NO139458C - Lysfoelsomt o-kinondiazid-kopieringssjikt som for farveendring ytterligere inneholder et lysfoelsomt farvestoff - Google Patents

Lysfoelsomt o-kinondiazid-kopieringssjikt som for farveendring ytterligere inneholder et lysfoelsomt farvestoff

Info

Publication number
NO139458C
NO139458C NO742238A NO742238A NO139458C NO 139458 C NO139458 C NO 139458C NO 742238 A NO742238 A NO 742238A NO 742238 A NO742238 A NO 742238A NO 139458 C NO139458 C NO 139458C
Authority
NO
Norway
Prior art keywords
light
sensitive
kinondiazide
additionally contains
layer additionally
Prior art date
Application number
NO742238A
Other languages
English (en)
Norwegian (no)
Other versions
NO742238L (de
NO139458B (no
Inventor
Paul Stahlhofen
Rainer Beutel
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of NO742238L publication Critical patent/NO742238L/no
Publication of NO139458B publication Critical patent/NO139458B/no
Publication of NO139458C publication Critical patent/NO139458C/no

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Color Printing (AREA)
NO742238A 1973-06-20 1974-06-19 Lysfoelsomt o-kinondiazid-kopieringssjikt som for farveendring ytterligere inneholder et lysfoelsomt farvestoff NO139458C (no)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2331377A DE2331377C2 (de) 1973-06-20 1973-06-20 Lichtempfindliches Kopiermaterial

Publications (3)

Publication Number Publication Date
NO742238L NO742238L (de) 1975-01-13
NO139458B NO139458B (no) 1978-12-04
NO139458C true NO139458C (no) 1979-03-14

Family

ID=5884548

Family Applications (1)

Application Number Title Priority Date Filing Date
NO742238A NO139458C (no) 1973-06-20 1974-06-19 Lysfoelsomt o-kinondiazid-kopieringssjikt som for farveendring ytterligere inneholder et lysfoelsomt farvestoff

Country Status (20)

Country Link
US (1) US3969118A (de)
JP (1) JPS5652301B2 (de)
AR (1) AR199440A1 (de)
AT (1) AT331636B (de)
BE (1) BE816580A (de)
BR (1) BR7404981D0 (de)
CA (1) CA1046332A (de)
CH (1) CH601842A5 (de)
CS (1) CS167209B2 (de)
DE (1) DE2331377C2 (de)
DK (1) DK144345C (de)
ES (1) ES427391A1 (de)
FI (1) FI58221C (de)
FR (1) FR2234584B1 (de)
GB (1) GB1463717A (de)
IT (1) IT1016063B (de)
NL (1) NL177353C (de)
NO (1) NO139458C (de)
SE (1) SE391404B (de)
ZA (1) ZA743882B (de)

Families Citing this family (74)

