NL193801C - Inrichting voor het verwarmen van een cirkelvormig substraat. - Google Patents

Inrichting voor het verwarmen van een cirkelvormig substraat. Download PDF

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Publication number
NL193801C
NL193801C NL8602358A NL8602358A NL193801C NL 193801 C NL193801 C NL 193801C NL 8602358 A NL8602358 A NL 8602358A NL 8602358 A NL8602358 A NL 8602358A NL 193801 C NL193801 C NL 193801C
Authority
NL
Netherlands
Prior art keywords
substrate
chamber
support member
heating
uniform
Prior art date
Application number
NL8602358A
Other languages
English (en)
Dutch (nl)
Other versions
NL8602358A (nl
NL193801B (nl
Original Assignee
Asm America
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asm America filed Critical Asm America
Publication of NL8602358A publication Critical patent/NL8602358A/nl
Publication of NL193801B publication Critical patent/NL193801B/xx
Application granted granted Critical
Publication of NL193801C publication Critical patent/NL193801C/nl

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/10—Heating of the reaction chamber or the substrate
    • C30B25/105—Heating of the reaction chamber or the substrate by irradiation or electric discharge

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
NL8602358A 1985-10-07 1986-09-17 Inrichting voor het verwarmen van een cirkelvormig substraat. NL193801C (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US78473985 1985-10-07
US06/784,739 US4654509A (en) 1985-10-07 1985-10-07 Method and apparatus for substrate heating in an axially symmetric epitaxial deposition apparatus

Publications (3)

Publication Number Publication Date
NL8602358A NL8602358A (nl) 1987-05-04
NL193801B NL193801B (nl) 2000-07-03
NL193801C true NL193801C (nl) 2000-11-06

Family

ID=25133382

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8602358A NL193801C (nl) 1985-10-07 1986-09-17 Inrichting voor het verwarmen van een cirkelvormig substraat.

Country Status (6)

Country Link
US (1) US4654509A (de)
JP (1) JP2545371B2 (de)
DE (1) DE3634131C2 (de)
FR (1) FR2606880B3 (de)
GB (1) GB2181459B (de)
NL (1) NL193801C (de)

