KR910011490A - 방사감지 장치 제조방법 - Google Patents

방사감지 장치 제조방법 Download PDF

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Publication number
KR910011490A
KR910011490A KR1019900018820A KR900018820A KR910011490A KR 910011490 A KR910011490 A KR 910011490A KR 1019900018820 A KR1019900018820 A KR 1019900018820A KR 900018820 A KR900018820 A KR 900018820A KR 910011490 A KR910011490 A KR 910011490A
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KR
South Korea
Prior art keywords
radiation sensing
acid
hydrocarbon
layer
technique
Prior art date
Application number
KR1019900018820A
Other languages
English (en)
Inventor
에드워드 머레이 데이비드
어니스트 머튜 엔드류
Original Assignee
원본미기재
듀 폰-하워슨 리미티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 원본미기재, 듀 폰-하워슨 리미티드 filed Critical 원본미기재
Publication of KR910011490A publication Critical patent/KR910011490A/ko

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B5/00—Electrostatic spraying apparatus; Spraying apparatus with means for charging the spray electrically; Apparatus for spraying liquids or other fluent materials by other electric means
    • B05B5/025—Discharge apparatus, e.g. electrostatic spray guns
    • B05B5/0255—Discharge apparatus, e.g. electrostatic spray guns spraying and depositing by electrostatic forces only
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/136—Coating process making radiation sensitive element
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/162—Protective or antiabrasion layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Light Receiving Elements (AREA)
  • Luminescent Compositions (AREA)
  • Saccharide Compounds (AREA)
  • Laminated Bodies (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Silicates, Zeolites, And Molecular Sieves (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Physical Vapour Deposition (AREA)
  • Measurement Of Radiation (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Sampling And Sample Adjustment (AREA)

Abstract

내용 없음

Description

방사감지 장치 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 따른 방사감지 장치 제조방법을 이루기 위한 가장 적당한 장치 개략적 단면도.
제2도는 본 발명에 따른 방사감지 장치 제조방법을 이루기 위한 2차적인 장치 개략적인 단면도.
제3도는 본 발명에 따른 방사감지 장치 제조방법을 이루기 위한 3차적인 장치 개략적인 단면도.

Claims (10)

  1. (1) 방사 감지층을 구성하는 기판을 제공하고, (2) 전색 액체와 방사 감지층을 현상액에 녹거나 분산하는 물질로 구성된 액체 구성물을 제공하고, (3) 상기 액체 구성물을 방사김지층의 표면에 분사 기술에 의해 방사 감지층으로 향하도록 유인하여 전색액체가 하이드로카르본으로 구성된 것을 특징으로 하는 방사감지 장치 제조방법.
  2. 제1항에 있어서, 하이드로카르본이 알리파틱 하이드로코르본인 것을 특징으로 하는 방사감지 장치 제조방법.
  3. 제1항에 있어서, 하이드로카르본이 150℃에서 200℃인 끓는 점을 가진것을 특징으로 하는 방사 감지 장치 제조방법.
  4. 제1항에 있어서, 구성물이 103∼109PSm-1의 전도성을 가진것을 특징으로 하는 방사 감지장치 제조방법.
  5. 제4항에 있어서, 분사 기술이 기판과 비교하여 적어도 5KV의 구성으로 구성물이 어떤다른 분쇄력없이 방울을 형성하도록 전위를 공급하는 단계를 포함하는 것을 특징으로 하는 방사 감지장치 제조방법.
  6. 제1항 부터 4항중 어느 한 항에 있어서, 분사 기술이 공기가 있는 또는 공기가 없는 정전기적 스프레이 기술인 것을 특징으로 하는 방사 감지장치 제조방법.
  7. 제1항 부터 4항중 어느한 항에 있어서, 스프레이 기술이 정전기적 회전벨 극미 기술인 것을 특징으로 하는 감지장치 제조방법.
  8. 제1항 부터 7항의 어느한 항에 있어서, 불연속 층의 물질이 -COOH1, -S-O3H1, -P-O3H, -SO2NH기거나 그것의 일치하는 음이온을 포함하는 것을 특징으로 하는 방사 감지장치 제조방법.
  9. 제1항부터 8항의 어느한항에 있어서, 불연속 보호층의 물질이 아크릴릭산, 메타크릴릭산, 크로토닉산, 이타코닉산, 말레익산과 푸마릭산, 이중의 하나나 더이상의 것과 스티렌, 비닐 톨루엔, 에틸렌, 프로필렌, 비닐 아세테이트, 메틸 메타크릴레이트, 부틸 케나크릴레이트, 에틸 아크릴레이트, 아크릴로니트릴 중의 하나나 더이상의 것의 중합 고분자인 것을 특징으로 하는 방사감지장치 제조방법.
  10. 제9항에 있어서, 불연속 보호층의 비닐 아세테이트/크로토닉산 중합 고분자이거나 메타크릴릭산/메타크릴릭 에스테르 중합고분자인 것을 특징으로 하는 방사감지 장치 제조방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019900018820A 1989-11-21 1990-11-20 방사감지 장치 제조방법 KR910011490A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB89262810 1989-11-21
GB898926281A GB8926281D0 (en) 1989-11-21 1989-11-21 Improvements in or relating to radiation sensitive devices

