 1983-06-16 | Unitika Ltd | キレ−ト形成基を有するフエノ−ル樹脂とその製造方法及び吸着処理方法 |
| US4500691A (en) * | 1983-01-13 | 1985-02-19 | Ciba-Geigy Corporation | Phenol-novolaks containing amino groups |
| US4474929A (en) * | 1983-09-30 | 1984-10-02 | The Dow Chemical Company | Polyglycidyl ethers of branched novolacs |
| US4468507A (en) * | 1983-11-21 | 1984-08-28 | The Dow Chemical Company | Method of limiting rate of heat evolution during acid-catalyzed phenol/polymethylolphenol condensations |
| SU1154297A1 (ru) * | 1984-01-04 | 1985-05-07 | Предприятие П/Я В-2304 | Герметизирующа порошкова композици |
| US4571374A (en) * | 1984-12-27 | 1986-02-18 | Minnesota Mining And Manufacturing Company | Multilayer dry-film positive-acting laminable photoresist with two photoresist layers wherein one layer includes thermal adhesive |
| EP0265387B1 (fr) * | 1986-10-23 | 1995-11-15 | Ciba-Geigy Ag | Méthode de formation d'images |
| CA2015721A1 (fr) * | 1989-05-12 | 1990-11-12 | Karen Ann Graziano | Methode d'utilisation de novolaques grandement ramifiees dans les resines photosensibles |
-
1989
- 1989-05-12 US US07/351,154 patent/US4939229A/en not_active Expired - Fee Related
-
1990
- 1990-04-17 CA CA002014644A patent/CA2014644A1/fr not_active Abandoned
- 1990-04-17 PH PH40380A patent/PH26861A/en unknown
- 1990-04-26 BR BR909001952A patent/BR9001952A/pt not_active Application Discontinuation
- 1990-05-07 JP JP2117295A patent/JPH0347820A/ja active Pending
- 1990-05-09 EP EP19900304969 patent/EP0399691A3/fr not_active Withdrawn
- 1990-05-10 ZA ZA903559A patent/ZA903559B/xx unknown
- 1990-05-10 IL IL94352A patent/IL94352A0/xx not_active IP Right Cessation
- 1990-05-10 MY MYPI90000741A patent/MY105698A/en unknown
- 1990-05-10 AU AU54884/90A patent/AU635929B2/en not_active Ceased
- 1990-05-10 NO NO90902062A patent/NO902062L/no unknown
- 1990-05-11 KR KR1019900006667A patent/KR900018187A/ko not_active Application Discontinuation
- 1990-05-11 FI FI902376A patent/FI902376A0/fi not_active Application Discontinuation
- 1990-05-12 CN CN90102765A patent/CN1022690C/zh not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| EP0399691A2 (fr) | 1990-11-28 |
| AU635929B2 (en) | 1993-04-08 |
| AU5488490A (en) | 1990-11-15 |
| CN1022690C (zh) | 1993-11-10 |
| MY105698A (en) | 1994-11-30 |
| ZA903559B (en) | 1991-01-30 |
| CN1047309A (zh) | 1990-11-28 |
| EP0399691A3 (fr) | 1991-04-03 |
| IL94352A0 (en) | 1991-03-10 |
| JPH0347820A (ja) | 1991-02-28 |
| FI902376A0 (fi) | 1990-05-11 |
| NO902062L (no) | 1990-11-13 |
| BR9001952A (pt) | 1991-07-30 |
| CA2014644A1 (fr) | 1990-11-12 |
| US4939229A (en) | 1990-07-03 |
| NO902062D0 (no) | 1990-05-10 |
| KR900018187A (ko) | 1990-12-20 |
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