US6799587B2
(en)
*
|
1992-06-30 |
2004-10-05 |
Southwest Research Institute |
Apparatus for contaminant removal using natural convection flow and changes in solubility concentrations by temperature
|
US5339844A
(en)
†
|
1992-08-10 |
1994-08-23 |
Hughes Aircraft Company |
Low cost equipment for cleaning using liquefiable gases
|
US5509431A
(en)
*
|
1993-12-14 |
1996-04-23 |
Snap-Tite, Inc. |
Precision cleaning vessel
|
US5417768A
(en)
*
|
1993-12-14 |
1995-05-23 |
Autoclave Engineers, Inc. |
Method of cleaning workpiece with solvent and then with liquid carbon dioxide
|
AU689850B2
(en)
|
1994-01-31 |
1998-04-09 |
Bausch & Lomb Incorporated |
Treatment of contact lenses with supercritical fluid
|
US6260386B1
(en)
*
|
1994-03-10 |
2001-07-17 |
Lucent Technologies Inc. |
Optical fiber preform cleaning method
|
KR0137841B1
(ko)
*
|
1994-06-07 |
1998-04-27 |
문정환 |
식각잔류물 제거방법
|
US5647386A
(en)
*
|
1994-10-04 |
1997-07-15 |
Entropic Systems, Inc. |
Automatic precision cleaning apparatus with continuous on-line monitoring and feedback
|
EP0711864B1
(de)
*
|
1994-11-08 |
2001-06-13 |
Raytheon Company |
Trockenreinigung von Kleidungstücken unter Verwendung von Gasstrahlverwirbelung
|
EP0791093B1
(de)
*
|
1994-11-09 |
2001-04-11 |
R.R. STREET & CO., INC. |
Verfahren und system zur aufbereitung von unter druck stehenden flüssigen lösungsmitteln zur reinigung von substraten
|
US5607518A
(en)
*
|
1995-02-22 |
1997-03-04 |
Ciba Geigy Corporation |
Methods of deblocking, extracting and cleaning polymeric articles with supercritical fluids
|
US5676705A
(en)
*
|
1995-03-06 |
1997-10-14 |
Lever Brothers Company, Division Of Conopco, Inc. |
Method of dry cleaning fabrics using densified carbon dioxide
|
US6148644A
(en)
|
1995-03-06 |
2000-11-21 |
Lever Brothers Company, Division Of Conopco, Inc. |
Dry cleaning system using densified carbon dioxide and a surfactant adjunct
|
US5783082A
(en)
*
|
1995-11-03 |
1998-07-21 |
University Of North Carolina |
Cleaning process using carbon dioxide as a solvent and employing molecularly engineered surfactants
|
US5733378A
(en)
*
|
1996-02-26 |
1998-03-31 |
Austin American Technology |
Method for cleaning printed circuit boards
|
WO1998013149A1
(fr)
*
|
1996-09-25 |
1998-04-02 |
Shuzurifuresher Kaihatsukyodokumiai |
Systeme de lavage utilisant un gaz liquefie de haute densite
|
US5822818A
(en)
*
|
1997-04-15 |
1998-10-20 |
Hughes Electronics |
Solvent resupply method for use with a carbon dioxide cleaning system
|
TW539918B
(en)
|
1997-05-27 |
2003-07-01 |
Tokyo Electron Ltd |
Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process
|
US6500605B1
(en)
|
1997-05-27 |
2002-12-31 |
Tokyo Electron Limited |
Removal of photoresist and residue from substrate using supercritical carbon dioxide process
|
US6306564B1
(en)
|
1997-05-27 |
2001-10-23 |
Tokyo Electron Limited |
Removal of resist or residue from semiconductors using supercritical carbon dioxide
|
US5964230A
(en)
*
|
1997-10-06 |
1999-10-12 |
Air Products And Chemicals, Inc. |
Solvent purge mechanism
|
US5849103A
(en)
*
|
1997-12-22 |
1998-12-15 |
Seh America, Inc. |
Method of monitoring fluid contamination
|
US5850747A
(en)
*
|
1997-12-24 |
1998-12-22 |
Raytheon Commercial Laundry Llc |
Liquified gas dry-cleaning system with pressure vessel temperature compensating compressor
|
US6070440A
(en)
*
|
1997-12-24 |
