KR940000414A - 아세트산의 제조방법 - Google Patents

아세트산의 제조방법 Download PDF

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KR940000414A
KR940000414A KR1019930009898A KR930009898A KR940000414A KR 940000414 A KR940000414 A KR 940000414A KR 1019930009898 A KR1019930009898 A KR 1019930009898A KR 930009898 A KR930009898 A KR 930009898A KR 940000414 A KR940000414 A KR 940000414A
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zone
acetic acid
water
concentration
flash
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KR100280254B1 (ko
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데이비드 오비그느 시몬
버나드 쿠퍼 제레미
존 왓슨 데릭
윌리암스 블루스리
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리챠드 데이비드크락
비피 케미칼스 리미티드
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C51/00Preparation of carboxylic acids or their salts, halides or anhydrides
    • C07C51/10Preparation of carboxylic acids or their salts, halides or anhydrides by reaction with carbon monoxide
    • C07C51/12Preparation of carboxylic acids or their salts, halides or anhydrides by reaction with carbon monoxide on an oxygen-containing group in organic compounds, e.g. alcohols
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C51/00Preparation of carboxylic acids or their salts, halides or anhydrides
    • C07C51/42Separation; Purification; Stabilisation; Use of additives
    • C07C51/43Separation; Purification; Stabilisation; Use of additives by change of the physical state, e.g. crystallisation
    • C07C51/44Separation; Purification; Stabilisation; Use of additives by change of the physical state, e.g. crystallisation by distillation
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C53/00Saturated compounds having only one carboxyl group bound to an acyclic carbon atom or hydrogen
    • C07C53/08Acetic acid

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Compression Or Coding Systems Of Tv Signals (AREA)
  • Luminescent Compositions (AREA)
  • Glass Compositions (AREA)
  • Iron Core Of Rotating Electric Machines (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)

Abstract

본 발명은 (a) 메탄올과 일 산화탄소를 카르보닐화 영역내로 공급하고, 공정 과정에 특정한 액테 반응 조성물을 유지하며, (b) 반응기로부터 액체 반응 조성물을 회수하여 플래쉬 영역으로 도입한 다음, 특정 비율의 증기 유분 과 액체 유분을 형성하고, (c) 액체 유분을 플래쉬 영역으로부터 반응 영역으로 순환시키고, 증기 유분을 일정한 과정으로 처리하여 단일 증류 영역의 사용으로 플래쉬 영역의 증기 유분으로 부터 아세트산 생성물을 회수하는 과정들을 포함하는 아세트산의 제조방법에 관한 것이다.

Description

아세트산의 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (15)

