SG11201700675UA - Implant masking and alignment - Google Patents

Implant masking and alignment

Info

Publication number
SG11201700675UA
SG11201700675UA SG11201700675UA SG11201700675UA SG11201700675UA SG 11201700675U A SG11201700675U A SG 11201700675UA SG 11201700675U A SG11201700675U A SG 11201700675UA SG 11201700675U A SG11201700675U A SG 11201700675UA SG 11201700675U A SG11201700675U A SG 11201700675UA
Authority
SG
Singapore
Prior art keywords
alignment
implant masking
masking
implant
Prior art date
Application number
SG11201700675UA
Inventor
Babak Adibi
Vinay Prabhakar
Terry Bluck
Original Assignee
Intevac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US201462033104P priority Critical
Application filed by Intevac Inc filed Critical Intevac Inc
Priority to PCT/US2015/043884 priority patent/WO2016022728A1/en
Publication of SG11201700675UA publication Critical patent/SG11201700675UA/en

Links

Classifications

    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/20Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/18Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H01J37/185Means for transferring objects between different enclosures of different pressure or atmosphere
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045Object or beam position registration
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2007Holding mechanisms
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202Movement
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/204Means for introducing and/or outputting objects
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30Electron or ion beam tubes for processing objects
    • H01J2237/317Processing objects on a microscale
    • H01J2237/31701Ion implantation
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30Electron or ion beam tubes for processing objects
    • H01J2237/317Processing objects on a microscale
    • H01J2237/31701Ion implantation
    • H01J2237/31706Ion implantation characterised by the area treated
    • H01J2237/3171Ion implantation characterised by the area treated patterned
    • H01J2237/31711Ion implantation characterised by the area treated patterned using mask
SG11201700675UA 2014-08-05 2015-08-05 Implant masking and alignment SG11201700675UA (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US201462033104P true 2014-08-05 2014-08-05
PCT/US2015/043884 WO2016022728A1 (en) 2014-08-05 2015-08-05 Implant masking and alignment

Publications (1)

Publication Number Publication Date
SG11201700675UA true SG11201700675UA (en) 2017-02-27

Family

ID=55264529

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201700675UA SG11201700675UA (en) 2014-08-05 2015-08-05 Implant masking and alignment

Country Status (6)

Country Link
US (1) US9543114B2 (en)
JP (1) JP6607923B2 (en)
CN (1) CN106688088B (en)
SG (1) SG11201700675UA (en)
TW (1) TWI662646B (en)
WO (1) WO2016022728A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8749053B2 (en) 2009-06-23 2014-06-10 Intevac, Inc. Plasma grid implant system for use in solar cell fabrications
CN104428883B (en) 2011-11-08 2017-02-22 因特瓦克公司 substrate processing system and method
MY167662A (en) 2012-04-19 2018-09-21 Intevac Inc Dual-mask arrangement for solar cell fabrication
TWI518832B (en) 2012-04-26 2016-01-21 因特瓦克公司 System architecture for vacuum processing
US10062600B2 (en) 2012-04-26 2018-08-28 Intevac, Inc. System and method for bi-facial processing of substrates
TWI662646B (en) 2014-08-05 2019-06-11 美商因特瓦克公司 Implant masking and alignment

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TWI662646B (en) 2014-08-05 2019-06-11 美商因特瓦克公司 Implant masking and alignment

Also Published As

Publication number Publication date
US20160042913A1 (en) 2016-02-11
CN106688088A (en) 2017-05-17
JP2017532759A (en) 2017-11-02
TW201606921A (en) 2016-02-16
CN106688088B (en) 2020-01-10
WO2016022728A1 (en) 2016-02-11
JP6607923B2 (en) 2019-11-20
TWI662646B (en) 2019-06-11
US9543114B2 (en) 2017-01-10

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