NO20083168L - Anordning, system og fremgangsmate for overflatebehandling av substrater - Google Patents
Anordning, system og fremgangsmate for overflatebehandling av substraterInfo
- Publication number
- NO20083168L NO20083168L NO20083168A NO20083168A NO20083168L NO 20083168 L NO20083168 L NO 20083168L NO 20083168 A NO20083168 A NO 20083168A NO 20083168 A NO20083168 A NO 20083168A NO 20083168 L NO20083168 L NO 20083168L
- Authority
- NO
- Norway
- Prior art keywords
- substrate
- conveyor
- moistening
- transport level
- transport
- Prior art date
Links
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C1/00—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
- B05C1/02—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to separate articles
- B05C1/025—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to separate articles to flat rectangular articles, e.g. flat sheets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C1/00—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
- B05C1/04—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length
- B05C1/08—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C1/00—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
- B05C1/04—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length
- B05C1/08—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line
- B05C1/10—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line the liquid or other fluent material being supplied from inside the roller
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C1/00—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
- B05C1/04—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length
- B05C1/16—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length only at particular parts of the work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C13/00—Means for manipulating or holding work, e.g. for separate articles
- B05C13/02—Means for manipulating or holding work, e.g. for separate articles for particular articles
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/6776—Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0085—Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C1/00—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
- B05C1/02—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to separate articles
- B05C1/027—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to separate articles only at particular parts of the articles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C1/00—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
- B05C1/04—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length
- B05C1/08—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line
- B05C1/0808—Details thereof, e.g. surface characteristics
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C1/00—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
- B05C1/04—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length
- B05C1/08—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line
- B05C1/0813—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line characterised by means for supplying liquid or other fluent material to the roller
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C1/00—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
- B05C1/04—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length
- B05C1/16—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length only at particular parts of the work
- B05C1/165—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length only at particular parts of the work using a roller or other rotating member which contacts the work along a generating line
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/01—Tools for processing; Objects used during processing
- H05K2203/0104—Tools for processing; Objects used during processing for patterning or coating
- H05K2203/0143—Using a roller; Specific shape thereof; Providing locally adhesive portions thereon
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/15—Position of the PCB during processing
