IL96551A0 - Preparation of high glass transition temperature novolak resins useful in high resolution photoresist compositions - Google Patents

Preparation of high glass transition temperature novolak resins useful in high resolution photoresist compositions

Info

Publication number
IL96551A0
IL96551A0 IL96551A IL9655190A IL96551A0 IL 96551 A0 IL96551 A0 IL 96551A0 IL 96551 A IL96551 A IL 96551A IL 9655190 A IL9655190 A IL 9655190A IL 96551 A0 IL96551 A0 IL 96551A0
Authority
IL
Israel
Prior art keywords
preparation
transition temperature
glass transition
novolak resins
photoresist compositions
Prior art date
Application number
IL96551A
Other languages
English (en)
Original Assignee
Rohm & Haas
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm & Haas filed Critical Rohm & Haas
Publication of IL96551A0 publication Critical patent/IL96551A0/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • G03F7/023Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • C08G8/24Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with mixtures of two or more phenols which are not covered by only one of the groups C08G8/10 - C08G8/20

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
IL96551A 1989-12-18 1990-12-05 Preparation of high glass transition temperature novolak resins useful in high resolution photoresist compositions IL96551A0 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US45202789A 1989-12-18 1989-12-18

Publications (1)

Publication Number Publication Date
IL96551A0 true IL96551A0 (en) 1991-09-16

Family

ID=23794719

Family Applications (1)

Application Number Title Priority Date Filing Date
IL96551A IL96551A0 (en) 1989-12-18 1990-12-05 Preparation of high glass transition temperature novolak resins useful in high resolution photoresist compositions

Country Status (12)

Country Link
EP (1) EP0435502A1 (ko)
JP (1) JPH04103612A (ko)
KR (1) KR910012816A (ko)
CN (1) CN1053616A (ko)
AU (1) AU6811790A (ko)
BR (1) BR9006221A (ko)
CA (1) CA2031564A1 (ko)
FI (1) FI906219A (ko)
IE (1) IE904551A1 (ko)
IL (1) IL96551A0 (ko)
NO (1) NO905340L (ko)
ZA (1) ZA9010118B (ko)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0510671B1 (en) * 1991-04-26 1997-11-12 Sumitomo Chemical Company, Limited Positive resist composition
JPH05273757A (ja) * 1991-08-20 1993-10-22 Hoechst Celanese Corp 高いガラス転位点と高い光感度を有するフォトレジスト用ノボラック樹脂組成物
EP0689214B1 (en) * 1994-06-21 1999-09-22 Sumitomo Special Metals Co., Ltd. Process of producing a multi-layered printed-coil substrate
US6000128A (en) * 1994-06-21 1999-12-14 Sumitomo Special Metals Co., Ltd. Process of producing a multi-layered printed-coil substrate
US7382992B2 (en) 2004-07-26 2008-06-03 Canon Kabushiki Kaisha Sheet material identification apparatus and image forming apparatus therewith
KR101399281B1 (ko) * 2007-06-29 2014-05-26 주식회사 동진쎄미켐 유기박막 트랜지스터용 감광성 수지 조성물
US8822123B2 (en) 2012-07-13 2014-09-02 Momentive Specialty Chemicals Inc. Polymeric materials and methods for making the polymeric materials
TW201806996A (zh) * 2016-04-06 2018-03-01 迪愛生股份有限公司 酚醛清漆型樹脂及抗蝕劑材料
CN112094392A (zh) * 2019-06-17 2020-12-18 山东圣泉新材料股份有限公司 一种酚醛树脂及其制备方法和应用
CN111484586A (zh) * 2020-04-27 2020-08-04 江苏准信自动化科技股份有限公司 一种光刻胶用线性酚醛树脂及其制造方法
CN113461885B (zh) * 2021-08-09 2022-07-05 北京彤程创展科技有限公司 一种光刻胶用酚醛树脂及其制备方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD211415A1 (de) * 1983-02-16 1984-07-11 Fotochem Werke Berlin Veb Positiv-fotokopierlack mit verbesserten eigenschaften
DE3686032T2 (de) * 1985-12-27 1993-02-18 Japan Synthetic Rubber Co Ltd Strahlungsempfindliche positiv arbeitende kunststoffzusammensetzung.
JPH0654390B2 (ja) * 1986-07-18 1994-07-20 東京応化工業株式会社 高耐熱性ポジ型ホトレジスト組成物
DE3852559T2 (de) * 1987-03-12 1995-05-24 Konishiroku Photo Ind Lichtempfindliche positive Flachdruckplatte.
US4837121A (en) * 1987-11-23 1989-06-06 Olin Hunt Specialty Products Inc. Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin

Also Published As

Publication number Publication date
FI906219A (fi) 1991-06-19
FI906219A0 (fi) 1990-12-17
AU6811790A (en) 1991-06-20
NO905340D0 (no) 1990-12-11
NO905340L (no) 1991-06-19
IE904551A1 (en) 1991-06-19
CN1053616A (zh) 1991-08-07
KR910012816A (ko) 1991-08-08
JPH04103612A (ja) 1992-04-06
EP0435502A1 (en) 1991-07-03
CA2031564A1 (en) 1991-06-19
ZA9010118B (en) 1991-08-28
BR9006221A (pt) 1991-09-24

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