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US4755654A (en) * 1987-03-26 1988-07-05 Crowley John L Semiconductor wafer heating chamber
US5198034A (en) * 1987-03-31 1993-03-30 Epsilon Technology, Inc. Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment
US4993355A (en) * 1987-03-31 1991-02-19 Epsilon Technology, Inc. Susceptor with temperature sensing device
US4821674A (en) * 1987-03-31 1989-04-18 Deboer Wiebe B Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment
US4975561A (en) * 1987-06-18 1990-12-04 Epsilon Technology Inc. Heating system for substrates
US4836138A (en) * 1987-06-18 1989-06-06 Epsilon Technology, Inc. Heating system for reaction chamber of chemical vapor deposition equipment
US5156820A (en) * 1989-05-15 1992-10-20 Rapro Technology, Inc. Reaction chamber with controlled radiant energy heating and distributed reactant flow
US5044943A (en) * 1990-08-16 1991-09-03 Applied Materials, Inc. Spoked susceptor support for enhanced thermal uniformity of susceptor in semiconductor wafer processing apparatus
DE4202944C2 (de) * 1992-02-01 1994-07-14 Heraeus Quarzglas Verfahren und Vorrichtung zum Erwärmen eines Materials
US5370739A (en) * 1992-06-15 1994-12-06 Materials Research Corporation Rotating susceptor semiconductor wafer processing cluster tool module useful for tungsten CVD
US5434110A (en) * 1992-06-15 1995-07-18 Materials Research Corporation Methods of chemical vapor deposition (CVD) of tungsten films on patterned wafer substrates
DE4306398A1 (de) * 1993-03-02 1994-09-08 Leybold Ag Vorrichtung zum Erwärmen eines Substrates
US5318801A (en) * 1993-05-18 1994-06-07 United States Of America As Represented By The Secretary Of The Navy Substrate temperature control apparatus and technique for CVD reactors
US6113702A (en) * 1995-09-01 2000-09-05 Asm America, Inc. Wafer support system
WO1997009737A1 (en) 1995-09-01 1997-03-13 Advanced Semiconductor Materials America, Inc. Wafer support system
DE19547601A1 (de) * 1995-12-20 1997-06-26 Sel Alcatel Ag Vorrichtung zum Sintern von porösen Schichten
JP3166065B2 (ja) * 1996-02-08 2001-05-14 東京エレクトロン株式会社 処理装置及び処理方法
JP3493880B2 (ja) * 1996-02-28 2004-02-03 信越半導体株式会社 輻射加熱装置および加熱方法
TW406454B (en) * 1996-10-10 2000-09-21 Berg Tech Inc High density connector and method of manufacture
US6067931A (en) * 1996-11-04 2000-05-30 General Electric Company Thermal processor for semiconductor wafers
US5792273A (en) * 1997-05-27 1998-08-11 Memc Electric Materials, Inc. Secondary edge reflector for horizontal reactor
US5960158A (en) * 1997-07-11 1999-09-28 Ag Associates Apparatus and method for filtering light in a thermal processing chamber
TW428290B (en) * 1998-03-02 2001-04-01 Steag Rtp Systems Gmbh Heat treatment device for substrate
US6301434B1 (en) 1998-03-23 2001-10-09 Mattson Technology, Inc. Apparatus and method for CVD and thermal processing of semiconductor substrates
US5970214A (en) * 1998-05-14 1999-10-19 Ag Associates Heating device for semiconductor wafers
US5930456A (en) * 1998-05-14 1999-07-27 Ag Associates Heating device for semiconductor wafers
US6127658A (en) * 1998-08-04 2000-10-03 Steag C.V.D. Systems, Ltd. Wafer heating apparatus and method with radiation absorptive peripheral barrier blocking stray radiation
US6210484B1 (en) 1998-09-09 2001-04-03 Steag Rtp Systems, Inc. Heating device containing a multi-lamp cone for heating semiconductor wafers
US6108491A (en) * 1998-10-30 2000-08-22 Applied Materials, Inc. Dual surface reflector
US6771895B2 (en) * 1999-01-06 2004-08-03 Mattson Technology, Inc. Heating device for heating semiconductor wafers in thermal processing chambers
US6281141B1 (en) 1999-02-08 2001-08-28 Steag Rtp Systems, Inc. Process for forming thin dielectric layers in semiconductor devices
DE19923400A1 (de) 1999-05-21 2000-11-30 Steag Rtp Systems Gmbh Vorrichtung und Verfahren zum thermischen Behandeln von Substraten
US6666924B1 (en) * 2000-03-28 2003-12-23 Asm America Reaction chamber with decreased wall deposition
US6476362B1 (en) 2000-09-12 2002-11-05 Applied Materials, Inc. Lamp array for thermal processing chamber
DE10051125A1 (de) 2000-10-16 2002-05-02 Steag Rtp Systems Gmbh Vorrichtung zum thermischen Behandeln von Substraten
US7108753B2 (en) * 2003-10-29 2006-09-19 Asm America, Inc. Staggered ribs on process chamber to reduce thermal effects
US20060093756A1 (en) * 2004-11-03 2006-05-04 Nagarajan Rajagopalan High-power dielectric seasoning for stable wafer-to-wafer thickness uniformity of dielectric CVD films
US7396415B2 (en) * 2005-06-02 2008-07-08 Asm America, Inc. Apparatus and methods for isolating chemical vapor reactions at a substrate surface
US8092606B2 (en) * 2007-12-18 2012-01-10 Asm Genitech Korea Ltd. Deposition apparatus
US10000965B2 (en) 2010-01-16 2018-06-19 Cardinal Cg Company Insulating glass unit transparent conductive coating technology
US10000411B2 (en) 2010-01-16 2018-06-19 Cardinal Cg Company Insulating glass unit transparent conductivity and low emissivity coating technology
US10060180B2 (en) 2010-01-16 2018-08-28 Cardinal Cg Company Flash-treated indium tin oxide coatings, production methods, and insulating glass unit transparent conductive coating technology
JP2015072937A (ja) * 2013-10-01 2015-04-16 株式会社東芝 半導体製造装置、半導体製造方法及びプロセスチューブ
US11028012B2 (en) 2018-10-31 2021-06-08 Cardinal Cg Company Low solar heat gain coatings, laminated glass assemblies, and methods of producing same
US11680338B2 (en) 2019-12-19 2023-06-20 Applied Materials, Inc. Linear lamp array for improved thermal uniformity and profile control

