KR910011490A - 방사감지 장치 제조방법 - Google Patents
방사감지 장치 제조방법 Download PDFInfo
- Publication number
- KR910011490A KR910011490A KR1019900018820A KR900018820A KR910011490A KR 910011490 A KR910011490 A KR 910011490A KR 1019900018820 A KR1019900018820 A KR 1019900018820A KR 900018820 A KR900018820 A KR 900018820A KR 910011490 A KR910011490 A KR 910011490A
- Authority
- KR
- South Korea
- Prior art keywords
- radiation sensing
- acid
- hydrocarbon
- layer
- technique
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B5/00—Electrostatic spraying apparatus; Spraying apparatus with means for charging the spray electrically; Apparatus for spraying liquids or other fluent materials by other electric means
- B05B5/025—Discharge apparatus, e.g. electrostatic spray guns
- B05B5/0255—Discharge apparatus, e.g. electrostatic spray guns spraying and depositing by electrostatic forces only
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/136—Coating process making radiation sensitive element
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/162—Protective or antiabrasion layer
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Light Receiving Elements (AREA)
- Luminescent Compositions (AREA)
- Silicates, Zeolites, And Molecular Sieves (AREA)
- Laminated Bodies (AREA)
- Developing Agents For Electrophotography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Saccharide Compounds (AREA)
- Physical Vapour Deposition (AREA)
- Measurement Of Radiation (AREA)
- Sampling And Sample Adjustment (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 따른 방사감지 장치 제조방법을 이루기 위한 가장 적당한 장치 개략적 단면도.
제2도는 본 발명에 따른 방사감지 장치 제조방법을 이루기 위한 2차적인 장치 개략적인 단면도.
제3도는 본 발명에 따른 방사감지 장치 제조방법을 이루기 위한 3차적인 장치 개략적인 단면도.
Claims (10)
- (1) 방사 감지층을 구성하는 기판을 제공하고, (2) 전색 액체와 방사 감지층을 현상액에 녹거나 분산하는 물질로 구성된 액체 구성물을 제공하고, (3) 상기 액체 구성물을 방사김지층의 표면에 분사 기술에 의해 방사 감지층으로 향하도록 유인하여 전색액체가 하이드로카르본으로 구성된 것을 특징으로 하는 방사감지 장치 제조방법.
- 제1항에 있어서, 하이드로카르본이 알리파틱 하이드로코르본인 것을 특징으로 하는 방사감지 장치 제조방법.
- 제1항에 있어서, 하이드로카르본이 150℃에서 200℃인 끓는 점을 가진것을 특징으로 하는 방사 감지 장치 제조방법.
- 제1항에 있어서, 구성물이 103∼109PSm-1의 전도성을 가진것을 특징으로 하는 방사 감지장치 제조방법.
- 제4항에 있어서, 분사 기술이 기판과 비교하여 적어도 5KV의 구성으로 구성물이 어떤다른 분쇄력없이 방울을 형성하도록 전위를 공급하는 단계를 포함하는 것을 특징으로 하는 방사 감지장치 제조방법.
- 제1항 부터 4항중 어느 한 항에 있어서, 분사 기술이 공기가 있는 또는 공기가 없는 정전기적 스프레이 기술인 것을 특징으로 하는 방사 감지장치 제조방법.
- 제1항 부터 4항중 어느한 항에 있어서, 스프레이 기술이 정전기적 회전벨 극미 기술인 것을 특징으로 하는 감지장치 제조방법.
- 제1항 부터 7항의 어느한 항에 있어서, 불연속 층의 물질이 -COOH1, -S-O3H1, -P-O3H, -SO2NH기거나 그것의 일치하는 음이온을 포함하는 것을 특징으로 하는 방사 감지장치 제조방법.
- 제1항부터 8항의 어느한항에 있어서, 불연속 보호층의 물질이 아크릴릭산, 메타크릴릭산, 크로토닉산, 이타코닉산, 말레익산과 푸마릭산, 이중의 하나나 더이상의 것과 스티렌, 비닐 톨루엔, 에틸렌, 프로필렌, 비닐 아세테이트, 메틸 메타크릴레이트, 부틸 케나크릴레이트, 에틸 아크릴레이트, 아크릴로니트릴 중의 하나나 더이상의 것의 중합 고분자인 것을 특징으로 하는 방사감지장치 제조방법.
