KR970066709A - 표면 스탬핑 장치 및 방법 - Google Patents

표면 스탬핑 장치 및 방법 Download PDF

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KR970066709A
KR970066709A KR1019970005121A KR19970005121A KR970066709A KR 970066709 A KR970066709 A KR 970066709A KR 1019970005121 A KR1019970005121 A KR 1019970005121A KR 19970005121 A KR19970005121 A KR 19970005121A KR 970066709 A KR970066709 A KR 970066709A
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stamping
pressure control
product
support structure
flexible
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죠지 엔. 마라카스
로렌스 엔 두워스키
캐슬린 토빈
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빈센트 비. 인그라시아
모토로라 인코포레이티드
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Publication of KR970066709A publication Critical patent/KR970066709A/ko

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41K—STAMPS; STAMPING OR NUMBERING APPARATUS OR DEVICES
    • B41K3/00—Apparatus for stamping articles having integral means for supporting the articles to be stamped
    • B41K3/02—Apparatus for stamping articles having integral means for supporting the articles to be stamped with stamping surface located above article-supporting surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C1/00—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
    • B05C1/02—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to separate articles
    • B05C1/027—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to separate articles only at particular parts of the articles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
    • B05D1/185—Processes for applying liquids or other fluent materials performed by dipping applying monomolecular layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/28—Processes for applying liquids or other fluent materials performed by transfer from the surfaces of elements carrying the liquid or other fluent material, e.g. brushes, pads, rollers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/28—Processes for applying liquids or other fluent materials performed by transfer from the surfaces of elements carrying the liquid or other fluent material, e.g. brushes, pads, rollers
    • B05D1/283—Transferring monomolecular layers or solutions of molecules adapted for forming monomolecular layers from carrying elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41K—STAMPS; STAMPING OR NUMBERING APPARATUS OR DEVICES
    • B41K3/00—Apparatus for stamping articles having integral means for supporting the articles to be stamped
    • B41K3/62—Details or accessories
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00277—Apparatus
    • B01J2219/00351—Means for dispensing and evacuation of reagents
    • B01J2219/00382—Stamping
    • C—CHEMISTRY; METALLURGY
    • C40—COMBINATORIAL TECHNOLOGY
    • C40B—COMBINATORIAL CHEMISTRY; LIBRARIES, e.g. CHEMICAL LIBRARIES
    • C40B60/00—Apparatus specially adapted for use in combinatorial chemistry or with libraries
    • C40B60/14—Apparatus specially adapted for use in combinatorial chemistry or with libraries for creating libraries

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Materials Engineering (AREA)
  • Composite Materials (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Micromachines (AREA)
  • Printing Methods (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Printing Plates And Materials Therefor (AREA)

Abstract

본 발명의 장치(100)는 지지 구조체(104)와, 이 지지 구조체의 반대편에 배치된 예정 패턴을 포함한 스탬핑면(110)을 갖는 가요성 스팸프(106)와, 지지 구조체(104)위에 배치된 압력 제어실(112)과, 가요성 스탬프(106)에 부착된 기계적 부착부(114)를 포함한다. 제품(102)의 표면(101)을 각인하기 위한 방법은, i) 압력제어실(112) 내의 지지 구조체(104)상에 제품(102)을 놓는 단계와, ii) 자기집합형 단층형성 분자종을 함유한 용액으로 스팸핑면(110)을 적시는 단계와, iii) 가요성 스탬프(106)상의 정렬패턴(118)을 제품(102)의 표면(101)상의 정렬 패턴(124)과 정렬시키는 단계와, iv) 가요성 스탬프(106)를 가로지르는 차압을 변화시킴으로써 가요성 스탬프(106)의 중심에서 접촉이 시작하여 제어된 방법으로 외부로 진행하도록 젖은 스탬프(106)의 중심에서 접촉이 시작하여 제어된 방법으로 외부로 진행하도록 젖은 스탬핑면(110)을 제품(102)의 표면(101)과 제어방식으로 접촉시키는 단계와, v) 예정 패턴응 갖는 자기집합형 단층(134)이 제품(102)의 표면(101)에 형성되도록 제품의 표면(101)에서 스탬핑면(110)을 제거하는 단계를 포함한다.

Description

표면 스탬핑 장치 및 방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명에 의한 제품은 표면을 스탬핑하기 위한 장치의 실시예의 측면도.

