NO961534L - Fremgangsmåte og apparat for generering av en utladning i damp i en radiofrekvenselektrode - Google Patents

Fremgangsmåte og apparat for generering av en utladning i damp i en radiofrekvenselektrode

Info

Publication number
NO961534L
NO961534L NO961534A NO961534A NO961534L NO 961534 L NO961534 L NO 961534L NO 961534 A NO961534 A NO 961534A NO 961534 A NO961534 A NO 961534A NO 961534 L NO961534 L NO 961534L
Authority
NO
Norway
Prior art keywords
radio frequency
discharge
electrode
hollow
pct
Prior art date
Application number
NO961534A
Other languages
English (en)
Other versions
NO961534D0 (no
NO313918B1 (no
Inventor
Ladislav Bardos
Hana Barankova
Soren Berg
Original Assignee
Surfcoat Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Surfcoat Oy filed Critical Surfcoat Oy
Publication of NO961534D0 publication Critical patent/NO961534D0/no
Publication of NO961534L publication Critical patent/NO961534L/no
Publication of NO313918B1 publication Critical patent/NO313918B1/no

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32596—Hollow cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Chemical Vapour Deposition (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
NO19961534A 1993-10-18 1996-04-18 FremgangsmÕte og apparat for generering av en utladning i damp i en radiofrekvenselektrode NO313918B1 (no)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
SE9303426A SE501888C2 (sv) 1993-10-18 1993-10-18 En metod och en apparat för generering av en urladdning i egna ångor från en radiofrekvenselektrod för kontinuerlig självförstoftning av elektroden
PCT/SE1994/000959 WO1995011322A1 (en) 1993-10-18 1994-10-12 A method and an apparatus for generation of a discharge in own vapors of a radio frequency electrode for sustained self-sputtering and evaporation of the electrode

Publications (3)

Publication Number Publication Date
NO961534D0 NO961534D0 (no) 1996-04-18
NO961534L true NO961534L (no) 1996-06-05
NO313918B1 NO313918B1 (no) 2002-12-23

Family

ID=20391460

Family Applications (1)

Application Number Title Priority Date Filing Date
NO19961534A NO313918B1 (no) 1993-10-18 1996-04-18 FremgangsmÕte og apparat for generering av en utladning i damp i en radiofrekvenselektrode

Country Status (13)

Country Link
US (1) US5716500A (no)
EP (1) EP0726967B1 (no)
JP (1) JP3778294B2 (no)
KR (1) KR100270892B1 (no)
AT (1) ATE224465T1 (no)
AU (1) AU680958B2 (no)
BR (1) BR9407844A (no)
CA (1) CA2174507C (no)
DE (1) DE69431405T2 (no)
ES (1) ES2185670T3 (no)
NO (1) NO313918B1 (no)
SE (1) SE501888C2 (no)
WO (1) WO1995011322A1 (no)

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KR100270892B1 (ko) 2000-12-01
JP3778294B2 (ja) 2006-05-24
WO1995011322A1 (en) 1995-04-27
BR9407844A (pt) 1997-05-13
DE69431405D1 (de) 2002-10-24
EP0726967B1 (en) 2002-09-18
SE501888C2 (sv) 1995-06-12
ATE224465T1 (de) 2002-10-15
JPH09505355A (ja) 1997-05-27
AU8007794A (en) 1995-05-08
CA2174507C (en) 2005-06-21
NO961534D0 (no) 1996-04-18
DE69431405T2 (de) 2003-01-16
SE9303426D0 (sv) 1993-10-18
AU680958B2 (en) 1997-08-14
ES2185670T3 (es) 2003-05-01
SE9303426L (sv) 1995-04-19
EP0726967A1 (en) 1996-08-21
CA2174507A1 (en) 1995-04-27
US5716500A (en) 1998-02-10
NO313918B1 (no) 2002-12-23

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