KR900018187A - 민감한 석판인쇄 성능을 가진 분기된 노볼랙의 제조법 - Google Patents

민감한 석판인쇄 성능을 가진 분기된 노볼랙의 제조법 Download PDF

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Publication number
KR900018187A
KR900018187A KR1019900006667A KR900006667A KR900018187A KR 900018187 A KR900018187 A KR 900018187A KR 1019900006667 A KR1019900006667 A KR 1019900006667A KR 900006667 A KR900006667 A KR 900006667A KR 900018187 A KR900018187 A KR 900018187A
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KR
South Korea
Prior art keywords
branched
acid catalyst
branched novolac
cresol
phenol
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KR1019900006667A
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English (en)
Inventor
에드워드 보간 2세 레오나드
Original Assignee
윌리암 이 램버트 3세
롬 앤드 하스 컴퍼니
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Application filed by 윌리암 이 램버트 3세, 롬 앤드 하스 컴퍼니 filed Critical 윌리암 이 램버트 3세
Publication of KR900018187A publication Critical patent/KR900018187A/ko

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • C08G8/10—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with phenol
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Materials For Photolithography (AREA)

Abstract

내용 없음

Description

민감한 석판 인쇄 성능을 가진 분기된 노볼랙의 제조법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (7)

  1. 산 촉매 존재하에 다 분기된 노볼랙 종합체를 형성하기 위해, 트리스(디알킬아미노기알킬)페놀이나 테트라키스(디알킬아미노알킬)페놀이 적어도 하나의 비치환된 오로토-나 파라-고리위치를 갖는 적어도 1몰당량의 페놀과 반응하는 것을 포함하는 열적으로 안정한, 다 분기된 노볼랙 중합체의 제조법 및 그 산 촉매가 다 분기된 노볼랙의 끓는점 이하에서 승화되거나 증류되거나 분해되는 산기로 부터 선택되는 것.
  2. 제1항에 있어서, 다 분기된 노볼랙 중합체가 산 촉매의 분해나 승화나 증류온도 이상의 온도 및 다 분기된 노볼랙 중합체의 분해온도 이하로 반응생성물을 가열하므로서 정제되는 것.
  3. 제2항에 있어서, 다 분기된 노볼랙 중합체가 산 촉매의 증류에 의해 분리되는 것.
  4. 제1항에 있어서, 산 촉매가 옥살산이거나 그것의 염인 것.
  5. 제1항에 있어서, 다 분기된 노볼랙 중합체가 P-크레졸을 약 40중량%포함하는것.
  6. 제1항에 있어서, 적어도 하나의 비치환된 오르토-나, 파라-고리위치를 가진 페놀이 0-크레졸, m-크레졸, p-크레졸, 2-이차-부틸페닐, 2,6-디메틸페놀, 3,4-디메틸페놀, 3,5-디메틸페놀, 2,3,5-트리메틸페놀, 2,3,6-트리메틸페놀, 레소르시놀, 2-메틸레소르시놀, 그밖의 레소르시놀 유도체 및 그들의 혼합물로 구성된 기로부터 선택되는 것.
  7. 제1항에 따라 제조된 다 분기된 노볼랙 중합체를 포함하는 광저항 조성물.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019900006667A 1989-05-12 1990-05-11 민감한 석판인쇄 성능을 가진 분기된 노볼랙의 제조법 KR900018187A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US351154 1989-05-12
US07/351,154 US4939229A (en) 1989-05-12 1989-05-12 Method for preparing lithographically sensitive branched novolaks using a mannich base intermediate

Publications (1)

Publication Number Publication Date
KR900018187A true KR900018187A (ko) 1990-12-20

Family

ID=23379799

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019900006667A KR900018187A (ko) 1989-05-12 1990-05-11 민감한 석판인쇄 성능을 가진 분기된 노볼랙의 제조법

Country Status (14)

