KR930007927A - 오르토키실렌 및 나프탈렌 혼합물의 기상산화에 의한 무수프탈산의 제조방법 - Google Patents
오르토키실렌 및 나프탈렌 혼합물의 기상산화에 의한 무수프탈산의 제조방법 Download PDFInfo
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- KR930007927A KR930007927A KR1019920019651A KR920019651A KR930007927A KR 930007927 A KR930007927 A KR 930007927A KR 1019920019651 A KR1019920019651 A KR 1019920019651A KR 920019651 A KR920019651 A KR 920019651A KR 930007927 A KR930007927 A KR 930007927A
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- phthalic anhydride
- oxide
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- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 title claims abstract 13
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 title claims abstract 13
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 title claims abstract 10
- 239000000203 mixture Substances 0.000 title claims abstract 5
- 238000000034 method Methods 0.000 title claims description 7
- 230000003647 oxidation Effects 0.000 title claims 2
- 238000007254 oxidation reaction Methods 0.000 title claims 2
- 239000012808 vapor phase Substances 0.000 title 1
- 239000003054 catalyst Substances 0.000 claims abstract description 21
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract 13
- 229910052792 caesium Inorganic materials 0.000 claims abstract 7
- 229910052700 potassium Inorganic materials 0.000 claims abstract 7
- 229910052701 rubidium Inorganic materials 0.000 claims abstract 7
- 239000007789 gas Substances 0.000 claims abstract 5
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims abstract 5
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 claims abstract 4
- 239000000463 material Substances 0.000 claims abstract 4
- 229910001935 vanadium oxide Inorganic materials 0.000 claims abstract 4
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims abstract 2
- 229910001882 dioxygen Inorganic materials 0.000 claims abstract 2
- 229910052758 niobium Inorganic materials 0.000 claims abstract 2
- 238000004519 manufacturing process Methods 0.000 claims 8
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims 5
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 claims 5
- 239000011591 potassium Substances 0.000 claims 5
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 claims 5
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 claims 5
- 229910052716 thallium Inorganic materials 0.000 claims 5
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 claims 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims 2
- 229910052787 antimony Inorganic materials 0.000 claims 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims 2
- 238000006243 chemical reaction Methods 0.000 claims 2
- 239000002243 precursor Substances 0.000 claims 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims 2
- 125000002015 acyclic group Chemical group 0.000 claims 1
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Inorganic materials O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 claims 1
- 230000002687 intercalation Effects 0.000 claims 1
- 238000009830 intercalation Methods 0.000 claims 1
- 239000010955 niobium Substances 0.000 claims 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims 1
- 239000002994 raw material Substances 0.000 claims 1
- 229910010271 silicon carbide Inorganic materials 0.000 claims 1
- YEAUATLBSVJFOY-UHFFFAOYSA-N tetraantimony hexaoxide Chemical compound O1[Sb](O2)O[Sb]3O[Sb]1O[Sb]2O3 YEAUATLBSVJFOY-UHFFFAOYSA-N 0.000 claims 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 abstract 1
- 239000003513 alkali Substances 0.000 description 2
Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C51/00—Preparation of carboxylic acids or their salts, halides or anhydrides
- C07C51/16—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation
- C07C51/31—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation of cyclic compounds with ring-splitting
- C07C51/313—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation of cyclic compounds with ring-splitting with molecular oxygen
