KR960042213A - 비함수 오프셋 인쇄판 제조용수 도막제거성 기록 재료 - Google Patents

비함수 오프셋 인쇄판 제조용수 도막제거성 기록 재료 Download PDF

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Publication number
KR960042213A
KR960042213A KR1019960014187A KR19960014187A KR960042213A KR 960042213 A KR960042213 A KR 960042213A KR 1019960014187 A KR1019960014187 A KR 1019960014187A KR 19960014187 A KR19960014187 A KR 19960014187A KR 960042213 A KR960042213 A KR 960042213A
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KR
South Korea
Prior art keywords
recording material
material according
radiation
sensitive layer
water
Prior art date
Application number
KR1019960014187A
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English (en)
Inventor
그리스 빌리-쿠르트
콘라트 클라우스-페터
위르겐 프르치빌라 클라우스
쉴로써 한스-요아힘
Original Assignee
클라우스 슈바이처, 위르겐 플라테
훽스트 아크티엔게젤샤프트
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Application filed by 클라우스 슈바이처, 위르겐 플라테, 훽스트 아크티엔게젤샤프트 filed Critical 클라우스 슈바이처, 위르겐 플라테
Publication of KR960042213A publication Critical patent/KR960042213A/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)

Abstract

본 발명은 기재, 디아조늄 염 중축합 생성물 및 3 내지 50중량%의 무기산을 함유하는 방사선 감수성 층 및 이의 상부에 위치한 실리콘 층을 갖는 기록 재료에 관한 것이다. 비함수 방지용 오프셋 판은 기록 재료로부터 제조될 수 있다.

Description

비함수 오프셋 인쇄판 제조용수 도막제거성 기록 재료
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (18)

  1. 기재, 디아조늄 염 중축합 생성물을 함유하는 방사선 감수성 층 및 실리콘 층을 (이 순서로)갖고, 방사선 감수성 층이 무기산을, 방사선 감수성 층의 전체 중량에 대해, 3 내지 50중량% 함유하는 방사선 감수성 기록 재료.
  2. 제1항에 있어서, 방사선 감수성 층이 무기산을, 방사선 감수성 층의 전체 중량에 대해, 5 내지 45중량% 함유하는 기록 재료.
  3. 제1항에 있어서, 무기산의 pKa치가 1.5 이상인 기록 재료.
  4. 제3항에 있어서, 무기산이 인산 또는 붕산인 기록 재료.
  5. 제1항에 있어서, 기재가 금속판 또는 호일인 기록 재료.
  6. 제1항에 있어서, 방사선 감수성 층이 방향족 디아조늄염의 생성물을 함유하는 기록 재료.
  7. 제6항에 있어서, 방향족 디아조늄 염의 축합 생성물이 비치환 또는 치환된 디페닐아민-4-디아조늄염과 포름알데히드 또는 4.4´-비스메톡시메틸디페닐 에테르의 축합 생성물인 기록 재료.
  8. 제1항에 있어서, 방사선 감수성 층이 중합성 결합제 또는 결합제 혼합물을, 방사선 감수성 층의 전체 중량에 대해, 70중량% 이하 함유하는 기록 재료.
  9. 제8항에 있어서, 중합성 결합제가 극성인 기록 재료.
  10. 제9항에 있어서, 중합성 결합제가 비이온성, 수용성 중합체 또는 공중합체인 기록 재료.
  11. 제10항에 있어서, 비이온성, 수용성 중합체 또는 공중합체가 폴리사카라이드, 폴리에틸렌 옥사이드, 폴리프로필렌 옥사이드, 폴리옥시메틸렌, 폴리아크릴아미드, 폴리(N-비닐아미드), 폴리아크리레이트, 폴리메타크릴레이트 또는 폴리비닐알콜인 기록 재료.
  12. 제9항에 있어서, 중합성 결합제가 비이온성, 수불용성 중합체 또는 공중합체인 기록 재료.
  13. 제12항에 있어서, 비이온성, 수불용성 중합체 또는 공중합체가 에폭시 수지, 아크릴레이트 수지 또는 메타크릴레이트수지, 셀룰로스 유도체, 폴리비닐 부티랄 또는 이로부터 유도된 중합체인 기록 재료.
  14. 제1항에 있어서, 방사선 감수성 층의 중량이 0.001 내지 3.00g/㎡인 기록 재료.
  15. 제1항에 있어서, 실리콘 층이 1성분 또는 다성분 비경화 고무로부터 제조된 기록 재료.
  16. 제1항에 있어서, 실리콘 층의 중량이 1 내지 20g/㎡인 기록 재료.
  17. 제1항에 있어서, 영상별로 조사한 후 물로 도막제거될 수 있는 기록 재료.
  18. 제1항에 있어서, 청구된 기록 재료를 사용하고 물로 현상을 수행함을 특징으로 하여, 기록 재료를 영상별로 조사한 다음 현상시켜 비함수 오프셋 인쇄판을 제조하는 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019960014187A 1995-05-04 1996-05-02 비함수 오프셋 인쇄판 제조용수 도막제거성 기록 재료 KR960042213A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19515804.0 1995-05-04
DE19515804A DE19515804A1 (de) 1995-05-04 1995-05-04 Mit Wasser entschichtbares Aufzeichnungsmaterial zur Herstellung von Wasserlos-Offsetdruckplatten