* Cited by examiner, † Cited by third party
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DE2641100A1 (de) * 1976-09-13 1978-03-16 Hoechst Ag Lichtempfindliche kopierschicht
US4108664A (en) * 1976-11-01 1978-08-22 Gaf Corporation Light-sensitive negative-working film containing a diazo oxide sensitizer and a p-toluenesulfonyl halide or a 2,4-dihalo-S-triazine
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GB2005855A (en) * 1977-10-03 1979-04-25 Polychrome Corp Lithographic imaging composition having improved image visibility
US4212935A (en) * 1978-02-24 1980-07-15 International Business Machines Corporation Method of modifying the development profile of photoresists
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DE2847878A1 (de) * 1978-11-04 1980-05-22 Hoechst Ag Lichtempfindliches gemisch
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DE3100077A1 (de) 1981-01-03 1982-08-05 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch, das einen naphthochinondiazidsulfonsaeureester enthaelt, und verfahren zur herstellung des naphthochinondiazidsulfonsaeureesters
AU8021782A (en) * 1981-02-20 1982-08-26 Polychrome Corp. Non-silver positive working radiation sensitive compositions
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US4348471A (en) * 1981-06-15 1982-09-07 Polychrome Corporation Positive acting composition yielding pre-development high visibility image after radiation exposure comprising acid free novolak, diazo oxide and acid sensitive dyestuff
DE3144480A1 (de) * 1981-11-09 1983-05-19 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial
DE3144499A1 (de) * 1981-11-09 1983-05-19 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial
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DE3510220A1 (de) * 1985-03-21 1986-09-25 Hoechst Ag, 6230 Frankfurt Positiv arbeitende strahlungsempfindliche beschichtungsloesung
DE3582697D1 (de) * 1984-06-07 1991-06-06 Hoechst Ag Positiv arbeitende strahlungsempfindliche beschichtungsloesung.
DE3445276A1 (de) * 1984-12-12 1986-06-19 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches gemisch, daraus hergestelltes lichtempfindliches aufzeichnungsmaterial und verfahren zur herstellung einer flachdruckform
US4672021A (en) * 1985-06-03 1987-06-09 Fairmount Chemical Company Contrast enhancement layer composition with naphthoquinone diazide, indicator dye and polymeric binder
JPS6478249A (en) * 1987-09-18 1989-03-23 Fuji Photo Film Co Ltd Photosensitive material and image forming method
JPH07120045B2 (ja) * 1987-10-22 1995-12-20 富士写真フイルム株式会社 パターン形成方法
JPH01142721A (ja) * 1987-11-30 1989-06-05 Fujitsu Ltd ポジ型感光性パターン形成材料およびパターン形成方法
US5250669A (en) * 1987-12-04 1993-10-05 Wako Pure Chemical Industries, Ltd. Photosensitive compound
US5272026A (en) * 1987-12-18 1993-12-21 Ucb S.A. Negative image process utilizing photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester or phenolic resin with diazoquinone sulfonic acid or diazoquinone carboxylic acid, and associated imaged article
GB8729510D0 (en) * 1987-12-18 1988-02-03 Ucb Sa Photosensitive compositions containing phenolic resins & diazoquinone compounds
JP2623309B2 (ja) * 1988-02-22 1997-06-25 ユーシービー ソシエテ アノニム レジストパターンを得る方法
DE69029104T2 (de) 1989-07-12 1997-03-20 Fuji Photo Film Co Ltd Polysiloxane und positiv arbeitende Resistmasse
US5002856A (en) * 1989-08-02 1991-03-26 E. I. Du Pont De Nemours And Company Thermally stable carbazole diazonium salts as sources of photo-initiated strong acid
US5206110A (en) * 1991-02-04 1993-04-27 Ocg Microelectronic Materials, Inc. Negative-working radiation-sensitive mixtures containing cyclized rubber polymer and contrast enhancing azo dye
US5250392A (en) * 1991-02-04 1993-10-05 Ocg Microelectronic Materials, Inc. Process of developing a negative-working radiation-sensitive photoresist containing cyclized rubber polymer and contrast enhancing azo dye
DE4110057A1 (de) * 1991-03-27 1992-10-01 Hoechst Ag Verfahren zur herstellung eines mehrfarben-pruefbildes und hierfuer geeignetes strahlungsempfindliches aufzeichnungsmaterial
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法
GB2277382A (en) * 1993-04-19 1994-10-26 Pan Graphics Ind Limited Photoresist composition
GB9326150D0 (en) * 1993-12-22 1994-02-23 Alcan Int Ltd Electrochemical roughening method
JP3290316B2 (ja) 1994-11-18 2002-06-10 富士写真フイルム株式会社 感光性平版印刷版
DE69905959T2 (de) 1998-04-06 2003-12-04 Fuji Photo Film Co Ltd Lichtempfindliche Harzzusammensetzung
ATE439235T1 (de) 1999-05-21 2009-08-15 Fujifilm Corp Lichtempfindliche zusammensetzung und flachdruckplattenbasis damit
US6296982B1 (en) * 1999-11-19 2001-10-02 Kodak Polychrome Graphics Llc Imaging articles
JP2001264979A (ja) * 2000-03-22 2001-09-28 Fuji Photo Film Co Ltd ポジ型感光性平版印刷版
DE60137398D1 (de) 2000-11-30 2009-03-05 Fujifilm Corp Lithographische Druckplattenvorläufer
US20040067435A1 (en) 2002-09-17 2004-04-08 Fuji Photo Film Co., Ltd. Image forming material
EP1619023B1 (de) 2004-07-20 2008-06-11 FUJIFILM Corporation Bilderzeugendes Material
JP2006058430A (ja) 2004-08-18 2006-03-02 Fuji Photo Film Co Ltd 平版印刷版原版
JP4404734B2 (ja) 2004-09-27 2010-01-27 富士フイルム株式会社 平版印刷版原版
JP4474296B2 (ja) 2005-02-09 2010-06-02 富士フイルム株式会社 平版印刷版原版
JP4404792B2 (ja) 2005-03-22 2010-01-27 富士フイルム株式会社 平版印刷版原版
US8196312B2 (en) 2006-05-18 2012-06-12 Fujifilm Corporation Drying method and apparatus for drying object
JP2009083106A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版用版面保護剤及び平版印刷版の製版方法
JP2009085984A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版原版
JP4890403B2 (ja) 2007-09-27 2012-03-07 富士フイルム株式会社 平版印刷版原版
JP4790682B2 (ja) 2007-09-28 2011-10-12 富士フイルム株式会社 平版印刷版原版
JP4994175B2 (ja) 2007-09-28 2012-08-08 富士フイルム株式会社 平版印刷版原版、及びそれに用いる共重合体の製造方法
CN101855026A (zh) 2007-11-14 2010-10-06 富士胶片株式会社 干燥涂布膜的方法和制造平版印刷版前体的方法
JP2009236355A (ja) 2008-03-26 2009-10-15 Fujifilm Corp 乾燥方法及び装置
JP5164640B2 (ja) 2008-04-02 2013-03-21 富士フイルム株式会社 平版印刷版原版
JP5183380B2 (ja) 2008-09-09 2013-04-17 富士フイルム株式会社 赤外線レーザ用感光性平版印刷版原版
JP2010237435A (ja) 2009-03-31 2010-10-21 Fujifilm Corp 平版印刷版原版
EP2481603A4 (de) 2009-09-24 2015-11-18 Fujifilm Corp Lithografische originaldruckplatte
US8828648B2 (en) 2010-02-17 2014-09-09 Fujifilm Corporation Method for producing a planographic printing plate
JP5253433B2 (ja) 2010-02-19 2013-07-31 富士フイルム株式会社 平版印刷版の作製方法
EP2555054B1 (de) 2010-03-31 2018-06-20 FUJIFILM Corporation Verfahren zur herstellung einer lithographischen druckplatte und druckverfahren
JP5490168B2 (ja) 2012-03-23 2014-05-14 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP5512730B2 (ja) 2012-03-30 2014-06-04 富士フイルム株式会社 平版印刷版の作製方法
US11675266B2 (en) * 2021-04-15 2023-06-13 Industrial Technology Research Institute Photosensitive compound, photosensitive composition, and patterning method

