TNSN90137A1 - Amelioration dans ou en rapport avec des dispositifs sensibles aux radiations - Google Patents
Amelioration dans ou en rapport avec des dispositifs sensibles aux radiationsInfo
- Publication number
- TNSN90137A1 TNSN90137A1 TNTNSN90137A TNSN90137A TNSN90137A1 TN SN90137 A1 TNSN90137 A1 TN SN90137A1 TN TNSN90137 A TNTNSN90137 A TN TNSN90137A TN SN90137 A TNSN90137 A TN SN90137A TN SN90137 A1 TNSN90137 A1 TN SN90137A1
- Authority
- TN
- Tunisia
- Prior art keywords
- radiation sensitive
- relating
- improvement
- sensitive devices
- covering layer
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B5/00—Electrostatic spraying apparatus; Spraying apparatus with means for charging the spray electrically; Apparatus for spraying liquids or other fluent materials by other electric means
- B05B5/025—Discharge apparatus, e.g. electrostatic spray guns
- B05B5/0255—Discharge apparatus, e.g. electrostatic spray guns spraying and depositing by electrostatic forces only
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/136—Coating process making radiation sensitive element
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/162—Protective or antiabrasion layer
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Light Receiving Elements (AREA)
- Luminescent Compositions (AREA)
- Laminated Bodies (AREA)
- Saccharide Compounds (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Silicates, Zeolites, And Molecular Sieves (AREA)
- Developing Agents For Electrophotography (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Sampling And Sample Adjustment (AREA)
- Physical Vapour Deposition (AREA)
- Measurement Of Radiation (AREA)
Abstract
UN DISPOSITIF SENSIBLE AU RADIATION EST MUNI D'UNE COUCHE DE REVETEMENT DISCONTINUE POUR AMELIORER LE TIRAGE SOUS VIDE. LA COUCHE DE REVETEMENT EST OBTENUE EN FORMANT UNE SOLUTION OU DISPERSION DU MATERIEL FORMANT LA COUCHE DANS UN HYDROCARBURE LIQUIDE. DES GOUTTES DE LA SOLUTION OU DISPERSION SONT ALORS PULVERISEES SUR LE DISPOSITIF SENSIBLE AUX RADIATIONS POUR FORMER LA COUCHE DE REVETEMENT DISCONTINUE
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB898926281A GB8926281D0 (en) | 1989-11-21 | 1989-11-21 | Improvements in or relating to radiation sensitive devices |
Publications (1)
Publication Number | Publication Date |
---|---|
TNSN90137A1 true TNSN90137A1 (fr) | 1991-03-05 |
Family
ID=10666652
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TNTNSN90137A TNSN90137A1 (fr) | 1989-11-21 | 1990-11-21 | Amelioration dans ou en rapport avec des dispositifs sensibles aux radiations |
Country Status (20)
Country | Link |
---|---|
US (1) | US5162193A (fr) |
EP (1) | EP0429234B1 (fr) |
JP (1) | JP3100056B2 (fr) |
KR (1) | KR910011490A (fr) |
AT (1) | ATE172799T1 (fr) |
AU (1) | AU6672490A (fr) |
BR (1) | BR9005871A (fr) |
CA (1) | CA2030363A1 (fr) |
CZ (1) | CZ574190A3 (fr) |
DE (1) | DE69032721T2 (fr) |
ES (1) | ES2121746T3 (fr) |
FI (1) | FI905723A (fr) |
GB (1) | GB8926281D0 (fr) |
HU (1) | HUT56644A (fr) |
IE (1) | IE904188A1 (fr) |
NO (1) | NO905026L (fr) |
