JPS55102162A - Ion source - Google Patents

Ion source

Info

Publication number
JPS55102162A
JPS55102162A JP920079A JP920079A JPS55102162A JP S55102162 A JPS55102162 A JP S55102162A JP 920079 A JP920079 A JP 920079A JP 920079 A JP920079 A JP 920079A JP S55102162 A JPS55102162 A JP S55102162A
Authority
JP
Japan
Prior art keywords
magnet
permanent magnet
loss
cathode
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP920079A
Other languages
Japanese (ja)
Inventor
Haruo Okano
Yasuhiro Horiike
Hiromichi Horie
Noboru Kuriyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Tokuda Seisakusho Co Ltd
Original Assignee
Toshiba Corp
Tokuda Seisakusho Co Ltd
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokuda Seisakusho Co Ltd, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP920079A priority Critical patent/JPS55102162A/en
Publication of JPS55102162A publication Critical patent/JPS55102162A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electron Sources, Ion Sources (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To reduce beam loss and control rise in temperature of a permanent magnet of cold cathode type ion source, by incorporating an anode in a discharge chamber formed with a cathode equipped with the magnet.
CONSTITUTION: An anode 21 as No.2 electrode is set in a discharge chamber formed with a ring cathode 20 as No.1 electrode having a permanent magnet 19, and the electric field produced by both electrodes and the magnetic field produced by the permanent magnet 19 cross each other at a right angle in an annular through hole 22. Since ion beams 24 are directly emitted from the hole 22, the beams 24 undergo no loss. A water tank 25 is placed right above the permanent magnet 19 to cool it with water, which is effective for controlling the magnet's temperature rise caused by cathode loss of positive ion. This system can reduce ion beam loss and control the magnet temperature, which is effective for long and continuous use of the ion source.
COPYRIGHT: (C)1980,JPO&Japio
JP920079A 1979-01-31 1979-01-31 Ion source Pending JPS55102162A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP920079A JPS55102162A (en) 1979-01-31 1979-01-31 Ion source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP920079A JPS55102162A (en) 1979-01-31 1979-01-31 Ion source

Publications (1)

Publication Number Publication Date
JPS55102162A true JPS55102162A (en) 1980-08-05

Family

ID=11713841

Family Applications (1)

Application Number Title Priority Date Filing Date
JP920079A Pending JPS55102162A (en) 1979-01-31 1979-01-31 Ion source

Country Status (1)

Country Link
JP (1) JPS55102162A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60138250U (en) * 1984-02-24 1985-09-12 財団法人　電力中央研究所 Ion irradiation device
JPS6310432A (en) * 1986-07-01 1988-01-18 Ulvac Corp Ion source
JP2003528423A (en) * 2000-03-22 2003-09-24 ターレス エレクトロン デバイス ゲゼルシャフト ミット ベシュレンクテル ハフツング Plasma accelerator

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60138250U (en) * 1984-02-24 1985-09-12 財団法人　電力中央研究所 Ion irradiation device
JPS6310432A (en) * 1986-07-01 1988-01-18 Ulvac Corp Ion source
JP2003528423A (en) * 2000-03-22 2003-09-24 ターレス エレクトロン デバイス ゲゼルシャフト ミット ベシュレンクテル ハフツング Plasma accelerator
JP4944336B2 (en) * 2000-03-22 2012-05-30 ターレス エレクトロン デバイス ゲゼルシャフト ミット ベシュレンクテル ハフツング Plasma accelerator

Similar Documents

Publication Publication Date Title
JPS575871A (en) Cathode part of magnetron type sputtering apparatus
EP0144572A3 (en) Magnetron-cathodes for the sputtering of ferromagnetic targets
JPS53121454A (en) Electron source of thin film electric field emission type and its manufacture
GB982669A (en) Improvements in or relating to electron beam generators
JPS5763750A (en) Control picture tube electron gun
JPS55102162A (en) Ion source
JPS53102677A (en) Ion beam radiating unit
JPS57191950A (en) Charged-particle source
JPS57194255A (en) Sputtering device
JPS643941A (en) Ion source
JPS5246300A (en) Ionic source
ES8306305A1 (en) Neutron accelerator tube having improved ionization section
JPS5292473A (en) Main lens electric field forming method of inline type 3 beam electron gun
JPS54102872A (en) Ion etching method
JPS57210551A (en) Triple-pole type ion pump
JPS55141721A (en) Sputtering apparatus for magnetic body
JPS5527040A (en) Medical or lotion water generator
JPS5338966A (en) Magnetron
SU146891A1 (en) Ion source for proton accelerator injectors
JPS5316572A (en) Magnetron
JPS53119067A (en) Electric color emitting display body
JPS5779170A (en) Target for magnetron sputtering
JPS5414154A (en) Electron gun
JPS52115161A (en) Electron gun for electron beam exposing device
JPS56160743A (en) Ion source