MY154175A - Substrate for a mask blank, mask blank, and photomask - Google Patents

Substrate for a mask blank, mask blank, and photomask

Info

Publication number
MY154175A
MY154175A MYPI2011003763A MYPI2011003763A MY154175A MY 154175 A MY154175 A MY 154175A MY PI2011003763 A MYPI2011003763 A MY PI2011003763A MY PI2011003763 A MYPI2011003763 A MY PI2011003763A MY 154175 A MY154175 A MY 154175A
Authority
MY
Malaysia
Prior art keywords
mask blank
corner
end faces
region
substrate
Prior art date
Application number
MYPI2011003763A
Other languages
English (en)
Inventor
Maruyama Osamu
Harada Kazuaki
Akagawa Hiroyuki
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of MY154175A publication Critical patent/MY154175A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
    • B24B9/02—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
    • B24B9/06—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
    • B24B9/065—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of thin, brittle parts, e.g. semiconductors, wafers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Surface Treatment Of Glass (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
MYPI2011003763A 2009-02-13 2010-02-09 Substrate for a mask blank, mask blank, and photomask MY154175A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009030840 2009-02-13

Publications (1)

Publication Number Publication Date
MY154175A true MY154175A (en) 2015-05-15

Family

ID=42561779

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2011003763A MY154175A (en) 2009-02-13 2010-02-09 Substrate for a mask blank, mask blank, and photomask

Country Status (6)

Country Link
JP (1) JP4839411B2 (zh)
KR (1) KR101168712B1 (zh)
CN (1) CN102317860B (zh)
MY (1) MY154175A (zh)
TW (1) TWI497195B (zh)
WO (1) WO2010092937A1 (zh)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012027176A (ja) * 2010-07-22 2012-02-09 Tosoh Corp フォトマスク用基板
JP6190108B2 (ja) * 2012-11-27 2017-08-30 Ｍｉｐｏｘ株式会社 板ガラス等ワークの周縁部を研磨テープにより研磨する研磨装置及び研磨方法
US10032472B2 (en) 2014-03-31 2018-07-24 Hoya Corporation Magnetic-disk glass substrate
US9341940B2 (en) 2014-05-15 2016-05-17 Taiwan Semiconductor Manufacturing Co., Ltd. Reticle and method of fabricating the same
TWI680347B (zh) 2015-12-29 2019-12-21 日商Ｈｏｙａ股份有限公司 光罩基板、光罩基底、光罩、光罩基板之製造方法、光罩之製造方法、及顯示裝置之製造方法
JP6288184B2 (ja) * 2016-08-12 2018-03-07 旭硝子株式会社 ガラス基板およびガラス基板の製造方法
JP7220980B2 (ja) * 2016-12-22 2023-02-13 Hoya株式会社 表示装置製造用のマスクブランク用基板の製造方法、マスクブランクの製造方法、及びマスクの製造方法
JP2018076230A (ja) * 2018-01-25 2018-05-17 旭硝子株式会社 ガラス基板およびガラス基板の製造方法
JP6948988B2 (ja) * 2018-06-26 2021-10-13 クアーズテック株式会社 フォトマスク用基板およびその製造方法
JP7253373B2 (ja) * 2018-12-28 2023-04-06 Hoya株式会社 マスクブランク用基板、多層反射膜付き基板、反射型マスクブランク、反射型マスク、透過型マスクブランク、透過型マスク、及び半導体装置の製造方法
JP7320378B2 (ja) * 2019-06-05 2023-08-03 株式会社ファインサーフェス技術 マスク基板およびその製造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6029747A (ja) * 1983-07-28 1985-02-15 Hoya Corp 電子デバイス用マスク基板
JP2004029735A (ja) * 2002-03-29 2004-01-29 Hoya Corp 電子デバイス用基板、該基板を用いたマスクブランクおよび転写用マスク、並びにこれらの製造方法、研磨装置および研磨方法
JP4163038B2 (ja) * 2002-04-15 2008-10-08 Ｈｏｙａ株式会社 反射型マスクブランク及び反射型マスク並びに半導体の製造方法
CN100580549C (zh) * 2002-12-03 2010-01-13 Hoya株式会社 光掩模坯料和光掩膜
KR101048910B1 (ko) * 2003-03-20 2011-07-12 호야 가부시키가이샤 레티클용 기판 및 그 제조방법과, 마스크 블랭크 및 그제조방법
JP3934115B2 (ja) * 2003-03-26 2007-06-20 Ｈｏｙａ株式会社 フォトマスク用基板、フォトマスクブランク、及びフォトマスク
US7323276B2 (en) * 2003-03-26 2008-01-29 Hoya Corporation Substrate for photomask, photomask blank and photomask
JP4206850B2 (ja) * 2003-07-18 2009-01-14 信越化学工業株式会社 露光用大型合成石英ガラス基板の製造方法
JP4784969B2 (ja) * 2004-03-30 2011-10-05 Ｈｏｙａ株式会社 マスクブランク用のガラス基板の製造方法、マスクブランクの製造方法、反射型マスクブランクの製造方法、露光用マスクの製造方法、及び反射型マスクの製造方法
JP2005333124A (ja) * 2004-04-22 2005-12-02 Asahi Glass Co Ltd 反射型マスク用低膨張硝子基板および反射型マスク
WO2008084680A1 (ja) * 2006-12-27 2008-07-17 Asahi Glass Company, Limited Ｅｕｖリソグラフィ用反射型マスクブランク
WO2008093534A1 (ja) * 2007-01-31 2008-08-07 Asahi Glass Company, Limited Ｅｕｖリソグラフィ用反射型マスクブランク
JP5085966B2 (ja) * 2007-04-09 2012-11-28 Ｈｏｙａ株式会社 フォトマスクブランクの製造方法、反射型マスクブランクの製造方法、フォトマスクの製造方法、及び反射型マスクの製造方法

Also Published As

Publication number Publication date
KR101168712B1 (ko) 2012-09-13
CN102317860A (zh) 2012-01-11
CN102317860B (zh) 2013-07-03
JP4839411B2 (ja) 2011-12-21
JPWO2010092937A1 (ja) 2012-08-16
TW201115264A (en) 2011-05-01
TWI497195B (zh) 2015-08-21
WO2010092937A1 (ja) 2010-08-19
KR20110115581A (ko) 2011-10-21

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