KR910012816A - 고해상 포토레지스트 조성물에 유용한 높은 유리전이 온도를 갖는 노블락 수지의 제조방법 - Google Patents

고해상 포토레지스트 조성물에 유용한 높은 유리전이 온도를 갖는 노블락 수지의 제조방법 Download PDF

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Publication number
KR910012816A
KR910012816A KR1019900020894A KR900020894A KR910012816A KR 910012816 A KR910012816 A KR 910012816A KR 1019900020894 A KR1019900020894 A KR 1019900020894A KR 900020894 A KR900020894 A KR 900020894A KR 910012816 A KR910012816 A KR 910012816A
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KR
South Korea
Prior art keywords
high resolution
glass transition
phenol
methylresorcinol
transition temperature
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KR1019900020894A
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English (en)
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주니어 레오나드 에드워드 보간
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원본미기재
롬 앤드 하스 캄파니
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Publication of KR910012816A publication Critical patent/KR910012816A/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • C08G8/24—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with mixtures of two or more phenols which are not covered by only one of the groups C08G8/10 - C08G8/20

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

내용 없음.

Description

고해상 포토레지스트 조성물에 유용한 높은 유리전이 온도를 갖는 노블락 수지의 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (14)

  1. 30-85 몰퍼센트의 포름 알데히드, 5-95 몰퍼센트의 다치환페놀, 및 9-95 몰퍼센트의 레조르시놀 화합물을 축합반응시킴을 특징으로 하는, 고해상 포토레지스트 조성물에 유용한 높은 유리전이온도를 갖는 노볼락 수지의 제조방법.
  2. 제1항에 있어서, 상기 축합반응이 산촉매 존재하에서 행하여짐을 특징으로 하는 제조방법.
  3. 제2항에 있어서. 상기 산촉매가 옥살산인 것을 특징으로 하는 제조방법.
  4. 제1항에 있어서, 노블락 수지가 120℃이상의 유리전이온도를 갖는 것을 특징으로 하는 제조방법.
  5. 제1항에 있어서, 다치환 페놀이 페놀고리의 최소한 3 및 5위치가 (C1-C1)알킬 및 아릴 기들로부터 선택된 서로 같거나 다른 치환체들로 치환된 페놀류로 구성된 것임을 특징으로 하는 제조방법.
  6. 제5항에 있어서, 상기 다치환 페놀이 3.5-디메틸 페놀인 것을 특징으로 하는 제조방법.
  7. 제1항에 있어서. 상기 레조르시놀 화합물이 레조르시놀, 4-클로로레조르시놀 2-메틸레조르시놀 4-메틸레조르시놀, 4-에틸레조르시놀, 및 알킬 또는 아릴 치환 디-또는 트리-히드록시벤젠으로 구성된 군으로부터 선택된 것임을 특징으로 하는 제조방법.
  8. 제7항에 있어서. 레조르시놀이 2-메틸레조르시놀인 것을 특징으로 하는 제조방법.
  9. 제1항에 있어서, 축합반응에 제2의 페놀이 사용되는 것을 특징으로 하는 제조방법.
  10. 제9항에 있어서, 제2의 페놀이 메타-크레졸인 것을 특징으로 하는 제조방법.
  11. 제1항에 있어서, 포름알데히드, 3,5-디메틸페놀 및 2-메틸레조르시놀을 축합반응시 킴을 특징으로 하는, 고해상 포토레지스트 조성물에 유용한 120℃이상의 유리 전이온도를 갖는 노볼락 수지의 제조방법.,
  12. 제9항에 있어서, 포름알데히드, 3,5-디메틸페놀, 2-메틸레조르시놀 및 메타-크레졸을 축합반응시킴을 특징으로 하는, 고해상 포토레지스트 조성물에 유용한 120℃이상의 유리 전이온도를 갖는 노볼락 수지의 제조방법.
  13. 비반응성 용매, 청구범위 1항의 노볼락 수지, 및 광활성 화합물로 구성되는 고해상 포토레지스트 조성물.
  14. 제13항에 있어서, 수성 현상 가능한 양성 포토레지스트인, 고해상 포토레지스트 조성물.
    참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019900020894A 1989-12-18 1990-12-18 고해상 포토레지스트 조성물에 유용한 높은 유리전이 온도를 갖는 노블락 수지의 제조방법 KR910012816A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US45202789A 1989-12-18 1989-12-18
US452027 1989-12-18