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/77—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom ortho- or peri-condensed with carbocyclic rings or ring systems
- C07D307/87—Benzo [c] furans; Hydrogenated benzo [c] furans
- C07D307/89—Benzo [c] furans; Hydrogenated benzo [c] furans with two oxygen atoms directly attached in positions 1 and 3
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/002—Mixed oxides other than spinels, e.g. perovskite
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/16—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
- B01J23/20—Vanadium, niobium or tantalum
- B01J23/22—Vanadium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J27/00—Catalysts comprising the elements or compounds of halogens, sulfur, selenium, tellurium, phosphorus or nitrogen; Catalysts comprising carbon compounds
- B01J27/14—Phosphorus; Compounds thereof
- B01J27/186—Phosphorus; Compounds thereof with arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
- B01J27/195—Phosphorus; Compounds thereof with arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium with vanadium, niobium or tantalum
- B01J27/198—Vanadium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J27/00—Catalysts comprising the elements or compounds of halogens, sulfur, selenium, tellurium, phosphorus or nitrogen; Catalysts comprising carbon compounds
- B01J27/20—Carbon compounds
- B01J27/22—Carbides
- B01J27/224—Silicon carbide
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C51/00—Preparation of carboxylic acids or their salts, halides or anhydrides
- C07C51/16—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation
- C07C51/21—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation with molecular oxygen
- C07C51/255—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation with molecular oxygen of compounds containing six-membered aromatic rings without ring-splitting
- C07C51/265—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation with molecular oxygen of compounds containing six-membered aromatic rings without ring-splitting having alkyl side chains which are oxidised to carboxyl groups
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2523/00—Constitutive chemical elements of heterogeneous catalysts
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Catalysts (AREA)
- Furan Compounds (AREA)
Abstract
전단촉매로서 산화바나듐 및 특정 아나타제형 산화티탄, Nb, P, 및 K,Cs, Rb 및 TI로 이루어진 군에서 선택된 적어도 1종의 성분을 함유하여 M 이루어지는 촉매물질을 불활성담채에 담지시틴 촉매와, 또한 후단촉매로서 전단촉매물질에 있어서, K,Cs, Rb,TI등의 적어도 1성분이 전단촉매에 대해 산화물로서 17-63%로 한이외에는 전단 촉매와 동일한 촉매를 반응기에 소정의 충량으로 적충충전하여, 이 반응기에 오르토키실렌 및 나트팔렌의 혼합물과 분자상 산소함유가스를 300-450℃의 온도로 유통하는 것을 특징으로 하는 오르토키실렌 및 나프탈렌의 혼합물을 촉매산화하여 무수프탈산을 제조하는 방법이다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제 1 도는 본 발명의 방법에 있어서의 후단촉매충량/전촉매충량비와 후단촉매중의 알칼리/전단촉매중의 알칼리의 중량비의 관계를 나타낸 그래프이다.
Claims (12)
- 오르토키실렌 및 나프탈렌의 혼합물을 다관식 고정상 반응기를 이용하여 분자상 산소함유가스에 의해 접촉 기상산화하여 무수프탈산을 제조하는 방법에 있어서, 전단촉매로서 전촉매충량의 원료가스 입구측에서 15-85용량%의 충량으로, 산화 바나듐을 V2O5로서 1-20중량부 및 그 입자경이 실질적으로 0.4-0.7㎛의 직경으로 이루어지는 다공성으로 비표면적이 10-60㎡/g인 아나타제형 산화티탄을 TiO₂로서 99-80중량부, 또한 이들 2성분의 합계 100중량부에 대해서 니오븀을 Mb2O5로서 0.01-1중량부, 인을 P2O5로서 0.2-1.2중량부, 안티몬을 Sb₂O₃로서 0.5-5중량부 및 칼륨, 세슘, 루비듐 및 탈륨으로 이루어진 군에서 선택된 적어도 1종의 성분을 산화물로서 0.3-1.2중량부 함유하여 이루어지는 촉매물질을 불활성담체에 5-20g/100㎖ 담지시킨 촉매와, 또한 후단촉매로서 저촉매충량의 원료가스 출구측에서 85-15용량%의 충량으로 상기 전단촉매물질에 있어서 칼륨, 세슘, 루비듐 및 탈륨으로 이루어지는 군에서 선택된 적어도 1종의 성분이 산화물로서 상기 전단촉매에 있어서의 양이 17-63중량%로 되는 촉매를 적층으로 충전하고, 이어서 이 반응기에 오르토키실렌 및 나프탈렌의 혼합물을 접촉산화하여 무스프탈산을 제조한 방법.
- 제 1 항에 있어서, 불환성 담체로서 알루미나(Ai₂O₃)의 함량이 10중량%이하이고, 또한 실리콘 카바이드(SiC)의 함향이 80중량%이상인 다공성 담체를 사용하여 이루어지는 무수프탈산의 제조방법.
- 제 2 항에 있어서, 불활성담체로서는 외관기공률이 15-40%인 다공성담체를 사영하여 이루어지는 무수프탈산의 제조방법.
- 제 1 항에 있어서, 원료가스중의 오프토키실렌의 나프탈렌에 대한 중량비가 1:99-99:1인 무수프탈산의 제조방법.
- 제 1 항에 있어서, 후단촉매에 있어서의 칼륨, 세슘, 루비듐 및 탈륨으로 이루어진 군에서 선택된 적어도 1종의 성분의 양이 산화물로서 상기 전단촉매에 있어서의 상기 성분에 대해서 20-60중량%인 무수프탈산의 제조방법.
- 제 1 항에 있어서, 전단촉매와 후단촉매의 용량비가 20:80-80:20인 무수프탈산의 제조방법.