- H05K2203/1509—Horizontally held PCB
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Coating Apparatus (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Rollers For Roller Conveyors For Transfer (AREA)
- Weting (AREA)
Abstract
Oppfinnelsen angår en innretning (1, 1') for å behandle overflater av silikonskiver (2), omfattende transportrulle (3) for å transportere silikonskivene (2) på et transportplan (5) som bestemmes av transportrullene (3) og minst en transportørinnretning (3a) som fukter silikonskiven (2) med et vannholdig behandlingsmedium (10). Transportørinnretningen (3a) er anordnet på en slik måte under transportplanet (5) at den berører transportplanet for å fukte substratflaten som er innrettet i den nedadgående retning med et behandlingsmedium (10). Transportørinnretningen er i direkte kontakt med substratflaten.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102005062528A DE102005062528A1 (de) | 2005-12-16 | 2005-12-16 | Vorrichtung und Verfahren zur Oberflächenbehandlung von Substraten |
PCT/EP2006/012116 WO2007073886A1 (de) | 2005-12-16 | 2006-12-15 | Vorrichtung, anlage und verfahren zur oberflächenbehandlung von substraten |
Publications (1)
Publication Number | Publication Date |
---|---|
NO20083168L true NO20083168L (no) | 2008-09-10 |
Family
ID=37837006
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NO20083168A NO20083168L (no) | 2005-12-16 | 2008-07-16 | Anordning, system og fremgangsmate for overflatebehandling av substrater |
Country Status (13)
Country | Link |
---|---|
US (1) | US20080311298A1 (no) |
EP (1) | EP1960119B1 (no) |
JP (1) | JP2009519590A (no) |
KR (1) | KR20080082642A (no) |
CN (1) | CN101495242B (no) |
AT (1) | ATE467462T1 (no) |
AU (1) | AU2006331080B2 (no) |
CA (1) | CA2632912A1 (no) |
DE (2) | DE102005062528A1 (no) |
ES (1) | ES2345945T3 (no) |
IL (1) | IL192072A (no) |
NO (1) | NO20083168L (no) |
WO (1) | WO2007073886A1 (no) |
Families Citing this family (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102005062527A1 (de) * | 2005-12-16 | 2007-06-21 | Gebr. Schmid Gmbh & Co. | Vorrichtung und Verfahren zur Oberflächenbehandlung von Substraten |
CN100541730C (zh) * | 2007-07-16 | 2009-09-16 | 无锡尚德太阳能电力有限公司 | 半导体基板表面的化学处理方法及其装置 |
DE102007054093B3 (de) * | 2007-11-13 | 2009-07-23 | Rena Sondermaschinen Gmbh | Vorrichtung und Verfahren zum Transport von flachem Gut in Durchlaufanlagen |
DE102007054090A1 (de) | 2007-11-13 | 2009-05-20 | Rena Sondermaschinen Gmbh | Vorrichtung und Verfahren zur einseitigen Nassbehandlung von Gut |
DE102007063202A1 (de) * | 2007-12-19 | 2009-06-25 | Gebr. Schmid Gmbh & Co. | Verfahren und Vorrichtung zur Behandlung von Silizium-Wafern |
DE102008037404A1 (de) | 2008-09-30 | 2010-04-01 | Schott Solar Ag | Verfahren zur chemischen Behandlung eines Substrats |
DE102009012230B4 (de) * | 2009-03-07 | 2012-07-26 | Deutsche Cell Gmbh | Vorrichtung und Verfahren zum einseitigen Entfernen einer dünnen Schicht von einem Halbleiter-Substrat |
KR101225298B1 (ko) * | 2009-06-26 | 2013-01-22 | 현대제철 주식회사 | 철근 침적장치 |
KR101069600B1 (ko) | 2009-09-01 | 2011-10-05 | 주식회사 케이씨텍 | 부상식 기판 코터 장치 및 그 코팅 방법 |
DE102009050845A1 (de) | 2009-10-19 | 2011-04-21 | Gebr. Schmid Gmbh & Co. | Verfahren und Vorrichtung zur Behandlung einer Substratoberfläche eines Substrats |
KR101081883B1 (ko) | 2009-12-21 | 2011-11-09 | 주식회사 케이씨텍 | 노즐 간극의 정밀제어가 가능한 기판 코터 장치 |
DE102009060931A1 (de) | 2009-12-23 | 2011-06-30 | Gebr. Schmid GmbH & Co., 72250 | Verfahren und Vorrichtung zur Behandlung von Siliziumsubstraten |
US8252619B2 (en) * | 2010-04-23 | 2012-08-28 | Primestar Solar, Inc. | Treatment of thin film layers photovoltaic module manufacture |
KR101279376B1 (ko) * | 2011-07-20 | 2013-07-24 | 주식회사 디엠에스 | 기판처리장치 |
CN103021905B (zh) | 2011-07-20 | 2016-12-21 | 显示器生产服务株式会社 | 基板处理装置 |
DE102011081327A1 (de) | 2011-08-22 | 2013-02-28 | Gebr. Schmid Gmbh | Vorrichtung zur Oberflächenbehandlung von Substraten |
DE102011081980B4 (de) | 2011-09-01 | 2023-07-06 | Gebr. Schmid Gmbh & Co. | Vorrichtung zum Benetzen von flachen Substraten und Anlage mit einer solchen Vorrichtung |
