KR950007963A - 액화 가스를 이용하여 세척하는 저가의 세척 장치 - Google Patents

액화 가스를 이용하여 세척하는 저가의 세척 장치 Download PDF

Info

Publication number
KR950007963A
KR950007963A KR1019940022320A KR19940022320A KR950007963A KR 950007963 A KR950007963 A KR 950007963A KR 1019940022320 A KR1019940022320 A KR 1019940022320A KR 19940022320 A KR19940022320 A KR 19940022320A KR 950007963 A KR950007963 A KR 950007963A
Authority
KR
South Korea
Prior art keywords
liquid
chamber
liquefied gas
cleaning chamber
particles
Prior art date
Application number
KR1019940022320A
Other languages
English (en)
Inventor
비. 스탠포드 제이알. 토마스
씨. 카오 시드니
Original Assignee
완다 케이. 덴슨-로우
휴우즈 에어크라프트 캄파니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=22173939&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=KR950007963(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by 완다 케이. 덴슨-로우, 휴우즈 에어크라프트 캄파니 filed Critical 완다 케이. 덴슨-로우
Publication of KR950007963A publication Critical patent/KR950007963A/ko

Links

Classifications

    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06F—LAUNDERING, DRYING, IRONING, PRESSING OR FOLDING TEXTILE ARTICLES
    • D06F43/00—Dry-cleaning apparatus or methods using volatile solvents
    • D06F43/007—Dry cleaning methods
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0021—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by liquid gases or supercritical fluids
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06F—LAUNDERING, DRYING, IRONING, PRESSING OR FOLDING TEXTILE ARTICLES
    • D06F19/00—Washing machines using vibrations for washing purposes
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06F—LAUNDERING, DRYING, IRONING, PRESSING OR FOLDING TEXTILE ARTICLES
    • D06F43/00—Dry-cleaning apparatus or methods using volatile solvents
    • D06F43/08—Associated apparatus for handling and recovering the solvents
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/26—Cleaning or polishing of the conductive pattern

Abstract

임의의 부분(20)의 정밀 세척은 이산화탄소(CO2)와 같은 액화 가스로써 복잡하고 값비싼 프로세서 시스템을 사요하지 않고서도 달성된다. 더욱이, 펌프 및 압축기를 사용하지 않고서도 소규모의 낮은 정도의 세척 장치의 단순하고 신뢰성 있는 성능이 달성된다. 소정의 기판으로부터 불필요한 재료를 제거하기 위한 장치(10)은, (a)액화 가스로부터 얻어진 액체(12')과 불필요한 입자 및 오염물을 함유하는 기판을 수납하기 위하여 대기 온도에서 대략 105.4㎏/㎠ (1500 psi)의 최대 압력을 견디도록 설계된 벽식 용기(walled vessel) 내에 둘러싸여 형성된 세척 챔버(17)과, (b) 상기 세척 챔버 내에 기판을 지지하기 위한 수단(21)과, (c) 세척 챔버 내의 벽식 용기에 부착된 초음파 에너지 발생 변환기(18)과, (d) 대략 63.3㎏/㎠ (900 psi)의 압력 이하에서 액화 가스(12)가 세척 챔버 내로 유입되도록 하기 위해 벽식 용기에 부착된 입구 수단(16)과, (e) 세척 챔버 내의 온도를 대략 50℃이상으로 제어하기 위해 세척 챔버에 연결된 온도 제어 수단(27)과, (f) 액화 가스를 상기 입구 수단에 제공하기 위한 저장 수단(14, 44)와, (g) 액하 가스를 액체으로 변화시키기 위한 수단과, 그리고 (h) 상기 액체을 세척 챔버로부터 제거하기 위해 챔버 내에 있는 출구 수단(22)를 포함하고 있다. 상기 액체는 입자 및 유기 오염물을 제거하도록 추가적으로 처리될 수 있고, 세척 챔버로 재순환되거나 또는 대기로 방출된다. 본 방법은 높은 정도의 세척이 요구되지 않을 때에 일반적인 요염 제거 및 입자 제거 방법에 특히 적용가능하다.