Publications (1)

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KR960042213A true KR960042213A (ko) 1996-12-21

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Country Status (6)

Country Link
US (1) US5773187A (ko)
EP (1) EP0741334B1 (ko)
JP (1) JPH08305012A (ko)
KR (1) KR960042213A (ko)
BR (1) BR9602169A (ko)
DE (2) DE19515804A1 (ko)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19852258A1 (de) * 1998-11-11 2000-05-18 Agfa Gevaert Ag Strahlungsempfindliches Aufzeichnungsmaterial zur Herstellung von Wasserlos-Offsetdruckplatten
EP1038669B1 (en) * 1999-03-26 2005-01-26 Toray Industries, Inc. Method of producing directly imageable waterless planographic printing plate
EP1142709B1 (en) 2000-04-06 2004-11-24 Toray Industries, Inc. Directly imageable planographic printing plate and method of production thereof
US6555283B1 (en) 2000-06-07 2003-04-29 Kodak Polychrome Graphics Llc Imageable element and waterless printing plate
CN102173181A (zh) * 2011-01-24 2011-09-07 北京师范大学 一种含有重氮树脂的阴图光敏无水胶印版及其制备方法
CN102096323A (zh) * 2011-01-24 2011-06-15 北京师范大学 一种含有重氮树脂的阳图光敏无水胶印版及其制备方法
JP6930145B2 (ja) * 2016-03-15 2021-09-01 東レ株式会社 印刷版用シリコーン組成物、並びに平版印刷版原版、平版印刷版および印刷物の製造方法

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GB1146618A (en) * 1965-10-11 1969-03-26 Harry Frank Gipe Method for preparing photo-lithographic plates
US3511178A (en) * 1967-01-06 1970-05-12 Minnesota Mining & Mfg Printing plate and method
JPS5539825B2 (ko) * 1972-05-12 1980-10-14
JPS5612860B2 (ko) * 1972-10-05 1981-03-25
JPS5823616B2 (ja) * 1976-11-08 1983-05-16 東レ株式会社 感光性ポリマ組成物
JPS5555344A (en) * 1978-10-20 1980-04-23 Toray Ind Inc Lithographic printing plate
DE3545204A1 (de) * 1985-12-20 1987-06-25 Hoechst Ag Lichtempfindliche druckplatte fuer den wasserlosen offsetdruck
DE3628719A1 (de) * 1986-08-23 1988-02-25 Hoechst Ag Vorsensibilisierte druckplatte und verfahren zur herstellung einer druckform fuer den wasserlosen flachdruck
DE3715792A1 (de) * 1987-05-12 1988-11-24 Hoechst Ag Entwickler fuer wasserlos druckende offsetplatten
DE3730213A1 (de) * 1987-09-09 1989-03-30 Hoechst Ag Vorsensibilisierte druckplatte fuer den wasserlosen flachdruck und verfahren zu ihrer herstellung
DE3731438A1 (de) * 1987-09-18 1989-03-30 Hoechst Ag Lichtempfindliche druckplatte fuer den wasserlosen flachdruck
DE3738863A1 (de) * 1987-11-16 1989-05-24 Hoechst Ag Lichtempfindliche druckplatte fuer den wasserlosen offsetdruck
JPH028848A (ja) * 1988-06-28 1990-01-12 Konica Corp 湿し水不要平版印刷版材料
JPH02282257A (ja) * 1989-04-24 1990-11-19 Mitsubishi Kasei Corp 湿し水不要感光性平版印刷版
JPH02282258A (ja) * 1989-04-24 1990-11-19 Mitsubishi Kasei Corp 湿し水不要感光性平版印刷版
US5122438A (en) * 1989-11-02 1992-06-16 Konica Corporation Method for developing a waterless light-sensitive lithographic plate

Also Published As

Publication number Publication date
US5773187A (en) 1998-06-30
BR9602169A (pt) 1998-01-13
EP0741334A1 (de) 1996-11-06
JPH08305012A (ja) 1996-11-22
DE59605902D1 (de) 2000-10-26
DE19515804A1 (de) 1996-11-07
EP0741334B1 (de) 2000-09-20

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