NO902062D0 - Fremgangsmaate til fremstilling av litografisk sensitive forgrenede novolakker. - Google Patents

Fremgangsmaate til fremstilling av litografisk sensitive forgrenede novolakker.

Info

Publication number
NO902062D0
NO902062D0 NO902062A NO902062A NO902062D0 NO 902062 D0 NO902062 D0 NO 902062D0 NO 902062 A NO902062 A NO 902062A NO 902062 A NO902062 A NO 902062A NO 902062 D0 NO902062 D0 NO 902062D0
Authority
NO
Norway
Prior art keywords
novolacts
litographic
procedure
preparation
branched
Prior art date
Application number
NO902062A
Other languages
English (en)
Other versions
NO902062L (no
Inventor
Leonard Edward Bogan
Original Assignee
Rohm & Haas
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm & Haas filed Critical Rohm & Haas
Publication of NO902062D0 publication Critical patent/NO902062D0/no
Publication of NO902062L publication Critical patent/NO902062L/no

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • C08G8/10—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with phenol
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Materials For Photolithography (AREA)
NO90902062A 1989-05-12 1990-05-10 Fremgangsmaate til fremstilling av litografisk sensitive forgrenede novolakker. NO902062L (no)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/351,154 US4939229A (en) 1989-05-12 1989-05-12 Method for preparing lithographically sensitive branched novolaks using a mannich base intermediate

Publications (2)

Publication Number Publication Date
NO902062D0 true NO902062D0 (no) 1990-05-10
NO902062L NO902062L (no) 1990-11-13

Family

ID=23379799

Family Applications (1)

Application Number Title Priority Date Filing Date
NO90902062A NO902062L (no) 1989-05-12 1990-05-10 Fremgangsmaate til fremstilling av litografisk sensitive forgrenede novolakker.

Country Status (14)

Country Link
US (1) US4939229A (no)
EP (1) EP0399691A3 (no)
JP (1) JPH0347820A (no)
KR (1) KR900018187A (no)
CN (1) CN1022690C (no)
AU (1) AU635929B2 (no)
BR (1) BR9001952A (no)
CA (1) CA2014644A1 (no)
FI (1) FI902376A0 (no)
IL (1) IL94352A0 (no)
MY (1) MY105698A (no)
NO (1) NO902062L (no)
PH (1) PH26861A (no)
ZA (1) ZA903559B (no)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0396254B1 (en) * 1989-04-03 1996-07-10 Kabushiki Kaisha Toshiba Photosensitive composition and pattern formation method using the same
CA2015721A1 (en) * 1989-05-12 1990-11-12 Karen Ann Graziano Method of using highly branched novolaks in photoresists
EP1035438A3 (en) * 1999-03-12 2000-09-20 Shipley Company LLC Phenolic resins and photoresist compositions comprising same
TWI263861B (en) * 1999-03-26 2006-10-11 Shinetsu Chemical Co Resist material and pattern forming method
EP1481282A4 (en) * 2002-03-04 2009-10-28 Shipley Co Llc NEGATIVE PHOTORESISTS FOR IMAGING WITH SHORT WAVE LENGTH
US6828383B2 (en) * 2002-12-13 2004-12-07 Occidental Petroleum Phenolic modified resorcinolic resins for rubber compounding
US7425402B2 (en) * 2003-08-13 2008-09-16 Agfa Graphics, N.V. Heat-sensitive lithographic printing plate precursor
US7205084B2 (en) * 2003-12-18 2007-04-17 Agfa-Gevaert Heat-sensitive lithographic printing plate precursor
WO2016021594A1 (ja) * 2014-08-08 2016-02-11 日産化学工業株式会社 芳香族メチロール化合物が反応したノボラック樹脂を含むレジスト下層膜形成組成物

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2147789A (en) * 1936-05-29 1939-02-21 Du Pont Resins from aminophenols and formaldehyde
US2431011A (en) * 1941-01-29 1947-11-18 Standard Oil Dev Co Corrosive inhibited additive for mineral lubricating oil composition
US2636019A (en) * 1951-06-26 1953-04-21 Research Corp Ion exchange resins from a trifunctional phenol, formaldehyde and a mannich base made from a trifunctional phenol, formaldehyde and a dialkylamine, morpholine or piperidine
JPS57102960A (en) * 1972-09-14 1982-06-26 Yoshizaki Kozo Production of thermosetting resin paint
EP0070624B1 (en) * 1981-06-22 1986-11-20 Philip A. Hunt Chemical Corporation Novolak resin and a positive photoresist composition containing the same
JPS58101108A (ja) * 1981-12-11 1983-06-16 Unitika Ltd キレ−ト形成基を有するフエノ−ル樹脂とその製造方法及び吸着処理方法
US4500691A (en) * 1983-01-13 1985-02-19 Ciba-Geigy Corporation Phenol-novolaks containing amino groups
US4474929A (en) * 1983-09-30 1984-10-02 The Dow Chemical Company Polyglycidyl ethers of branched novolacs
US4468507A (en) * 1983-11-21 1984-08-28 The Dow Chemical Company Method of limiting rate of heat evolution during acid-catalyzed phenol/polymethylolphenol condensations
SU1154297A1 (ru) * 1984-01-04 1985-05-07 Предприятие П/Я В-2304 Герметизирующа порошкова композици
US4571374A (en) * 1984-12-27 1986-02-18 Minnesota Mining And Manufacturing Company Multilayer dry-film positive-acting laminable photoresist with two photoresist layers wherein one layer includes thermal adhesive
EP0662636A3 (en) * 1986-10-23 1995-11-22 Ciba Geigy Ag Imaging processes.
CA2015721A1 (en) * 1989-05-12 1990-11-12 Karen Ann Graziano Method of using highly branched novolaks in photoresists

Also Published As

Publication number Publication date
BR9001952A (pt) 1991-07-30
AU635929B2 (en) 1993-04-08
JPH0347820A (ja) 1991-02-28
CN1047309A (zh) 1990-11-28
NO902062L (no) 1990-11-13
MY105698A (en) 1994-11-30
EP0399691A3 (en) 1991-04-03
CN1022690C (zh) 1993-11-10
US4939229A (en) 1990-07-03
ZA903559B (en) 1991-01-30
FI902376A0 (fi) 1990-05-11
EP0399691A2 (en) 1990-11-28
PH26861A (en) 1992-11-16
AU5488490A (en) 1990-11-15
CA2014644A1 (en) 1990-11-12
KR900018187A (ko) 1990-12-20
IL94352A0 (en) 1991-03-10

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