CA1044398A - Composes photosensibles et photoresistances qui les renferment - Google Patents
Composes photosensibles et photoresistances qui les renfermentInfo
- Publication number
- CA1044398A CA1044398A CA219,615A CA219615A CA1044398A CA 1044398 A CA1044398 A CA 1044398A CA 219615 A CA219615 A CA 219615A CA 1044398 A CA1044398 A CA 1044398A
- Authority
- CA
- Canada
- Prior art keywords
- light
- sensitive
- acid
- mixture
- nitrobenzoic acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C247/00—Compounds containing azido groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
- C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
- C08G59/1477—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing nitrogen
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Epoxy Resins (AREA)
- Paints Or Removers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB584674A GB1448332A (en) | 1974-02-08 | 1974-02-08 | Light-sensitive compoudns and photoresists containing the same |
Publications (1)
Publication Number | Publication Date |
---|---|
CA1044398A true CA1044398A (fr) | 1978-12-12 |
Family
ID=9803731
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA219,615A Expired CA1044398A (fr) | 1974-02-08 | 1975-02-07 | Composes photosensibles et photoresistances qui les renferment |
Country Status (8)
Country | Link |
---|---|
JP (1) | JPS50114499A (fr) |
BE (1) | BE825326A (fr) |
CA (1) | CA1044398A (fr) |
DE (1) | DE2503969A1 (fr) |
FR (1) | FR2260603B1 (fr) |
GB (1) | GB1448332A (fr) |
NL (1) | NL7501274A (fr) |
SE (1) | SE7501269L (fr) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100520163B1 (ko) * | 2001-06-21 | 2005-10-10 | 주식회사 하이닉스반도체 | 니트로기를 포함하는 신규의 포토레지스트 중합체 및 이를함유하는 포토레지스트 조성물 |
CN113101913B (zh) * | 2021-03-19 | 2022-05-27 | 浙江恒逸石化研究院有限公司 | 一种用于蒽醌降解物再生的条形催化剂的制备方法 |
-
1974
- 1974-02-08 GB GB584674A patent/GB1448332A/en not_active Expired
-
1975
- 1975-01-31 DE DE19752503969 patent/DE2503969A1/de not_active Withdrawn
- 1975-02-04 NL NL7501274A patent/NL7501274A/xx unknown
- 1975-02-05 SE SE7501269A patent/SE7501269L/xx unknown
- 1975-02-06 JP JP50014941A patent/JPS50114499A/ja active Pending
- 1975-02-07 CA CA219,615A patent/CA1044398A/fr not_active Expired
- 1975-02-07 BE BE153188A patent/BE825326A/fr unknown
- 1975-02-10 FR FR7504052A patent/FR2260603B1/fr not_active Expired
Also Published As
Publication number | Publication date |
---|---|
GB1448332A (en) | 1976-09-02 |
FR2260603A1 (fr) | 1975-09-05 |
SE7501269L (fr) | 1975-08-11 |
JPS50114499A (fr) | 1975-09-08 |
BE825326A (fr) | 1975-08-07 |
NL7501274A (nl) | 1975-08-12 |
FR2260603B1 (fr) | 1980-05-16 |
DE2503969A1 (de) | 1975-08-14 |
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