Claims (5)

  1. 제품(102,302)의 표면(101,301)을 스탬핑하기 위한 장치(100,200,300)에 있어서, 표면(105)을 갖는 지지 구조체(104,304)와; 이 지지 구조체(104,304)의 표면(105)위에 배치된 제1입력 제어실(112,312)과, 예정 패턴을 갖는 스탬핑면(110,310)및 외부면(108,308)을 가지는 가요성 스탬프(106,206,306)와; 상기 제1압력 제어실(112,312)내부에 배치되어서 자기집합형 단층 형성 분자종을 갖는 용액으로 스탬핑면(110,310)을 적시는 수단과; 스탬핑면(110,310)의 예정 패턴이 제품(102,302)의 표면(101,301)상에 각인 되도록 스탬핑면(110.310)을 제품(102,302)표면 (101.301)과 제어하면서 접촉시키는 수단을 포함하고; 상기 가요성 스탬프(106,306)는 스탬핑면(110,310)이 지지 구조체(104,304)의 표면(105)과 마주보도록 지지 구조체(104,304)위에 배치되고, 상기 스탬핑면(110,310)이 제1압력 제어실(112,312)의 내부에 배치되고, 상기 지지 구조체(104,304)및 제1압력 제어실(112,312)은 제품(102,302)이 제1압력 제어실(112,312)내부에서 지지 구조체(104,304)상에 배치되도록 구성되고 또 제품(102,201)의 표면(101.301)이 스탬핑면(110,310)과 마주보도록 구성되는 것을 특징으로 하는 제품의 표면 스탬핑장치.
  2. 제품(102)의 표면(101)을 스탬핑하기 위한 장치(100)에 있어서, 표면(105)을 갖는 지지 구조체(104)와; 이 지지 구조체(104)의 표면(105)위에 배치된 제1압력 제어실(112)과; 예정 패턴을 갖는 스탬핑면(110) 및 외부면(108)을 가지는 가요성 스팸프(106)와; 상기 제1압력 제어실(112)외부에 배치되어서 자기집합형 단층 형성 분자종을 갖는 용액으로 포화되는 표면(128)을 갖는 스폰지형 기판(16)을 포함하고; 상기 가요성 스탬프(106)는 스탬핑면(110)이 지지 구조체(104)의 표면(105)과 마주보도록 지지 구조체(104)위에 배치되고, 상기 스탬핑면(110)이 제1압력 제어실(112)의 내부에 배치되고, 상기 지지 구조체(104)및 제1압력 제어실(112)은 제품(102)이 제1압력 제어실(112)내부에서 지지구조체(104)상에 배치되도록 구성되고 또 제품(102)의 표면(101)이 스탬핑면(110)과 마주보도록 구성되고; 상기 스폰지형 기판(126)의 표면(128)은 가요성 스탬프(106)의 스탬핑면(110)의 면적과 거의 동일한 면적을 가지므로 스폰지형 기판(126)의 표면(128)이 스탬핑면(110)을 수용하여 상기 용액으로 적실수 있는 것을 특징으로 하는 제품의 표면 스탬핑장치.
  3. 제품(102,302)의 표면(101,301)을 스탬핑하기 위한 방법에 있어서, 표면(105)을 갖는 지지 구조체(104,304)를 제공하는 단계와; 이 지지 구조체(104,304)의 표면(105)위에 배치된 제1압력 제어실(112,312)을 제공하는 단계와; 예정 패턴을 갖는 스탬핑면(110,310)과 외부면(108,308)과 모서리를 가지는 가요성 스탬프(106,206,306)를 제공하는 단계와; 스탬핑면(110,310)이 지지 구조체(104,304)의 표면(105)과 마주보도록 하고 또 스탬핑면(110,310)이 제1압력 제어실(112,312)의 내부에 있도록 지지 구조체(104,304)위에 가요성 스탬프(106,206,306)를 배치하는 단계와; 제품(102,302)의 표면(101,301)의 스탬핑면(110,310)과 마주보도록 제1압력 제어실(112,312)내에서 지지 구조체(104,304)의 표면(105)에 제품(102,302)을 두는 단계와; 자기집합형 단층 형성 분자종을 갖는 용액으로 스탬핑면(110.310)을 적시는 단계와; 스탬핑면(110.301)의 예정 패턴이 제품(102.302)의 표면(101.301)상에 각인되도록 스탬핑면(110.310)을 제품(102.302)의 표면 (101.301)과 제어하면서 접촉시키는 단계를 포함하는 것을 특징으로 하는 제품의 표면 스탬핑방법.
  4. 제3항에 있어서, 제품(102)의 표면(101)으로부터 제어방법으로 가요성 스탬프(306)를 제거함으로써 제품(102)의 표면(101)에 예정 패턴을 갖는 자기집합형 단층 형성 분자종의 자기집합형 단층(134)을 형성하는 단계를 더 포함하는 것을 특징으로 하는 제품의 표면 스탬핑방법.