Description

액화 가스를 이용하여 세척하는 저가의 세척 장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 실시에 사용되는 장치의 제1실시예를 부분적으로 단면 절개한 개략도

Claims (9)

  1. 소정의 기판의 주요 표면으로부터 불필요한 입자 및 오염물을 제거하기 위한 장치에 있어서, (a) 액화 가스로부터 얻어진 액체(12')과 불필요한 입자 및 오염물을 함유하는 기판을 수납하기 위하여 대기 온도에서 대략 105.4㎏/㎠ (1500 psi)의 최대 압력을 견디도록 설계된 벽식 용기(walled vessel)내에 둘러싸여 형성된 세척 챔버(17)과, (b) 상기 세척 챔버 내에 기판을 지지하기 위한 수단(21)과, (c) 세척 챔버 내의 벽식 용기에 부착된 초음파 에너지 발생 변환기(18)과, (d) 대략 63.3㎏/㎠ (900 psi)의 압력 이하에서 액화 가스(12)가 세척 챔버내로 유입되도록 하기 위해 벽식 용기에 부착된 입구 수단(16)과, (e) 세척 챔버 내의 온도를 대략 50℃ 이상으로 제어하기 위해 세척 챔버(17)에 연결된 온도 제어 수단(27)과, (f) 액화 가스(12)를 상기 입구 수단(28)과, 그리고 (h) 상기 액체(12')을 세척 챔버(17)로부터 제거하기 위해 챔버(17) 내에 있는 출구 수단(22)를 포함하는 것을 특징으로 하는 장치.
  2. 제1항에 있어서, 상기 액체(12')으로부터 입자의 제거를 위해 상기 출구 수단(22)와 결합된 필터 수단(24,40)을 또한 포함하는 것을 특징으로 하는 장치.
  3. 제2항에 있어서, 상기 세척 챔버(17)로부터의 제거 후에 상기 필터 수단(24)가 10 내지 100㎛크기의 입자를 상기 액체(12')으로부터 제거하기 위해 상기 출구 수단(22)와 결합되어 있는 밀폐 재순환 시스템을 포함하고, 상기 세척 챔버(17) 내로 유입되기 이전에 상기 액체(12)의 온도를 제어하기 위해 상기 저장 수단(14)와 상기 입구 수단(16) 사이에 열교환기(27)을 또한 포함하고 있으며, 상기 액화 가스로부터 상기 액체를 얻기 위한 수단이 상기 액화 가스(12)가 액체 상태(12')로 되는 것을 확실히 하기 위해 상기 필터 수단(24)와 상기 저장 수단(14)사이에 압축기 수단(32)를 구비하고 있는 것을 특징으로 하는 장치.
  4. 제3항에 있어서, 상기 여과된 액체(12')을 가스 상태(12)로 변환시키기 위해 상기 필터 수단(24)와 상기 압축기 수단(32) 사이에 감압 밸브(35)를 포함하는 것을 특징으로 하는 장치.
  5. 제3항에 있어서, 상기 액체로부터 0.1 내지 1.0㎛ 크기의 입자 및 유기 오염물을 제거하고, 상기 여과된 액체(12')을 가스 상태(12)로 변환시키기 위해 상기 필터 수단(24) 이후에 그리고 상기 압축기 수단(32) 이전에 분리기 장치(26)과, 작은 입자를 제거하기 위한 사이클론 수단(34)를 또한 포함하는 것을 특징으로 하는 장치.
  6. 제3항에 있어서, 상기 세척 챔버(17)로부터 입자 및 유기 오염물을 제거한 후에 상기 액체(12')을 감시하기 위하여 입자 및 유기 오염물의 수증을 감시하는 모니터 수단(29)를 또한 포함하고, 상기 모니터 수단은 상기 출구수단(22)와 결합되는 것을 특징으로 하는 장치.
  7. 제2항에 있어서, 상기 세척 챔버(17)로부터의 제거 이전에 10 내지 100㎛ 크기의 입자를 액체(12')으로부터 제거하기 위해 상기 필터 수단(40)이 상기 출구 수단(22)와 결합된 배출 수단을 포함하는 것을 특징으로 하는 장치.
  8. 제7항에 있어서, 상기 액체(12')으로부터 0.1 내지 1.0㎛ 크기의 입자를 제거하기 위해 상기 필터(40)을 통한 상기 액체(12')의 통로와 배출 이전의 위치 사이에 상기 출구 수단(22)와 결합한 분리기(38)을 또한 포함하는 것을 특징으로 하는 장치.
  9. 제7항에 있어서, 내장된 상기 액화 가스(12)를 가열하기 위해 상기 저장소(44) 내에 가열 수단(46)을 또한 포함하는 것을 특징으로 하는 장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019940022320A 1993-09-07 1994-09-06 액화 가스를 이용하여 세척하는 저가의 세척 장치 KR950007963A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/082,866 US5339844A (en) 1992-08-10 1993-09-07 Low cost equipment for cleaning using liquefiable gases
US8/082,866 1993-09-07