Country Link
US (1) US4939229A (ko)
EP (1) EP0399691A3 (ko)
JP (1) JPH0347820A (ko)
KR (1) KR900018187A (ko)
CN (1) CN1022690C (ko)
AU (1) AU635929B2 (ko)
BR (1) BR9001952A (ko)
CA (1) CA2014644A1 (ko)
FI (1) FI902376A0 (ko)
IL (1) IL94352A0 (ko)
MY (1) MY105698A (ko)
NO (1) NO902062L (ko)
PH (1) PH26861A (ko)
ZA (1) ZA903559B (ko)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0396254B1 (en) * 1989-04-03 1996-07-10 Kabushiki Kaisha Toshiba Photosensitive composition and pattern formation method using the same
CA2015721A1 (en) * 1989-05-12 1990-11-12 Karen Ann Graziano Method of using highly branched novolaks in photoresists
EP1035438A3 (en) * 1999-03-12 2000-09-20 Shipley Company LLC Phenolic resins and photoresist compositions comprising same
US6455223B1 (en) * 1999-03-26 2002-09-24 Shin-Etsu Chemical Co., Ltd. Resist compositions and patterning process
WO2003077029A1 (en) * 2002-03-04 2003-09-18 Shipley Company, Llc Negative photoresists for short wavelength imaging
US6828383B2 (en) * 2002-12-13 2004-12-07 Occidental Petroleum Phenolic modified resorcinolic resins for rubber compounding
US7425402B2 (en) * 2003-08-13 2008-09-16 Agfa Graphics, N.V. Heat-sensitive lithographic printing plate precursor
US7205084B2 (en) * 2003-12-18 2007-04-17 Agfa-Gevaert Heat-sensitive lithographic printing plate precursor
JP6703308B2 (ja) * 2014-08-08 2020-06-03 日産化学株式会社 芳香族メチロール化合物が反応したノボラック樹脂を含むレジスト下層膜形成組成物

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2147789A (en) * 1936-05-29 1939-02-21 Du Pont Resins from aminophenols and formaldehyde
US2431011A (en) * 1941-01-29 1947-11-18 Standard Oil Dev Co Corrosive inhibited additive for mineral lubricating oil composition
US2636019A (en) * 1951-06-26 1953-04-21 Research Corp Ion exchange resins from a trifunctional phenol, formaldehyde and a mannich base made from a trifunctional phenol, formaldehyde and a dialkylamine, morpholine or piperidine
JPS57102960A (en) * 1972-09-14 1982-06-26 Yoshizaki Kozo Production of thermosetting resin paint
DE3274354D1 (en) * 1981-06-22 1987-01-08 Hunt Chem Corp Philip A Novolak resin and a positive photoresist composition containing the same
JPS58101108A (ja) * 1981-12-11 1983-06-16 Unitika Ltd キレ−ト形成基を有するフエノ−ル樹脂とその製造方法及び吸着処理方法
US4500691A (en) * 1983-01-13 1985-02-19 Ciba-Geigy Corporation Phenol-novolaks containing amino groups
US4474929A (en) * 1983-09-30 1984-10-02 The Dow Chemical Company Polyglycidyl ethers of branched novolacs
US4468507A (en) * 1983-11-21 1984-08-28 The Dow Chemical Company Method of limiting rate of heat evolution during acid-catalyzed phenol/polymethylolphenol condensations
SU1154297A1 (ru) * 1984-01-04 1985-05-07 Предприятие П/Я В-2304 Герметизирующа порошкова композици
US4571374A (en) * 1984-12-27 1986-02-18 Minnesota Mining And Manufacturing Company Multilayer dry-film positive-acting laminable photoresist with two photoresist layers wherein one layer includes thermal adhesive
EP0662636A3 (en) * 1986-10-23 1995-11-22 Ciba Geigy Ag Imaging processes.
CA2015721A1 (en) * 1989-05-12 1990-11-12 Karen Ann Graziano Method of using highly branched novolaks in photoresists

Also Published As

Publication number Publication date
NO902062D0 (no) 1990-05-10
CA2014644A1 (en) 1990-11-12
US4939229A (en) 1990-07-03
EP0399691A2 (en) 1990-11-28
CN1022690C (zh) 1993-11-10
FI902376A0 (fi) 1990-05-11
NO902062L (no) 1990-11-13
MY105698A (en) 1994-11-30
CN1047309A (zh) 1990-11-28
AU635929B2 (en) 1993-04-08
PH26861A (en) 1992-11-16
ZA903559B (en) 1991-01-30
IL94352A0 (en) 1991-03-10
AU5488490A (en) 1990-11-15
JPH0347820A (ja) 1991-02-28
EP0399691A3 (en) 1991-04-03
BR9001952A (pt) 1991-07-30

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