Publications (1)

Publication Number Publication Date
KR910011490A true KR910011490A (ko) 1991-08-07

Family

ID=10666652

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019900018820A KR910011490A (ko) 1989-11-21 1990-11-20 방사감지 장치 제조방법

Country Status (20)

Country Link
US (1) US5162193A (ko)
EP (1) EP0429234B1 (ko)
JP (1) JP3100056B2 (ko)
KR (1) KR910011490A (ko)
AT (1) ATE172799T1 (ko)
AU (1) AU6672490A (ko)
BR (1) BR9005871A (ko)
CA (1) CA2030363A1 (ko)
CZ (1) CZ574190A3 (ko)
DE (1) DE69032721T2 (ko)
ES (1) ES2121746T3 (ko)
FI (1) FI905723A (ko)
GB (1) GB8926281D0 (ko)
HU (1) HUT56644A (ko)
IE (1) IE904188A1 (ko)
NO (1) NO905026L (ko)
NZ (1) NZ236132A (ko)
TN (1) TNSN90137A1 (ko)
ZA (1) ZA909106B (ko)
ZW (1) ZW17590A1 (ko)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2630487B2 (ja) * 1990-06-14 1997-07-16 富士写真フイルム株式会社 感光性印刷版の製造方法
JP2622769B2 (ja) * 1990-04-19 1997-06-18 富士写真フイルム株式会社 感光性印刷版の製造方法
JPH0446343A (ja) * 1990-06-14 1992-02-17 Fuji Photo Film Co Ltd 感光性印刷版及びその製造方法
JPH0446341A (ja) * 1990-06-14 1992-02-17 Fuji Photo Film Co Ltd 感光性印刷版の製造方法
IT1252016B (it) * 1991-11-28 1995-05-27 Lastra Spa Metodo ed apparecchiatura per la mattatura di lastre da stampa fotosensibili
JPH086256A (ja) * 1994-06-24 1996-01-12 Mitsubishi Electric Corp レジストパターンの形成方法および該方法に用いられる酸性の水溶性材料組成物
DE4439184A1 (de) * 1994-11-03 1996-05-09 Hoechst Ag Lichtempfindliches Aufzeichnungsmaterial
DE19533021A1 (de) * 1995-09-07 1997-03-13 Hoechst Ag Mattiertes strahlungsempfindliches Aufzeichnungsmaterial und Verfahren zu dessen Herstellung
JPH10171124A (ja) * 1996-12-11 1998-06-26 Konica Corp 感光性印刷版の製造方法
US6433154B1 (en) 1997-06-12 2002-08-13 Bristol-Myers Squibb Company Functional receptor/kinase chimera in yeast cells
US6479216B1 (en) 1999-09-15 2002-11-12 Agfa-Gevaert Method for obtaining a heat sensitive element by spray-coating
DE69912775T2 (de) * 1999-09-15 2004-08-12 Agfa-Gevaert Verfahren zur Sprühbeschichtung eines wärmeempfindlichen Aufzeichnungselements
WO2001087491A1 (en) 2000-05-16 2001-11-22 Regents Of The University Of Minnesota High mass throughput particle generation using multiple nozzle spraying
US6500494B2 (en) 2000-12-29 2002-12-31 Kodak Polychrome Graphics Llc Spray coating matting method for printing plate precursors
US7247338B2 (en) 2001-05-16 2007-07-24 Regents Of The University Of Minnesota Coating medical devices
EP2529761B1 (en) 2006-01-31 2017-06-14 Nanocopoeia, Inc. Nanoparticle coating of surfaces
US9108217B2 (en) 2006-01-31 2015-08-18 Nanocopoeia, Inc. Nanoparticle coating of surfaces
CA2637883C (en) 2006-01-31 2015-07-07 Regents Of The University Of Minnesota Electrospray coating of objects
US9040816B2 (en) 2006-12-08 2015-05-26 Nanocopoeia, Inc. Methods and apparatus for forming photovoltaic cells using electrospray
JP5080177B2 (ja) * 2007-09-03 2012-11-21 日本電波工業株式会社 レジスト塗布装置
US20090202938A1 (en) * 2008-02-08 2009-08-13 Celin Savariar-Hauck Method of improving surface abrasion resistance of imageable elements
KR101696852B1 (ko) * 2010-01-12 2017-01-17 동부대우전자 주식회사 스팀발생장치
KR101915610B1 (ko) * 2017-02-28 2018-11-06 (주)엔피홀딩스 스팀 생성 용기