Publications (1)

Publication Number Publication Date
KR950007963A true KR950007963A (ko) 1995-04-15

Family

ID=22173939

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940022320A KR950007963A (ko) 1993-09-07 1994-09-06 액화 가스를 이용하여 세척하는 저가의 세척 장치

Country Status (7)

Country Link
US (1) US5339844A (ko)
EP (1) EP0641611B2 (ko)
JP (1) JP2922791B2 (ko)
KR (1) KR950007963A (ko)
CA (1) CA2130241A1 (ko)
DE (1) DE69410192T3 (ko)
TW (1) TW438631B (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100405156B1 (ko) * 2001-05-10 2003-11-12 김선욱 고압 세정장치

Families Citing this family (99)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6799587B2 (en) * 1992-06-30 2004-10-05 Southwest Research Institute Apparatus for contaminant removal using natural convection flow and changes in solubility concentrations by temperature
US5339844A (en) † 1992-08-10 1994-08-23 Hughes Aircraft Company Low cost equipment for cleaning using liquefiable gases
US5509431A (en) * 1993-12-14 1996-04-23 Snap-Tite, Inc. Precision cleaning vessel
US5417768A (en) * 1993-12-14 1995-05-23 Autoclave Engineers, Inc. Method of cleaning workpiece with solvent and then with liquid carbon dioxide
EP0741637B1 (en) 1994-01-31 1999-07-28 Bausch & Lomb Incorporated Treatment of contact lenses with supercritical fluid
US6260386B1 (en) * 1994-03-10 2001-07-17 Lucent Technologies Inc. Optical fiber preform cleaning method
KR0137841B1 (ko) * 1994-06-07 1998-04-27 문정환 식각잔류물 제거방법
US5647386A (en) * 1994-10-04 1997-07-15 Entropic Systems, Inc. Automatic precision cleaning apparatus with continuous on-line monitoring and feedback
EP0711864B1 (en) * 1994-11-08 2001-06-13 Raytheon Company Dry-cleaning of garments using gas-jet agitation
DE69520687T2 (de) * 1994-11-09 2001-08-23 R R Street & Co Verfahren und system zur aufbereitung von unter druck stehenden flüssigen lösungsmitteln zur reinigung von substraten
US5607518A (en) * 1995-02-22 1997-03-04 Ciba Geigy Corporation Methods of deblocking, extracting and cleaning polymeric articles with supercritical fluids
US6148644A (en) 1995-03-06 2000-11-21 Lever Brothers Company, Division Of Conopco, Inc. Dry cleaning system using densified carbon dioxide and a surfactant adjunct
US5676705A (en) * 1995-03-06 1997-10-14 Lever Brothers Company, Division Of Conopco, Inc. Method of dry cleaning fabrics using densified carbon dioxide
US5783082A (en) * 1995-11-03 1998-07-21 University Of North Carolina Cleaning process using carbon dioxide as a solvent and employing molecularly engineered surfactants
US5733378A (en) * 1996-02-26 1998-03-31 Austin American Technology Method for cleaning printed circuit boards
EP0893166A4 (en) * 1996-09-25 2004-11-10 Shuzurifuresher Kaihatsukyodok WASHING SYSTEM USING LIQUID, HIGH DENSITY GAS
US5822818A (en) * 1997-04-15 1998-10-20 Hughes Electronics Solvent resupply method for use with a carbon dioxide cleaning system
US6500605B1 (en) 1997-05-27 2002-12-31 Tokyo Electron Limited Removal of photoresist and residue from substrate using supercritical carbon dioxide process
US6306564B1 (en) 1997-05-27 2001-10-23 Tokyo Electron Limited Removal of resist or residue from semiconductors using supercritical carbon dioxide
TW539918B (en) 1997-05-27 2003-07-01 Tokyo Electron Ltd Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process
US5964230A (en) * 1997-10-06 1999-10-12 Air Products And Chemicals, Inc. Solvent purge mechanism
US5849103A (en) * 1997-12-22 1998-12-15 Seh America, Inc. Method of monitoring fluid contamination
US6070440A (en) * 1997-12-24 2000-06-06 Raytheon Commercial Laundry Llc High pressure cleaning vessel with a space saving door opening/closing apparatus
US6012307A (en) * 1997-12-24 2000-01-11 Ratheon Commercial Laundry Llc Dry-cleaning machine with controlled agitation
US5850747A (en) * 1997-12-24 1998-12-22 Raytheon Commercial Laundry Llc Liquified gas dry-cleaning system with pressure vessel temperature compensating compressor
US5858107A (en) * 1998-01-07 1999-01-12 Raytheon Company Liquid carbon dioxide cleaning using jet edge sonic whistles at low temperature
US6426136B1 (en) 1998-02-10 2002-07-30 R & D Technology, Inc. Method of reducing material size
SG109403A1 (en) * 1998-03-21 2005-03-30 Arai Kunio Method for using high density compressed liquefied gases in cleaning applications