2000-06-06 |
Raytheon Commercial Laundry Llc |
High pressure cleaning vessel with a space saving door opening/closing apparatus
|
US6012307A
(en)
*
|
1997-12-24 |
2000-01-11 |
Ratheon Commercial Laundry Llc |
Dry-cleaning machine with controlled agitation
|
US5858107A
(en)
*
|
1998-01-07 |
1999-01-12 |
Raytheon Company |
Liquid carbon dioxide cleaning using jet edge sonic whistles at low temperature
|
US6426136B1
(en)
|
1998-02-10 |
2002-07-30 |
R & D Technology, Inc. |
Method of reducing material size
|
SG109403A1
(en)
*
|
1998-03-21 |
2005-03-30 |
Arai Kunio |
Method for using high density compressed liquefied gases in cleaning applications
|
US6098430A
(en)
|
1998-03-24 |
2000-08-08 |
Micell Technologies, Inc. |
Cleaning apparatus
|
US5977045A
(en)
*
|
1998-05-06 |
1999-11-02 |
Lever Brothers Company |
Dry cleaning system using densified carbon dioxide and a surfactant adjunct
|
US6113708A
(en)
*
|
1998-05-26 |
2000-09-05 |
Candescent Technologies Corporation |
Cleaning of flat-panel display
|
US5996155A
(en)
*
|
1998-07-24 |
1999-12-07 |
Raytheon Company |
Process for cleaning, disinfecting, and sterilizing materials using the combination of dense phase gas and ultraviolet radiation
|
US6290778B1
(en)
|
1998-08-12 |
2001-09-18 |
Hudson Technologies, Inc. |
Method and apparatus for sonic cleaning of heat exchangers
|
US6277753B1
(en)
|
1998-09-28 |
2001-08-21 |
Supercritical Systems Inc. |
Removal of CMP residue from semiconductors using supercritical carbon dioxide process
|
US6734120B1
(en)
*
|
1999-02-19 |
2004-05-11 |
Axcelis Technologies, Inc. |
Method of photoresist ash residue removal
|
US6212916B1
(en)
|
1999-03-10 |
2001-04-10 |
Sail Star Limited |
Dry cleaning process and system using jet agitation
|
US6260390B1
(en)
|
1999-03-10 |
2001-07-17 |
Sail Star Limited |
Dry cleaning process using rotating basket agitation
|
US6397421B1
(en)
*
|
1999-09-24 |
2002-06-04 |
Micell Technologies |
Methods and apparatus for conserving vapor and collecting liquid carbon dioxide for carbon dioxide dry cleaning
|
US6314601B1
(en)
|
1999-09-24 |
2001-11-13 |
Mcclain James B. |
System for the control of a carbon dioxide cleaning apparatus
|
US6748960B1
(en)
|
1999-11-02 |
2004-06-15 |
Tokyo Electron Limited |
Apparatus for supercritical processing of multiple workpieces
|
WO2001033615A2
(en)
|
1999-11-02 |
2001-05-10 |
Tokyo Electron Limited |
Method and apparatus for supercritical processing of multiple workpieces
|
US6776801B2
(en)
|
1999-12-16 |
2004-08-17 |
Sail Star Inc. |
Dry cleaning method and apparatus
|
US6663954B2
(en)
|
2000-01-03 |
2003-12-16 |
R & D Technology, Inc. |
Method of reducing material size
|
US6248136B1
(en)
|
2000-02-03 |
2001-06-19 |
Micell Technologies, Inc. |
Methods for carbon dioxide dry cleaning with integrated distribution
|
AU2001255656A1
(en)
|
2000-04-25 |
2001-11-07 |
Tokyo Electron Limited |
Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module
|
US6837251B1
(en)
*
|
2000-06-21 |
2005-01-04 |
Air Products And Chemicals, Inc. |
Multiple contents container assembly for ultrapure solvent purging
|
AU2001290171A1
(en)
*
|
2000-07-26 |
2002-02-05 |
Tokyo Electron Limited |
High pressure processing chamber for semiconductor substrate
|
JP2002237481A
(ja)
*
|
2001-02-09 |
2002-08-23 |
Kobe Steel Ltd |
微細構造体の洗浄方法
|
KR100405156B1
(ko)
*
|
2001-05-10 |