- 제 2 항에 있어서, 불활성담체가 알루미나 함량이 5중량%이하임과 동시에, 실리콘 카바이드 함량이 95중량%이상인 무수 프탈산이 제조방법.
- 제 1 항에 있어서, 반응이 300-400℃의 온도와 1,000-6000hr-1의 공간속도로 행해지는 무수프탈산의 제조방법.
- 제 1 항에 있어서, 반응이 330-380℃의 온도와 1,000-4000hr-1의 고간속도로 행해지는 무수프탈산의 제조방법.
- 제 1 항에 있어서, 아나타제현 산화티탄의 비표면적이 15-40㎡/g인 무수프탈산의 제조방법.
- 제 2 항에 있어서, 산화바나듐이 V2O5로서 2-15중량부에 대해서 아나타제형 산화티탄은 TiO₂로서 98-85중량부이며, 동시에 산화바나듐과 산화티탄의 함유량 100중랴우에 대해서 니오븀이 Nb2O5로서 0.015-0.8중량부, 인이 P2O5로서 0.25-1중량부, 안티몬이Sb2O3로서 1-4중량부, 또한 칼륨, 세슘, 루비듐 및 탈륨으로 이루어진 군에서 선택된 적어도 1종의 성분이 산화물로서 0.4-1.1중량부인 무수프탈산의 제조방법.
- 제1항에 있어서, 후단촉매충량/전촉매충량비(%)와 후단촉매중의 칼륨,세슘, 루비듐 및 탈륨으로 이루어진 군에서 선택된 적어도 1종의 성분/전단촉매중의 상기 성분 중량비와의 관계가 만족하는 범위내인 무수프탈산의 제조방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP91-279895 | 1991-10-25 | ||
| JP27989591 | 1991-10-25 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR930007927A true KR930007927A (ko) | 1993-05-20 |
| KR0133049B1 KR0133049B1 (ko) | 1998-04-17 |
Family
ID=17617425
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019920019651A KR0133049B1 (ko) | 1991-10-25 | 1992-10-24 | 오르토키실렌 및 나프탈렌 혼합물의 기상산화에 의한 무수프탈산의 제조방법 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US5229527A (ko) |
| EP (1) | EP0539878B1 (ko) |
| KR (1) | KR0133049B1 (ko) |
| AU (1) | AU650796B2 (ko) |
| CZ (1) | CZ282750B6 (ko) |
| DE (1) | DE69207552T2 (ko) |
| ES (1) | ES2084240T3 (ko) |
| PL (1) | PL174322B1 (ko) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW415939B (en) * | 1996-10-23 | 2000-12-21 | Nippon Steel Chemical Co | Gas-phase oxidization process and process for the preparation of phthalic anhydride |
| DE19707943C2 (de) | 1997-02-27 | 1999-07-08 | Basf Ag | Verfahren zur Herstellung von Phthalsäureanhydrid und Katalysator hierfür |
| JP4097749B2 (ja) * | 1997-10-03 | 2008-06-11 | 株式会社日本触媒 | 接触酸化用触媒 |
| CN1059131C (zh) * | 1997-10-29 | 2000-12-06 | 天津市西青区杨柳青镇工艺印刷厂 | 生产苯酐用催化剂 |
| DE19823275A1 (de) | 1998-05-26 | 1999-12-02 | Basf Ag | Verfahren zur Herstellung von Phthalsäureanhydrid durch katalytische Gasphasenoxidation von x-Xylol-/-Naphthalin-Gemischen |
| DE19823262A1 (de) * | 1998-05-26 | 1999-12-02 | Basf Ag | Verfahren zur Herstellung von Phthalsäureanhydrid |
| US6465685B1 (en) | 1999-11-24 | 2002-10-15 | General Electric Company | Method for oxidation of xylene derivatives |
| US6649773B2 (en) | 2002-03-22 | 2003-11-18 | General Electric Company | Method for the manufacture of halophthalic acids and anhydrides |
| US6657068B2 (en) | 2002-03-22 | 2003-12-02 | General Electric Company | Liquid phase oxidation of halogenated ortho-xylenes |
| US6657067B2 (en) | 2002-03-22 | 2003-12-02 | General Electric Company | Method for the manufacture of chlorophthalic anhydride |
| DE10323461A1 (de) * | 2003-05-23 | 2004-12-09 | Basf Ag | Herstellung von Aldehyden, Carbonsäuren und/oder Carbonsäureanhydriden mittels Vanadiumoxid, Titandioxid und Antimonoxid enthaltender Katalysatoren |
| DE10323817A1 (de) | 2003-05-23 | 2004-12-09 | Basf Ag | Verfahren zur Herstellung von Phthalsäureanhydrid |
| DE10344846A1 (de) | 2003-09-26 | 2005-04-14 | Basf Ag | Gasphasenoxidationskatalysator mit definierter Vanadiumoxid-Teilchengrößenverteilung |
