KR930001975A - 무수프탈산 제조용 촉매와 그 촉매를 이용한 무수프탈산의 제조방법 - Google Patents

무수프탈산 제조용 촉매와 그 촉매를 이용한 무수프탈산의 제조방법 Download PDF

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KR930001975A
KR930001975A KR1019920012207A KR920012207A KR930001975A KR 930001975 A KR930001975 A KR 930001975A KR 1019920012207 A KR1019920012207 A KR 1019920012207A KR 920012207 A KR920012207 A KR 920012207A KR 930001975 A KR930001975 A KR 930001975A
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weight
parts
catalyst
antimony
phthalic anhydride
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겐지 우에다
마사끼 오꾸노
다쯔야 가와바다
신야 다나까
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다나까 쇼오소
가부시기가이샤 니뽄쇼꾸바이
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    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/16—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
    • B01J23/20—Vanadium, niobium or tantalum
    • B01J23/22—Vanadium
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
    • B01J23/76—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36
    • B01J23/84—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36 with arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/002—Mixed oxides other than spinels, e.g. perovskite
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/16—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
    • B01J23/18—Arsenic, antimony or bismuth
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J27/00—Catalysts comprising the elements or compounds of halogens, sulfur, selenium, tellurium, phosphorus or nitrogen; Catalysts comprising carbon compounds
    • B01J27/14—Phosphorus; Compounds thereof
    • B01J27/186—Phosphorus; Compounds thereof with arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
    • B01J27/195—Phosphorus; Compounds thereof with arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium with vanadium, niobium or tantalum
    • B01J27/198—Vanadium
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C51/00—Preparation of carboxylic acids or their salts, halides or anhydrides
    • C07C51/16—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation
    • C07C51/21—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation with molecular oxygen
    • C07C51/255—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation with molecular oxygen of compounds containing six-membered aromatic rings without ring-splitting
    • C07C51/265—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation with molecular oxygen of compounds containing six-membered aromatic rings without ring-splitting having alkyl side chains which are oxidised to carboxyl groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C51/00—Preparation of carboxylic acids or their salts, halides or anhydrides
    • C07C51/16—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation
    • C07C51/31—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation of cyclic compounds with ring-splitting
    • C07C51/313—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation of cyclic compounds with ring-splitting with molecular oxygen
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2523/00—Constitutive chemical elements of heterogeneous catalysts

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Abstract

내용 없음.

Description

무수프탈산 제조용 촉매와 그 촉매를 이용한 무수프탈산의 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명 실시예 2에 의해 수득한 촉매 E에 대한 회절각 범위 10∼90°에서의 X선 회절 분석결과를 보여주는 도표,
제2도는 비교예2에 의해 수득한 촉매 G의 회절각 범위 10∼90°에서의 X선 회절 분석결과를 보여주는 도표,
제3도는 바나듐과 티타늄만으로 구성된 촉매의 회절각 범위 26∼36°에서의 X선 회절 분석결과를 보여주는 도표.

Claims (6)