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Also Published As

Publication number Publication date
AU7015774A (en) 1975-12-18
ATA508274A (de) 1975-11-15
DE2331377C2 (de) 1982-10-14
DK144345C (da) 1982-07-19
SE391404B (sv) 1977-02-14
BR7404981D0 (pt) 1975-09-30
CS167209B2 (de) 1976-04-29
ZA743882B (en) 1975-06-25
IT1016063B (it) 1977-05-30
FR2234584B1 (de) 1981-09-18
ES427391A1 (es) 1977-03-01
BE816580A (fr) 1974-12-19
JPS5652301B2 (de) 1981-12-11
AR199440A1 (es) 1974-08-30
CH601842A5 (de) 1978-07-14
DE2331377A1 (de) 1975-01-16
FI58221C (fi) 1980-12-10
DK144345B (da) 1982-02-22
SE7407871L (de) 1974-12-23
JPS5036209A (de) 1975-04-05
DK327274A (de) 1975-03-03
NL177353B (nl) 1985-04-01
FR2234584A1 (de) 1975-01-17
US3969118A (en) 1976-07-13
FI186074A (de) 1974-12-21
NL177353C (nl) 1985-09-02
NL7407678A (de) 1974-12-24
CA1046332A (en) 1979-01-16
NO742238L (de) 1975-01-13
AT331636B (de) 1976-08-25
NO139458B (no) 1978-12-04
GB1463717A (en) 1977-02-09
FI58221B (fi) 1980-08-29

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