- 제9항에 있어서, 불연속 보호층의 비닐 아세테이트/크로토닉산 중합 고분자이거나 메타크릴릭산/메타크릴릭 에스테르 중합고분자인 것을 특징으로 하는 방사감지 장치 제조방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB89262810 | 1989-11-21 | ||
GB898926281A GB8926281D0 (en) | 1989-11-21 | 1989-11-21 | Improvements in or relating to radiation sensitive devices |
Publications (1)
Publication Number | Publication Date |
---|---|
KR910011490A true KR910011490A (ko) | 1991-08-07 |
Family
ID=10666652
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019900018820A KR910011490A (ko) | 1989-11-21 | 1990-11-20 | 방사감지 장치 제조방법 |
Country Status (20)
Country | Link |
---|---|
US (1) | US5162193A (ko) |
EP (1) | EP0429234B1 (ko) |
JP (1) | JP3100056B2 (ko) |
KR (1) | KR910011490A (ko) |
AT (1) | ATE172799T1 (ko) |
AU (1) | AU6672490A (ko) |
BR (1) | BR9005871A (ko) |
CA (1) | CA2030363A1 (ko) |
CZ (1) | CZ574190A3 (ko) |
DE (1) | DE69032721T2 (ko) |
ES (1) | ES2121746T3 (ko) |
FI (1) | FI905723A (ko) |
GB (1) | GB8926281D0 (ko) |
HU (1) | HUT56644A (ko) |
IE (1) | IE904188A1 (ko) |
NO (1) | NO905026L (ko) |
NZ (1) | NZ236132A (ko) |
TN (1) | TNSN90137A1 (ko) |
ZA (1) | ZA909106B (ko) |
ZW (1) | ZW17590A1 (ko) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2630487B2 (ja) * | 1990-06-14 | 1997-07-16 | 富士写真フイルム株式会社 | 感光性印刷版の製造方法 |
JP2622769B2 (ja) * | 1990-04-19 | 1997-06-18 | 富士写真フイルム株式会社 | 感光性印刷版の製造方法 |
JPH0446341A (ja) * | 1990-06-14 | 1992-02-17 | Fuji Photo Film Co Ltd | 感光性印刷版の製造方法 |
JPH0446343A (ja) * | 1990-06-14 | 1992-02-17 | Fuji Photo Film Co Ltd | 感光性印刷版及びその製造方法 |
IT1252016B (it) * | 1991-11-28 | 1995-05-27 | Lastra Spa | Metodo ed apparecchiatura per la mattatura di lastre da stampa fotosensibili |
JPH086256A (ja) * | 1994-06-24 | 1996-01-12 | Mitsubishi Electric Corp | レジストパターンの形成方法および該方法に用いられる酸性の水溶性材料組成物 |
DE4439184A1 (de) * | 1994-11-03 | 1996-05-09 | Hoechst Ag | Lichtempfindliches Aufzeichnungsmaterial |
DE19533021A1 (de) * | 1995-09-07 | 1997-03-13 | Hoechst Ag | Mattiertes strahlungsempfindliches Aufzeichnungsmaterial und Verfahren zu dessen Herstellung |
JPH10171124A (ja) * | 1996-12-11 | 1998-06-26 | Konica Corp | 感光性印刷版の製造方法 |
US6433154B1 (en) | 1997-06-12 | 2002-08-13 | Bristol-Myers Squibb Company | Functional receptor/kinase chimera in yeast cells |
EP1084862B1 (en) * | 1999-09-15 | 2003-11-12 | Agfa-Gevaert | A method for obtaining a heat sensitive element by spray-coating |
US6479216B1 (en) | 1999-09-15 | 2002-11-12 | Agfa-Gevaert | Method for obtaining a heat sensitive element by spray-coating |
DE60135455D1 (de) * | 2000-05-16 | 2008-10-02 | Univ Minnesota | It einer mehrfachdüsenanordnung |
US6500494B2 (en) | 2000-12-29 | 2002-12-31 | Kodak Polychrome Graphics Llc | Spray coating matting method for printing plate precursors |
US7247338B2 (en) | 2001-05-16 | 2007-07-24 | Regents Of The University Of Minnesota | Coating medical devices |
US9248217B2 (en) | 2006-01-31 | 2016-02-02 | Nanocopocia, LLC | Nanoparticle coating of surfaces |
US9108217B2 (en) | 2006-01-31 | 2015-08-18 | Nanocopoeia, Inc. | Nanoparticle coating of surfaces |
WO2007089881A2 (en) | 2006-01-31 | 2007-08-09 | Regents Of The University Of Minnesota | Electrospray coating of objects |
US9040816B2 (en) | 2006-12-08 | 2015-05-26 | Nanocopoeia, Inc. | Methods and apparatus for forming photovoltaic cells using electrospray |
JP5080177B2 (ja) * | 2007-09-03 | 2012-11-21 | 日本電波工業株式会社 | レジスト塗布装置 |
US20090202938A1 (en) * | 2008-02-08 | 2009-08-13 | Celin Savariar-Hauck | Method of improving surface abrasion resistance of imageable elements |
KR101696852B1 (ko) * | 2010-01-12 | 2017-01-17 | 동부대우전자 주식회사 | 스팀발생장치 |