US6098430A (en) * 1998-03-24 2000-08-08 Micell Technologies, Inc. Cleaning apparatus
US5977045A (en) * 1998-05-06 1999-11-02 Lever Brothers Company Dry cleaning system using densified carbon dioxide and a surfactant adjunct
US6113708A (en) * 1998-05-26 2000-09-05 Candescent Technologies Corporation Cleaning of flat-panel display
US5996155A (en) * 1998-07-24 1999-12-07 Raytheon Company Process for cleaning, disinfecting, and sterilizing materials using the combination of dense phase gas and ultraviolet radiation
US6290778B1 (en) 1998-08-12 2001-09-18 Hudson Technologies, Inc. Method and apparatus for sonic cleaning of heat exchangers
US6277753B1 (en) 1998-09-28 2001-08-21 Supercritical Systems Inc. Removal of CMP residue from semiconductors using supercritical carbon dioxide process
US6734120B1 (en) * 1999-02-19 2004-05-11 Axcelis Technologies, Inc. Method of photoresist ash residue removal
US6260390B1 (en) 1999-03-10 2001-07-17 Sail Star Limited Dry cleaning process using rotating basket agitation
US6212916B1 (en) 1999-03-10 2001-04-10 Sail Star Limited Dry cleaning process and system using jet agitation
US6397421B1 (en) * 1999-09-24 2002-06-04 Micell Technologies Methods and apparatus for conserving vapor and collecting liquid carbon dioxide for carbon dioxide dry cleaning
US6314601B1 (en) * 1999-09-24 2001-11-13 Mcclain James B. System for the control of a carbon dioxide cleaning apparatus
JP5073902B2 (ja) 1999-11-02 2012-11-14 東京エレクトロン株式会社 多数のワークピースを超臨界処理する方法及び装置
US6748960B1 (en) 1999-11-02 2004-06-15 Tokyo Electron Limited Apparatus for supercritical processing of multiple workpieces
US6776801B2 (en) 1999-12-16 2004-08-17 Sail Star Inc. Dry cleaning method and apparatus
US6663954B2 (en) 2000-01-03 2003-12-16 R & D Technology, Inc. Method of reducing material size
US6248136B1 (en) 2000-02-03 2001-06-19 Micell Technologies, Inc. Methods for carbon dioxide dry cleaning with integrated distribution
IL152376A0 (en) 2000-04-25 2003-05-29 Tokyo Electron Ltd Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module
US6837251B1 (en) 2000-06-21 2005-01-04 Air Products And Chemicals, Inc. Multiple contents container assembly for ultrapure solvent purging
WO2002009147A2 (en) * 2000-07-26 2002-01-31 Tokyo Electron Limited High pressure processing chamber for semiconductor substrate
JP2002237481A (ja) * 2001-02-09 2002-08-23 Kobe Steel Ltd 微細構造体の洗浄方法
JP4210045B2 (ja) * 2001-06-25 2009-01-14 横河電機株式会社 洗浄装置
KR100777233B1 (ko) * 2001-08-27 2007-11-19 주식회사 포스코 열교환기 세정 방법
WO2003028909A1 (en) * 2001-09-28 2003-04-10 Raytheon Company Dense-phase fluid cleaning system utilizing ultrasonic transducers
US20040040660A1 (en) * 2001-10-03 2004-03-04 Biberger Maximilian Albert High pressure processing chamber for multiple semiconductor substrates
US6953047B2 (en) * 2002-01-14 2005-10-11 Air Products And Chemicals, Inc. Cabinet for chemical delivery with solvent purging
US7146991B2 (en) 2002-01-23 2006-12-12 Cinetic Automation Corporation Parts washer system
US7001468B1 (en) 2002-02-15 2006-02-21 Tokyo Electron Limited Pressure energized pressure vessel opening and closing device and method of providing therefor
US6966348B2 (en) * 2002-05-23 2005-11-22 Air Products And Chemicals, Inc. Purgeable container for low vapor pressure chemicals
US6648034B1 (en) 2002-05-23 2003-11-18 Air Products And Chemicals, Inc. Purgeable manifold for low vapor pressure chemicals containers
US20030217764A1 (en) * 2002-05-23 2003-11-27 Kaoru Masuda Process and composition for removing residues from the microstructure of an object
US7267727B2 (en) * 2002-09-24 2007-09-11 Air Products And Chemicals, Inc. Processing of semiconductor components with dense processing fluids and ultrasonic energy
US6889508B2 (en) * 2002-10-02 2005-05-10 The Boc Group, Inc. High pressure CO2 purification and supply system
US6960242B2 (en) * 2002-10-02 2005-11-01 The Boc Group, Inc. CO2 recovery process for supercritical extraction
JP2004158534A (ja) * 2002-11-05 2004-06-03 Kobe Steel Ltd 微細構造体の洗浄方法
US6722642B1 (en) 2002-11-06 2004-04-20 Tokyo Electron Limited High pressure compatible vacuum chuck for semiconductor wafer including lift mechanism
