NL194380B - Dunnefilmtransistor voor vloeibaarkristalweergeefinrichting en werkwijze voor het fabriceren daarvan. - Google Patents
Dunnefilmtransistor voor vloeibaarkristalweergeefinrichting en werkwijze voor het fabriceren daarvan.Info
- Publication number
- NL194380B NL194380B NL9302256A NL9302256A NL194380B NL 194380 B NL194380 B NL 194380B NL 9302256 A NL9302256 A NL 9302256A NL 9302256 A NL9302256 A NL 9302256A NL 194380 B NL194380 B NL 194380B
- Authority
- NL
- Netherlands
- Prior art keywords
- manufacturing
- liquid crystal
- thin film
- crystal display
- film transistor
- Prior art date
Links
- 239000004973 liquid crystal related substance Substances 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000010409 thin film Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Thin Film Transistor (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP34760292A JPH06202148A (ja) | 1992-12-28 | 1992-12-28 | 液晶表示装置用薄膜トランジスタ及びその製造方法 |
JP34760192 | 1992-12-28 | ||
JP34760292 | 1992-12-28 | ||
JP34760192A JPH06202147A (ja) | 1992-12-28 | 1992-12-28 | 液晶表示装置用薄膜トランジスタ及びその製造方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
NL9302256A NL9302256A (nl) | 1994-07-18 |
NL194380B true NL194380B (nl) | 2001-10-01 |
NL194380C NL194380C (nl) | 2002-02-04 |
Family
ID=26578557
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL9302256A NL194380C (nl) | 1992-12-28 | 1993-12-24 | Dunnefilmtransistor voor vloeibaarkristalweergeefinrichting en werkwijze voor het fabriceren daarvan. |
Country Status (3)
Country | Link |
---|---|
US (1) | US5539551A (nl) |
KR (1) | KR0138081B1 (nl) |
NL (1) | NL194380C (nl) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2738289B2 (ja) * | 1993-12-30 | 1998-04-08 | 日本電気株式会社 | 液晶表示装置の製造方法 |
FR2721428B1 (fr) * | 1994-06-17 | 1996-09-13 | France Telecom | Ecran d'affichage à matrice active à commande multiplexée. |
JP3240858B2 (ja) * | 1994-10-19 | 2001-12-25 | ソニー株式会社 | カラー表示装置 |
KR0171102B1 (ko) * | 1995-08-29 | 1999-03-20 | 구자홍 | 액정표시장치 구조 및 제조방법 |
US5835177A (en) * | 1995-10-05 | 1998-11-10 | Kabushiki Kaisha Toshiba | Array substrate with bus lines takeout/terminal sections having multiple conductive layers |
JP3222762B2 (ja) * | 1996-04-26 | 2001-10-29 | シャープ株式会社 | アクティブマトリクス基板およびその製造方法 |
US5670062A (en) * | 1996-06-07 | 1997-09-23 | Lucent Technologies Inc. | Method for producing tapered lines |
KR100476622B1 (ko) * | 1997-10-13 | 2005-08-23 | 삼성전자주식회사 | 몰리브덴-텅스턴합금을사용한배선을이용한액정표시장치및그제조방법 |
KR100303446B1 (ko) * | 1998-10-29 | 2002-10-04 | 삼성전자 주식회사 | 액정표시장치용박막트랜지스터기판의제조방법 |
KR100739366B1 (ko) * | 1999-12-20 | 2007-07-16 | 엘지.필립스 엘시디 주식회사 | 박막 트랜지스터 및 그 제조방법 |
JP2001194676A (ja) * | 2000-01-07 | 2001-07-19 | Hitachi Ltd | 液晶表示装置 |
TW504846B (en) * | 2000-06-28 | 2002-10-01 | Semiconductor Energy Lab | Semiconductor device and manufacturing method thereof |
TW525216B (en) * | 2000-12-11 | 2003-03-21 | Semiconductor Energy Lab | Semiconductor device, and manufacturing method thereof |
SG111923A1 (en) | 2000-12-21 | 2005-06-29 | Semiconductor Energy Lab | Light emitting device and method of manufacturing the same |
SG116443A1 (en) * | 2001-03-27 | 2005-11-28 | Semiconductor Energy Lab | Wiring and method of manufacturing the same, and wiring board and method of manufacturing the same. |
KR100617290B1 (ko) * | 2003-12-30 | 2006-08-30 | 엘지.필립스 엘시디 주식회사 | 반사투과형 액정표시장치용 어레이기판과 그 제조방법 |
KR100978264B1 (ko) * | 2006-12-26 | 2010-08-26 | 엘지디스플레이 주식회사 | 반사투과형 액정표시장치 및 그 제조방법 |
US8110829B2 (en) * | 2007-05-31 | 2012-02-07 | Lg Display Co., Ltd. | Array substrate of liquid crystal display and method for fabricating the same |
US8084859B2 (en) * | 2007-10-12 | 2011-12-27 | Panasonic Corporation | Semiconductor device |
JP2009103732A (ja) * | 2007-10-19 | 2009-05-14 | Sony Corp | 表示装置およびその製造方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5461875A (en) * | 1977-10-27 | 1979-05-18 | Sony Corp | Etching method of aluminum wiring |
JPS6014473A (ja) * | 1983-07-05 | 1985-01-25 | Asahi Glass Co Ltd | 薄膜トランジスタの電極構造 |
JPS6077420A (ja) * | 1983-10-04 | 1985-05-02 | Seiko Epson Corp | 半導体装置 |
JPH01144682A (ja) * | 1987-11-30 | 1989-06-06 | Nec Corp | 薄膜トランジスタの製造方法 |
JPH039569A (ja) * | 1989-06-07 | 1991-01-17 | Toshiba Corp | 薄膜トランジスタ |
US5162933A (en) * | 1990-05-16 | 1992-11-10 | Nippon Telegraph And Telephone Corporation | Active matrix structure for liquid crystal display elements wherein each of the gate/data lines includes at least a molybdenum-base alloy layer containing 0.5 to 10 wt. % of chromium |
JPH04111322A (ja) * | 1990-08-30 | 1992-04-13 | Stanley Electric Co Ltd | 薄膜トランジスタの製造方法 |
US5198694A (en) * | 1990-10-05 | 1993-03-30 | General Electric Company | Thin film transistor structure with improved source/drain contacts |
JPH04505832A (ja) * | 1990-10-05 | 1992-10-08 | ゼネラル・エレクトリック・カンパニイ | 改良されたソース/ドレイン接点を持つ薄膜トランジスタ構造 |
JP2690404B2 (ja) * | 1991-03-07 | 1997-12-10 | シャープ株式会社 | アクティブマトリクス基板 |
JP2952075B2 (ja) * | 1991-06-12 | 1999-09-20 | キヤノン株式会社 | 液晶素子の製造法 |
-
1993
- 1993-12-16 US US08/168,644 patent/US5539551A/en not_active Expired - Lifetime
- 1993-12-24 NL NL9302256A patent/NL194380C/nl not_active IP Right Cessation
- 1993-12-27 KR KR1019930030057A patent/KR0138081B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR940016621A (ko) | 1994-07-23 |
US5539551A (en) | 1996-07-23 |
KR0138081B1 (ko) | 1998-06-15 |
NL194380C (nl) | 2002-02-04 |
NL9302256A (nl) | 1994-07-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A1A | A request for search or an international-type search has been filed | ||
BB | A search report has been drawn up | ||
BC | A request for examination has been filed | ||
V1 | Lapsed because of non-payment of the annual fee |
Effective date: 20090701 |