Family Cites Families (10)

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Publication number Priority date Publication date Assignee Title
US2695002A (en) * 1950-06-24 1954-11-23 Ransburg Electro Coating Corp Electrostatic atomizer of liquids
JPS5532086A (en) * 1978-08-30 1980-03-06 Fuji Photo Film Co Ltd Photosensitive printing plate
JPS5734558A (en) * 1980-08-11 1982-02-24 Fuji Photo Film Co Ltd Photosensitive printing plate
JPS58137469A (ja) * 1982-02-10 1983-08-15 Fuji Photo Film Co Ltd 記録材料のマツト化方法
JPS58182636A (ja) * 1982-04-20 1983-10-25 Fuji Photo Film Co Ltd 感光性印刷版
GB8319227D0 (en) * 1983-07-15 1983-08-17 Ici Plc Electrostatic spraying
DE3433247A1 (de) * 1984-09-11 1986-03-20 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches aufzeichnungsmaterial und verfahren zu seiner herstellung
DE3661121D1 (en) * 1985-09-03 1988-12-15 Sale Tilney Technology Plc Electrostatic coating blade and method of electrostatic spraying
GB8609703D0 (en) * 1986-04-21 1986-05-29 Ici Plc Electrostatic spraying
GB8813154D0 (en) * 1988-06-03 1988-07-06 Vickers Plc Improvements in/relating to radiation sensitive devices

Also Published As

Publication number Publication date
HUT56644A (en) 1991-09-30
ATE172799T1 (de) 1998-11-15
GB8926281D0 (en) 1990-01-10
DE69032721D1 (de) 1998-12-03
EP0429234A2 (en) 1991-05-29
FI905723A0 (fi) 1990-11-20
BR9005871A (pt) 1991-09-24
EP0429234B1 (en) 1998-10-28
ZW17590A1 (en) 1991-06-16
CA2030363A1 (en) 1991-05-22
JP3100056B2 (ja) 2000-10-16
JPH03194558A (ja) 1991-08-26
NO905026L (no) 1991-05-22
AU6672490A (en) 1991-05-30
NO905026D0 (no) 1990-11-20
HU907216D0 (en) 1991-05-28
FI905723A (fi) 1991-05-22
US5162193A (en) 1992-11-10
EP0429234A3 (en) 1991-12-27
ZA909106B (en) 1991-11-27
ES2121746T3 (es) 1998-12-16
NZ236132A (en) 1992-01-29
CZ574190A3 (en) 1993-02-17
DE69032721T2 (de) 1999-04-08
IE904188A1 (en) 1991-05-22
TNSN90137A1 (fr) 1991-03-05

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