MY183097A - Implant masking and alignment system with rollers - Google Patents

Implant masking and alignment system with rollers

Info

Publication number
MY183097A
MY183097A MYPI2017700346A MYPI2017700346A MY183097A MY 183097 A MY183097 A MY 183097A MY PI2017700346 A MYPI2017700346 A MY PI2017700346A MY PI2017700346 A MYPI2017700346 A MY PI2017700346A MY 183097 A MY183097 A MY 183097A
Authority
MY
Malaysia
Prior art keywords
aligned
straight edge
substrate
mask
rollers
Prior art date
Application number
MYPI2017700346A
Other languages
English (en)
Inventor
Babak Adibi
Vinay Prabhakar
Terry Bluck
Original Assignee
Intevac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Intevac Inc filed Critical Intevac Inc
Publication of MY183097A publication Critical patent/MY183097A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H01J37/185—Means for transferring objects between different enclosures of different pressure or atmosphere
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2007—Holding mechanisms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/204—Means for introducing and/or outputting objects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31701—Ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31701—Ion implantation
    • H01J2237/31706—Ion implantation characterised by the area treated
    • H01J2237/3171—Ion implantation characterised by the area treated patterned
    • H01J2237/31711—Ion implantation characterised by the area treated patterned using mask

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
MYPI2017700346A 2014-08-05 2015-08-05 Implant masking and alignment system with rollers MY183097A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201462033104P 2014-08-05 2014-08-05
PCT/US2015/043884 WO2016022728A1 (en) 2014-08-05 2015-08-05 Implant masking and alignment

Publications (1)

Publication Number Publication Date
MY183097A true MY183097A (en) 2021-02-13

Family

ID=55264529

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2017700346A MY183097A (en) 2014-08-05 2015-08-05 Implant masking and alignment system with rollers

Country Status (7)

Country Link
US (1) US9543114B2 (zh)
JP (1) JP6607923B2 (zh)
CN (1) CN106688088B (zh)
MY (1) MY183097A (zh)
SG (1) SG11201700675UA (zh)
TW (1) TWI662646B (zh)
WO (1) WO2016022728A1 (zh)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8749053B2 (en) 2009-06-23 2014-06-10 Intevac, Inc. Plasma grid implant system for use in solar cell fabrications
SG10201508582WA (en) 2011-11-08 2015-11-27 Intevac Inc Substrate processing system and method
EP2839052A4 (en) 2012-04-19 2015-06-10 Intevac Inc DOUBLE MASK ARRANGEMENT FOR MANUFACTURING SOLAR CELL
US10679883B2 (en) * 2012-04-19 2020-06-09 Intevac, Inc. Wafer plate and mask arrangement for substrate fabrication
US10062600B2 (en) 2012-04-26 2018-08-28 Intevac, Inc. System and method for bi-facial processing of substrates
EP2852469B1 (en) 2012-04-26 2019-04-24 Intevac, Inc. System architecture for vacuum processing
US9543114B2 (en) 2014-08-05 2017-01-10 Intevac, Inc. Implant masking and alignment system with rollers
US10854772B2 (en) * 2017-07-19 2020-12-01 Intevac, Inc. Multi-piece substrate holder and alignment mechanism
US10559710B2 (en) * 2017-07-19 2020-02-11 Intevac, Inc. System of height and alignment rollers for precise alignment of wafers for ion implantation
EP3704519A4 (en) 2017-11-01 2021-08-04 Nitto Denko Corporation LIGHT DISTRIBUTION STRUCTURE AND ELEMENT, ASSOCIATED PROCEDURE AND USES
WO2020131431A1 (en) * 2018-12-17 2020-06-25 Applied Materials, Inc. A method of forming devices on a substrate
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Also Published As

Publication number Publication date
CN106688088B (zh) 2020-01-10
US20160042913A1 (en) 2016-02-11
US9543114B2 (en) 2017-01-10
TWI662646B (zh) 2019-06-11
SG11201700675UA (en) 2017-02-27
JP6607923B2 (ja) 2019-11-20
JP2017532759A (ja) 2017-11-02
CN106688088A (zh) 2017-05-17
WO2016022728A1 (en) 2016-02-11
TW201606921A (zh) 2016-02-16

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