NO20041298L - Kvartsglassdigel for trekking av silisiumenkeltkrystall og fremgangsmate for fremstilling derav - Google Patents

Kvartsglassdigel for trekking av silisiumenkeltkrystall og fremgangsmate for fremstilling derav

Info

Publication number
NO20041298L
NO20041298L NO20041298A NO20041298A NO20041298L NO 20041298 L NO20041298 L NO 20041298L NO 20041298 A NO20041298 A NO 20041298A NO 20041298 A NO20041298 A NO 20041298A NO 20041298 L NO20041298 L NO 20041298L
Authority
NO
Norway
Prior art keywords
making
single crystal
quartz glass
silicon single
glass crucible
Prior art date
Application number
NO20041298A
Other languages
English (en)
Inventor
Yasuo Ohama
Takayuki Togawa
Original Assignee
Shinetsu Quartz Prod
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Quartz Prod filed Critical Shinetsu Quartz Prod
Publication of NO20041298L publication Critical patent/NO20041298L/no

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould
    • C03B19/095—Other methods of shaping glass by fusing powdered glass in a shaping mould by centrifuging, e.g. arc discharge in rotating mould
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/10—Crucibles or containers for supporting the melt
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10S117/90—Apparatus characterized by composition or treatment thereof, e.g. surface finish, surface coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10—Apparatus
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10—Apparatus
    • Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
    • Y10T117/1032—Seed pulling

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Metallurgy (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Glass Melting And Manufacturing (AREA)
NO20041298A 2002-07-31 2004-03-29 Kvartsglassdigel for trekking av silisiumenkeltkrystall og fremgangsmate for fremstilling derav NO20041298L (no)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002223999A JP4086283B2 (ja) 2002-07-31 2002-07-31 シリコン単結晶引上げ用石英ガラスルツボおよびその製造方法
PCT/EP2003/008422 WO2004013384A1 (en) 2002-07-31 2003-07-30 Quartz glass crucible for pulling up silicon single crystal and method for producing the same

Publications (1)

Publication Number Publication Date
NO20041298L true NO20041298L (no) 2004-03-29

Family

ID=31492122

Family Applications (1)

Application Number Title Priority Date Filing Date
NO20041298A NO20041298L (no) 2002-07-31 2004-03-29 Kvartsglassdigel for trekking av silisiumenkeltkrystall og fremgangsmate for fremstilling derav

Country Status (10)

Country Link
US (1) US7686887B2 (no)
EP (1) EP1532297B1 (no)
JP (1) JP4086283B2 (no)
KR (1) KR100524452B1 (no)
CN (1) CN1302157C (no)
DE (1) DE60316812T2 (no)
NO (1) NO20041298L (no)
SG (1) SG106151A1 (no)
TW (1) TW590992B (no)
WO (1) WO2004013384A1 (no)