  5. 제3항에 있어서, 상기 스탬핑면(110,310)을 제품(102,302)의 표면(101,301)과 제어하면서 접촉시키는 단계는, 스탬핑면(110,310)이 제품(102,302)의 표면(101,301)에 가까이 접근하여 스탬핑면(110,310)과 제품(102,302)의 표면(101,301)과의 사이에 프린팅갭을 규정하도록 가요성 스탬프(106,206,306)를 배치하는 단계와; 상기 가요성 스탬프(106,206,306)를 모서리에 움직이지 않게 고정하는 단계와; 상기 제1압력 제어실(112,312)내부에 스탬핑면(110,310)과 제품(102,302)의 표면(101,301)과의 사이에 프린팅갭을 유지하기에 충분한 압력을 갖는 불활성가스(130,330)를 공급하는 단계와; 그후에 스탬핑면(110,310)과 제품(102,302)의 표면(101,301)과의 접촉이 가요성 스탬프(106,206,306)의 중심에서 시작하여 제어된 방법으로 외부로 진행함으로써 제품(102,302)의 표면(101,301)과 스탬핑면(110,310)과의 사이에 불활성가스의 불필요한 포획을 방지하도록 불활성가스(130,330)의 압력을 감소시키는 단계를 포함하는 것을 특징으로 하는 제품의 표면 스탬핑 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019970005121A 1996-03-04 1997-02-20 표면 스탬핑 장치 및 방법 KR970066709A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US610.776 1996-03-04
US08/610,776 US5669303A (en) 1996-03-04 1996-03-04 Apparatus and method for stamping a surface

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KR970066709A true KR970066709A (ko) 1997-10-13

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US (1) US5669303A (ko)
EP (1) EP0794016A1 (ko)
JP (1) JPH09240125A (ko)
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Families Citing this family (176)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6518168B1 (en) * 1995-08-18 2003-02-11 President And Fellows Of Harvard College Self-assembled monolayer directed patterning of surfaces
US6482742B1 (en) * 2000-07-18 2002-11-19 Stephen Y. Chou Fluid pressure imprint lithography
US20040036201A1 (en) * 2000-07-18 2004-02-26 Princeton University Methods and apparatus of field-induced pressure imprint lithography
US5734629A (en) * 1995-12-28 1998-03-31 Rimage Corporation CD transporter
US5731152A (en) * 1996-05-13 1998-03-24 Motorola, Inc. Methods and systems for biological reagent placement
DE19735026C1 (de) * 1997-08-13 1999-05-27 Freudenberg Carl Fa Vorrichtung zur Beschichtung einer Materialbahn mit einer Paste
US5937758A (en) * 1997-11-26 1999-08-17 Motorola, Inc. Micro-contact printing stamp
US5947027A (en) * 1998-09-08 1999-09-07 Motorola, Inc. Printing apparatus with inflatable means for advancing a substrate towards the stamping surface
US6334960B1 (en) * 1999-03-11 2002-01-01 Board Of Regents, The University Of Texas System Step and flash imprint lithography
US7629028B2 (en) * 1999-03-19 2009-12-08 Battelle Memorial Insitute Methods of making monolayers
WO2001004938A1 (en) * 1999-07-09 2001-01-18 Institute Of Materials Research & Engineering Mechanical patterning of a device layer
EP1072954A3 (en) * 1999-07-28 2002-05-22 Lucent Technologies Inc. Lithographic process for device fabrication
US6873087B1 (en) * 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
US7432634B2 (en) 2000-10-27 2008-10-07 Board Of Regents, University Of Texas System Remote center compliant flexure device
US6272983B1 (en) 2000-01-04 2001-08-14 Donna L. Plant Chupurdy Stamping device for irregular surfaces
US20010051842A1 (en) * 2000-06-12 2001-12-13 Duplium Corporation Apparatus and method for producing an indexed three-dimensional landmark on compact discs for subsequent use or processing
EP1303792B1 (en) * 2000-07-16 2012-10-03 Board Of Regents, The University Of Texas System High-resolution overlay alignement methods and systems for imprint lithography
US20050160011A1 (en) * 2004-01-20 2005-07-21 Molecular Imprints, Inc. Method for concurrently employing differing materials to form a layer on a substrate
KR100827741B1 (ko) 2000-07-17 2008-05-07 보드 오브 리전츠, 더 유니버시티 오브 텍사스 시스템 임프린트 리소그래피 공정을 위한 자동 유체 분배 방법 및시스템
US7635262B2 (en) 2000-07-18 2009-12-22 Princeton University Lithographic apparatus for fluid pressure imprint lithography
AU2001284896A1 (en) 2000-08-14 2002-02-25 Surface Logix, Inc. Deformable stamp for patterning three-dimensional surfaces
