KR920003105A - 폴리이미드막 패턴을 형성하기 위한 감광성 수지 조성물 및 그 패턴을 구비하여 이루어지는 반도체 장치 - Google Patents

폴리이미드막 패턴을 형성하기 위한 감광성 수지 조성물 및 그 패턴을 구비하여 이루어지는 반도체 장치 Download PDF

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Publication number
KR920003105A
KR920003105A KR1019910011460A KR910011460A KR920003105A KR 920003105 A KR920003105 A KR 920003105A KR 1019910011460 A KR1019910011460 A KR 1019910011460A KR 910011460 A KR910011460 A KR 910011460A KR 920003105 A KR920003105 A KR 920003105A
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KR
South Korea
Prior art keywords
substituted
resin composition
photosensitive resin
pattern
polyimide film
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KR1019910011460A
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English (en)
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KR940007803B1 (ko
Inventor
수지 하야세
유끼히로 미고가미
요시히꼬 나까노
Original Assignee
아오이 죠이찌
가부시끼가이샤 도시바
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Publication of KR920003105A publication Critical patent/KR920003105A/ko
Application granted granted Critical
Publication of KR940007803B1 publication Critical patent/KR940007803B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1057—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain
    • C08G73/106—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain containing silicon
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/42—Block-or graft-polymers containing polysiloxane sequences
    • C08G77/452—Block-or graft-polymers containing polysiloxane sequences containing nitrogen-containing sequences
    • C08G77/455—Block-or graft-polymers containing polysiloxane sequences containing nitrogen-containing sequences containing polyamide, polyesteramide or polyimide sequences
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • C08K5/541—Silicon-containing compounds containing oxygen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0754—Non-macromolecular compounds containing silicon-to-silicon bonds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904—Monomer or polymer contains initiating group
    • Y10S522/905—Benzophenone group

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Materials For Photolithography (AREA)
  • Formation Of Insulating Films (AREA)

Abstract

내용 없음.

Description

폴리이미드막 패턴을 형성하기 위한 감광성 수지 조성물 및 그 패턴을 구비하여 이루어지는 반도체 장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (2)

  1. 일반구조(Ⅰ)로 표시되는 반복단위를 함유하는 폴리아미드산과, 일반식(Ⅱ)으로 표시되는 적어도 한종류의 실릴케톤 화합물을 함유한 것을 특징으로하는 폴리이미드막 패턴을 형성하기 위한 감광성 수지 조성물.
    단 R1-R16, l, m, n, s, t, u는 각각 다음의 것을 나타낸다.
    R1: 치환 또는 비치환의또는
    R2: 2가 유기물
    R3, R4: 탄소수 1-12의 치환 또는 비치환 알킬기, 또는 탄소수 6-14의 치환 혹은 비치환 방향족기
    R5-R16의 치환 혹은 비치환 알킬기, 탄소수 6-14의 치환 혹은 비치환 방향족기, 또는 치환 혹은 비치환 실릴기
    l, m, n, s, t, u : o또는 1이면서 적어도 하나는 1인수
  2. 제 1 항의 감광성 수지 조성물을 사용하여 형성된 폴리이미드막 패턴을 패시 베이션막 또는 층간 절연막으로서 구비하여 이루어지는 반도체 장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019910011460A 1990-07-05 1991-07-05 폴리이미드막 패턴을 형성하기 위한 감광성 수지 조성물 및 그 패턴을 구비하여 이루어지는 반도체 장치 KR940007803B1 (ko)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP17630390 1990-07-05
JP1990-176303 1990-07-05
JP90-176303 1990-07-05
JP90-259033 1990-09-28
JP1990-259033 1990-09-28
JP25903390 1990-09-28

Publications (2)

Publication Number Publication Date
KR920003105A true KR920003105A (ko) 1992-02-29
KR940007803B1 KR940007803B1 (ko) 1994-08-25

Family

ID=26497270

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019910011460A KR940007803B1 (ko) 1990-07-05 1991-07-05 폴리이미드막 패턴을 형성하기 위한 감광성 수지 조성물 및 그 패턴을 구비하여 이루어지는 반도체 장치

Country Status (4)

Country Link
US (1) US5176982A (ko)
EP (1) EP0467561B1 (ko)
KR (1) KR940007803B1 (ko)
DE (1) DE69113900T2 (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5418635A (en) * 1992-02-19 1995-05-23 Sharp Kabushiki Kaisha Liquid crystal device with a reflective substrate with bumps of photosensitive resin which have 2 or more heights and random configuration
JPH0675237A (ja) * 1992-08-28 1994-03-18 Sharp Corp 反射型液晶表示装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2967162D1 (en) * 1978-09-29 1984-09-13 Hitachi Ltd Light-sensitive polymer composition
JPS57125212A (en) * 1981-01-27 1982-08-04 Toshiba Corp Photo-polymerizable composition
JPS5857428A (ja) * 1981-09-30 1983-04-05 Toshiba Corp 光重合組成物
JPS6067531A (ja) * 1983-09-22 1985-04-17 Toshiba Corp 樹脂組成物
US4698295A (en) * 1984-11-16 1987-10-06 Ciba-Geigy Corporation Polyimides, a process for their preparation and their use, and tetracarboxylic acids and tetracarboxylic acid derivatives
EP0200680A3 (de) * 1985-04-11 1988-10-05 Ciba-Geigy Ag Beschichtetes Material und dessen Verwendung
US4661611A (en) * 1985-12-06 1987-04-28 Fuji Photo Film Co., Ltd. Polyfunctional acylsilane crosslinking agents and photocrosslinking systems comprising the same
DE3701801A1 (de) * 1986-01-22 1987-07-23 Ricoh Kk Optisches informationsaufzeichnungsmaterial
JPH0259752A (ja) * 1988-08-25 1990-02-28 Toshiba Corp 感光性組成物

Also Published As

Publication number Publication date
US5176982A (en) 1993-01-05
EP0467561A3 (en) 1992-09-02
DE69113900T2 (de) 1996-03-28
DE69113900D1 (de) 1995-11-23
KR940007803B1 (ko) 1994-08-25
EP0467561B1 (en) 1995-10-18
EP0467561A2 (en) 1992-01-22

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