| US7541489B2 (en) | 2004-06-30 | 2009-06-02 | Sabic Innovative Plastics Ip B.V. | Method of making halophthalic acids and halophthalic anhydrides |
| JP5174462B2 (ja) * | 2004-11-18 | 2013-04-03 | ビーエーエスエフ ソシエタス・ヨーロピア | 触媒を製造するための二酸化チタン混合物の使用 |
| CN102811808A (zh) | 2010-03-19 | 2012-12-05 | 巴斯夫欧洲公司 | 基于贫硫和钙的二氧化钛的气相氧化用催化剂 |
| TW201206896A (en) | 2010-04-13 | 2012-02-16 | Basf Se | Process for controlling a gas phase oxidation reactor for preparation of phthalic anhydride |
| US8859459B2 (en) | 2010-06-30 | 2014-10-14 | Basf Se | Multilayer catalyst for preparing phthalic anhydride and process for preparing phthalic anhydride |
| US9212157B2 (en) | 2010-07-30 | 2015-12-15 | Basf Se | Catalyst for the oxidation of o-xylene and/or naphthalene to phthalic anhydride |
| DE102017202351A1 (de) | 2017-02-14 | 2018-08-16 | Clariant International Ltd | Katalysatormaterial zur Oxidation von Kohlenwasserstoffen mit antimondotiertem Titandioxid |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS591378B2 (ja) * | 1979-12-03 | 1984-01-11 | 株式会社日本触媒 | 無水フタル酸製造用触媒 |
| IT1226043B (it) * | 1981-06-16 | 1990-12-10 | Italiana Carbochimica | Procedimento per l'ottenimento di anidride ftalica partendo da ortoxilolo, naftalina e loro miscele per ossidazione in presenza di un catalizzatore specifico e catalizzatore ottenuto con la messa in opera del procedimento |
| JPS6037108B2 (ja) * | 1981-09-30 | 1985-08-24 | 新日鐵化学株式会社 | 無水フタル酸の製造方法 |
| US4469878A (en) * | 1981-09-30 | 1984-09-04 | Nippon Steel Chemical Co., Ltd. | Method for manufacture of phthalic anhydride |
| JPS63253080A (ja) * | 1987-04-10 | 1988-10-20 | Nippon Steel Chem Co Ltd | 無水フタル酸の製造方法 |
| DE3719476A1 (de) * | 1987-06-11 | 1988-12-29 | Huels Chemische Werke Ag | Verfahren zur herstellung von phthalsaeureanhydrid durch gasphasenoxidation eines o-xylol-naphthalin-gemisches |
| JPH01190677A (ja) * | 1988-01-27 | 1989-07-31 | Nippon Steel Chem Co Ltd | 無水フタル酸の製造法 |
-
1992
- 1992-10-23 US US07/965,228 patent/US5229527A/en not_active Expired - Lifetime
- 1992-10-23 CZ CS923209A patent/CZ282750B6/cs not_active IP Right Cessation
- 1992-10-23 PL PL92296341A patent/PL174322B1/pl not_active IP Right Cessation
- 1992-10-23 ES ES92118153T patent/ES2084240T3/es not_active Expired - Lifetime
- 1992-10-23 EP EP92118153A patent/EP0539878B1/en not_active Expired - Lifetime
- 1992-10-23 DE DE69207552T patent/DE69207552T2/de not_active Expired - Fee Related
- 1992-10-23 AU AU27296/92A patent/AU650796B2/en not_active Ceased
- 1992-10-24 KR KR1019920019651A patent/KR0133049B1/ko not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| DE69207552T2 (de) | 1996-06-05 |
| EP0539878A2 (en) | 1993-05-05 |
| AU650796B2 (en) | 1994-06-30 |
| KR0133049B1 (ko) | 1998-04-17 |
| ES2084240T3 (es) | 1996-05-01 |
| AU2729692A (en) | 1993-04-29 |
| EP0539878A3 (en) | 1993-05-19 |
| CZ282750B6 (cs) | 1997-09-17 |
| PL174322B1 (pl) | 1998-07-31 |
| US5229527A (en) | 1993-07-20 |
| EP0539878B1 (en) | 1996-01-10 |
| PL296341A1 (en) | 1993-07-12 |
| DE69207552D1 (de) | 1996-02-22 |
| CZ320992A3 (en) | 1993-05-12 |
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