  1. 분자산소 또는 분자산소를 함유하는 기체를 이용한 o-크실렌 및/도는 나프탈렌의 증기상 촉매산화에 의한 무수프탈산 제조에 이용되며 내열성 무기담체에 담지된 촉매 활성물질을 갖는 촉매에 있어서, 상기 촉매 활성물질은 (A) - V2O5환산 1∼20 중량부의 산화바나듐과 TiO2환산99∼80 중량부의 비표면적이 10∼60m2/g인 아나타제형의 이산화티탸늄; 및 (B)-(A)의 총 100 중량부당 Nb2O5환산 0.01∼1 중량부의 니오브, 산화물 환산 0.05∼2 중량부의 칼륨, 세슘, 루비듐과 탈륨 중에서 선택되는 하나 이상의 원소, P2O5환산 0.2∼1.2 중량부의 인 및 Sb2O5환산 0.55∼5.5 중량부의 안티몬을 함유하며, 상기 안티몬은 안티몬 급원으로서 5가의 안티몬 화합물을 사용에 의해 얻어지는 것을 특징으로 하는 무수프탈산 제조용 촉매.
  2. 제1항에 있어서, 내열성 무기담체에 담지되어 있는 촉매 활성물질층에서 직경이 0.15∼0.45μm인 세공에 의해 점유된 세공용적이 10μm 또는 그 이하의 직경을 갖는 세공에 의해 점유된 총 세공 용적의 50%이상인 것을 특징으로 하는 무수프탈산 제조용 촉매.
  3. 분자산소 또는 분자산소를 함유하는 기체를 이용한 o-크실렌 및/또는 나프탈렌의 증기상 촉매산화에 의한 무수프탈산 제조에 이용되며 내열성 무기담체에 다지된 촉매 활성물질을 갖는 촉매에 있어서, 상기 촉매 활성물질은 (A)-V2O5환산 1∼20 중량부의 산화바나듐과 TiO2환산 99∼80 중량부의 비표면적이 10∼60m2/g인 아나타제형의 이산화티타늄; 및 (B) - (A)의 총 100 중량부당 Nb2O5환산 0.01∼1 중량부의 니오브, 산화물 환산 0.05∼2 증량부의 칼륨, 세슘, 루비듐과 탈륨중에서 선택된 하나 이상의 원소, P2O5환산 0.2∼1.2 중량부의 인, Ag2O 환산 0.05∼2 중량부의 은 및 Sb2O5환산 0.55∼5.5 중량부의 안티몬을 함유하며 상기 안티몬은 안티몬 급원으로서 5가의 안티몬 화합물의 사용에 의해 얻어지는 것을 특징으로 하는 수무프탈산 제조용 촉매.
  4. 제3항에 있어서, 내열성 무기담체에 담지되어 있는 촉매 활성물질층에서 직경이 0.15∼0.45μm인 세공에 의해 점유된 세공용적이 10μm 또는 그 이하의 직경을 갖는 세공에 의해 점유된 총 세공 용적의 50% 이상인 것을 특징으로 하는 무수프탈산 제조용 촉매.
  5. 분자산소 또는 분자산소를 함유하는 기체를 이용한 o-크실렌 및/또는 나프탈렌을 촉매층에 통과시킴으로써 무수프탈산 제조하는 방법에 있어서, 반응관내의 상기 촉매층은 다수의 반응존을 만들기 위해 두 개 또는 그 이상의 구역으로 나뉘며 활성도가 조절되어진 다수의 촉매조각들이 반응존에 채워져서 촉매 활성도가 반응관의 물질기체 입구에서 출구쪽으로 높아지며, 상기 촉매는 내열성 무기담체에 담지된 촉매 활성물질을 가지며, 상기 촉매 활성물질은 (A) - V2O5환산 1∼20 중량부의 산화바나듐과 TiO2환산 99∼80 중량부의 비표면적이 10∼60m2/g인 아나타제형의 이산화티타늄; 및 (B)-(A)의 총 100 중량부당 Nb2O5환산 0.01∼1 중량부의 니오브, 산화물환산, 0.05∼2 중량부의 칼륨, 세슘, 루비듐과 탈륨중에서 선택된 하나이상의 원소, P2O5환산 0.2∼1.2 중량부의 인, 및 Sb2O5환산 0.55∼5.5 중량부의 안티몬을 함유하며, 상기 안티몬의 안티몬 급원으로서 5가지 안티몬 화합물의 사용에 의해 얻어지는 것을 특징으로 하는 무수프탈산 제조용 촉매.
  6. 분자산소 또는 분자산소를 함유하는 기체와 함께 o-크실렌 및/또는 나프탈렌의 촉매층에 통과시킴으로써 무수프탈산의 제조하는 방법에 있어서, 반응관내의 상기 촉매층은 다수의 반응존을 만들기 위해 두 개 또는 그 이상의 구역으로 나뉘며 활성도가 조절되어진 다수의 촉매 조각들리 반응존에 채워져서 촉매 활성도가 반응관의 물질기체 입구에서 출구쪽으로 높아지며, 상기 촉매는 내열성 무기담체에 담지된 촉매 활성물질을 가지며, 상기 촉매 활성물질은(A)-V2O5환산 1∼20 중량부의 산화바나듐과 TiO2환산99∼80 중량부의 비표면적이 10∼60m2/g인 아나타제형의 이산화티타늄; 및 (B)-(A)의 총 100 중량부당 Nb2O5환산 0.01∼1 중량부의 니오브, 산화물환산, 0.05∼2 중량부의 칼륨, 세슘, 루비듐과 탈륨중에서 선택된 하나이상의 원소, P2O5환산 0.2∼1.2 중량부의 인, Ag2O 환산 0,05∼2 중량부의 은 및 Sb2O5환산 0.55∼5.5 중량부의 안티몬을 함유하며, 상기 안티몬은 안티몬 급원으로서 5가의 안티몬 화합물의 사용에 의해 얻어지는 것을 특징으로 하는 무수프탈산 제조용 촉매.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019920012207A 1991-07-10 1992-07-09 무수프탈산 제조용 촉매와 그 촉매를 이용한 무수프탈산의 제조방법 KR950009710B1 (ko)

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ATE116870T1 (de) 1995-01-15
CN1030070C (zh) 1995-10-18
RU2043784C1 (ru) 1995-09-20
DE69201169D1 (de) 1995-02-23
US5235071A (en) 1993-08-10
EP0522871A1 (en) 1993-01-13
EP0522871B1 (en) 1995-01-11
ES2066561T3 (es) 1995-03-01
BR9202537A (pt) 1993-03-16
DE69201169T2 (de) 1995-05-18
JP2654315B2 (ja) 1997-09-17
KR950009710B1 (ko) 1995-08-26
CN1069263A (zh) 1993-02-24

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