NZ (1) | NZ236132A (fr) |
TN (1) | TNSN90137A1 (fr) |
ZA (1) | ZA909106B (fr) |
ZW (1) | ZW17590A1 (fr) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2630487B2 (ja) * | 1990-06-14 | 1997-07-16 | 富士写真フイルム株式会社 | 感光性印刷版の製造方法 |
JP2622769B2 (ja) * | 1990-04-19 | 1997-06-18 | 富士写真フイルム株式会社 | 感光性印刷版の製造方法 |
JPH0446343A (ja) * | 1990-06-14 | 1992-02-17 | Fuji Photo Film Co Ltd | 感光性印刷版及びその製造方法 |
JPH0446341A (ja) * | 1990-06-14 | 1992-02-17 | Fuji Photo Film Co Ltd | 感光性印刷版の製造方法 |
IT1252016B (it) * | 1991-11-28 | 1995-05-27 | Lastra Spa | Metodo ed apparecchiatura per la mattatura di lastre da stampa fotosensibili |
JPH086256A (ja) * | 1994-06-24 | 1996-01-12 | Mitsubishi Electric Corp | レジストパターンの形成方法および該方法に用いられる酸性の水溶性材料組成物 |
DE4439184A1 (de) * | 1994-11-03 | 1996-05-09 | Hoechst Ag | Lichtempfindliches Aufzeichnungsmaterial |
DE19533021A1 (de) * | 1995-09-07 | 1997-03-13 | Hoechst Ag | Mattiertes strahlungsempfindliches Aufzeichnungsmaterial und Verfahren zu dessen Herstellung |
JPH10171124A (ja) * | 1996-12-11 | 1998-06-26 | Konica Corp | 感光性印刷版の製造方法 |
US6433154B1 (en) | 1997-06-12 | 2002-08-13 | Bristol-Myers Squibb Company | Functional receptor/kinase chimera in yeast cells |
US6479216B1 (en) | 1999-09-15 | 2002-11-12 | Agfa-Gevaert | Method for obtaining a heat sensitive element by spray-coating |
DE69912775T2 (de) * | 1999-09-15 | 2004-08-12 | Agfa-Gevaert | Verfahren zur Sprühbeschichtung eines wärmeempfindlichen Aufzeichnungselements |
WO2001087491A1 (fr) | 2000-05-16 | 2001-11-22 | Regents Of The University Of Minnesota | Generation de particules a haut debit massique faisant appel a une pulverisation a buses multiples |
US6500494B2 (en) | 2000-12-29 | 2002-12-31 | Kodak Polychrome Graphics Llc | Spray coating matting method for printing plate precursors |
US7247338B2 (en) | 2001-05-16 | 2007-07-24 | Regents Of The University Of Minnesota | Coating medical devices |
EP2529761B1 (fr) | 2006-01-31 | 2017-06-14 | Nanocopoeia, Inc. | Revêtement de nanoparticule des surfaces |
US9108217B2 (en) | 2006-01-31 | 2015-08-18 | Nanocopoeia, Inc. | Nanoparticle coating of surfaces |
CA2637883C (fr) | 2006-01-31 | 2015-07-07 | Regents Of The University Of Minnesota | Revetement d'objets par electropulverisation |
US9040816B2 (en) | 2006-12-08 | 2015-05-26 | Nanocopoeia, Inc. | Methods and apparatus for forming photovoltaic cells using electrospray |
JP5080177B2 (ja) * | 2007-09-03 | 2012-11-21 | 日本電波工業株式会社 | レジスト塗布装置 |
US20090202938A1 (en) * | 2008-02-08 | 2009-08-13 | Celin Savariar-Hauck | Method of improving surface abrasion resistance of imageable elements |
KR101696852B1 (ko) * | 2010-01-12 | 2017-01-17 | 동부대우전자 주식회사 | 스팀발생장치 |
KR101915610B1 (ko) * | 2017-02-28 | 2018-11-06 | (주)엔피홀딩스 | 스팀 생성 용기 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2695002A (en) * | 1950-06-24 | 1954-11-23 | Ransburg Electro Coating Corp | Electrostatic atomizer of liquids |
JPS5532086A (en) * | 1978-08-30 | 1980-03-06 | Fuji Photo Film Co Ltd | Photosensitive printing plate |
JPS5734558A (en) * | 1980-08-11 | 1982-02-24 | Fuji Photo Film Co Ltd | Photosensitive printing plate |