EP1352295B1 (en) 2000-10-12 2015-12-23 Board of Regents, The University of Texas System Template for room temperature, low pressure micro- and nano-imprint lithography
DE20122196U1 (de) * 2000-10-12 2004-09-16 Board of Regents, The University of Texas System, Austin Schablone für Niederdruck-Mikro- und -Nanoprägelithographie bei Raumtemperatur
EP1336132A2 (en) * 2000-11-22 2003-08-20 Koninklijke Philips Electronics N.V. Stamp, method, and apparatus
US20050120902A1 (en) * 2001-04-25 2005-06-09 David Adams Edge transfer lithography
US6798464B2 (en) 2001-05-11 2004-09-28 International Business Machines Corporation Liquid crystal display
US6964793B2 (en) * 2002-05-16 2005-11-15 Board Of Regents, The University Of Texas System Method for fabricating nanoscale patterns in light curable compositions using an electric field
US7338613B2 (en) * 2001-09-10 2008-03-04 Surface Logix, Inc. System and process for automated microcontact printing
US7117790B2 (en) * 2002-01-11 2006-10-10 Massachusetts Institute Of Technology Microcontact printing
US7037639B2 (en) * 2002-05-01 2006-05-02 Molecular Imprints, Inc. Methods of manufacturing a lithography template
KR100981692B1 (ko) * 2002-05-27 2010-09-13 코닌클리케 필립스 일렉트로닉스 엔.브이. 스탬프로부터 기판으로 패턴을 전사하기 위한 방법 및 디바이스
EP1512049A1 (en) * 2002-06-07 2005-03-09 Obducat AB Method for transferring a pattern
US7252492B2 (en) * 2002-06-20 2007-08-07 Obducat Ab Devices and methods for aligning a stamp and a substrate
US7179079B2 (en) * 2002-07-08 2007-02-20 Molecular Imprints, Inc. Conforming template for patterning liquids disposed on substrates
US20080160129A1 (en) 2006-05-11 2008-07-03 Molecular Imprints, Inc. Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template
US6926929B2 (en) * 2002-07-09 2005-08-09 Molecular Imprints, Inc. System and method for dispensing liquids
US7019819B2 (en) * 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US7442336B2 (en) * 2003-08-21 2008-10-28 Molecular Imprints, Inc. Capillary imprinting technique
US6908861B2 (en) * 2002-07-11 2005-06-21 Molecular Imprints, Inc. Method for imprint lithography using an electric field
US6916584B2 (en) * 2002-08-01 2005-07-12 Molecular Imprints, Inc. Alignment methods for imprint lithography
US20040156988A1 (en) * 2002-08-26 2004-08-12 Mehenti Neville Z. Selective and alignment-free molecular patterning of surfaces
US6936194B2 (en) * 2002-09-05 2005-08-30 Molecular Imprints, Inc. Functional patterning material for imprint lithography processes
US7434512B2 (en) * 2002-09-09 2008-10-14 International Business Machines Corporation Printing in a medium
US6939120B1 (en) 2002-09-12 2005-09-06 Komag, Inc. Disk alignment apparatus and method for patterned media production
US8349241B2 (en) 2002-10-04 2013-01-08 Molecular Imprints, Inc. Method to arrange features on a substrate to replicate features having minimal dimensional variability
US6980282B2 (en) * 2002-12-11 2005-12-27 Molecular Imprints, Inc. Method for modulating shapes of substrates
US7641840B2 (en) * 2002-11-13 2010-01-05 Molecular Imprints, Inc. Method for expelling gas positioned between a substrate and a mold
US20040112862A1 (en) * 2002-12-12 2004-06-17 Molecular Imprints, Inc. Planarization composition and method of patterning a substrate using the same
US6871558B2 (en) 2002-12-12 2005-03-29 Molecular Imprints, Inc. Method for determining characteristics of substrate employing fluid geometries
TW200500811A (en) * 2002-12-13 2005-01-01 Molecular Imprints Inc Magnification correction employing out-of-plane distortion of a substrate
US7179396B2 (en) 2003-03-25 2007-02-20 Molecular Imprints, Inc. Positive tone bi-layer imprint lithography method
US7186656B2 (en) * 2004-05-21 2007-03-06 Molecular Imprints, Inc. Method of forming a recessed structure employing a reverse tone process