Publications (1)

Publication Number Publication Date
KR910012816A true KR910012816A (ko) 1991-08-08

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KR1019900020894A KR910012816A (ko) 1989-12-18 1990-12-18 고해상 포토레지스트 조성물에 유용한 높은 유리전이 온도를 갖는 노블락 수지의 제조방법

Country Status (12)

Country Link
EP (1) EP0435502A1 (ko)
JP (1) JPH04103612A (ko)
KR (1) KR910012816A (ko)
CN (1) CN1053616A (ko)
AU (1) AU6811790A (ko)
BR (1) BR9006221A (ko)
CA (1) CA2031564A1 (ko)
FI (1) FI906219A (ko)
IE (1) IE904551A1 (ko)
IL (1) IL96551A0 (ko)
NO (1) NO905340L (ko)
ZA (1) ZA9010118B (ko)

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Publication number Priority date Publication date Assignee Title
DE69223083T2 (de) * 1991-04-26 1998-07-02 Sumitomo Chemical Co Positivarbeitende Resistzusammensetzung
JPH05273757A (ja) * 1991-08-20 1993-10-22 Hoechst Celanese Corp 高いガラス転位点と高い光感度を有するフォトレジスト用ノボラック樹脂組成物
US6000128A (en) * 1994-06-21 1999-12-14 Sumitomo Special Metals Co., Ltd. Process of producing a multi-layered printed-coil substrate
EP0689214B1 (en) * 1994-06-21 1999-09-22 Sumitomo Special Metals Co., Ltd. Process of producing a multi-layered printed-coil substrate
US7382992B2 (en) 2004-07-26 2008-06-03 Canon Kabushiki Kaisha Sheet material identification apparatus and image forming apparatus therewith
KR101399281B1 (ko) * 2007-06-29 2014-05-26 주식회사 동진쎄미켐 유기박막 트랜지스터용 감광성 수지 조성물
US8822123B2 (en) 2012-07-13 2014-09-02 Momentive Specialty Chemicals Inc. Polymeric materials and methods for making the polymeric materials
TW201806996A (zh) * 2016-04-06 2018-03-01 迪愛生股份有限公司 酚醛清漆型樹脂及抗蝕劑材料
CN112094392A (zh) * 2019-06-17 2020-12-18 山东圣泉新材料股份有限公司 一种酚醛树脂及其制备方法和应用
CN111484586A (zh) * 2020-04-27 2020-08-04 江苏准信自动化科技股份有限公司 一种光刻胶用线性酚醛树脂及其制造方法
CN113461885B (zh) * 2021-08-09 2022-07-05 北京彤程创展科技有限公司 一种光刻胶用酚醛树脂及其制备方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD211415A1 (de) * 1983-02-16 1984-07-11 Fotochem Werke Berlin Veb Positiv-fotokopierlack mit verbesserten eigenschaften
DE3686032T2 (de) * 1985-12-27 1993-02-18 Japan Synthetic Rubber Co Ltd Strahlungsempfindliche positiv arbeitende kunststoffzusammensetzung.
JPH0654390B2 (ja) * 1986-07-18 1994-07-20 東京応化工業株式会社 高耐熱性ポジ型ホトレジスト組成物
DE3852559T2 (de) * 1987-03-12 1995-05-24 Konishiroku Photo Ind Lichtempfindliche positive Flachdruckplatte.
US4837121A (en) * 1987-11-23 1989-06-06 Olin Hunt Specialty Products Inc. Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin

Also Published As

Publication number Publication date
FI906219A (fi) 1991-06-19
JPH04103612A (ja) 1992-04-06
BR9006221A (pt) 1991-09-24
CA2031564A1 (en) 1991-06-19
EP0435502A1 (en) 1991-07-03
AU6811790A (en) 1991-06-20
FI906219A0 (fi) 1990-12-17
ZA9010118B (en) 1991-08-28
NO905340D0 (no) 1990-12-11
CN1053616A (zh) 1991-08-07
IL96551A0 (en) 1991-09-16
IE904551A1 (en) 1991-06-19
NO905340L (no) 1991-06-19

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