  1. (a) 메탄올과 일산화탄소를 카르보닐화 영역내로 공급하고 여기서 공정과정중에 다음의 액체 반응 조성물, 즉 (i) 로듐 카르보닐화 촉매; (ii) 요오드화 메틸; (iii) 반응 조성물에 가용성인 요오드화염을 함유하는 카르보닐화 촉매 안정화제; (iv) 약 10중량% 이하의 농도인 한정량의 물: (v) 2중량 % 이상의 농도인 아세트산 메틸; 및 (vi) 아세트산을 함유하는 액체 반응 조성물을 유지하고, (b) 반응기로 부터 액체 반응 조성물을 회수하여,열을 가하거나 가함이 없이, 이것을 플래쉬 영역으로 도입하여 약8중량%이하의 물, 아세트산 생성물, 피로피온 산 부산물 및 플래쉬 영역 공급물의 대부분의 성분을 차지하는 아세트산 메틸과 요오드화 메틸을 함유하는 증기 유분, 및 비휘발성 로듐 촉매, 비휘발성 촉매 안정화제, 아세트산, 물 및 프래쉬 영영 공급물의 나머지 성분인 아세트산 메틸, 요오드화 메틸 및 프로피온산 부산물을 함유하는 액체 유분을 형성하고, (c) 액체 유분을 플래쉬 영역으로부터 반응영역으로 순환시키고, 다음과정에 의하여, 즉 (d) 증기 유분을 증기 및/또는 액체로서 플래쉬 영역으로부터 증류 영역으로 도입하고, (e) 증류 영역의 상부로 부터 물, 아세트산 메틸, 요오드화 메틸 및 아세트산을 함유하는 최종 순환 경스트림(light ends recycle stream)을 제거하며, (f) 플래쉬 영역의 증기 유분의 도입점 아래에 있는 증류 영역으로부터, 1500ppm미만의 물 농도 및 500ppm 미만의 프로피온산 농도를 갖는 산 생성물 스트림을 제거하는 과정에 의하여, 단일 증류 영역의 사용으로 플래쉬 영역의 증기 유분으로부터 아세트산 생성물을 회수하는 과정들을 포함하는 아세트산의 제조방법.
  2. 제1항에 있어서, 액체 반응 조성물이 약 8중량% 이하의 농도로 한정량의 물을 함유하고, 플래쉬 영역의 중기 유분이 약 6중량% 이하의 농도로 물을 함유하는 방법.
  3. 제1항에 있어서, 액체 반응 조성물이 아세트산의 휘발도와 비교하여 뭍의 휘발도를 억제하는 요오드화염을 함유하는 방법.
  4. 제3항에 있어서, 아세트산의 휘발도와 비교하여 물의 휘발도를 억제하는 요오드화염이 알칼리 금속, 알칼리토금속, 수소 및 알루미늄의 요오드화염으로 구성된 군으로 부터 선택된 하나 이상의 염을 함유하는 방법.
  5. 제1항에 있어서, 액체 반응 조성물 내의 아세트산 메틸의 농도가 2 내지 15중량% 벋위내인 방법.
  6. 제1항에 있어서, 카르보닐화 반응에 역효과를 주는 부식 금속의 농도가 액체 반응 조성물 줄에서 1000ppm 미만인 방법.
  7. 제6항에 있어서, 부식 금속이 철, 망간 및 니켈로 구성된 군으로 부터 선택된 하나 이상의 금속을 함유하는 방법.
  8. 제1항에 있어서, 단일 증류 영역이 25개 이하의 이론적 단수를 갖는 방법.
  9. 제1항에 있어서, 단일 증류 영역이 공급 지점 상부에 약 4 내지 15개의 이론적 정류 단수를 갖는 방법.
  10. 제1항에 있어서, 단일 증류 영역이 공급 지점 하부에 약 14개 이하의 이론적 단수를 갖는 방법.
  11. 제1항에 있어서, 단일 증류 영역이 57개 이하의 실제적인 분리 단수를 갖는 방법.
  12. 제1항에 있어서, 아세트산 생성물을 하나 이상의 이온 교환 수지상에 통과시켜 요오드화 오염물을 제거하는 방법.
  13. 제12항에 있어서, 하나 이상의 이온 교환 수지가 음이온 교환 수지를 포함하는 방법.
  14. 제12항에 있어서, 하나 이상의 이온 교환 수지가 은-충진 수지를 포함하는 방법.
  15. 제1항에 있어서, 액체 조성물이 (a) 약 8중량%이하의 물, (b) 2내지 15중량%의 아세트산 메틸; 및 (c) 1000ppm미만의 부식 금속을 함유하며, 플래쉬 영역의 증기 유분이 약 6중량%이하의 물을 함유하고 단일 증류 영역이 25개 이하의 이론적 단수를 갖는 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019930009898A 1992-06-02 1993-06-02 아세트산의 제조방법 KR100280254B1 (ko)

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GB9211671.4 1992-06-02
GB929211671A GB9211671D0 (en) 1992-06-02 1992-06-02 Process

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EP (1) EP0573189B1 (ko)
JP (1) JP3616400B2 (ko)
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CN (1) CN1041820C (ko)
AT (1) ATE146770T1 (ko)
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CA (1) CA2097478C (ko)
DE (1) DE69306861T2 (ko)
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FI (1) FI932515A (ko)
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KR100280254B1 (ko) 2001-02-01
NO931984D0 (no) 1993-06-01
AU3985593A (en) 1993-12-16
CN1041820C (zh) 1999-01-27
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US5416237A (en) 1995-05-16
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NO179040C (no) 1996-07-24
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SG50365A1 (en) 1998-07-20
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RU2102379C1 (ru) 1998-01-20
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