US20050191419A1 (en) * 2003-04-11 2005-09-01 Helt James M. Fabrication of nanostructures
US7396475B2 (en) 2003-04-25 2008-07-08 Molecular Imprints, Inc. Method of forming stepped structures employing imprint lithography
US6951173B1 (en) * 2003-05-14 2005-10-04 Molecular Imprints, Inc. Assembly and method for transferring imprint lithography templates
US6805054B1 (en) 2003-05-14 2004-10-19 Molecular Imprints, Inc. Method, system and holder for transferring templates during imprint lithography processes
JP4201182B2 (ja) * 2003-05-20 2008-12-24 大日本印刷株式会社 細胞培養基材およびその製造方法
US7307118B2 (en) 2004-11-24 2007-12-11 Molecular Imprints, Inc. Composition to reduce adhesion between a conformable region and a mold
US7150622B2 (en) * 2003-07-09 2006-12-19 Molecular Imprints, Inc. Systems for magnification and distortion correction for imprint lithography processes
US7090716B2 (en) * 2003-10-02 2006-08-15 Molecular Imprints, Inc. Single phase fluid imprint lithography method
US8211214B2 (en) 2003-10-02 2012-07-03 Molecular Imprints, Inc. Single phase fluid imprint lithography method
US20050098534A1 (en) * 2003-11-12 2005-05-12 Molecular Imprints, Inc. Formation of conductive templates employing indium tin oxide
US20050106321A1 (en) * 2003-11-14 2005-05-19 Molecular Imprints, Inc. Dispense geometery to achieve high-speed filling and throughput
JP4401153B2 (ja) * 2003-12-05 2010-01-20 大日本印刷株式会社 パターニング用基板および細胞培養基板
US6981445B2 (en) * 2003-12-24 2006-01-03 Axela Biosensors Inc. Method and apparatus for micro-contact printing
JP4152375B2 (ja) * 2004-01-14 2008-09-17 東海商事株式会社 電子部品の印刷装置
US20050156353A1 (en) * 2004-01-15 2005-07-21 Watts Michael P. Method to improve the flow rate of imprinting material
DE10394369A5 (de) * 2004-01-19 2007-05-03 Siemens Ag Vorrichtung und Verfahren zum passgenauen Übereinanderdrucken
US20060019390A1 (en) * 2004-01-28 2006-01-26 Dai Nippon Printing Co., Ltd. Patterning substrate and cell culture substrate
US20050255594A1 (en) * 2004-01-28 2005-11-17 Dai Nippon Printing Co., Ltd. Patterning substrate and cell culture substrate
US20050266319A1 (en) * 2004-01-28 2005-12-01 Dai Nippon Printing Co., Ltd. Patterning substrate and cell culture substrate
US20060115999A1 (en) * 2004-12-01 2006-06-01 Molecular Imprints, Inc. Methods of exposure for the purpose of thermal management for imprint lithography processes
US7919305B2 (en) 2004-02-19 2011-04-05 Dai Nippon Printing Co., Ltd. Method for manufacturing cell culture substrate
US7019835B2 (en) * 2004-02-19 2006-03-28 Molecular Imprints, Inc. Method and system to measure characteristics of a film disposed on a substrate
JP2004200178A (ja) * 2004-02-19 2004-07-15 Sumitomo Electric Ind Ltd 酸化物超電導導体およびその製造方法
US8076386B2 (en) 2004-02-23 2011-12-13 Molecular Imprints, Inc. Materials for imprint lithography
US7906180B2 (en) * 2004-02-27 2011-03-15 Molecular Imprints, Inc. Composition for an etching mask comprising a silicon-containing material
US20050189676A1 (en) * 2004-02-27 2005-09-01 Molecular Imprints, Inc. Full-wafer or large area imprinting with multiple separated sub-fields for high throughput lithography
JP4456393B2 (ja) 2004-03-26 2010-04-28 大日本印刷株式会社 細胞培養基板の製造方法および細胞培養基板製造装置
WO2005104756A2 (en) * 2004-04-27 2005-11-10 The Board Of Trustees Of The University Of Illinois Composite patterning devices for soft lithography
US7140861B2 (en) * 2004-04-27 2006-11-28 Molecular Imprints, Inc. Compliant hard template for UV imprinting
WO2005119802A2 (en) * 2004-05-28 2005-12-15 Board Of Regents, The University Of Texas System Adaptive shape substrate support system and method
US20070228593A1 (en) * 2006-04-03 2007-10-04 Molecular Imprints, Inc. Residual Layer Thickness Measurement and Correction
US7785526B2 (en) * 2004-07-20 2010-08-31 Molecular Imprints, Inc. Imprint alignment method, system, and template