US6880560B2 (en) * 2002-11-18 2005-04-19 Techsonic Substrate processing apparatus for processing substrates using dense phase gas and sonic waves
KR101108901B1 (ko) * 2003-02-06 2012-02-20 램 리써치 코포레이션 일정한 최대 효율로 ｒｆ 생성기의 자동-조정을 이용하는개선된 메가소닉 세정 작용
US7021635B2 (en) * 2003-02-06 2006-04-04 Tokyo Electron Limited Vacuum chuck utilizing sintered material and method of providing thereof
US7077917B2 (en) * 2003-02-10 2006-07-18 Tokyo Electric Limited High-pressure processing chamber for a semiconductor wafer
US7225820B2 (en) 2003-02-10 2007-06-05 Tokyo Electron Limited High-pressure processing chamber for a semiconductor wafer
US20040198066A1 (en) * 2003-03-21 2004-10-07 Applied Materials, Inc. Using supercritical fluids and/or dense fluids in semiconductor applications
US6938439B2 (en) * 2003-05-22 2005-09-06 Cool Clean Technologies, Inc. System for use of land fills and recyclable materials
US20050039775A1 (en) * 2003-08-19 2005-02-24 Whitlock Walter H. Process and system for cleaning surfaces of semiconductor wafers
US7338565B2 (en) * 2003-08-21 2008-03-04 Cinetic Automation Corporation Housingless washer
US7353832B2 (en) * 2003-08-21 2008-04-08 Cinetic Automation Corporation Housingless washer
US7186093B2 (en) * 2004-10-05 2007-03-06 Tokyo Electron Limited Method and apparatus for cooling motor bearings of a high pressure pump
US20050288485A1 (en) * 2004-06-24 2005-12-29 Mahl Jerry M Method and apparatus for pretreatment of polymeric materials utilized in carbon dioxide purification, delivery and storage systems
US7250374B2 (en) 2004-06-30 2007-07-31 Tokyo Electron Limited System and method for processing a substrate using supercritical carbon dioxide processing
US7434590B2 (en) 2004-12-22 2008-10-14 Tokyo Electron Limited Method and apparatus for clamping a substrate in a high pressure processing system
US7140393B2 (en) 2004-12-22 2006-11-28 Tokyo Electron Limited Non-contact shuttle valve for flow diversion in high pressure systems
US7435447B2 (en) 2005-02-15 2008-10-14 Tokyo Electron Limited Method and system for determining flow conditions in a high pressure processing system
US7380984B2 (en) 2005-03-28 2008-06-03 Tokyo Electron Limited Process flow thermocouple
US7767145B2 (en) 2005-03-28 2010-08-03 Toyko Electron Limited High pressure fourier transform infrared cell
US7494107B2 (en) 2005-03-30 2009-02-24 Supercritical Systems, Inc. Gate valve for plus-atmospheric pressure semiconductor process vessels
US20070228600A1 (en) * 2005-04-01 2007-10-04 Bohnert George W Method of making containers from recycled plastic resin
US7253253B2 (en) 2005-04-01 2007-08-07 Honeywell Federal Manufacturing & Technology, Llc Method of removing contaminants from plastic resins
US7789971B2 (en) 2005-05-13 2010-09-07 Tokyo Electron Limited Treatment of substrate using functionalizing agent in supercritical carbon dioxide
US7524383B2 (en) 2005-05-25 2009-04-28 Tokyo Electron Limited Method and system for passivating a processing chamber
US7361231B2 (en) * 2005-07-01 2008-04-22 Ekc Technology, Inc. System and method for mid-pressure dense phase gas and ultrasonic cleaning
US20070044427A1 (en) * 2005-08-26 2007-03-01 Atomic Energy Council - Institute Of Nuclear Energy Research Submarine ultrasonic cleaning machine
US7964029B2 (en) * 2006-07-17 2011-06-21 Thar Instrument, Inc. Process flowstream collection system
WO2008143839A1 (en) * 2007-05-15 2008-11-27 Eco2 Plastics Method and system for removing pcbs from synthetic resin materials
WO2009076576A2 (en) * 2007-12-12 2009-06-18 Eco2 Plastics Continuous system for processing particles
WO2010030505A1 (en) * 2008-09-10 2010-03-18 Austin American Technology Corporation Cleaning and testing ionic cleanliness of electronic assemblies
JP5544666B2 (ja) 2011-06-30 2014-07-09 セメス株式会社 基板処理装置
JP2013032245A (ja) * 2011-08-02 2013-02-14 Japan Organo Co Ltd 二酸化炭素精製供給方法及びシステム
CN103480609A (zh) * 2013-06-09 2014-01-01 青岛科技大学 一种超临界二氧化碳清洗精密零部件装置
CN107159643A (zh) * 2017-06-22 2017-09-15 安徽江淮汽车集团股份有限公司 多功能清洗小车及清洗控制方法
CN107855345A (zh) * 2017-11-27 2018-03-30 无锡市湖昌机械制造有限公司 自动开闭透气窗的清洗封箱室
CN108754479B (zh) * 2018-07-02 2020-04-21 杨景峰 基于高压密闭循环系统的零排放磷化、皂化的方法
US20200355431A1 (en) 2019-05-06 2020-11-12 Messer Industries Usa, Inc. Impurity Control For A High Pressure CO2 Purification And Supply System

