KR960042213A - 비함수 오프셋 인쇄판 제조용수 도막제거성 기록 재료 - Google Patents
비함수 오프셋 인쇄판 제조용수 도막제거성 기록 재료 Download PDFInfo
- Publication number
- KR960042213A KR960042213A KR1019960014187A KR19960014187A KR960042213A KR 960042213 A KR960042213 A KR 960042213A KR 1019960014187 A KR1019960014187 A KR 1019960014187A KR 19960014187 A KR19960014187 A KR 19960014187A KR 960042213 A KR960042213 A KR 960042213A
- Authority
- KR
- South Korea
- Prior art keywords
- recording material
- material according
- radiation
- sensitive layer
- water
- Prior art date
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Abstract
본 발명은 기재, 디아조늄 염 중축합 생성물 및 3 내지 50중량%의 무기산을 함유하는 방사선 감수성 층 및 이의 상부에 위치한 실리콘 층을 갖는 기록 재료에 관한 것이다. 비함수 방지용 오프셋 판은 기록 재료로부터 제조될 수 있다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (18)
- 기재, 디아조늄 염 중축합 생성물을 함유하는 방사선 감수성 층 및 실리콘 층을 (이 순서로)갖고, 방사선 감수성 층이 무기산을, 방사선 감수성 층의 전체 중량에 대해, 3 내지 50중량% 함유하는 방사선 감수성 기록 재료.
- 제1항에 있어서, 방사선 감수성 층이 무기산을, 방사선 감수성 층의 전체 중량에 대해, 5 내지 45중량% 함유하는 기록 재료.
- 제1항에 있어서, 무기산의 pKa치가 1.5 이상인 기록 재료.
- 제3항에 있어서, 무기산이 인산 또는 붕산인 기록 재료.
- 제1항에 있어서, 기재가 금속판 또는 호일인 기록 재료.
- 제1항에 있어서, 방사선 감수성 층이 방향족 디아조늄염의 생성물을 함유하는 기록 재료.
- 제6항에 있어서, 방향족 디아조늄 염의 축합 생성물이 비치환 또는 치환된 디페닐아민-4-디아조늄염과 포름알데히드 또는 4.4´-비스메톡시메틸디페닐 에테르의 축합 생성물인 기록 재료.
- 제1항에 있어서, 방사선 감수성 층이 중합성 결합제 또는 결합제 혼합물을, 방사선 감수성 층의 전체 중량에 대해, 70중량% 이하 함유하는 기록 재료.
- 제8항에 있어서, 중합성 결합제가 극성인 기록 재료.
- 제9항에 있어서, 중합성 결합제가 비이온성, 수용성 중합체 또는 공중합체인 기록 재료.
- 제10항에 있어서, 비이온성, 수용성 중합체 또는 공중합체가 폴리사카라이드, 폴리에틸렌 옥사이드, 폴리프로필렌 옥사이드, 폴리옥시메틸렌, 폴리아크릴아미드, 폴리(N-비닐아미드), 폴리아크리레이트, 폴리메타크릴레이트 또는 폴리비닐알콜인 기록 재료.
- 제9항에 있어서, 중합성 결합제가 비이온성, 수불용성 중합체 또는 공중합체인 기록 재료.
- 제12항에 있어서, 비이온성, 수불용성 중합체 또는 공중합체가 에폭시 수지, 아크릴레이트 수지 또는 메타크릴레이트수지, 셀룰로스 유도체, 폴리비닐 부티랄 또는 이로부터 유도된 중합체인 기록 재료.
- 제1항에 있어서, 방사선 감수성 층의 중량이 0.001 내지 3.00g/㎡인 기록 재료.
- 제1항에 있어서, 실리콘 층이 1성분 또는 다성분 비경화 고무로부터 제조된 기록 재료.
- 제1항에 있어서, 실리콘 층의 중량이 1 내지 20g/㎡인 기록 재료.
- 제1항에 있어서, 영상별로 조사한 후 물로 도막제거될 수 있는 기록 재료.