US7162810B2 (en) * 2004-08-11 2007-01-16 Intel Corporation Micro tool alignment apparatus and method
US7309225B2 (en) * 2004-08-13 2007-12-18 Molecular Imprints, Inc. Moat system for an imprint lithography template
US7939131B2 (en) 2004-08-16 2011-05-10 Molecular Imprints, Inc. Method to provide a layer with uniform etch characteristics
KR100606640B1 (ko) 2004-08-30 2006-07-28 주식회사 디엠에스 식각 영역을 만들기 위한 장치
US20070164476A1 (en) * 2004-09-01 2007-07-19 Wei Wu Contact lithography apparatus and method employing substrate deformation
US7547504B2 (en) 2004-09-21 2009-06-16 Molecular Imprints, Inc. Pattern reversal employing thick residual layers
US7205244B2 (en) 2004-09-21 2007-04-17 Molecular Imprints Patterning substrates employing multi-film layers defining etch-differential interfaces
US20060062922A1 (en) 2004-09-23 2006-03-23 Molecular Imprints, Inc. Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor
US20060081557A1 (en) * 2004-10-18 2006-04-20 Molecular Imprints, Inc. Low-k dielectric functional imprinting materials
TW200626370A (en) * 2004-10-22 2006-08-01 Koninkl Philips Electronics Nv Roller micro-contact printer with pressure control
US7630067B2 (en) * 2004-11-30 2009-12-08 Molecular Imprints, Inc. Interferometric analysis method for the manufacture of nano-scale devices
US7292326B2 (en) * 2004-11-30 2007-11-06 Molecular Imprints, Inc. Interferometric analysis for the manufacture of nano-scale devices
US20070231421A1 (en) 2006-04-03 2007-10-04 Molecular Imprints, Inc. Enhanced Multi Channel Alignment
WO2006060757A2 (en) 2004-12-01 2006-06-08 Molecular Imprints, Inc. Eliminating printability of sub-resolution defects in imprint lithography
US7811505B2 (en) 2004-12-07 2010-10-12 Molecular Imprints, Inc. Method for fast filling of templates for imprint lithography using on template dispense
DE602004014002D1 (de) 2004-12-10 2008-07-03 Essilor Int Stempel zum Auftragen eines Motivs, Verfahren zur Stempelherstellung und Verfahren zur Herstellung eines Objekts anhand von diesem Stempel
US7409759B2 (en) * 2004-12-16 2008-08-12 Asml Holding N.V. Method for making a computer hard drive platen using a nano-plate
US7363854B2 (en) * 2004-12-16 2008-04-29 Asml Holding N.V. System and method for patterning both sides of a substrate utilizing imprint lithography
US7410591B2 (en) * 2004-12-16 2008-08-12 Asml Holding N.V. Method and system for making a nano-plate for imprint lithography
US7331283B2 (en) * 2004-12-16 2008-02-19 Asml Holding N.V. Method and apparatus for imprint pattern replication
US7399422B2 (en) * 2005-11-29 2008-07-15 Asml Holding N.V. System and method for forming nanodisks used in imprint lithography and nanodisk and memory disk formed thereby
US20060177535A1 (en) * 2005-02-04 2006-08-10 Molecular Imprints, Inc. Imprint lithography template to facilitate control of liquid movement
US7636999B2 (en) 2005-01-31 2009-12-29 Molecular Imprints, Inc. Method of retaining a substrate to a wafer chuck
US7635263B2 (en) 2005-01-31 2009-12-22 Molecular Imprints, Inc. Chucking system comprising an array of fluid chambers
US7383769B2 (en) * 2005-02-24 2008-06-10 Intel Corporation System and method for vacuum generated imprinting
US20060234499A1 (en) * 2005-03-29 2006-10-19 Akira Kodera Substrate processing method and substrate processing apparatus
JP5180820B2 (ja) * 2005-05-03 2013-04-10 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ スタンプから基板にパターンを転写する方法及び装置
US20070228608A1 (en) * 2006-04-03 2007-10-04 Molecular Imprints, Inc. Preserving Filled Features when Vacuum Wiping
US20060266916A1 (en) * 2005-05-25 2006-11-30 Molecular Imprints, Inc. Imprint lithography template having a coating to reflect and/or absorb actinic energy
US9249386B2 (en) * 2005-06-06 2016-02-02 Dai Nippon Printing Co., Ltd. Substrate for cell transfer