2003-11-12 |
김선욱 |
고압 세정장치
|
JP4210045B2
(ja)
*
|
2001-06-25 |
2009-01-14 |
横河電機株式会社 |
洗浄装置
|
KR100777233B1
(ko)
*
|
2001-08-27 |
2007-11-19 |
주식회사 포스코 |
열교환기 세정 방법
|
EP1429875A1
(de)
*
|
2001-09-28 |
2004-06-23 |
Raytheon Company |
Ultraschall-reinigungssystem unter verwendung eines fluides in seiner dichten phase
|
US20040040660A1
(en)
*
|
2001-10-03 |
2004-03-04 |
Biberger Maximilian Albert |
High pressure processing chamber for multiple semiconductor substrates
|
US6953047B2
(en)
*
|
2002-01-14 |
2005-10-11 |
Air Products And Chemicals, Inc. |
Cabinet for chemical delivery with solvent purging
|
US7146991B2
(en)
|
2002-01-23 |
2006-12-12 |
Cinetic Automation Corporation |
Parts washer system
|
US7001468B1
(en)
|
2002-02-15 |
2006-02-21 |
Tokyo Electron Limited |
Pressure energized pressure vessel opening and closing device and method of providing therefor
|
US6966348B2
(en)
*
|
2002-05-23 |
2005-11-22 |
Air Products And Chemicals, Inc. |
Purgeable container for low vapor pressure chemicals
|
US6648034B1
(en)
|
2002-05-23 |
2003-11-18 |
Air Products And Chemicals, Inc. |
Purgeable manifold for low vapor pressure chemicals containers
|
US20030217764A1
(en)
*
|
2002-05-23 |
2003-11-27 |
Kaoru Masuda |
Process and composition for removing residues from the microstructure of an object
|
US7267727B2
(en)
*
|
2002-09-24 |
2007-09-11 |
Air Products And Chemicals, Inc. |
Processing of semiconductor components with dense processing fluids and ultrasonic energy
|
US6960242B2
(en)
*
|
2002-10-02 |
2005-11-01 |
The Boc Group, Inc. |
CO2 recovery process for supercritical extraction
|
US6889508B2
(en)
*
|
2002-10-02 |
2005-05-10 |
The Boc Group, Inc. |
High pressure CO2 purification and supply system
|
JP2004158534A
(ja)
*
|
2002-11-05 |
2004-06-03 |
Kobe Steel Ltd |
微細構造体の洗浄方法
|
US6722642B1
(en)
|
2002-11-06 |
2004-04-20 |
Tokyo Electron Limited |
High pressure compatible vacuum chuck for semiconductor wafer including lift mechanism
|
US6880560B2
(en)
*
|
2002-11-18 |
2005-04-19 |
Techsonic |
Substrate processing apparatus for processing substrates using dense phase gas and sonic waves
|
US7021635B2
(en)
*
|
2003-02-06 |
2006-04-04 |
Tokyo Electron Limited |
Vacuum chuck utilizing sintered material and method of providing thereof
|
WO2004071938A2
(en)
*
|
2003-02-06 |
2004-08-26 |
Lam Research Corporation |
Improved megasonic cleaning efficiency using auto- tuning of an rf generator at constant maximum efficiency
|
US7225820B2
(en)
|
2003-02-10 |
2007-06-05 |
Tokyo Electron Limited |
High-pressure processing chamber for a semiconductor wafer
|
US7077917B2
(en)
*
|
2003-02-10 |
2006-07-18 |
Tokyo Electric Limited |
High-pressure processing chamber for a semiconductor wafer
|
US20040198066A1
(en)
*
|
2003-03-21 |
2004-10-07 |
Applied Materials, Inc. |
Using supercritical fluids and/or dense fluids in semiconductor applications
|
US6938439B2
(en)
*
|
2003-05-22 |
2005-09-06 |
Cool Clean Technologies, Inc. |
System for use of land fills and recyclable materials
|
US20050039775A1
(en)
*
|
2003-08-19 |
2005-02-24 |
Whitlock Walter H. |
Process and system for cleaning surfaces of semiconductor wafers
|
US7353832B2
(en)
*
|
2003-08-21 |
2008-04-08 |
Cinetic Automation Corporation |
Housingless washer
|
US7338565B2
(en)
*
|
2003-08-21 |
2008-03-04 |
Cinetic Automation Corporation |
Housingless washer
