NL185591C - Werkwijze voor het vervaardigen van een geintegreerde halfgeleiderschakeling van tenminste een veldeffecttransistor met een geisoleerde poortelektrode van een eerste soort en van tenminste een veldeffecttransistor met een geisoleerde poortelektrode van de voor de eerste soort complementaire tweede soort. - Google Patents
Werkwijze voor het vervaardigen van een geintegreerde halfgeleiderschakeling van tenminste een veldeffecttransistor met een geisoleerde poortelektrode van een eerste soort en van tenminste een veldeffecttransistor met een geisoleerde poortelektrode van de voor de eerste soort complementaire tweede soort.Info
- Publication number
- NL185591C NL185591C NL7506288A NL7506288A NL185591C NL 185591 C NL185591 C NL 185591C NL 7506288 A NL7506288 A NL 7506288A NL 7506288 A NL7506288 A NL 7506288A NL 185591 C NL185591 C NL 185591C
- Authority
- NL
- Netherlands
- Prior art keywords
- prevention
- sector
- field effect
- effect transistor
- manufacturing
- Prior art date
Links
- 230000002265 prevention Effects 0.000 title 21
- 230000005669 field effect Effects 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/76202—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO
- H01L21/76213—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO introducing electrical inactive or active impurities in the local oxidation region, e.g. to alter LOCOS oxide growth characteristics or for additional isolation purpose
- H01L21/76216—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO introducing electrical inactive or active impurities in the local oxidation region, e.g. to alter LOCOS oxide growth characteristics or for additional isolation purpose introducing electrical active impurities in the local oxidation region for the sole purpose of creating channel stoppers
- H01L21/76218—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO introducing electrical inactive or active impurities in the local oxidation region, e.g. to alter LOCOS oxide growth characteristics or for additional isolation purpose introducing electrical active impurities in the local oxidation region for the sole purpose of creating channel stoppers introducing both types of electrical active impurities in the local oxidation region for the sole purpose of creating channel stoppers, e.g. for isolation of complementary doped regions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/8238—Complementary field-effect transistors, e.g. CMOS
- H01L21/823878—Complementary field-effect transistors, e.g. CMOS isolation region manufacturing related aspects, e.g. to avoid interaction of isolation region with adjacent structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/8238—Complementary field-effect transistors, e.g. CMOS
- H01L21/823892—Complementary field-effect transistors, e.g. CMOS with a particular manufacturing method of the wells or tubs, e.g. twin tubs, high energy well implants, buried implanted layers for lateral isolation [BILLI]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
- H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
- H01L27/092—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors
- H01L27/0927—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors comprising a P-well only in the substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Local Oxidation Of Silicon (AREA)
- Bipolar Transistors (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US47535874A | 1974-06-03 | 1974-06-03 |
Publications (2)
Publication Number | Publication Date |
---|---|
NL7506288A NL7506288A (nl) | 1975-12-05 |
NL185591C true NL185591C (nl) | 1990-05-16 |
Family
ID=23887225
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL7506288A NL185591C (nl) | 1974-06-03 | 1975-05-28 | Werkwijze voor het vervaardigen van een geintegreerde halfgeleiderschakeling van tenminste een veldeffecttransistor met een geisoleerde poortelektrode van een eerste soort en van tenminste een veldeffecttransistor met een geisoleerde poortelektrode van de voor de eerste soort complementaire tweede soort. |
Country Status (8)
Country | Link |
---|---|
JP (1) | JPS5619746B2 (nl) |
CA (1) | CA1017073A (nl) |
DE (1) | DE2523379C2 (nl) |
FR (1) | FR2275888A1 (nl) |
GB (1) | GB1499548A (nl) |
HK (1) | HK27981A (nl) |
IT (1) | IT1032951B (nl) |
NL (1) | NL185591C (nl) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5160466A (en) * | 1974-11-22 | 1976-05-26 | Hitachi Ltd | Handotaisochino seizohoho |
JPS5286083A (en) * | 1976-01-12 | 1977-07-16 | Hitachi Ltd | Production of complimentary isolation gate field effect transistor |
DE2945854A1 (de) * | 1979-11-13 | 1981-05-21 | Deutsche Itt Industries Gmbh, 7800 Freiburg | Ionenimplantationsverfahren |
US4345366A (en) * | 1980-10-20 | 1982-08-24 | Ncr Corporation | Self-aligned all-n+ polysilicon CMOS process |
JPS5955054A (ja) * | 1982-09-24 | 1984-03-29 | Hitachi Ltd | 半導体装置の製造方法 |
JPH0636425B2 (ja) * | 1983-02-23 | 1994-05-11 | テキサス インスツルメンツ インコ−ポレイテツド | Cmos装置の製造方法 |
EP0123384A1 (en) * | 1983-02-25 | 1984-10-31 | Western Digital Corporation | Complementary insulated gate field effect integrated circuit structure and process for fabricating the structure |
JP2572653B2 (ja) * | 1989-12-29 | 1997-01-16 | セイコーエプソン株式会社 | 半導体装置の製造方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1104070B (de) * | 1959-01-27 | 1961-04-06 | Siemens Ag | Verfahren zur Herstellung einer eine eigenleitende oder nahezu eigenleitende Zone aufweisenden Halbleitertriode |
US3356858A (en) * | 1963-06-18 | 1967-12-05 | Fairchild Camera Instr Co | Low stand-by power complementary field effect circuitry |
US3648225A (en) * | 1969-12-04 | 1972-03-07 | Sperry Rand Corp | Digital sonar doppler navigator |
NL160988C (nl) * | 1971-06-08 | 1979-12-17 | Philips Nv | Halfgeleiderinrichting met een halfgeleiderlichaam, be- vattende ten minste een eerste veldeffecttransistor met geisoleerde stuurelektrode en werkwijze voor de vervaar- diging van de halfgeleiderinrichting. |
JPS49123287A (nl) * | 1973-03-28 | 1974-11-26 |
-
1975
- 1975-05-06 CA CA226,321A patent/CA1017073A/en not_active Expired
- 1975-05-19 GB GB2128575A patent/GB1499548A/en not_active Expired
- 1975-05-21 IT IT6831975A patent/IT1032951B/it active
- 1975-05-27 DE DE19752523379 patent/DE2523379C2/de not_active Expired
- 1975-05-28 NL NL7506288A patent/NL185591C/nl not_active IP Right Cessation
- 1975-05-30 FR FR7516972A patent/FR2275888A1/fr active Granted
- 1975-06-02 JP JP6545175A patent/JPS5619746B2/ja not_active Expired
-
1981
- 1981-06-25 HK HK27981A patent/HK27981A/xx unknown
Also Published As
Publication number | Publication date |
---|---|
JPS515969A (nl) | 1976-01-19 |
DE2523379C2 (de) | 1986-10-02 |
IT1032951B (it) | 1979-06-20 |
GB1499548A (en) | 1978-02-01 |
JPS5619746B2 (nl) | 1981-05-09 |
NL7506288A (nl) | 1975-12-05 |
CA1017073A (en) | 1977-09-06 |
FR2275888A1 (fr) | 1976-01-16 |
HK27981A (en) | 1981-07-03 |
FR2275888B1 (nl) | 1981-08-21 |
DE2523379A1 (de) | 1975-12-11 |
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Legal Events
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BA | A request for search or an international-type search has been filed | ||
BB | A search report has been drawn up | ||
BC | A request for examination has been filed | ||
A85 | Still pending on 85-01-01 | ||
V4 | Lapsed because of reaching the maximum lifetime of a patent |