IL96551A0 - Preparation of high glass transition temperature novolak resins useful in high resolution photoresist compositions - Google Patents
Preparation of high glass transition temperature novolak resins useful in high resolution photoresist compositionsInfo
- Publication number
- IL96551A0 IL96551A0 IL96551A IL9655190A IL96551A0 IL 96551 A0 IL96551 A0 IL 96551A0 IL 96551 A IL96551 A IL 96551A IL 9655190 A IL9655190 A IL 9655190A IL 96551 A0 IL96551 A0 IL 96551A0
- Authority
- IL
- Israel
- Prior art keywords
- preparation
- transition temperature
- glass transition
- novolak resins
- photoresist compositions
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
- G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
- C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
- C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
- C08G8/24—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with mixtures of two or more phenols which are not covered by only one of the groups C08G8/10 - C08G8/20
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Materials For Photolithography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US45202789A | 1989-12-18 | 1989-12-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IL96551A0 true IL96551A0 (en) | 1991-09-16 |
Family
ID=23794719
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IL96551A IL96551A0 (en) | 1989-12-18 | 1990-12-05 | Preparation of high glass transition temperature novolak resins useful in high resolution photoresist compositions |
Country Status (12)
| Country | Link |
|---|---|
| EP (1) | EP0435502A1 (ko) |
| JP (1) | JPH04103612A (ko) |
| KR (1) | KR910012816A (ko) |
| CN (1) | CN1053616A (ko) |
| AU (1) | AU6811790A (ko) |
| BR (1) | BR9006221A (ko) |
| CA (1) | CA2031564A1 (ko) |
| FI (1) | FI906219A (ko) |
| IE (1) | IE904551A1 (ko) |
| IL (1) | IL96551A0 (ko) |
| NO (1) | NO905340L (ko) |
| ZA (1) | ZA9010118B (ko) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0510671B1 (en) * | 1991-04-26 | 1997-11-12 | Sumitomo Chemical Company, Limited | Positive resist composition |
| JPH05273757A (ja) * | 1991-08-20 | 1993-10-22 | Hoechst Celanese Corp | 高いガラス転位点と高い光感度を有するフォトレジスト用ノボラック樹脂組成物 |
| EP0689214B1 (en) * | 1994-06-21 | 1999-09-22 | Sumitomo Special Metals Co., Ltd. | Process of producing a multi-layered printed-coil substrate |
| US6000128A (en) * | 1994-06-21 | 1999-12-14 | Sumitomo Special Metals Co., Ltd. | Process of producing a multi-layered printed-coil substrate |
| US7382992B2 (en) | 2004-07-26 | 2008-06-03 | Canon Kabushiki Kaisha | Sheet material identification apparatus and image forming apparatus therewith |
| KR101399281B1 (ko) * | 2007-06-29 | 2014-05-26 | 주식회사 동진쎄미켐 | 유기박막 트랜지스터용 감광성 수지 조성물 |
| US8822123B2 (en) | 2012-07-13 | 2014-09-02 | Momentive Specialty Chemicals Inc. | Polymeric materials and methods for making the polymeric materials |
| TW201806996A (zh) * | 2016-04-06 | 2018-03-01 | 迪愛生股份有限公司 | 酚醛清漆型樹脂及抗蝕劑材料 |
| CN112094392A (zh) * | 2019-06-17 | 2020-12-18 | 山东圣泉新材料股份有限公司 | 一种酚醛树脂及其制备方法和应用 |
| CN111484586A (zh) * | 2020-04-27 | 2020-08-04 | 江苏准信自动化科技股份有限公司 | 一种光刻胶用线性酚醛树脂及其制造方法 |
| CN113461885B (zh) * | 2021-08-09 | 2022-07-05 | 北京彤程创展科技有限公司 | 一种光刻胶用酚醛树脂及其制备方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DD211415A1 (de) * | 1983-02-16 | 1984-07-11 | Fotochem Werke Berlin Veb | Positiv-fotokopierlack mit verbesserten eigenschaften |
| DE3686032T2 (de) * | 1985-12-27 | 1993-02-18 | Japan Synthetic Rubber Co Ltd | Strahlungsempfindliche positiv arbeitende kunststoffzusammensetzung. |
| JPH0654390B2 (ja) * | 1986-07-18 | 1994-07-20 | 東京応化工業株式会社 | 高耐熱性ポジ型ホトレジスト組成物 |
| DE3852559T2 (de) * | 1987-03-12 | 1995-05-24 | Konishiroku Photo Ind | Lichtempfindliche positive Flachdruckplatte. |
| US4837121A (en) * | 1987-11-23 | 1989-06-06 | Olin Hunt Specialty Products Inc. | Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin |
-
1990
- 1990-12-05 CA CA002031564A patent/CA2031564A1/en not_active Abandoned
- 1990-12-05 IL IL96551A patent/IL96551A0/xx unknown
- 1990-12-07 BR BR909006221A patent/BR9006221A/pt not_active Application Discontinuation
- 1990-12-10 EP EP90313404A patent/EP0435502A1/en not_active Withdrawn
- 1990-12-11 NO NO90905340A patent/NO905340L/no unknown
- 1990-12-17 FI FI906219A patent/FI906219A/fi not_active Application Discontinuation
- 1990-12-17 ZA ZA9010118A patent/ZA9010118B/xx unknown
- 1990-12-17 AU AU68117/90A patent/AU6811790A/en not_active Abandoned
- 1990-12-17 JP JP2402810A patent/JPH04103612A/ja active Pending
- 1990-12-17 IE IE455190A patent/IE904551A1/en unknown
- 1990-12-18 CN CN90110445.0A patent/CN1053616A/zh active Pending
- 1990-12-18 KR KR1019900020894A patent/KR910012816A/ko not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| FI906219A (fi) | 1991-06-19 |
| FI906219A0 (fi) | 1990-12-17 |
| AU6811790A (en) | 1991-06-20 |
| NO905340D0 (no) | 1990-12-11 |
| NO905340L (no) | 1991-06-19 |
| IE904551A1 (en) | 1991-06-19 |
| CN1053616A (zh) | 1991-08-07 |
| KR910012816A (ko) | 1991-08-08 |
| JPH04103612A (ja) | 1992-04-06 |
| EP0435502A1 (en) | 1991-07-03 |
| CA2031564A1 (en) | 1991-06-19 |
| ZA9010118B (en) | 1991-08-28 |
| BR9006221A (pt) | 1991-09-24 |
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