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4561902A (en) † 1983-03-03 1985-12-31 Lee Cecil D Ultrasonic method and apparatus for cleaning transmissions
DE3611422A1 (de) † 1986-04-05 1987-10-15 Henkel Kgaa Verfahren zur reinigung verschmutzter fester formteile
US4936922A (en) * 1987-05-21 1990-06-26 Roger L. Cherry High-purity cleaning system, method, and apparatus
US4832753A (en) * 1987-05-21 1989-05-23 Tempress Measurement & Control Corporation High-purity cleaning system, method, and apparatus
DK161670C (da) * 1988-01-05 1992-01-27 Phoenix Contractors As Fremgangsmaade til rensning af forurenet materiale saasom jord og anlaeg til anvendelse ved fremgangsmaaden
US4990260A (en) * 1988-01-28 1991-02-05 The Water Group, Inc. Method and apparatus for removing oxidizable contaminants in water to achieve high purity water for industrial use
US4906387A (en) * 1988-01-28 1990-03-06 The Water Group, Inc. Method for removing oxidizable contaminants in cooling water used in conjunction with a cooling tower
US5013366A (en) * 1988-12-07 1991-05-07 Hughes Aircraft Company Cleaning process using phase shifting of dense phase gases
US5051135A (en) * 1989-01-30 1991-09-24 Kabushiki Kaisha Tiyoda Seisakusho Cleaning method using a solvent while preventing discharge of solvent vapors to the environment
US5102504A (en) * 1989-10-23 1992-04-07 Tetsuya Saito Device for solvent recovery in an ultrasonic cleaning device
US5279615A (en) † 1991-06-14 1994-01-18 The Clorox Company Method and composition using densified carbon dioxide and cleaning adjunct to clean fabrics
US5339844A (en) † 1992-08-10 1994-08-23 Hughes Aircraft Company Low cost equipment for cleaning using liquefiable gases
US5316591A (en) † 1992-08-10 1994-05-31 Hughes Aircraft Company Cleaning by cavitation in liquefied gas