KR101915610B1 (ko) * | 2017-02-28 | 2018-11-06 | (주)엔피홀딩스 | 스팀 생성 용기 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2695002A (en) * | 1950-06-24 | 1954-11-23 | Ransburg Electro Coating Corp | Electrostatic atomizer of liquids |
JPS5532086A (en) * | 1978-08-30 | 1980-03-06 | Fuji Photo Film Co Ltd | Photosensitive printing plate |
JPS5734558A (en) * | 1980-08-11 | 1982-02-24 | Fuji Photo Film Co Ltd | Photosensitive printing plate |
JPS58137469A (ja) * | 1982-02-10 | 1983-08-15 | Fuji Photo Film Co Ltd | 記録材料のマツト化方法 |
JPS58182636A (ja) * | 1982-04-20 | 1983-10-25 | Fuji Photo Film Co Ltd | 感光性印刷版 |
GB8319227D0 (en) * | 1983-07-15 | 1983-08-17 | Ici Plc | Electrostatic spraying |
DE3433247A1 (de) * | 1984-09-11 | 1986-03-20 | Hoechst Ag, 6230 Frankfurt | Strahlungsempfindliches aufzeichnungsmaterial und verfahren zu seiner herstellung |
DE216502T1 (de) * | 1985-09-03 | 1987-07-23 | Sale Tilney Technology Plc, London | Rakel zum elektrostatischen beschichten und verfahren zum elektrostatischen bespruehen. |
GB8609703D0 (en) * | 1986-04-21 | 1986-05-29 | Ici Plc | Electrostatic spraying |
GB8813154D0 (en) * | 1988-06-03 | 1988-07-06 | Vickers Plc | Improvements in/relating to radiation sensitive devices |
-
1989
- 1989-11-21 GB GB898926281A patent/GB8926281D0/en active Pending
-
1990
- 1990-11-13 ES ES90312359T patent/ES2121746T3/es not_active Expired - Lifetime
- 1990-11-13 DE DE69032721T patent/DE69032721T2/de not_active Expired - Fee Related
- 1990-11-13 AT AT90312359T patent/ATE172799T1/de not_active IP Right Cessation
- 1990-11-13 EP EP90312359A patent/EP0429234B1/en not_active Expired - Lifetime
- 1990-11-13 ZA ZA909106A patent/ZA909106B/xx unknown
- 1990-11-16 ZW ZW175/90A patent/ZW17590A1/xx unknown
- 1990-11-16 AU AU66724/90A patent/AU6672490A/en not_active Abandoned
- 1990-11-19 US US07/615,226 patent/US5162193A/en not_active Expired - Fee Related
- 1990-11-19 NZ NZ236132A patent/NZ236132A/en unknown
- 1990-11-20 CA CA002030363A patent/CA2030363A1/en not_active Abandoned
- 1990-11-20 NO NO90905026A patent/NO905026L/no unknown
- 1990-11-20 HU HU907216A patent/HUT56644A/hu unknown
- 1990-11-20 FI FI905723A patent/FI905723A/fi not_active Application Discontinuation
- 1990-11-20 IE IE418890A patent/IE904188A1/en unknown
- 1990-11-20 KR KR1019900018820A patent/KR910011490A/ko not_active Application Discontinuation
- 1990-11-20 CZ CS905741A patent/CZ574190A3/cs unknown
- 1990-11-20 BR BR909005871A patent/BR9005871A/pt unknown
- 1990-11-21 TN TNTNSN90137A patent/TNSN90137A1/fr unknown
- 1990-11-21 JP JP02317589A patent/JP3100056B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0429234B1 (en) | 1998-10-28 |
FI905723A (fi) | 1991-05-22 |
US5162193A (en) | 1992-11-10 |
HU907216D0 (en) | 1991-05-28 |
HUT56644A (en) | 1991-09-30 |
DE69032721D1 (de) | 1998-12-03 |
EP0429234A2 (en) | 1991-05-29 |
AU6672490A (en) | 1991-05-30 |
FI905723A0 (fi) | 1990-11-20 |
NO905026L (no) | 1991-05-22 |
ES2121746T3 (es) | 1998-12-16 |
ZA909106B (en) | 1991-11-27 |
DE69032721T2 (de) | 1999-04-08 |
ATE172799T1 (de) | 1998-11-15 |
NZ236132A (en) | 1992-01-29 |
BR9005871A (pt) | 1991-09-24 |
JP3100056B2 (ja) | 2000-10-16 |
CZ574190A3 (en) | 1993-02-17 |
NO905026D0 (no) | 1990-11-20 |
CA2030363A1 (en) | 1991-05-22 |
TNSN90137A1 (fr) | 1991-03-05 |
EP0429234A3 (en) | 1991-12-27 |
GB8926281D0 (en) | 1990-01-10 |
IE904188A1 (en) | 1991-05-22 |
ZW17590A1 (en) | 1991-06-16 |
JPH03194558A (ja) | 1991-08-26 |
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Legal Events
Date | Code | Title | Description |
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WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |