KR980006260A - 반도체 장치의 보호 소자 - Google Patents
반도체 장치의 보호 소자 Download PDFInfo
- Publication number
- KR980006260A KR980006260A KR1019960024426A KR19960024426A KR980006260A KR 980006260 A KR980006260 A KR 980006260A KR 1019960024426 A KR1019960024426 A KR 1019960024426A KR 19960024426 A KR19960024426 A KR 19960024426A KR 980006260 A KR980006260 A KR 980006260A
- Authority
- KR
- South Korea
- Prior art keywords
- semiconductor device
- drain
- well
- source
- branches
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract 9
- 239000000758 substrate Substances 0.000 claims 2
- 230000015556 catabolic process Effects 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
- H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
- H01L27/0266—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using field effect transistors as protective elements
- H01L27/027—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using field effect transistors as protective elements specially adapted to provide an electrical current path other than the field effect induced current path
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
- H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
- H01L27/0288—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using passive elements as protective elements, e.g. resistors, capacitors, inductors, spark-gaps
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Semiconductor Integrated Circuits (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Abstract
본 발명은 반도체 장치의 보호 소자에 관한 것으로서, 다욱 상세하게는, 반도체 장치의 보호 소자로 이용되는 사다리 구조의 NMOS트랜지스터에 관한 것이다. 본 발명에서는 다수의 드레인 가지를 저항으로 연결하고 웰가 소스/웰 패턴의 접속점은 입력단 또는 출력단과 가까운 드레인 가지 쪽에 형성한다. 이렇게 함으로써, 모든 드레인가지로 전류를 분산시켜 전류의 밀집화로 인한 소자의 열적 파괴현상을 막을 수 있다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제 2도는 본 발명의 실시예에 따른 사다리 구조의 NMOS 트랜지스터의 구조를 도시한 배치도.
Claims (3)
- 웰, 소스 영역 및 드레인 영역을 가지고 있는 반도체 기판, 상기 반도체 기판 위에 형성되어 있는 다수의 평행한 게이트 가지, 상기 다수의 게이트 가지의 사이에 형성되어 있으며 상기 드레인 영역과 접속하고 있는 다수의 드레인 가지, 상기 드레인 가지를 연결하는 다수의 저항, 상기 다수의 게이트 가지의 사이에 형성되어 상기 소스 영역 및 상기 웰과 접속되어 있는 소스/웰 패턴을 포함하는 반도체 장치의 보호소자
- 제1항에서, 상기 드레인 가지는 상기 반도체 장치의 입출력단과 연결되어 있고 상기 소스/웰 패턴은 접지되어 있는 바도체 장치의 보호 소자
- 제2항에서, 상기 소스/웰 패턴과 상기 웰의 접속점은 상기 반도체 장치의 입출력단에 가까운 드레인 가지쪽에 형성되어 있는 반도체 장치의 보호소자
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960024426A KR100188135B1 (en) | 1996-06-27 | 1996-06-27 | Protection device of semiconductor device |
TW086107784A TW327254B (en) | 1996-06-27 | 1997-06-05 | An apparatus and method for electrostatic discharge protection with improved current dispersion |
US08/878,483 US5977595A (en) | 1996-06-27 | 1997-06-18 | Apparatus and method for electrostatic discharge protection with improved current dispersion |
JP9172414A JPH1070246A (ja) | 1996-06-27 | 1997-06-27 | 半導体装置の保護素子 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960024426A KR100188135B1 (en) | 1996-06-27 | 1996-06-27 | Protection device of semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
KR980006260A true KR980006260A (ko) | 1998-03-30 |
KR100188135B1 KR100188135B1 (en) | 1999-06-01 |
Family
ID=19463826
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019960024426A KR100188135B1 (en) | 1996-06-27 | 1996-06-27 | Protection device of semiconductor device |
Country Status (4)
Country | Link |
---|---|
US (1) | US5977595A (ko) |
JP (1) | JPH1070246A (ko) |
KR (1) | KR100188135B1 (ko) |
TW (1) | TW327254B (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100699845B1 (ko) * | 2005-06-10 | 2007-03-27 | 삼성전자주식회사 | 액티브 영역의 면적을 감소시킨 반도체 메모리 장치 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4376348B2 (ja) * | 1998-05-18 | 2009-12-02 | パナソニック株式会社 | 半導体装置 |
JP3758876B2 (ja) * | 1999-02-02 | 2006-03-22 | Necマイクロシステム株式会社 | 半導体装置のレイアウト方法 |
US6587320B1 (en) | 2000-01-04 | 2003-07-01 | Sarnoff Corporation | Apparatus for current ballasting ESD sensitive devices |
KR20030019432A (ko) * | 2000-06-15 | 2003-03-06 | 사르노프 코포레이션 | 멀티-핑거 전류 밸러스팅 esd 보호 회로 및 esd감지 회로용 인터리브 밸러스팅 방법 |
US6750517B1 (en) * | 2000-11-06 | 2004-06-15 | Taiwan Semiconductor Manufacturing Company | Device layout to improve ESD robustness in deep submicron CMOS technology |
US7402846B2 (en) | 2005-10-20 | 2008-07-22 | Atmel Corporation | Electrostatic discharge (ESD) protection structure and a circuit using the same |
JP5431791B2 (ja) * | 2009-05-27 | 2014-03-05 | ルネサスエレクトロニクス株式会社 | 静電気保護回路 |
JP6100026B2 (ja) * | 2013-03-06 | 2017-03-22 | エスアイアイ・セミコンダクタ株式会社 | 半導体装置 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USH842H (en) * | 1989-06-30 | 1990-11-06 | American Telephone And Telegraph Company | Metal conductor structure having low electro-migration at high currents for semiconductor devices |
-
1996
- 1996-06-27 KR KR1019960024426A patent/KR100188135B1/ko not_active IP Right Cessation
-
1997
- 1997-06-05 TW TW086107784A patent/TW327254B/zh not_active IP Right Cessation
- 1997-06-18 US US08/878,483 patent/US5977595A/en not_active Expired - Lifetime
- 1997-06-27 JP JP9172414A patent/JPH1070246A/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100699845B1 (ko) * | 2005-06-10 | 2007-03-27 | 삼성전자주식회사 | 액티브 영역의 면적을 감소시킨 반도체 메모리 장치 |
Also Published As
Publication number | Publication date |
---|---|
JPH1070246A (ja) | 1998-03-10 |
TW327254B (en) | 1998-02-21 |
US5977595A (en) | 1999-11-02 |
KR100188135B1 (en) | 1999-06-01 |
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