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100405156B1 (ko) * 2001-05-10 2003-11-12 김선욱 고압 세정장치

Also Published As

Publication number Publication date
JPH07171527A (ja) 1995-07-11
DE69410192D1 (de) 1998-06-18
EP0641611B1 (en) 1998-05-13
TW438631B (en) 2001-06-07
JP2922791B2 (ja) 1999-07-26
DE69410192T3 (de) 2004-01-08
CA2130241A1 (en) 1995-03-08
EP0641611A1 (en) 1995-03-08
US5339844A (en) 1994-08-23
EP0641611B2 (en) 2002-07-31
DE69410192T2 (de) 1999-01-14

Similar Documents

Publication Publication Date Title
KR950007963A (ko) 액화 가스를 이용하여 세척하는 저가의 세척 장치
RU2366873C2 (ru) Система и способ извлечения гексафторида серы в газовой фазе
US5377705A (en) Precision cleaning system
US5509431A (en) Precision cleaning vessel
CA2139952A1 (en) Liquid/supercritical cleaning with decreased polymer damage
CA2104055A1 (en) Method and apparatus for recovering multicomponent vapor mixtures
JPH01196491A (ja) プラズマ炉からの排出ガス循環装置及びその方法
US7444761B2 (en) Intrinsically safe flammable solvent processing method and system
JP2989445B2 (ja) ヘリウム族気体精製装置
US4917807A (en) Method for recovering solvent
KR101099936B1 (ko) 중합체 물질의 전처리 방법 및 장치
US4770197A (en) Apparatus for recovering solvent
US4842748A (en) Methods for removing volatile substances from water using flash vaporization
EP0624405A1 (en) Megasonic cleaning system using compressed, condensed gases
US20040222152A1 (en) Process for carbon dioxide recovery from a process tool
CN210495759U (zh) 一种voc、甲醛、游离气态物和/或碳氢化合物加速蒸发室
JP4757452B2 (ja) 気液分離装置
JPH01317520A (ja) 気相析出の際の排ガス流に対するフイルタ装置
JP3289035B2 (ja) 半導体ウエハの洗浄方法
JP2007014919A (ja) 排ガス処理装置および排ガス処理システム
JPH1050648A (ja) 超臨界流体洗浄装置
JPH0663303A (ja) 洗浄装置の溶剤濃縮回収法
JPH02277236A (ja) 洗浄装置
JP2003010829A (ja) 水銀除去装置及び方法
JP2004160350A (ja) Ｐｃｂ汚染物の除染装置

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E601 Decision to refuse application