JPS58137469A (ja) * | 1982-02-10 | 1983-08-15 | Fuji Photo Film Co Ltd | 記録材料のマツト化方法 |
JPS58182636A (ja) * | 1982-04-20 | 1983-10-25 | Fuji Photo Film Co Ltd | 感光性印刷版 |
GB8319227D0 (en) * | 1983-07-15 | 1983-08-17 | Ici Plc | Electrostatic spraying |
DE3433247A1 (de) * | 1984-09-11 | 1986-03-20 | Hoechst Ag, 6230 Frankfurt | Strahlungsempfindliches aufzeichnungsmaterial und verfahren zu seiner herstellung |
DE3661121D1 (en) * | 1985-09-03 | 1988-12-15 | Sale Tilney Technology Plc | Electrostatic coating blade and method of electrostatic spraying |
GB8609703D0 (en) * | 1986-04-21 | 1986-05-29 | Ici Plc | Electrostatic spraying |
GB8813154D0 (en) * | 1988-06-03 | 1988-07-06 | Vickers Plc | Improvements in/relating to radiation sensitive devices |
-
1989
- 1989-11-21 GB GB898926281A patent/GB8926281D0/en active Pending
-
1990
- 1990-11-13 ES ES90312359T patent/ES2121746T3/es not_active Expired - Lifetime
- 1990-11-13 AT AT90312359T patent/ATE172799T1/de not_active IP Right Cessation
- 1990-11-13 DE DE69032721T patent/DE69032721T2/de not_active Expired - Fee Related
- 1990-11-13 ZA ZA909106A patent/ZA909106B/xx unknown
- 1990-11-13 EP EP90312359A patent/EP0429234B1/fr not_active Expired - Lifetime
- 1990-11-16 AU AU66724/90A patent/AU6672490A/en not_active Abandoned
- 1990-11-16 ZW ZW175/90A patent/ZW17590A1/xx unknown
- 1990-11-19 US US07/615,226 patent/US5162193A/en not_active Expired - Fee Related
- 1990-11-19 NZ NZ236132A patent/NZ236132A/en unknown
- 1990-11-20 FI FI905723A patent/FI905723A/fi not_active Application Discontinuation
- 1990-11-20 CZ CS905741A patent/CZ574190A3/cs unknown
- 1990-11-20 BR BR909005871A patent/BR9005871A/pt unknown
- 1990-11-20 KR KR1019900018820A patent/KR910011490A/ko not_active Application Discontinuation
- 1990-11-20 HU HU907216A patent/HUT56644A/hu unknown
- 1990-11-20 CA CA002030363A patent/CA2030363A1/fr not_active Abandoned
- 1990-11-20 IE IE418890A patent/IE904188A1/en unknown
- 1990-11-20 NO NO90905026A patent/NO905026L/no unknown
- 1990-11-21 TN TNTNSN90137A patent/TNSN90137A1/fr unknown
- 1990-11-21 JP JP02317589A patent/JP3100056B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
HUT56644A (en) | 1991-09-30 |
ATE172799T1 (de) | 1998-11-15 |
GB8926281D0 (en) | 1990-01-10 |
DE69032721D1 (de) | 1998-12-03 |
EP0429234A2 (fr) | 1991-05-29 |
FI905723A0 (fi) | 1990-11-20 |
BR9005871A (pt) | 1991-09-24 |
EP0429234B1 (fr) | 1998-10-28 |
ZW17590A1 (en) | 1991-06-16 |
CA2030363A1 (fr) | 1991-05-22 |
JP3100056B2 (ja) | 2000-10-16 |
JPH03194558A (ja) | 1991-08-26 |
KR910011490A (ko) | 1991-08-07 |
NO905026L (no) | 1991-05-22 |
AU6672490A (en) | 1991-05-30 |
NO905026D0 (no) | 1990-11-20 |
HU907216D0 (en) | 1991-05-28 |
FI905723A (fi) | 1991-05-22 |
US5162193A (en) | 1992-11-10 |
EP0429234A3 (en) | 1991-12-27 |
ZA909106B (en) | 1991-11-27 |
ES2121746T3 (es) | 1998-12-16 |
NZ236132A (en) | 1992-01-29 |
CZ574190A3 (en) | 1993-02-17 |
DE69032721T2 (de) | 1999-04-08 |
IE904188A1 (en) | 1991-05-22 |
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