US7256131B2 (en) * 2005-07-19 2007-08-14 Molecular Imprints, Inc. Method of controlling the critical dimension of structures formed on a substrate
US8557351B2 (en) 2005-07-22 2013-10-15 Molecular Imprints, Inc. Method for adhering materials together
US7759407B2 (en) 2005-07-22 2010-07-20 Molecular Imprints, Inc. Composition for adhering materials together
US8808808B2 (en) 2005-07-22 2014-08-19 Molecular Imprints, Inc. Method for imprint lithography utilizing an adhesion primer layer
US20070035717A1 (en) * 2005-08-12 2007-02-15 Wei Wu Contact lithography apparatus, system and method
US20070064384A1 (en) * 2005-08-25 2007-03-22 Molecular Imprints, Inc. Method to transfer a template transfer body between a motion stage and a docking plate
US7665981B2 (en) * 2005-08-25 2010-02-23 Molecular Imprints, Inc. System to transfer a template transfer body between a motion stage and a docking plate
US7316554B2 (en) 2005-09-21 2008-01-08 Molecular Imprints, Inc. System to control an atmosphere between a body and a substrate
JP2007134368A (ja) * 2005-11-08 2007-05-31 Nikon Corp パターン転写装置、露光装置及びパターン転写方法
US7906058B2 (en) 2005-12-01 2011-03-15 Molecular Imprints, Inc. Bifurcated contact printing technique
US7803308B2 (en) 2005-12-01 2010-09-28 Molecular Imprints, Inc. Technique for separating a mold from solidified imprinting material
WO2007067488A2 (en) 2005-12-08 2007-06-14 Molecular Imprints, Inc. Method and system for double-sided patterning of substrates
US7670530B2 (en) 2006-01-20 2010-03-02 Molecular Imprints, Inc. Patterning substrates employing multiple chucks
US7500431B2 (en) * 2006-01-12 2009-03-10 Tsai-Wei Wu System, method, and apparatus for membrane, pad, and stamper architecture for uniform base layer and nanoimprinting pressure
JP4736821B2 (ja) * 2006-01-24 2011-07-27 株式会社日立製作所 パターン形成方法およびパターン形成装置
ATE513625T1 (de) * 2006-04-03 2011-07-15 Molecular Imprints Inc Lithographiedrucksystem
US7802978B2 (en) 2006-04-03 2010-09-28 Molecular Imprints, Inc. Imprinting of partial fields at the edge of the wafer
US8142850B2 (en) 2006-04-03 2012-03-27 Molecular Imprints, Inc. Patterning a plurality of fields on a substrate to compensate for differing evaporation times
US8850980B2 (en) 2006-04-03 2014-10-07 Canon Nanotechnologies, Inc. Tessellated patterns in imprint lithography
KR20090003153A (ko) 2006-04-03 2009-01-09 몰레큘러 임프린츠 인코퍼레이티드 다수의 필드와 정렬 마크를 갖는 기판을 동시에 패턴화하는방법
US20070231422A1 (en) * 2006-04-03 2007-10-04 Molecular Imprints, Inc. System to vary dimensions of a thin template
WO2007117698A2 (en) 2006-04-07 2007-10-18 Qd Vision, Inc. Composition including material, methods of depositing material, articles including same and systems for depositing material
US8012395B2 (en) 2006-04-18 2011-09-06 Molecular Imprints, Inc. Template having alignment marks formed of contrast material
US7547398B2 (en) 2006-04-18 2009-06-16 Molecular Imprints, Inc. Self-aligned process for fabricating imprint templates containing variously etched features
US7854867B2 (en) 2006-04-21 2010-12-21 Molecular Imprints, Inc. Method for detecting a particle in a nanoimprint lithography system
JP4848832B2 (ja) * 2006-05-09 2011-12-28 凸版印刷株式会社 ナノインプリント装置及びナノインプリント方法
US8215946B2 (en) 2006-05-18 2012-07-10 Molecular Imprints, Inc. Imprint lithography system and method
KR100857521B1 (ko) * 2006-06-13 2008-09-08 엘지디스플레이 주식회사 박막트랜지스터 제조용 몰드의 제조방법 및 그 제조장비
WO2008111947A1 (en) 2006-06-24 2008-09-18 Qd Vision, Inc. Methods and articles including nanomaterial
JP4886400B2 (ja) * 2006-07-07 2012-02-29 株式会社日立ハイテクノロジーズ インプリント装置およびインプリント方法
US20080020303A1 (en) * 2006-07-24 2008-01-24 Wei Wu Alignment for contact lithography
US7946837B2 (en) * 2006-10-06 2011-05-24 Asml Netherlands B.V. Imprint lithography
EP2091666B1 (en) * 2006-12-04 2017-10-18 Koninklijke Philips N.V. Method and apparatus for applying a sheet to a substrate
US8172968B2 (en) * 2007-01-16 2012-05-08 Koninklijke Philips Electronics N.V. Method and system for contacting of a flexible sheet and a substrate
US20080271625A1 (en) * 2007-01-22 2008-11-06 Nano Terra Inc. High-Throughput Apparatus for Patterning Flexible Substrates and Method of Using the Same
JP5186123B2 (ja) * 2007-03-14 2013-04-17 東芝機械株式会社 転写装置および転写方法
US20080230773A1 (en) * 2007-03-20 2008-09-25 Nano Terra Inc. Polymer Composition for Preparing Electronic Devices by Microcontact Printing Processes and Products Prepared by the Processes
DE102007017502A1 (de) * 2007-04-13 2008-10-16 Aquagroup Ag Elektrochemisch behandeltes Wasser, Verfahren und Vorrichtung zu dessen Herstellung und seine Verwendung als Desinfektionsmittel
US20090025595A1 (en) * 2007-07-25 2009-01-29 Nano Terra Inc. Contact Printing Method Using an Elastomeric Stamp Having a Variable Surface Area and Variable Shape
JP4578517B2 (ja) * 2007-12-26 2010-11-10 Ｓｃｉｖａｘ株式会社 インプリント装置およびインプリント方法
US20100015270A1 (en) * 2008-07-15 2010-01-21 Molecular Imprints, Inc. Inner cavity system for nano-imprint lithography
US7927976B2 (en) * 2008-07-23 2011-04-19 Semprius, Inc. Reinforced composite stamp for dry transfer printing of semiconductor elements
WO2010059781A1 (en) * 2008-11-19 2010-05-27 Semprius, Inc. Printing semiconductor elements by shear-assisted elastomeric stamp transfer
JP5411557B2 (ja) * 2009-04-03 2014-02-12 株式会社日立ハイテクノロジーズ 微細構造転写装置
JP4944158B2 (ja) * 2009-06-01 2012-05-30 株式会社日立製作所 ナノプリント用スタンパ、及び微細構造転写方法
US8261660B2 (en) * 2009-07-22 2012-09-11 Semprius, Inc. Vacuum coupled tool apparatus for dry transfer printing semiconductor elements
JP5540628B2 (ja) * 2009-09-28 2014-07-02 大日本印刷株式会社 ナノインプリントパターン形成方法
WO2013077386A1 (ja) * 2011-11-25 2013-05-30 Ｓｃｉｖａｘ株式会社 インプリント装置およびインプリント方法
JP5759348B2 (ja) 2011-11-30 2015-08-05 株式会社Ｓｃｒｅｅｎホールディングス パターン形成装置およびパターン形成方法
JP6086675B2 (ja) 2011-11-30 2017-03-01 株式会社Ｓｃｒｅｅｎホールディングス 印刷装置および印刷方法
JP5938218B2 (ja) * 2012-01-16 2016-06-22 キヤノン株式会社 インプリント装置、物品の製造方法およびインプリント方法
JP5824379B2 (ja) * 2012-02-07 2015-11-25 キヤノン株式会社 インプリント装置、インプリント方法、及び物品の製造方法
CN103373094A (zh) * 2012-04-11 2013-10-30 得利环球有限公司 微接触印刷设备及方法
WO2014013563A1 (ja) * 2012-07-18 2014-01-23 アイトリックス株式会社 インプリント装置
EP2889895B1 (en) 2012-08-27 2017-11-15 Scivax Corporation Imprint device and imprint method
US9193199B2 (en) * 2013-11-20 2015-11-24 Eastman Kodak Company PDMS imprinting stamp with embedded flexure
US9513543B2 (en) * 2013-11-20 2016-12-06 Eastman Kodak Company Method for forming a non-deformable patterned template
JP6363838B2 (ja) * 2014-01-08 2018-07-25 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
KR102552850B1 (ko) 2014-09-22 2023-07-10 코닌클리케 필립스 엔.브이. 전사 방법 및 장치 그리고 컴퓨터 프로그램 제품
US11204550B2 (en) 2018-01-26 2021-12-21 Morphotonics Holding B.V. Process and equipment for texturing discrete substrates
JP6540848B2 (ja) * 2018-03-16 2019-07-10 大日本印刷株式会社 ナノインプリント用テンプレート

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB472796A (en) * 1936-12-03 1937-09-30 Ichiro Hakogi Method of and apparatus for printing on curved faced bodies
US3096713A (en) * 1961-12-28 1963-07-09 Jr Donal Mclaughlin Rubber stamp
US3259063A (en) * 1964-12-14 1966-07-05 Ray C Rothman Marking device
IL79158A0 (en) * 1986-06-19 1986-09-30 Becher David Self-inking rubber stamps
US5512131A (en) * 1993-10-04 1996-04-30 President And Fellows Of Harvard College Formation of microstamped patterns on surfaces and derivative articles
US5537927A (en) * 1994-08-26 1996-07-23 Tension Envelope Corporation Apparatus and method for precisely drilling alignment pin register holes in pre-marked flexible printing plates
WO1996029629A2 (en) * 1995-03-01 1996-09-26 President And Fellows Of Harvard College Microcontact printing on surfaces and derivative articles

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