|
US7186093B2
(en)
*
|
2004-10-05 |
2007-03-06 |
Tokyo Electron Limited |
Method and apparatus for cooling motor bearings of a high pressure pump
|
US20050288485A1
(en)
*
|
2004-06-24 |
2005-12-29 |
Mahl Jerry M |
Method and apparatus for pretreatment of polymeric materials utilized in carbon dioxide purification, delivery and storage systems
|
US7250374B2
(en)
|
2004-06-30 |
2007-07-31 |
Tokyo Electron Limited |
System and method for processing a substrate using supercritical carbon dioxide processing
|
US7140393B2
(en)
|
2004-12-22 |
2006-11-28 |
Tokyo Electron Limited |
Non-contact shuttle valve for flow diversion in high pressure systems
|
US7434590B2
(en)
|
2004-12-22 |
2008-10-14 |
Tokyo Electron Limited |
Method and apparatus for clamping a substrate in a high pressure processing system
|
US7435447B2
(en)
|
2005-02-15 |
2008-10-14 |
Tokyo Electron Limited |
Method and system for determining flow conditions in a high pressure processing system
|
US7380984B2
(en)
|
2005-03-28 |
2008-06-03 |
Tokyo Electron Limited |
Process flow thermocouple
|
US7767145B2
(en)
|
2005-03-28 |
2010-08-03 |
Toyko Electron Limited |
High pressure fourier transform infrared cell
|
US7494107B2
(en)
|
2005-03-30 |
2009-02-24 |
Supercritical Systems, Inc. |
Gate valve for plus-atmospheric pressure semiconductor process vessels
|
US7253253B2
(en)
|
2005-04-01 |
2007-08-07 |
Honeywell Federal Manufacturing & Technology, Llc |
Method of removing contaminants from plastic resins
|
US20070228600A1
(en)
*
|
2005-04-01 |
2007-10-04 |
Bohnert George W |
Method of making containers from recycled plastic resin
|
US7789971B2
(en)
|
2005-05-13 |
2010-09-07 |
Tokyo Electron Limited |
Treatment of substrate using functionalizing agent in supercritical carbon dioxide
|
US7524383B2
(en)
|
2005-05-25 |
2009-04-28 |
Tokyo Electron Limited |
Method and system for passivating a processing chamber
|
US7361231B2
(en)
*
|
2005-07-01 |
2008-04-22 |
Ekc Technology, Inc. |
System and method for mid-pressure dense phase gas and ultrasonic cleaning
|
US20070044427A1
(en)
*
|
2005-08-26 |
2007-03-01 |
Atomic Energy Council - Institute Of Nuclear Energy Research |
Submarine ultrasonic cleaning machine
|
US7964029B2
(en)
*
|
2006-07-17 |
2011-06-21 |
Thar Instrument, Inc. |
Process flowstream collection system
|
US20100236580A1
(en)
*
|
2007-05-15 |
2010-09-23 |
Delaurentiis Gary M |
METHOD AND SYSTEM FOR REMOVING PCBs FROM SYNTHETIC RESIN MATERIALS
|
US20090155437A1
(en)
*
|
2007-12-12 |
2009-06-18 |
Bohnert George W |
Continuous system for processing particles
|
US20100059084A1
(en)
*
|
2008-09-10 |
2010-03-11 |
Austin American Technology Corporation |
Cleaning and testing ionic cleanliness of electronic assemblies
|
JP5544666B2
(ja)
|
2011-06-30 |
2014-07-09 |
セメス株式会社 |
基板処理装置
|
JP2013032245A
(ja)
*
|
2011-08-02 |
2013-02-14 |
Japan Organo Co Ltd |
二酸化炭素精製供給方法及びシステム
|
CN103480609A
(zh)
*
|
2013-06-09 |
2014-01-01 |
青岛科技大学 |
一种超临界二氧化碳清洗精密零部件装置
|
CN107159643A
(zh)
*
|
2017-06-22 |
2017-09-15 |
安徽江淮汽车集团股份有限公司 |
多功能清洗小车及清洗控制方法
|
CN107855345A
(zh)
*
|
2017-11-27 |
2018-03-30 |
无锡市湖昌机械制造有限公司 |
自动开闭透气窗的清洗封箱室
|
CN108754479B
(zh)
*
|
2018-07-02 |
2020-04-21 |
杨景峰 |
基于高压密闭循环系统的零排放磷化、皂化的方法
|
US11624556B2
(en)
|
2019-05-06 |
2023-04-11 |
Messer Industries Usa, Inc. |
Impurity control for a high pressure CO2 purification and supply system
|