- 제1항에 있어서, 청구된 기록 재료를 사용하고 물로 현상을 수행함을 특징으로 하여, 기록 재료를 영상별로 조사한 다음 현상시켜 비함수 오프셋 인쇄판을 제조하는 방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19515804A DE19515804A1 (de) | 1995-05-04 | 1995-05-04 | Mit Wasser entschichtbares Aufzeichnungsmaterial zur Herstellung von Wasserlos-Offsetdruckplatten |
DE19515804.0 | 1995-05-04 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR960042213A true KR960042213A (ko) | 1996-12-21 |
Family
ID=7760694
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019960014187A KR960042213A (ko) | 1995-05-04 | 1996-05-02 | 비함수 오프셋 인쇄판 제조용수 도막제거성 기록 재료 |
Country Status (6)
Country | Link |
---|---|
US (1) | US5773187A (ko) |
EP (1) | EP0741334B1 (ko) |
JP (1) | JPH08305012A (ko) |
KR (1) | KR960042213A (ko) |
BR (1) | BR9602169A (ko) |
DE (2) | DE19515804A1 (ko) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19852258A1 (de) * | 1998-11-11 | 2000-05-18 | Agfa Gevaert Ag | Strahlungsempfindliches Aufzeichnungsmaterial zur Herstellung von Wasserlos-Offsetdruckplatten |
DE60017625T2 (de) * | 1999-03-26 | 2005-12-22 | Toray Industries, Inc. | Verfahren zur Herstellung von direkt beschreibbarer Trockenflachdruckplatte |
US6787291B2 (en) | 2000-04-06 | 2004-09-07 | Toray Industries, Inc. | Directly imageable planographic printing plate and production method thereof |
US6555283B1 (en) * | 2000-06-07 | 2003-04-29 | Kodak Polychrome Graphics Llc | Imageable element and waterless printing plate |
CN102096323A (zh) * | 2011-01-24 | 2011-06-15 | 北京师范大学 | 一种含有重氮树脂的阳图光敏无水胶印版及其制备方法 |
CN102173181A (zh) * | 2011-01-24 | 2011-09-07 | 北京师范大学 | 一种含有重氮树脂的阴图光敏无水胶印版及其制备方法 |
JP6930145B2 (ja) * | 2016-03-15 | 2021-09-01 | 東レ株式会社 | 印刷版用シリコーン組成物、並びに平版印刷版原版、平版印刷版および印刷物の製造方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1146618A (en) * | 1965-10-11 | 1969-03-26 | Harry Frank Gipe | Method for preparing photo-lithographic plates |
US3511178A (en) * | 1967-01-06 | 1970-05-12 | Minnesota Mining & Mfg | Printing plate and method |
JPS5539825B2 (ko) * | 1972-05-12 | 1980-10-14 | ||
JPS5612860B2 (ko) * | 1972-10-05 | 1981-03-25 | ||
JPS5823616B2 (ja) * | 1976-11-08 | 1983-05-16 | 東レ株式会社 | 感光性ポリマ組成物 |
JPS5555344A (en) * | 1978-10-20 | 1980-04-23 | Toray Ind Inc | Lithographic printing plate |
DE3545204A1 (de) * | 1985-12-20 | 1987-06-25 | Hoechst Ag | Lichtempfindliche druckplatte fuer den wasserlosen offsetdruck |
DE3628719A1 (de) * | 1986-08-23 | 1988-02-25 | Hoechst Ag | Vorsensibilisierte druckplatte und verfahren zur herstellung einer druckform fuer den wasserlosen flachdruck |
DE3715792A1 (de) * | 1987-05-12 | 1988-11-24 | Hoechst Ag | Entwickler fuer wasserlos druckende offsetplatten |
DE3730213A1 (de) * | 1987-09-09 | 1989-03-30 | Hoechst Ag | Vorsensibilisierte druckplatte fuer den wasserlosen flachdruck und verfahren zu ihrer herstellung |
DE3731438A1 (de) * | 1987-09-18 | 1989-03-30 | Hoechst Ag | Lichtempfindliche druckplatte fuer den wasserlosen flachdruck |
DE3738863A1 (de) * | 1987-11-16 | 1989-05-24 | Hoechst Ag | Lichtempfindliche druckplatte fuer den wasserlosen offsetdruck |
JPH028848A (ja) * | 1988-06-28 | 1990-01-12 | Konica Corp | 湿し水不要平版印刷版材料 |
JPH02282258A (ja) * | 1989-04-24 | 1990-11-19 | Mitsubishi Kasei Corp | 湿し水不要感光性平版印刷版 |
JPH02282257A (ja) * | 1989-04-24 | 1990-11-19 | Mitsubishi Kasei Corp | 湿し水不要感光性平版印刷版 |
US5122438A (en) * | 1989-11-02 | 1992-06-16 | Konica Corporation | Method for developing a waterless light-sensitive lithographic plate |
-
1995
- 1995-05-04 DE DE19515804A patent/DE19515804A1/de not_active Withdrawn
-
1996
- 1996-04-25 DE DE59605902T patent/DE59605902D1/de not_active Expired - Fee Related
- 1996-04-25 EP EP96106525A patent/EP0741334B1/de not_active Expired - Lifetime
- 1996-05-01 US US08/640,702 patent/US5773187A/en not_active Expired - Fee Related
- 1996-05-02 KR KR1019960014187A patent/KR960042213A/ko not_active Application Discontinuation
- 1996-05-06 BR BR9602169A patent/BR9602169A/pt not_active Application Discontinuation
- 1996-05-07 JP JP8112676A patent/JPH08305012A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
US5773187A (en) | 1998-06-30 |
JPH08305012A (ja) | 1996-11-22 |
DE59605902D1 (de) | 2000-10-26 |
EP0741334B1 (de) | 2000-09-20 |
BR9602169A (pt) | 1998-01-13 |
EP0741334A1 (de) | 1996-11-06 |
DE19515804A1 (de) | 1996-11-07 |
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WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |