JPS56100414A - Correcting device for pattern of photomask - Google Patents

Correcting device for pattern of photomask

Info

Publication number
JPS56100414A
JPS56100414A JP271080A JP271080A JPS56100414A JP S56100414 A JPS56100414 A JP S56100414A JP 271080 A JP271080 A JP 271080A JP 271080 A JP271080 A JP 271080A JP S56100414 A JPS56100414 A JP S56100414A
Authority
JP
Japan
Prior art keywords
pattern
corrected
missing
excess
sustainable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP271080A
Other languages
Japanese (ja)
Inventor
Yukimichi Kanedaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP271080A priority Critical patent/JPS56100414A/en
Publication of JPS56100414A publication Critical patent/JPS56100414A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To perform correction of both excess and missing parts of a pattern as a photomask device being set in one device and also to make a corrected missing part sustainable to chemical and physical treatment. CONSTITUTION:The pattern surface of a mask 2 is sealed to the opening part of a vacuum chamber 1, and Ar is introduced 6 and kept at 10<-3>Torr. A lamp 14 is lighted to detect the missing part 3, while supporting block pieces 1, 7, 10 and 5 are driven, and thus observation is conducted. Next, the opening of an anode 11 being adjusted, the missing part 3 is covered in the minimum degree as required, high voltage is given to in between the anode 11 and a Cr target 13 and thereby Cr is connected to be corrected. The part thus corrected is sustainable to chemical and physical treatment in the same degree as a normal Cr pattern. As for the excess part, a laser is oscillated 18, a beam is shaped 19, and the beam thus shaped is focused at the excess part through an optical system, whereby the part is removed through evaporation. By this constitution, the efficiency of operation is raised.
JP271080A 1980-01-14 1980-01-14 Correcting device for pattern of photomask Pending JPS56100414A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP271080A JPS56100414A (en) 1980-01-14 1980-01-14 Correcting device for pattern of photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP271080A JPS56100414A (en) 1980-01-14 1980-01-14 Correcting device for pattern of photomask

Publications (1)

Publication Number Publication Date
JPS56100414A true JPS56100414A (en) 1981-08-12

Family

ID=11536848

Family Applications (1)

Application Number Title Priority Date Filing Date
JP271080A Pending JPS56100414A (en) 1980-01-14 1980-01-14 Correcting device for pattern of photomask

Country Status (1)

Country Link
JP (1) JPS56100414A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59222838A (en) * 1983-06-01 1984-12-14 Toppan Printing Co Ltd Defect correcting device
JPS6114640A (en) * 1984-06-20 1986-01-22 グールド・インコーポレイテツド Method and apparatus for correcting defect of photo mask
JPH03188259A (en) * 1989-12-18 1991-08-16 Tokyo Rika Univ Pattern defect correcting device
JP2005350692A (en) * 2004-06-08 2005-12-22 Sony Corp Film deposition method and film deposition apparatus

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59222838A (en) * 1983-06-01 1984-12-14 Toppan Printing Co Ltd Defect correcting device
JPH0466020B2 (en) * 1983-06-01 1992-10-21 Toppan Printing Co Ltd
JPS6114640A (en) * 1984-06-20 1986-01-22 グールド・インコーポレイテツド Method and apparatus for correcting defect of photo mask
JPH03188259A (en) * 1989-12-18 1991-08-16 Tokyo Rika Univ Pattern defect correcting device
JP2005350692A (en) * 2004-06-08 2005-12-22 Sony Corp Film deposition method and film deposition apparatus
JP4649880B2 (en) * 2004-06-08 2011-03-16 ソニー株式会社 Film forming method and film forming apparatus

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