IL94352A0 - Preparation of lithographically sensitive branched novolaks - Google Patents

Preparation of lithographically sensitive branched novolaks

Info

Publication number
IL94352A0
IL94352A0 IL94352A IL9435290A IL94352A0 IL 94352 A0 IL94352 A0 IL 94352A0 IL 94352 A IL94352 A IL 94352A IL 9435290 A IL9435290 A IL 9435290A IL 94352 A0 IL94352 A0 IL 94352A0
Authority
IL
Israel
Prior art keywords
preparation
novolaks
lithographically sensitive
lithographically
branched novolaks
Prior art date
Application number
IL94352A
Other languages
English (en)
Original Assignee
Rohm & Haas
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm & Haas filed Critical Rohm & Haas
Publication of IL94352A0 publication Critical patent/IL94352A0/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • C08G8/10—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with phenol
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Materials For Photolithography (AREA)
IL94352A 1989-05-12 1990-05-10 Preparation of lithographically sensitive branched novolaks IL94352A0 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/351,154 US4939229A (en) 1989-05-12 1989-05-12 Method for preparing lithographically sensitive branched novolaks using a mannich base intermediate

Publications (1)

Publication Number Publication Date
IL94352A0 true IL94352A0 (en) 1991-03-10

Family

ID=23379799

Family Applications (1)

Application Number Title Priority Date Filing Date
IL94352A IL94352A0 (en) 1989-05-12 1990-05-10 Preparation of lithographically sensitive branched novolaks

Country Status (14)

Country Link
US (1) US4939229A (fr)
EP (1) EP0399691A3 (fr)
JP (1) JPH0347820A (fr)
KR (1) KR900018187A (fr)
CN (1) CN1022690C (fr)
AU (1) AU635929B2 (fr)
BR (1) BR9001952A (fr)
CA (1) CA2014644A1 (fr)
FI (1) FI902376A0 (fr)
IL (1) IL94352A0 (fr)
MY (1) MY105698A (fr)
NO (1) NO902062L (fr)
PH (1) PH26861A (fr)
ZA (1) ZA903559B (fr)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69027707T2 (de) * 1989-04-03 1997-01-09 Toshiba Kawasaki Kk Photoempfindliche Zusammensetzung und Verfahren zur Herstellung von Mustern unter Verwendung dieser Zusammensetzung
CA2015721A1 (fr) * 1989-05-12 1990-11-12 Karen Ann Graziano Methode d'utilisation de novolaques grandement ramifiees dans les resines photosensibles
EP1035438A3 (fr) * 1999-03-12 2000-09-20 Shipley Company LLC Résines phénoliques et compositions pour photoréserves comprenant ces résines
US6455223B1 (en) * 1999-03-26 2002-09-24 Shin-Etsu Chemical Co., Ltd. Resist compositions and patterning process
EP1481282A4 (fr) * 2002-03-04 2009-10-28 Shipley Co Llc Photoresists negatifs pour imagerie a longueur d'onde courte
US6828383B2 (en) * 2002-12-13 2004-12-07 Occidental Petroleum Phenolic modified resorcinolic resins for rubber compounding
US7425402B2 (en) * 2003-08-13 2008-09-16 Agfa Graphics, N.V. Heat-sensitive lithographic printing plate precursor
US7205084B2 (en) * 2003-12-18 2007-04-17 Agfa-Gevaert Heat-sensitive lithographic printing plate precursor
WO2016021594A1 (fr) * 2014-08-08 2016-02-11 日産化学工業株式会社 Composition de formation de film de sous-couche de réserve contenant une résine novolaque mise à réagir avec un composé de méthylol aromatique

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2147789A (en) * 1936-05-29 1939-02-21 Du Pont Resins from aminophenols and formaldehyde
US2431011A (en) * 1941-01-29 1947-11-18 Standard Oil Dev Co Corrosive inhibited additive for mineral lubricating oil composition
US2636019A (en) * 1951-06-26 1953-04-21 Research Corp Ion exchange resins from a trifunctional phenol, formaldehyde and a mannich base made from a trifunctional phenol, formaldehyde and a dialkylamine, morpholine or piperidine
JPS57102960A (en) * 1972-09-14 1982-06-26 Yoshizaki Kozo Production of thermosetting resin paint
EP0070624B1 (fr) * 1981-06-22 1986-11-20 Philip A. Hunt Chemical Corporation Résine novolaque et une composition phototrésist positive la contenant
JPS58101108A (ja) * 1981-12-11 1983-06-16 Unitika Ltd キレ−ト形成基を有するフエノ−ル樹脂とその製造方法及び吸着処理方法
US4500691A (en) * 1983-01-13 1985-02-19 Ciba-Geigy Corporation Phenol-novolaks containing amino groups
US4474929A (en) * 1983-09-30 1984-10-02 The Dow Chemical Company Polyglycidyl ethers of branched novolacs
US4468507A (en) * 1983-11-21 1984-08-28 The Dow Chemical Company Method of limiting rate of heat evolution during acid-catalyzed phenol/polymethylolphenol condensations
SU1154297A1 (ru) * 1984-01-04 1985-05-07 Предприятие П/Я В-2304 Герметизирующа порошкова композици
US4571374A (en) * 1984-12-27 1986-02-18 Minnesota Mining And Manufacturing Company Multilayer dry-film positive-acting laminable photoresist with two photoresist layers wherein one layer includes thermal adhesive
DE3751598T2 (de) * 1986-10-23 1996-04-18 Ciba Geigy Ag Bilderzeugungsverfahren.
CA2015721A1 (fr) * 1989-05-12 1990-11-12 Karen Ann Graziano Methode d'utilisation de novolaques grandement ramifiees dans les resines photosensibles

Also Published As

Publication number Publication date
BR9001952A (pt) 1991-07-30
NO902062D0 (no) 1990-05-10
KR900018187A (ko) 1990-12-20
FI902376A0 (fi) 1990-05-11
CA2014644A1 (fr) 1990-11-12
NO902062L (no) 1990-11-13
EP0399691A2 (fr) 1990-11-28
CN1022690C (zh) 1993-11-10
CN1047309A (zh) 1990-11-28
EP0399691A3 (fr) 1991-04-03
AU635929B2 (en) 1993-04-08
AU5488490A (en) 1990-11-15
JPH0347820A (ja) 1991-02-28
MY105698A (en) 1994-11-30
PH26861A (en) 1992-11-16
ZA903559B (en) 1991-01-30
US4939229A (en) 1990-07-03

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Legal Events

Date Code Title Description
RH Patent void