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US7383696B2 (en) * 2005-09-08 2008-06-10 Heraeus Shin-Etsu America, Inc. Silica glass crucible with bubble-free and reduced bubble growth wall
US20070084397A1 (en) * 2005-10-19 2007-04-19 General Electric Company Quartz glass crucible and method for treating surface of quartz glass crucible
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US9139932B2 (en) 2006-10-18 2015-09-22 Richard Lee Hansen Quartz glass crucible and method for treating surface of quartz glass crucible
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JP4922233B2 (ja) * 2008-04-30 2012-04-25 ジャパンスーパークォーツ株式会社 石英ガラスルツボ
JP4879220B2 (ja) * 2008-05-28 2012-02-22 ジャパンスーパークォーツ株式会社 石英ガラスルツボとその製造方法
DE102008030310B3 (de) * 2008-06-30 2009-06-18 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung eines Quarzglastiegels
JP5072933B2 (ja) * 2008-10-31 2012-11-14 ジャパンスーパークォーツ株式会社 シリコン単結晶引き上げ用石英ガラスルツボ及びその製造方法並びにシリコン単結晶の製造方法
JP5058138B2 (ja) * 2008-12-09 2012-10-24 ジャパンスーパークォーツ株式会社 シリコン単結晶引き上げ用石英ガラスルツボ
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KR101395859B1 (ko) * 2009-09-10 2014-05-15 쟈판 스파 쿼츠 가부시키가이샤 실리콘 단결정 인상용 실리카 유리 도가니 및 그 제조 방법
JP5453679B2 (ja) * 2009-10-02 2014-03-26 株式会社Ｓｕｍｃｏ シリカガラスルツボの製造装置及びシリカガラスルツボの製造方法
TWI393805B (zh) 2009-11-16 2013-04-21 Masahiro Hoshino Purification method of metallurgical silicon
US9115445B2 (en) 2009-12-11 2015-08-25 Sumco Corporation Vitreous silica crucible
TWI414644B (zh) * 2009-12-14 2013-11-11 Japan Super Quartz Corp 氧化矽玻璃坩堝及其製造方法
TWI397617B (zh) 2010-02-12 2013-06-01 Masahiro Hoshino Metal silicon purification device
DE102010021694A1 (de) 2010-05-27 2011-12-01 Heraeus Quarzglas Gmbh & Co. Kg Quarzglastiegel und Verfahren für dessen Herstellung
JP5453677B2 (ja) * 2010-06-25 2014-03-26 株式会社Ｓｕｍｃｏ シリカガラスルツボ、シリコンインゴットの製造方法
TWI403461B (zh) 2010-07-21 2013-08-01 Masahiro Hoshino Method and apparatus for improving yield and yield of metallurgical silicon
CN102127806B (zh) * 2010-10-28 2012-09-05 杭州先进石英材料有限公司 一种石英玻璃坩埚及其制备方法
JP5685894B2 (ja) 2010-11-05 2015-03-18 信越半導体株式会社 石英ガラスルツボ及びその製造方法、並びにシリコン単結晶の製造方法
JP5605902B2 (ja) * 2010-12-01 2014-10-15 株式会社Ｓｕｍｃｏ シリカガラスルツボの製造方法、シリカガラスルツボ
DE102012100147A1 (de) * 2012-01-10 2012-12-13 Schott Solar Ag Verfahren zur Herstellung von mono-, quasimono- oder multikristallinen Metall- oder Halbmetallkörpern
DE102012109181B4 (de) 2012-09-27 2018-06-28 Heraeus Quarzglas Gmbh & Co. Kg Ziehen eines Halbleiter-Einkristalls nach dem Czochralski-Verfahren und dafür geeigneter Quarzglastiegel
EP2835452A4 (en) * 2013-04-08 2016-02-24 Shinetsu Quartz Prod SILICON DIOXIDE TIP FOR PULLING A SILICONE INCRISTAL AND METHOD FOR THE PRODUCTION THEREOF
CN105239159A (zh) * 2015-09-10 2016-01-13 上海超硅半导体有限公司 直拉法生长单晶硅用石英坩埚的设计及制备方法
CN108977879B (zh) * 2018-09-13 2021-02-26 浙江美晶新材料有限公司 一种单晶用高纯石英坩埚及其制备方法
KR102270393B1 (ko) * 2019-10-22 2021-06-30 에스케이실트론 주식회사 원료 공급 유닛, 이를 포함하는 실리콘 단결정 잉곳의 성장 장치 및 원료 공급 방법
JP7359734B2 (ja) * 2020-04-06 2023-10-11 信越石英株式会社 成型板、石英ガラスるつぼの製造装置及び石英ガラスるつぼの製造方法
CN113832537B (zh) * 2021-09-30 2022-08-26 西安奕斯伟材料科技有限公司 石英坩埚及拉晶炉

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Also Published As

Publication number Publication date
US7686887B2 (en) 2010-03-30
KR20040012472A (ko) 2004-02-11
CN1671891A (zh) 2005-09-21
EP1532297A1 (en) 2005-05-25
DE60316812T2 (de) 2008-07-17
JP4086283B2 (ja) 2008-05-14
KR100524452B1 (ko) 2005-10-26
TW200402399A (en) 2004-02-16
WO2004013384A1 (en) 2004-02-12
JP2004059410A (ja) 2004-02-26
SG106151A1 (en) 2004-09-30
EP1532297B1 (en) 2007-10-10
CN1302157C (zh) 2007-02-28
TW590992B (en) 2004-06-11
DE60316812D1 (de) 2007-11-22
US20050235907A1 (en) 2005-10-27

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