DE102011081981A1 (de) | 2011-09-01 | 2013-03-07 | Gebr. Schmid Gmbh & Co. | Vorrichtung und Anlage zum Bearbeiten von flachen Substraten |
DE102011118441B8 (de) | 2011-11-12 | 2018-10-04 | RENA Technologies GmbH | Anlage und Verfahren zur Behandlung von flachen Substraten |
CN102721704A (zh) * | 2012-06-26 | 2012-10-10 | 潮州三环(集团)股份有限公司 | 电子陶瓷片缺陷自动检测方法及其检测装置 |
DE102012107372B4 (de) | 2012-08-10 | 2017-03-09 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Alkalischer Ätzprozess und Vorrichtung zur Durchführung des Verfahrens |
CN102916075A (zh) * | 2012-09-27 | 2013-02-06 | 奥特斯维能源(太仓)有限公司 | 一种制绒深度稳定的方法 |
DE102013202138A1 (de) * | 2013-02-08 | 2014-08-14 | Gebr. Schmid Gmbh | Vorrichtung zur Substratnassbehandlung und Verwendung |
US9093599B2 (en) | 2013-07-26 | 2015-07-28 | First Solar, Inc. | Vapor deposition apparatus for continuous deposition of multiple thin film layers on a substrate |
DE102013219886A1 (de) | 2013-10-01 | 2015-04-02 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung und Verfahren zur kontinuierlichen Herstellung poröser Siliciumschichten |
DE102013221522A1 (de) | 2013-10-01 | 2015-04-02 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung und Verfahren zur kontinuierlichen Herstellung poröser Siliciumschichten |
CN105624781A (zh) * | 2016-01-14 | 2016-06-01 | 福建福晶科技股份有限公司 | 一种四硼酸锂晶体的制备方法及生长设备 |
DE102016009499A1 (de) | 2016-08-04 | 2018-02-08 | International Solar Energy Research Center Konstanz E.V. | Verfahren und Vorrichtung zum Aufbringen einer Flüssigkeitskappe auf einer Substratoberseite als Schutz der Substratoberseite in einseitigen, horizontalen nasschemischen Behandlungsprozessen |
EP3324426B1 (en) * | 2016-11-16 | 2021-05-05 | ATOTECH Deutschland GmbH | Transport roller |
CN106583141B (zh) * | 2016-12-07 | 2019-07-26 | 孙平 | 一种高效率试剂涂片机 |
CN107282360A (zh) * | 2017-07-20 | 2017-10-24 | 山东长兴木业机械有限公司 | 一种全自动智能单板涂胶生产线 |
JP2022502246A (ja) * | 2018-09-27 | 2022-01-11 | コーニング インコーポレイテッド | 基板を処理する装置及び方法 |
DE202018005633U1 (de) | 2018-12-08 | 2019-03-26 | H2GEMINI Technology Consulting GmbH | Vorrichtung zur selektiven Ätzung von Substraten |
CN112892983B (zh) * | 2021-01-21 | 2021-12-17 | 大余县和锋电子有限公司 | 一种蓝牙头戴耳机包装盒自动上漆设备 |
CN113578649A (zh) * | 2021-08-12 | 2021-11-02 | 成都中建材光电材料有限公司 | 一种涂覆装置 |
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-
2005
- 2005-12-16 DE DE102005062528A patent/DE102005062528A1/de not_active Withdrawn
-
2006
- 2006-12-15 JP JP2008544888A patent/JP2009519590A/ja active Pending
- 2006-12-15 CA CA002632912A patent/CA2632912A1/en not_active Abandoned
- 2006-12-15 AU AU2006331080A patent/AU2006331080B2/en not_active Ceased
- 2006-12-15 EP EP06840992A patent/EP1960119B1/de active Active
- 2006-12-15 AT AT06840992T patent/ATE467462T1/de active
- 2006-12-15 WO PCT/EP2006/012116 patent/WO2007073886A1/de active Application Filing
- 2006-12-15 DE DE502006006950T patent/DE502006006950D1/de active Active
- 2006-12-15 KR KR1020087014379A patent/KR20080082642A/ko active IP Right Grant
- 2006-12-15 CN CN2006800472311A patent/CN101495242B/zh active Active
- 2006-12-15 ES ES06840992T patent/ES2345945T3/es active Active
-
2008
- 2008-06-11 IL IL192072A patent/IL192072A/en not_active IP Right Cessation
- 2008-06-13 US US12/139,317 patent/US20080311298A1/en not_active Abandoned
- 2008-07-16 NO NO20083168A patent/NO20083168L/no not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
AU2006331080A2 (en) | 2008-07-24 |
EP1960119B1 (de) | 2010-05-12 |
ATE467462T1 (de) | 2010-05-15 |
EP1960119A1 (de) | 2008-08-27 |
CA2632912A1 (en) | 2007-07-05 |
KR20080082642A (ko) | 2008-09-11 |
AU2006331080B2 (en) | 2011-03-17 |
CN101495242A (zh) | 2009-07-29 |
US20080311298A1 (en) | 2008-12-18 |
IL192072A (en) | 2012-09-24 |
DE502006006950D1 (de) | 2010-06-24 |
ES2345945T3 (es) | 2010-10-06 |
AU2006331080A1 (en) | 2007-07-05 |
DE102005062528A1 (de) | 2007-06-21 |
JP2009519590A (ja) | 2009-05-14 |
WO2007073886A1 (de) | 2007-07-05 |
IL192072A0 (en) | 2008-12-29 |
CN101495242B (zh) | 2013-03-27 |
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