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GB219077A (en) * 1923-04-16 1924-07-16 Charles Ashmore Baker Improvements in electrically heated ovens
GB611141A (en) * 1946-04-23 1948-10-26 Townson & Mercer Ltd Improvements in or relating to electrically boost-heated ovens
GB770955A (en) * 1954-04-09 1957-03-27 Ohio Commw Eng Co Improvements in the surface coating and impregnation of metal surfaces
GB1291357A (en) * 1970-11-03 1972-10-04 Applied Materials Tech Improvements in or relating to radiation heated reactors
FR2126127B1 (de) * 1971-02-26 1973-05-11 Cadillac France
US3836751A (en) * 1973-07-26 1974-09-17 Applied Materials Inc Temperature controlled profiling heater
US4081313A (en) * 1975-01-24 1978-03-28 Applied Materials, Inc. Process for preparing semiconductor wafers with substantially no crystallographic slip
US4101759A (en) * 1976-10-26 1978-07-18 General Electric Company Semiconductor body heater
JPS56124437A (en) * 1980-03-07 1981-09-30 Chiyou Lsi Gijutsu Kenkyu Kumiai Gas phase chemical reaction apparatus
JPS59928A (ja) * 1982-06-25 1984-01-06 Ushio Inc 光加熱装置
JPS5959876A (ja) * 1982-09-30 1984-04-05 Ushio Inc 光照射炉の運転方法
JPS5977289A (ja) * 1982-10-26 1984-05-02 ウシオ電機株式会社 光照射炉
US4511788A (en) * 1983-02-09 1985-04-16 Ushio Denki Kabushiki Kaisha Light-radiant heating furnace
JPS59139898U (ja) * 1983-03-10 1984-09-18 ウシオ電機株式会社 光照射炉
GB2136937A (en) * 1983-03-18 1984-09-26 Philips Electronic Associated A furnace for rapidly heating semiconductor bodies
JPS60116778A (ja) * 1983-11-23 1985-06-24 ジエミニ　リサーチ，インコーポレイテツド 化学蒸着方法及び装置
FR2594529B1 (fr) * 1986-02-19 1990-01-26 Bertin & Cie Appareil pour traitements thermiques de pieces minces, telles que des plaquettes de silicium

Also Published As

Publication number Publication date
NL8602358A (nl) 1987-05-04
US4654509A (en) 1987-03-31
GB8623977D0 (en) 1986-11-12
FR2606880A1 (fr) 1988-05-20
JPS6293378A (ja) 1987-04-28
FR2606880B3 (fr) 1989-06-16
DE3634131C2 (de) 2001-10-04
NL193801B (nl) 2000-07-03
GB2181459A (en) 1987-04-23
GB2181459B (en) 1990-04-25
DE3634131A1 (de) 1987-04-09
JP2545371B2 (ja) 1996-10-16

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Date Code Title Description
BA A request for search or an international-type search has been filed
CNR Transfer of rights (patent application after its laying open for public inspection)

Free format text: ADVANCED SEMICONDUCTOR MATERIALS AMERICA, INC.

BB A search report has been drawn up
BC A request for examination has been filed
CNR Transfer of rights (patent application after its laying open for public inspection)

Free format text: ASM AMERICA, INC.

V1 Lapsed because of non-payment of the annual fee

Effective date: 20020401

V1 Lapsed because of non-payment of the annual fee

Effective date: 20020401